JP2013254783A5 - - Google Patents

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Publication number
JP2013254783A5
JP2013254783A5 JP2012128158A JP2012128158A JP2013254783A5 JP 2013254783 A5 JP2013254783 A5 JP 2013254783A5 JP 2012128158 A JP2012128158 A JP 2012128158A JP 2012128158 A JP2012128158 A JP 2012128158A JP 2013254783 A5 JP2013254783 A5 JP 2013254783A5
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JP
Japan
Prior art keywords
mold
butane
gas
imprint
resin
Prior art date
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Granted
Application number
JP2012128158A
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English (en)
Japanese (ja)
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JP2013254783A (ja
JP5932500B2 (ja
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Priority to JP2012128158A priority Critical patent/JP5932500B2/ja
Priority claimed from JP2012128158A external-priority patent/JP5932500B2/ja
Publication of JP2013254783A publication Critical patent/JP2013254783A/ja
Publication of JP2013254783A5 publication Critical patent/JP2013254783A5/ja
Application granted granted Critical
Publication of JP5932500B2 publication Critical patent/JP5932500B2/ja
Active legal-status Critical Current
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JP2012128158A 2012-06-05 2012-06-05 インプリント方法およびインプリント装置、それを用いた物品の製造方法 Active JP5932500B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012128158A JP5932500B2 (ja) 2012-06-05 2012-06-05 インプリント方法およびインプリント装置、それを用いた物品の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012128158A JP5932500B2 (ja) 2012-06-05 2012-06-05 インプリント方法およびインプリント装置、それを用いた物品の製造方法

Publications (3)

Publication Number Publication Date
JP2013254783A JP2013254783A (ja) 2013-12-19
JP2013254783A5 true JP2013254783A5 (enExample) 2015-07-16
JP5932500B2 JP5932500B2 (ja) 2016-06-08

Family

ID=49952078

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012128158A Active JP5932500B2 (ja) 2012-06-05 2012-06-05 インプリント方法およびインプリント装置、それを用いた物品の製造方法

Country Status (1)

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JP (1) JP5932500B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6176937B2 (ja) * 2012-09-19 2017-08-09 キヤノン株式会社 インプリント用光硬化性組成物及び膜の製造方法
JP2016162863A (ja) * 2015-02-27 2016-09-05 キヤノン株式会社 パターンの形成方法、加工基板の製造方法、光学部品の製造方法、回路基板の製造方法、電子部品の製造方法
JP6647027B2 (ja) * 2015-12-03 2020-02-14 キヤノン株式会社 インプリント装置および物品製造方法
US10754243B2 (en) 2016-03-31 2020-08-25 Canon Kabushiki Kaisha Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold
US10578965B2 (en) * 2016-03-31 2020-03-03 Canon Kabushiki Kaisha Pattern forming method
US10754245B2 (en) * 2016-03-31 2020-08-25 Canon Kabushiki Kaisha Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold
CN109116679A (zh) * 2018-09-19 2019-01-01 京东方科技集团股份有限公司 纳米压印方法及纳米压印装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4975008B2 (ja) * 2007-12-13 2012-07-11 エルジー ディスプレイ カンパニー リミテッド インキ組成物及びこれを用いたパターン形成方法
KR101363783B1 (ko) * 2008-11-14 2014-02-17 엘지디스플레이 주식회사 임프린팅용 감광성 수지 조성물 및 기판 상에 유기막을 형성하는 방법
JP5175771B2 (ja) * 2009-02-27 2013-04-03 株式会社日立ハイテクノロジーズ 微細構造転写装置及び微細構造転写方法

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