JP4975008B2 - インキ組成物及びこれを用いたパターン形成方法 - Google Patents
インキ組成物及びこれを用いたパターン形成方法 Download PDFInfo
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- JP4975008B2 JP4975008B2 JP2008317534A JP2008317534A JP4975008B2 JP 4975008 B2 JP4975008 B2 JP 4975008B2 JP 2008317534 A JP2008317534 A JP 2008317534A JP 2008317534 A JP2008317534 A JP 2008317534A JP 4975008 B2 JP4975008 B2 JP 4975008B2
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- MNVMYTVDDOXZLS-UHFFFAOYSA-N 4-methoxyguaiacol Natural products COC1=CC=C(O)C(OC)=C1 MNVMYTVDDOXZLS-UHFFFAOYSA-N 0.000 description 1
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- ROQVLEJBZBDIMF-UHFFFAOYSA-N C.C=CC(C)(C)C=1C(=C(C=C(C=CC(=O)O)C1)C(C)(C)C)O.C=CC(C)(C)C=1C(=C(C=C(C=CC(=O)O)C1)C(C)(C)C)O.C=CC(C)(C)C=1C(=C(C=C(C=CC(=O)O)C1)C(C)(C)C)O.C=CC(C)(C)C=1C(=C(C=C(C=CC(=O)O)C1)C(C)(C)C)O Chemical compound C.C=CC(C)(C)C=1C(=C(C=C(C=CC(=O)O)C1)C(C)(C)C)O.C=CC(C)(C)C=1C(=C(C=C(C=CC(=O)O)C1)C(C)(C)C)O.C=CC(C)(C)C=1C(=C(C=C(C=CC(=O)O)C1)C(C)(C)C)O.C=CC(C)(C)C=1C(=C(C=C(C=CC(=O)O)C1)C(C)(C)C)O ROQVLEJBZBDIMF-UHFFFAOYSA-N 0.000 description 1
- VWRUXXHWUZUAMT-UHFFFAOYSA-N C1=CC(O)(O)C(O)C(O)=C1C(=O)C1=CC=CC=C1 Chemical compound C1=CC(O)(O)C(O)C(O)=C1C(=O)C1=CC=CC=C1 VWRUXXHWUZUAMT-UHFFFAOYSA-N 0.000 description 1
- VTHXZABQLOTBSV-UHFFFAOYSA-N C[I]C Chemical compound C[I]C VTHXZABQLOTBSV-UHFFFAOYSA-N 0.000 description 1
- XYVQFUJDGOBPQI-UHFFFAOYSA-N Methyl-2-hydoxyisobutyric acid Chemical compound COC(=O)C(C)(C)O XYVQFUJDGOBPQI-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- JKIJEFPNVSHHEI-UHFFFAOYSA-N Phenol, 2,4-bis(1,1-dimethylethyl)-, phosphite (3:1) Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP(OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC1=CC=C(C(C)(C)C)C=C1C(C)(C)C JKIJEFPNVSHHEI-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- BGNXCDMCOKJUMV-UHFFFAOYSA-N Tert-Butylhydroquinone Chemical compound CC(C)(C)C1=CC(O)=CC=C1O BGNXCDMCOKJUMV-UHFFFAOYSA-N 0.000 description 1
- AENUIJHRXXBURW-UHFFFAOYSA-N [H]OC([H])[I]C([H])O[H] Chemical compound [H]OC([H])[I]C([H])O[H] AENUIJHRXXBURW-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000007323 disproportionation reaction Methods 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 229960004337 hydroquinone Drugs 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- ADDQUOLYROTOKS-UHFFFAOYSA-N iodomethanol Chemical compound OCI ADDQUOLYROTOKS-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- SSDSCDGVMJFTEQ-UHFFFAOYSA-N octadecyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 SSDSCDGVMJFTEQ-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229950011087 perflunafene Drugs 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- UWEYRJFJVCLAGH-IJWZVTFUSA-N perfluorodecalin Chemical compound FC1(F)C(F)(F)C(F)(F)C(F)(F)[C@@]2(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)[C@@]21F UWEYRJFJVCLAGH-IJWZVTFUSA-N 0.000 description 1
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 239000004038 photonic crystal Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 239000003784 tall oil Substances 0.000 description 1
- 239000004250 tert-Butylhydroquinone Substances 0.000 description 1
- 235000019281 tert-butylhydroquinone Nutrition 0.000 description 1
- WHRNULOCNSKMGB-UHFFFAOYSA-N tetrahydrofuran thf Chemical compound C1CCOC1.C1CCOC1 WHRNULOCNSKMGB-UHFFFAOYSA-N 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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Description
本発明のインキ組成物は、a)高分子樹脂5乃至45重量部、b)粘着性付与剤5乃至45重量部、及びc)有機溶媒50乃至90重量部を含み、特に粘度を高め、ねばっこいタック性を維持できる粘着性付与剤を添加することにより、パターン支持体の役目と共に、優れるパターン形成能を有し、また、パターン転写率を高め、歩留まりを改善させ、工程の効率を向上させることができる。
パターンのないブランケットの上に実施形態1−2及び比較例1−2のインキ組成物をコーティングした。20秒の間自然乾燥した後、ブランケットがクリシェを過ぎながら、形成しようとする基板に微細パターンを転写させ、このパターンの転写率を表2に表した。パターンの転写率は、1mm×1mmのサイズを有するセル100個中、パターン形成に従って0%〜100%と明示した。
パターンのないブランケットの上に実施形態1−2及び比較例1−2のインキ組成物をコーティングした。一定の時間自然乾燥した後、ブランケットがクリシェを過ぎながら、形成しようとする基板の上に微細パターンを転写させた。次に、微細パターンが転写された基板を高温で一定の時間熱処理した後、40℃のアルミニウムエッチング溶液に一定の時間浸して乾燥させた後、走査電子顕微鏡を通じて微細パターンの表面分析を行い、その結果をそれぞれ図1乃至図4に示した。また、微細パターン部分と下部基板との接着力を測定して表3に表した。上記微細パターン部分と下部基板との接着力を程度によって0%〜100%と明示した。
本発明のインキ組成物は、パターンが形成されたブランケットにインキ組成物を接触させて基板の上にパターンを転写させるインプリントリソグラフィ工程及びロールプリント工程に使われ、上記インキ組成物は、高分子樹脂、粘着性付与剤、及び有機溶媒を含み、上記ブランケットの上記インキ組成物に対する24時間後の膨潤比が0%−5%であることを特徴とする。好ましくは、上記インキ組成物は、a)高分子樹脂5乃至45重量部、b)粘着性付与剤5乃至45重量部、及びc)有機溶媒50乃至90重量部を含む。
ブランケットを50mm×50mmのサイズで切った後、実施形態1−2及び比較例1−2のインキ組成物に24時間完全に浸したものをメタノールで洗浄した後、洗浄後の重さと初期の重さとの比を通じて膨潤比(%)を測定して下記の表5に表した。
パターンのないブランケットの上に実施形態1−2及び比較例1−2のインキ組成物をコーティングした。20秒間自然乾燥した後、ブランケットがクリシェを過ぎながら、形成しようとする基板に微細パターンを転写させ、パターンの転写率を表6に表した。パターンの転写率は、1mm×1mmのサイズを有するセル100個中、パターン形成に従って0%−100%の間で明示した。
パターンのないブランケットの上に実施形態1−2及び比較例1−2のインキ組成物をコーティングした。インキ組成物を自然乾燥した後、ブランケットがクリシェを過ぎながら、形成しようとする基板の上に微細パターンを転写させた。次に、微細パターンが転写された基板を熱処理した後、40℃のアルミニウムエッチング溶液に浸してから取り出して乾燥させた後、走査電子顕微鏡を通じて微細パターンの表面分析を行い、その結果をそれぞれ図5乃至図8に示した。
パターンのないブランケットの上に実施形態1−2及び比較例1−2のインキ組成物をコーティングした。インキ組成物を自然乾燥した後、ブランケットがクリシェを過ぎながら、形成しようとする基板の上に微細パターンを転写させた。次に、微細パターンが転写された基板を熱処理した後、40℃のアルミニウムエッチング溶液に浸してから取り出して乾燥させた後、パターンが形成された転写率を通じて待機時間を測定して表7に表した。表7の単位は%である。
Claims (10)
- a)ノボラック樹脂である高分子樹脂5乃至45重量部と、
b)ブチル化ハイドロキシアニソール、及びポリ(p−ハイドロキシ)スチレンからなる群から1種以上選択される粘着性付与剤5乃至45重量部と、
c)アセトニトリル、メタノール、及びトリエチレングリコールからなる群から1種以上選択される有機溶媒50乃至90重量部と、
を含むことを特徴とするインキ組成物。 - シリコン系列の界面活性剤またはふっ素系列の界面活性剤をインキ組成物総100重量部に対し、0.01乃至3重量部でさらに含むことを特徴とする請求項1に記載のインキ組成物。
- 密着性増感剤0.01乃至5重量部または視認性化合物0.1乃至3重量部をインキ組成物総100重量部に対し、さらに含むことを特徴とする請求項1又は2に記載のインキ組成物。
- 請求項1〜3のいずれか1項に記載のインキ組成物を使用することによるパターン形成方法。
- 前記パターンが、インプリントリソグラフィもしくはロールプリントを使用することにより形成されていることを特徴とする請求項4に記載のパターン形成方法。
- 前記インキ組成物が、0.5〜10μmの厚さでコーティングされていることを特徴とする請求項4又は5に記載のパターン形成方法。
- パターンが形成されたブランケットにインキ組成物を接触させて基板の上にパターンを転写させるインプリントリソグラフィ工程もしくはロールプリント工程であって、
前記インキ組成物は、ノボラック樹脂である高分子樹脂5乃至45重量部と、ブチル化ハイドロキシアニソール、及びポリ(p−ハイドロキシ)スチレンからなる群から1種以上選択される粘着性付与剤5乃至45重量部と、アセトニトリル、メタノール、及びトリエチレングリコールからなる群から1種以上選択される有機溶媒50乃至90重量部とを含み、前記インキ組成物に対する前記ブランケットの24時間後の膨潤比が0%−5%であることを特徴とするパターン形成方法。 - 前記インキ組成物が、シリコン系列の界面活性剤またはふっ素系列の界面活性剤をインキ組成物総100重量部に対し、0.01乃至3重量部でさらに含むことを特徴とする請求項7に記載のパターン形成方法。
- 前記インキ組成物が、インキ組成物総100重量部に対し、密着性増感剤0.01乃至5重量部または視認性化合物を0.1乃至3重量部でさらに含むことを特徴とする請求項7又は8に記載のパターン形成方法。
- 前記インキ組成物が、0.5〜10μmの厚さでコーティングされていることを特徴とする請求項7〜9のいずれか1項に記載のパターン形成方法。
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JP2002341525A (ja) * | 2001-05-14 | 2002-11-27 | Fuji Photo Film Co Ltd | ポジ型フォトレジスト転写材料およびそれを用いた基板表面の加工方法 |
AUPR853401A0 (en) | 2001-10-29 | 2001-11-29 | Arnold, Phillip John | Harmonic synchroniser system |
KR100846085B1 (ko) | 2001-10-31 | 2008-07-14 | 주식회사 동진쎄미켐 | 액정표시장치 회로용 포토레지스트 조성물 |
JP2003307850A (ja) * | 2002-04-15 | 2003-10-31 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
KR101298940B1 (ko) * | 2005-08-23 | 2013-08-22 | 주식회사 동진쎄미켐 | 포토레지스트 조성물 및 이를 이용한 박막 트랜지스터기판의 제조방법 |
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2008
- 2008-12-12 JP JP2008317534A patent/JP4975008B2/ja active Active
- 2008-12-12 TW TW097148675A patent/TWI567142B/zh active
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US20090176936A1 (en) | 2009-07-09 |
JP2009144155A (ja) | 2009-07-02 |
TWI567142B (zh) | 2017-01-21 |
TW200925223A (en) | 2009-06-16 |
US8492459B2 (en) | 2013-07-23 |
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