JP2013254783A5 - - Google Patents
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- Publication number
- JP2013254783A5 JP2013254783A5 JP2012128158A JP2012128158A JP2013254783A5 JP 2013254783 A5 JP2013254783 A5 JP 2013254783A5 JP 2012128158 A JP2012128158 A JP 2012128158A JP 2012128158 A JP2012128158 A JP 2012128158A JP 2013254783 A5 JP2013254783 A5 JP 2013254783A5
- Authority
- JP
- Japan
- Prior art keywords
- mold
- butane
- gas
- imprint
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- IJDNQMDRQITEOD-UHFFFAOYSA-N butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 claims description 8
- 239000001273 butane Substances 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 7
- 229920005989 resin Polymers 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims 12
- 235000020127 ayran Nutrition 0.000 claims 1
- 238000009835 boiling Methods 0.000 claims 1
- 235000021152 breakfast Nutrition 0.000 claims 1
- 239000011261 inert gas Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
Description
上記課題を解決するために、本発明は、型を用いて基板上の樹脂にパターンを形成するインプリント方法であって、ブタン系ガスを含む雰囲気中で、型と樹脂とを接触させることを特徴とする。 In order to solve the above problems, the present invention provides a imprint method for forming a pattern on a tree fat on a substrate by using a mold, in an atmosphere containing butane-based gas, contacting the mold and the resin It is characterized by.
Claims (8)
ブタン系ガスを含む雰囲気中で、前記型と前記樹脂とを接触させることを特徴とするインプリント方法。 A imprint method for forming a pattern on a tree fat on a substrate using a mold,
An imprint method comprising contacting the mold and the resin in an atmosphere containing a butane-based gas.
ブタン系ガスを含む気体を前記型と前記基板との間の空間に供給するガス供給機構を備え、
前記ガス供給機構からの前記ブタン系ガスの雰囲気中で、前記型と前記樹脂とを接触させることを特徴とするインプリント装置。 A imprint apparatus that forms a pattern tree fat on a substrate using a mold,
The gas containing Breakfast Tan-based gas and a gas supply mechanism for supplying the space between the mold and the substrate,
The atmosphere of the butane-containing gas from the gas supply mechanism, the imprint apparatus according to claim Rukoto by contacting the mold with the resin.
前記工程で前記パターンを形成された基板を加工する工程と、
を含むことを特徴とする物品の製造方法。 Forming a resin pattern on a substrate using the imprint method according to any one of claims 1 to 6 or the imprint apparatus according to claim 7;
Processing the substrate on which the pattern is formed in the step;
A method for producing an article comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012128158A JP5932500B2 (en) | 2012-06-05 | 2012-06-05 | Imprint method, imprint apparatus, and article manufacturing method using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012128158A JP5932500B2 (en) | 2012-06-05 | 2012-06-05 | Imprint method, imprint apparatus, and article manufacturing method using the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013254783A JP2013254783A (en) | 2013-12-19 |
| JP2013254783A5 true JP2013254783A5 (en) | 2015-07-16 |
| JP5932500B2 JP5932500B2 (en) | 2016-06-08 |
Family
ID=49952078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012128158A Active JP5932500B2 (en) | 2012-06-05 | 2012-06-05 | Imprint method, imprint apparatus, and article manufacturing method using the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5932500B2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6176937B2 (en) * | 2012-09-19 | 2017-08-09 | キヤノン株式会社 | Photo-curable composition for imprint and method for producing film |
| JP2016162863A (en) * | 2015-02-27 | 2016-09-05 | キヤノン株式会社 | Pattern formation method, manufacturing method for processed substrate, manufacturing method for optical component, manufacturing method for circuit board, and manufacturing method for electronic component |
| JP6647027B2 (en) * | 2015-12-03 | 2020-02-14 | キヤノン株式会社 | Imprint apparatus and article manufacturing method |
| US10578965B2 (en) * | 2016-03-31 | 2020-03-03 | Canon Kabushiki Kaisha | Pattern forming method |
| US10754243B2 (en) * | 2016-03-31 | 2020-08-25 | Canon Kabushiki Kaisha | Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold |
| US10754245B2 (en) * | 2016-03-31 | 2020-08-25 | Canon Kabushiki Kaisha | Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold |
| CN109116679A (en) * | 2018-09-19 | 2019-01-01 | 京东方科技集团股份有限公司 | Nano-imprinting method and nano-imprinting device |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI567142B (en) * | 2007-12-13 | 2017-01-21 | 樂金顯示科技股份有限公司 | Ink composition and method of forming a pattern using the same |
| KR101363783B1 (en) * | 2008-11-14 | 2014-02-17 | 엘지디스플레이 주식회사 | Photosensitive resin composition for imprinting process and method of forming organic layer over substrate |
| JP5175771B2 (en) * | 2009-02-27 | 2013-04-03 | 株式会社日立ハイテクノロジーズ | Fine structure transfer apparatus and fine structure transfer method |
-
2012
- 2012-06-05 JP JP2012128158A patent/JP5932500B2/en active Active
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