TWD158417S - Plasma power transfer rod for a semiconductor deposition apparatus - Google Patents
Plasma power transfer rod for a semiconductor deposition apparatusInfo
- Publication number
- TWD158417S TWD158417S TW101303544F TW101303544F TWD158417S TW D158417 S TWD158417 S TW D158417S TW 101303544 F TW101303544 F TW 101303544F TW 101303544 F TW101303544 F TW 101303544F TW D158417 S TWD158417 S TW D158417S
- Authority
- TW
- Taiwan
- Prior art keywords
- plasma power
- rod
- power transfer
- deposition apparatus
- semiconductor deposition
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 230000008021 deposition Effects 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000007769 metal material Substances 0.000 abstract 1
Abstract
【物品用途】;本創作係關於一種用於半導體沉積設備之電漿功率轉接桿。;【創作特點】;此桿係由金屬材料製成。此桿係置於一腔室之一反應空間與半導體製造設備中之一電漿功率產生器之間。此桿係用於轉接由電漿功率產生器所產生出之電漿功率至該腔室。此桿具用於引入該腔室之一端部,且在該桿之中央具一延伸部以增進轉接電漿功率之效率。[Article Use];This creation is about a plasma power transfer rod for semiconductor deposition equipment.; [Creation Features];This rod is made of metal material. This rod is placed between a reaction space in a chamber and a plasma power generator in a semiconductor manufacturing equipment. This rod is used to transfer the plasma power generated by the plasma power generator to the chamber. This rod is used to introduce one end of the chamber, and has an extension in the center of the rod to improve the efficiency of transferring plasma power.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20120026479 | 2012-05-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD158417S true TWD158417S (en) | 2014-01-11 |
Family
ID=50441837
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101303544F TWD158417S (en) | 2012-05-29 | 2012-06-19 | Plasma power transfer rod for a semiconductor deposition apparatus |
Country Status (2)
Country | Link |
---|---|
US (1) | USD702654S1 (en) |
TW (1) | TWD158417S (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD812002S1 (en) * | 2015-09-29 | 2018-03-06 | Ihi Corporation | Wireless power transfer device |
USD818447S1 (en) * | 2017-04-28 | 2018-05-22 | Applied Materials, Inc. | Plasma feedthrough flange |
USD861758S1 (en) * | 2017-07-10 | 2019-10-01 | Lincoln Global, Inc. | Vented plasma cutting electrode |
USD868855S1 (en) * | 2018-03-13 | 2019-12-03 | Automation Services, Llc | Fixture bar clamp |
USD956005S1 (en) * | 2019-09-19 | 2022-06-28 | Applied Materials, Inc. | Shaped electrode |
USD983056S1 (en) * | 2019-12-13 | 2023-04-11 | Gened Co., Ltd. | Probe pin |
-
2012
- 2012-06-13 US US29/424,575 patent/USD702654S1/en active Active
- 2012-06-19 TW TW101303544F patent/TWD158417S/en unknown
Also Published As
Publication number | Publication date |
---|---|
USD702654S1 (en) | 2014-04-15 |
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