TWD158417S - Plasma power transfer rod for a semiconductor deposition apparatus - Google Patents

Plasma power transfer rod for a semiconductor deposition apparatus

Info

Publication number
TWD158417S
TWD158417S TW101303544F TW101303544F TWD158417S TW D158417 S TWD158417 S TW D158417S TW 101303544 F TW101303544 F TW 101303544F TW 101303544 F TW101303544 F TW 101303544F TW D158417 S TWD158417 S TW D158417S
Authority
TW
Taiwan
Prior art keywords
plasma power
rod
power transfer
deposition apparatus
semiconductor deposition
Prior art date
Application number
TW101303544F
Other languages
Chinese (zh)
Inventor
Jeong Ho Lee
Woo Chan Kim
Sang Jin Jeong
Hyun Soo Jang
Original Assignee
Asm智慧財產控股公司
Asm Ip Holding Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asm智慧財產控股公司, Asm Ip Holding Bv filed Critical Asm智慧財產控股公司
Publication of TWD158417S publication Critical patent/TWD158417S/en

Links

Abstract

【物品用途】;本創作係關於一種用於半導體沉積設備之電漿功率轉接桿。;【創作特點】;此桿係由金屬材料製成。此桿係置於一腔室之一反應空間與半導體製造設備中之一電漿功率產生器之間。此桿係用於轉接由電漿功率產生器所產生出之電漿功率至該腔室。此桿具用於引入該腔室之一端部,且在該桿之中央具一延伸部以增進轉接電漿功率之效率。[Article Use];This creation is about a plasma power transfer rod for semiconductor deposition equipment.; [Creation Features];This rod is made of metal material. This rod is placed between a reaction space in a chamber and a plasma power generator in a semiconductor manufacturing equipment. This rod is used to transfer the plasma power generated by the plasma power generator to the chamber. This rod is used to introduce one end of the chamber, and has an extension in the center of the rod to improve the efficiency of transferring plasma power.

TW101303544F 2012-05-29 2012-06-19 Plasma power transfer rod for a semiconductor deposition apparatus TWD158417S (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR20120026479 2012-05-29

Publications (1)

Publication Number Publication Date
TWD158417S true TWD158417S (en) 2014-01-11

Family

ID=50441837

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101303544F TWD158417S (en) 2012-05-29 2012-06-19 Plasma power transfer rod for a semiconductor deposition apparatus

Country Status (2)

Country Link
US (1) USD702654S1 (en)
TW (1) TWD158417S (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD812002S1 (en) * 2015-09-29 2018-03-06 Ihi Corporation Wireless power transfer device
USD818447S1 (en) * 2017-04-28 2018-05-22 Applied Materials, Inc. Plasma feedthrough flange
USD861758S1 (en) * 2017-07-10 2019-10-01 Lincoln Global, Inc. Vented plasma cutting electrode
USD868855S1 (en) * 2018-03-13 2019-12-03 Automation Services, Llc Fixture bar clamp
USD956005S1 (en) * 2019-09-19 2022-06-28 Applied Materials, Inc. Shaped electrode
USD983056S1 (en) * 2019-12-13 2023-04-11 Gened Co., Ltd. Probe pin

Also Published As

Publication number Publication date
USD702654S1 (en) 2014-04-15

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