JP2018146239A5

JP2018146239A5 -

Info

Publication number: JP2018146239A5
Application number: JP2017037988A
Authority: JP
Filing date: 2017-03-01
Publication date: 2020-02-13
Anticipated expiration: 2037-03-01

Claims

It has an optical system for defect inspection and an illumination system for defect inspection,
The illumination system is a ring illumination in which a plurality of LEDs are arranged in an annular shape, and each of the spot lights by the plurality of LEDs is gathered in a region centered on a focal position of the optical system,
The ring illumination installed on the side of the optical system of a substrate to be inspected, wherein each of spot lights by the plurality of LEDs is radiated at an acute angle to the substrate surface, and the reflected light is formed by an objective lens. A reflective darkfield ring illumination configured to prevent direct entry into the
The ring illumination installed on the opposite side of the substrate from the optical system, wherein the plurality of L
Each of the spot lights by the ED is radiated at an acute angle to the back surface of the substrate, and the transmitted light transmitted through the inside of the substrate through refraction is transmitted through a dark field ring illumination so as not to directly enter the objective lens.
A defect inspection apparatus comprising:

It has an optical system for defect inspection and an illumination system for defect inspection,
The illumination system is a ring illumination in which a plurality of LEDs are arranged in an annular shape, and each of the spot lights by the plurality of LEDs is gathered in a region centered on a focal position of the optical system,
The ring illumination installed on the side of the optical system of the substrate to be inspected, wherein each of the spot lights by the plurality of LEDs is irradiated at an acute angle with respect to the substrate surface, and the reflected light is formed by an objective lens. A reflective darkfield ring illumination configured to prevent direct entry into the
The ring illumination installed on the opposite side of the substrate from the optical system, wherein the plurality of L
Each of the spot lights by the ED is radiated at an acute angle to the back surface of the substrate, and the transmitted light transmitted through the inside of the substrate through refraction is transmitted through a dark field ring illumination so as not to directly enter the objective lens.
Illumination installed on the opposite side of the optical system of the substrate, the spot illumination of the transmission coaxial with the optical axis of the optical system,
A defect inspection apparatus comprising:

The defect inspection apparatus according to claim 1, wherein an optical axis of the optical system and a center axis of the ring in the ring illumination are aligned and coaxial.

Having an imaging optical system including an objective lens, an imaging lens and an imaging element,
The image sensor is a TDI sensor,
The imaging optics includes a TDI camera;
Means for relatively moving the substrate and the TDI camera in a constant direction at a constant speed,
The moving direction and the speed of the imaging area on the substrate are matched with the direction and speed of the charge transfer of the CCD in the TDI sensor, so that the imaging area is repeatedly exposed and photographed by the number of vertical stages of the CCD. The defect inspection apparatus according to any one of claims 1 to 3, wherein

The defect inspection apparatus according to any one of claims 1 to 4, wherein the defect inspection apparatus includes a high-precision imaging optical system having a focus likelihood of less than ± 0.1 mm.

Using the objective lens, using a laser beam, and constructing an autofocus means,
The defect inspection apparatus according to claim 4, further comprising a unit configured to prevent the laser beam used for the autofocus unit from being reflected on the imaging device.

It has an optical system for defect inspection and an illumination system for defect inspection,
The illumination system is a ring illumination in which a plurality of LEDs are arranged in an annular shape, and each of the spot lights by the plurality of LEDs is gathered in a region centered on a focal position of the optical system,
The ring illumination is installed on the side of the optical system of the substrate to be inspected,
The distance from the end of the substrate side in the ring illumination to the substrate surface, the working distance d of the ring illumination,
Let the radius of the ring illumination be r,
From the viewpoint of mechanical size limitation, the ranges of d and r are defined,
When the light beam of the LED is incident on the substrate, the angle between the light beam and the substrate surface,
With the irradiation angle α of the ring illumination, from the viewpoint of a dark field request that direct illumination light does not enter the objective lens, to define the range of the α,
The irradiation density by the ring illumination is p, from the viewpoint of increasing the irradiation density p and from the viewpoint that the upper limit of the irradiation angle α is limited from the dark field request, to define the range of the p,
From the equation d = rTan (α) determined from the positional relationship, the values of d, r and α are determined while considering the irradiation density p, and the apparatus is manufactured based on these values. A method for manufacturing a defect inspection device.

It has an optical system for defect inspection and an illumination system for defect inspection,
The illumination system is a ring illumination in which a plurality of LEDs are arranged in an annular shape, and each of the spot lights by the plurality of LEDs is gathered in a region centered on a focal position of the optical system,
The ring illumination is installed on the opposite side of the substrate to be inspected from the optical system,
The distance from the end of the substrate side in the ring illumination to the substrate surface, the working distance d of the ring illumination,
Let the radius of the ring illumination be r,
From the viewpoint of mechanical size limitation, the ranges of d and r are defined,
When the light beam of the LED is incident on the substrate, the angle between the light beam and the back surface of the substrate,
With the irradiation angle α of the ring illumination, from the viewpoint of a dark field request to prevent the illumination light from directly entering the objective lens, and from the viewpoint of the request of incidence near the Brewster angle, to define the range of α. ,
From the viewpoint that the irradiation density by the ring illumination is p, the upper limit of the irradiation angle α is limited by the viewpoint of increasing the irradiation density p, and by the dark field request and the request for incidence near the Brewster angle. Stipulate the range,
Let g be the thickness of the glass,
Defect inspection wherein the values of d, r, and α are determined in consideration of the irradiation density p from the following equation (3) determined from the positional relationship, and an apparatus is manufactured based on these values. Device manufacturing method.

Using the defect inspection device according to any one of claims 1 to 6 or the defect inspection device manufactured by the method for manufacturing a defect inspection device according to any one of claims 7 or 8, A defect inspection method characterized by inspecting .

10. The defect inspection method according to claim 9, wherein the object to be inspected is any one of a glass substrate, a mask blank, and a mask blank with a resist .