JP2018140352A5 - - Google Patents

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JP2018140352A5
JP2018140352A5 JP2017036358A JP2017036358A JP2018140352A5 JP 2018140352 A5 JP2018140352 A5 JP 2018140352A5 JP 2017036358 A JP2017036358 A JP 2017036358A JP 2017036358 A JP2017036358 A JP 2017036358A JP 2018140352 A5 JP2018140352 A5 JP 2018140352A5
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Japan
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raw material
processing
material liquid
mist
film forming
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JP2017036358A
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Japanese (ja)
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JP7126107B2 (ja
JP2018140352A (ja
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JP2017036358A 2017-02-28 2017-02-28 成膜方法 Active JP7126107B2 (ja)

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JP2017036358A JP7126107B2 (ja) 2017-02-28 2017-02-28 成膜方法

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Application Number Priority Date Filing Date Title
JP2017036358A JP7126107B2 (ja) 2017-02-28 2017-02-28 成膜方法

Publications (3)

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JP2018140352A JP2018140352A (ja) 2018-09-13
JP2018140352A5 true JP2018140352A5 (enrdf_load_stackoverflow) 2020-04-09
JP7126107B2 JP7126107B2 (ja) 2022-08-26

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JP2017036358A Active JP7126107B2 (ja) 2017-02-28 2017-02-28 成膜方法

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JP (1) JP7126107B2 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7366340B2 (ja) * 2019-06-28 2023-10-23 株式会社Flosfia エッチング処理方法
TWI849160B (zh) * 2019-06-28 2024-07-21 日商Ｆｌｏｓｆｉａ股份有限公司 蝕刻處理方法和半導體裝置的製造方法
JP7366341B2 (ja) * 2019-06-28 2023-10-23 株式会社Flosfia エッチング処理方法
JP7391297B2 (ja) * 2019-06-28 2023-12-05 株式会社Flosfia エッチング処理方法およびエッチング処理装置
KR20240049513A (ko) 2021-08-30 2024-04-16 니치유 가부시키가이샤 방열 회로 기판, 방열 부재, 및 방열 회로 기판의 제조 방법
KR20240165926A (ko) 2022-03-18 2024-11-25 니치유 가부시키가이샤 방열 기판, 방열 회로 기판, 방열 부재, 및 방열 기판의 제조 방법
CN119677894A (zh) 2023-01-24 2025-03-21 日油株式会社 化学气相沉积法用成膜助剂、化学气相沉积法用涂布液、金属氧化物膜及金属氧化物膜的成膜方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6143063A (en) 1996-03-04 2000-11-07 Symetrix Corporation Misted precursor deposition apparatus and method with improved mist and mist flow
JP2008289967A (ja) 2007-05-23 2008-12-04 Samco Inc 薄膜形成方法及び薄膜形成装置
KR20130113591A (ko) * 2012-04-06 2013-10-16 주식회사 경우 히터가 구비된 박막 제조 장치
JP3208344U (ja) 2015-11-16 2017-01-05 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 低蒸気圧のエアゾールに支援されるｃｖｄ

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