JP2017022294A5 - - Google Patents
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- Publication number
- JP2017022294A5 JP2017022294A5 JP2015140077A JP2015140077A JP2017022294A5 JP 2017022294 A5 JP2017022294 A5 JP 2017022294A5 JP 2015140077 A JP2015140077 A JP 2015140077A JP 2015140077 A JP2015140077 A JP 2015140077A JP 2017022294 A5 JP2017022294 A5 JP 2017022294A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- silicon oxide
- mist
- oxide film
- droplet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 239000003595 mist Substances 0.000 claims description 10
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 10
- 239000012159 carrier gas Substances 0.000 claims description 8
- 239000004065 semiconductor Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000002994 raw material Substances 0.000 claims description 6
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical group CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 2
- 238000000889 atomisation Methods 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims description 2
- 239000012528 membrane Substances 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015140077A JP6613467B2 (ja) | 2015-07-13 | 2015-07-13 | シリコン酸化膜の成膜方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015140077A JP6613467B2 (ja) | 2015-07-13 | 2015-07-13 | シリコン酸化膜の成膜方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017022294A JP2017022294A (ja) | 2017-01-26 |
| JP2017022294A5 true JP2017022294A5 (enrdf_load_stackoverflow) | 2018-08-30 |
| JP6613467B2 JP6613467B2 (ja) | 2019-12-04 |
Family
ID=57888386
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015140077A Active JP6613467B2 (ja) | 2015-07-13 | 2015-07-13 | シリコン酸化膜の成膜方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6613467B2 (enrdf_load_stackoverflow) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6906220B2 (ja) * | 2017-02-28 | 2021-07-21 | 株式会社Flosfia | 処理方法 |
| WO2019187337A1 (ja) * | 2018-03-28 | 2019-10-03 | 株式会社明電舎 | 酸化膜形成方法 |
| CN111902564B (zh) * | 2018-03-28 | 2022-01-11 | 株式会社明电舍 | 氧化物膜形成方法 |
| CN111347054A (zh) * | 2018-12-21 | 2020-06-30 | 财团法人金属工业研究发展中心 | 磁性粉末复合材料及其制备方法 |
| JP7606190B2 (ja) | 2021-02-25 | 2024-12-25 | 株式会社デンソー | スイッチングデバイスとその製造方法 |
-
2015
- 2015-07-13 JP JP2015140077A patent/JP6613467B2/ja active Active
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