JP2018116287A - 光学基板の平坦化 - Google Patents
光学基板の平坦化 Download PDFInfo
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- JP2018116287A JP2018116287A JP2018030700A JP2018030700A JP2018116287A JP 2018116287 A JP2018116287 A JP 2018116287A JP 2018030700 A JP2018030700 A JP 2018030700A JP 2018030700 A JP2018030700 A JP 2018030700A JP 2018116287 A JP2018116287 A JP 2018116287A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3435—Applying energy to the substrate during sputtering
- C23C14/3442—Applying energy to the substrate during sputtering using an ion beam
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/328—Partly or completely removing a coating
- C03C2218/33—Partly or completely removing a coating by etching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
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- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optical Elements Other Than Lenses (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (5)
- サイズが1ミクロンから2ミクロンの範囲内である少なくとも1つの結節を有する基板と、
前記基板の全体及び前記結節上に配設された、1.2ミクロンから3.4ミクロンの範囲内の厚さを有する平坦化層と、
前記平坦化層上に配設された二酸化ケイ素及び二酸化ハフニウムの交互連続層と、
を備えた、光学的構成要素。 - 前記平坦化層が、二酸化ケイ素を含む、請求項1に記載の光学的構成要素。
- 前記平坦化層が、タンタラ(Ta2O5)及びジルコニア(ZrO2)の少なくとも一方を含む、請求項1に記載の光学的構成要素。
- 前記平坦化層が、二酸化ハフニウム(HfO2)を含む、請求項1に記載の光学的構成要素。
- 前記二酸化ケイ素の層がスパッタリングされた二酸化ケイ素を含み、前記二酸化ハフニ
ウムの層がスパッタリングされたハフニウムを含む、請求項1に記載の光学的構成要素。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261713332P | 2012-10-12 | 2012-10-12 | |
US61/713,332 | 2012-10-12 | ||
JP2015536757A JP6329157B2 (ja) | 2012-10-12 | 2013-01-25 | 光学基板の平坦化 |
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JP2015536757A Division JP6329157B2 (ja) | 2012-10-12 | 2013-01-25 | 光学基板の平坦化 |
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JP2020014931A Division JP2020098355A (ja) | 2012-10-12 | 2020-01-31 | 光学基板の平坦化 |
Publications (2)
Publication Number | Publication Date |
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JP2018116287A true JP2018116287A (ja) | 2018-07-26 |
JP6942073B2 JP6942073B2 (ja) | 2021-09-29 |
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JP2015536757A Active JP6329157B2 (ja) | 2012-10-12 | 2013-01-25 | 光学基板の平坦化 |
JP2018030700A Active JP6942073B2 (ja) | 2012-10-12 | 2018-02-23 | 光学基板の平坦化 |
JP2020014931A Pending JP2020098355A (ja) | 2012-10-12 | 2020-01-31 | 光学基板の平坦化 |
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JP2015536757A Active JP6329157B2 (ja) | 2012-10-12 | 2013-01-25 | 光学基板の平坦化 |
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JP2020014931A Pending JP2020098355A (ja) | 2012-10-12 | 2020-01-31 | 光学基板の平坦化 |
Country Status (4)
Country | Link |
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US (2) | US10175391B2 (ja) |
EP (1) | EP2906977B1 (ja) |
JP (3) | JP6329157B2 (ja) |
WO (1) | WO2014058452A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10100745B2 (en) | 2012-10-08 | 2018-10-16 | United Technologies Corporation | Geared turbine engine with relatively lightweight propulsor module |
WO2014058452A1 (en) | 2012-10-12 | 2014-04-17 | Lawrence Livermore National Security, Llc | Planarization of optical substrates |
CN109207934B (zh) * | 2017-06-29 | 2020-09-18 | 中国科学院上海硅酸盐研究所 | 一种采用石英环光学镀膜材料改善高反膜微缺陷的方法 |
CN111819303B (zh) * | 2018-02-19 | 2023-12-08 | 应用材料公司 | 使用溅射蚀刻以中止厚膜中结晶发生的pvd二氧化钛形成 |
CN116855913A (zh) * | 2022-03-28 | 2023-10-10 | 中国科学院上海光学精密机械研究所 | 一种去除光学薄膜节瘤缺陷表面球冠状凸起的抛光方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06509056A (ja) * | 1991-11-12 | 1994-10-13 | ヒューズ・エアクラフト・カンパニー | レーザ除去を使用した清浄な良好に整列されたCdTe表面の生成 |
JP2000507000A (ja) * | 1996-03-19 | 2000-06-06 | オプティカル コーティング ラボラトリー インコーポレイテッド | スパッタ厚膜コーティングにおける散乱の減少方法 |
JP2002520601A (ja) * | 1998-07-08 | 2002-07-09 | カール−ツアイス−スチフツング | EUVのためのSiO2被覆したミラー基板 |
JP2005032813A (ja) * | 2003-07-08 | 2005-02-03 | Nikon Corp | 露光装置及び露光方法 |
JP2011513801A (ja) * | 2008-03-11 | 2011-04-28 | ピーピージー・インダストリーズ・オハイオ・インコーポレイテッド | 反射性物品 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5725598A (en) | 1980-07-21 | 1982-02-10 | Toshiba Plant Kensetsu Kk | Installation of foor surface of equipment and hardware therefor |
EP0372438A3 (en) | 1988-12-05 | 1990-08-01 | Honeywell Inc. | Uv and plasma stable high-reflectance multilayer dielectric mirror |
JPH06132584A (ja) | 1992-10-14 | 1994-05-13 | Sumitomo Metal Mining Co Ltd | 凹面反射鏡の作成方法 |
US20050118533A1 (en) * | 2002-03-01 | 2005-06-02 | Mirkarimi Paul B. | Planarization of substrate pits and scratches |
US20030164998A1 (en) * | 2002-03-01 | 2003-09-04 | The Regents Of The University Of California | Ion-assisted deposition techniques for the planarization of topological defects |
US7001788B2 (en) | 2003-05-29 | 2006-02-21 | Applied Materials, Inc. | Maskless fabrication of waveguide mirrors |
JP4703354B2 (ja) * | 2005-10-14 | 2011-06-15 | Hoya株式会社 | 多層反射膜付き基板、その製造方法、反射型マスクブランクおよび反射型マスク |
TW200721896A (en) | 2005-11-22 | 2007-06-01 | Sanyo Electric Co | Light emitting element and display device |
WO2008039845A2 (en) * | 2006-09-26 | 2008-04-03 | Applied Materials, Inc. | Fluorine plasma treatment of high-k gate stack for defect passivation |
WO2014058452A1 (en) | 2012-10-12 | 2014-04-17 | Lawrence Livermore National Security, Llc | Planarization of optical substrates |
-
2013
- 2013-01-25 WO PCT/US2013/023222 patent/WO2014058452A1/en active Application Filing
- 2013-01-25 EP EP13845167.9A patent/EP2906977B1/en active Active
- 2013-01-25 JP JP2015536757A patent/JP6329157B2/ja active Active
- 2013-01-25 US US14/434,699 patent/US10175391B2/en active Active
-
2018
- 2018-02-23 JP JP2018030700A patent/JP6942073B2/ja active Active
- 2018-11-07 US US16/183,491 patent/US10901121B2/en active Active
-
2020
- 2020-01-31 JP JP2020014931A patent/JP2020098355A/ja active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06509056A (ja) * | 1991-11-12 | 1994-10-13 | ヒューズ・エアクラフト・カンパニー | レーザ除去を使用した清浄な良好に整列されたCdTe表面の生成 |
JP2000507000A (ja) * | 1996-03-19 | 2000-06-06 | オプティカル コーティング ラボラトリー インコーポレイテッド | スパッタ厚膜コーティングにおける散乱の減少方法 |
JP2002520601A (ja) * | 1998-07-08 | 2002-07-09 | カール−ツアイス−スチフツング | EUVのためのSiO2被覆したミラー基板 |
JP2005032813A (ja) * | 2003-07-08 | 2005-02-03 | Nikon Corp | 露光装置及び露光方法 |
JP2011513801A (ja) * | 2008-03-11 | 2011-04-28 | ピーピージー・インダストリーズ・オハイオ・インコーポレイテッド | 反射性物品 |
Non-Patent Citations (1)
Title |
---|
XINBIN CHENG ET AL.: "Using engineered nodules to study laser-induced damage in optical thin films with nanosecond pulses", PROC. OF SPIE, vol. 8190, JPN7016002970, 2011, pages 1 - 9, XP060021799, ISSN: 0004259194, DOI: 10.1117/12.889262 * |
Also Published As
Publication number | Publication date |
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US10901121B2 (en) | 2021-01-26 |
US20150276993A1 (en) | 2015-10-01 |
US20190162879A1 (en) | 2019-05-30 |
JP2016500841A (ja) | 2016-01-14 |
EP2906977A1 (en) | 2015-08-19 |
EP2906977B1 (en) | 2018-06-13 |
JP2020098355A (ja) | 2020-06-25 |
WO2014058452A1 (en) | 2014-04-17 |
JP6942073B2 (ja) | 2021-09-29 |
US10175391B2 (en) | 2019-01-08 |
JP6329157B2 (ja) | 2018-05-23 |
EP2906977A4 (en) | 2016-05-11 |
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