JP2018108892A5

JP2018108892A5 -

Info

Publication number: JP2018108892A5
Application number: JP2017227757A
Authority: JP
Filing date: 2017-11-28
Publication date: 2019-10-10

Description

また、実施形態に係る基板処理装置は、
基板を浮上させて搬送しながら前記基板に対して処理を行う基板処理装置において、
前記基板を浮上させる浮上装置と、前記浮上装置によって浮上支持される前記基板を搬送方向に搬送する搬送力付与機構と、を有する浮上搬送装置と、
前記浮上搬送装置により浮上搬送される前記基板に対して処理流体を供給する処理流体供給機構と、
を有し、
前記浮上装置は、
前記基板の搬送経路を挟んで、下側浮上装置と上側浮上装置を有し、
前記下側浮上装置と前記上側浮上装置は、いずれも複数の浮上ブロックを有し、
前記各浮上ブロックは、搬送される前記基板に対向する面に、流体を噴出する噴出孔と、前記流体を吸引する吸引孔と、をそれぞれ複数有し、
前記下側浮上装置と前記上側浮上装置をそれぞれ構成する複数の前記浮上ブロックは、
前記基板の搬送方向において間隙を設けて配置され、
前記下側浮上装置を構成する複数の前記浮上ブロック間に有する前記間隙には、前記上側浮上装置を構成するいずれかの前記浮上ブロックが対向し、前記上側浮上装置を構成する複数の前記浮上ブロック間に有する前記間隙には、前記下側浮上装置を構成するいずれかの前記浮上ブロックが対向し、
前記下側浮上装置を構成する複数の前記浮上ブロック間に有する前記間隙と、前記上側浮上装置を構成する複数の前記浮上ブロック間に有する前記間隙とは、対向しないようにして配置されることを特徴とする。 In addition, the substrate processing apparatus according to the embodiment
In the substrate processing apparatus for processing the substrate while the substrate is lifted and conveyed,
A levitation transport device having a levitation device for levitating the substrate, and a transport force applying mechanism for transporting the substrate supported and levitated by the levitation device in a transport direction;
A processing fluid supply mechanism that supplies a processing fluid to the substrate that is levitated and conveyed by the levitating and conveying device;
Have
The levitating device is
With a lower levitation device and an upper levitation device across the substrate transport path,
The lower levitation device and the upper levitation device both have a plurality of levitation blocks,
Each of the floating blocks has a plurality of ejection holes for ejecting fluid and suction holes for sucking the fluid on the surface facing the substrate to be conveyed,
The plurality of levitation blocks that respectively constitute the lower levitation device and the upper levitation device,
Arranged with a gap in the substrate transport direction,
Any of the levitation blocks constituting the upper levitation device faces the gap between the plurality of levitation blocks constituting the lower levitation device, and the plurality of levitation blocks constituting the upper levitation device. Any of the levitation blocks constituting the lower levitation device are opposed to the gap between them,
The gap between the plurality of floating blocks constituting the lower levitation device and the gap between the plurality of levitation blocks constituting the upper levitation device are arranged so as not to face each other. Features.

なお、上側浮上装置１２と下側浮上装置１１がそれぞれ有する浮上ブロック１２ａ、１２ｂの配置関係を図１を用いて説明したが、本実施形態においては、図４に示すように、浮上ブロック１２ａと１２ｂは、搬送される基板Ｗの大きさに合わせて、基板Ｗの搬送方向Ａだけでなく、搬送方向Ａとは直交する方向（以下、「幅方向」という。）にも複数（本実施形態においては５つ）設けられていてもよい。この場合には、先に述べた間隙は、搬送方向Ａに加え、前述の幅方向に沿っても形成され、しかも幅方向の長さは、基板Ｗの大きさによって浮上ブロック１２ａ、１２ｂの数を調整することで、自由に設定することができる。なお、図４においては、処理液供給装置２０、３０、制御部４０を省略してある。 In addition, although the arrangement | positioning relationship of the floating blocks 12a and 12b which each of the upper levitation apparatus 12 and the lower levitation apparatus 11 has was demonstrated using FIG. 1, in this embodiment, as shown in FIG. According to the size of the substrate W to be transported, a plurality of 12b are provided not only in the transport direction A of the substrate W but also in a direction perpendicular to the transport direction A (hereinafter referred to as “width direction”) (this embodiment). 5) may be provided. In this case, the gap described above is formed not only in the conveyance direction A but also in the width direction described above, and the length in the width direction depends on the size of the substrate W and is equal to the number of the floating blocks 12a and 12b. It can be set freely by adjusting. In FIG. 4, the processing liquid supply devices 20 and 30 and the control unit 40 are omitted.

搬送力付与機構１３は、浮上ブロック１２ａ、１２ｂに対して非接触状態（浮上状態）で保持された基板Ｗを、搬送方向Ａに搬送するものである。具体的には、図４に示すように、基板Ｗの搬送方向Ａに沿った側面に接触するローラ１３ａを有している。各ローラ１３ａは、不図示の駆動装置によって回転駆動させられるようになっている。ローラ１３ａの回転により、浮上している基板ＷにＡ方向への搬送力が付与されることになる。
The transport force applying mechanism 13 transports the substrate W held in a non-contact state (floating state) with respect to the floating blocks 12a and 12b in the transport direction A. Specifically, as shown in FIG. 4, the roller 13 a is in contact with the side surface along the transport direction A of the substrate W. Each roller 13a is rotationally driven by a driving device (not shown). By the rotation of the roller 13a , a transport force in the A direction is applied to the substrate W that is flying.

Claims

A levitating and conveying device for levitating and conveying a substrate,
With a lower levitation device and an upper levitation device across the substrate transport path,
The lower levitation device and the upper levitation device both have a plurality of levitation blocks,
Each of the floating blocks has a plurality of ejection holes for ejecting fluid and suction holes for sucking the fluid on the surface facing the substrate to be conveyed,
The plurality of levitation blocks that respectively constitute the lower levitation device and the upper levitation device,
Arranged with a gap in the substrate transport direction,
Any of the levitation blocks constituting the upper levitation device faces the gap between the plurality of levitation blocks constituting the lower levitation device, and the plurality of levitation blocks constituting the upper levitation device. Any of the levitation blocks constituting the lower levitation device are opposed to the gap between them,
The gap between the plurality of floating blocks constituting the lower levitation device and the gap between the plurality of levitation blocks constituting the upper levitation device are arranged so as not to face each other. Floating transport device characterized.

The plurality of the floating blocks constituting the lower floating device and the plurality of the floating blocks constituting the upper floating device have the same length in the transport direction of the substrate. The levitation conveyance apparatus described.

The length of the one floating block that constitutes the lower floating device and the one floating block that constitutes the upper floating device that opposes the floating block overlaps with each other in the transport direction of the substrate. The levitation conveyance apparatus according to claim 1, wherein the levitation conveyance apparatus is not more than half of a length in the conveyance direction of the substrate in one of the levitation blocks constituting the lower levitation apparatus.

4. The plurality of the levitation blocks that respectively constitute the lower levitation device and the upper levitation device are provided in a direction orthogonal to the substrate transport direction. Levitation transport device.

In the substrate processing apparatus for processing the substrate while the substrate is lifted and conveyed,
A levitation transport device having a levitation device for levitating the substrate, and a transport force applying mechanism for transporting the substrate supported and levitated by the levitation device in a transport direction;
A processing fluid supply mechanism that supplies a processing fluid to the substrate that is levitated and conveyed by the levitating and conveying device;
Have
The levitating device is
With a lower levitation device and an upper levitation device across the substrate transport path,
The lower levitation device and the upper levitation device both have a plurality of levitation blocks,
Each of the floating blocks has a plurality of ejection holes for ejecting fluid and suction holes for sucking the fluid on the surface facing the substrate to be conveyed,
The plurality of levitation blocks that respectively constitute the lower levitation device and the upper levitation device,
Arranged with a gap in the substrate transport direction,
Any of the levitation blocks constituting the upper levitation device faces the gap between the plurality of levitation blocks constituting the lower levitation device, and the plurality of levitation blocks constituting the upper levitation device. Any of the levitation blocks constituting the lower levitation device are opposed to the gap between them,
The gap between the plurality of floating blocks constituting the lower levitation device and the gap between the plurality of levitation blocks constituting the upper levitation device are arranged so as not to face each other. A substrate processing apparatus.

The lower levitation device and the upper levitation device both have two levitation blocks,
The gap formed by the two levitation blocks of the lower levitation device is formed on the downstream side in the substrate transport direction with respect to the gap formed by the two levitation blocks of the upper levitation device. The substrate processing apparatus according to claim 5, wherein:

The processing fluid supply mechanism includes:
A first supply nozzle disposed in the gap of the upper levitation device for supplying the processing fluid;
A second supply nozzle that is disposed in the gap of the lower levitation device and supplies the processing fluid;
Have
The processing fluid is supplied from the first supply nozzle to the upper surface of the substrate transported by the transport force applying mechanism, and the processing fluid is supplied from the second supply nozzle to the lower surface of the substrate. The substrate processing apparatus according to claim 6.