JP2015118969A5

JP2015118969A5 -

Info

Publication number: JP2015118969A5
Application number: JP2013259848A
Authority: JP
Filing date: 2013-12-17
Publication date: 2017-01-19
Anticipated expiration: 2033-12-17

Description

実施形態に係る基板搬送装置は、第１のシャフトを介して複数設けられる搬送ローラによって基板を搬送する搬送部を備え、前記搬送部は、搬送される前記基板に向けて液体を噴射する噴射部に対し、前記基板の搬送経路を介して対向する位置に設けられ、搬送される前記基板に接触する接触ローラを具備し、前記接触ローラは第２のシャフトを介して回転可能に支持ブロックに設けられており、前記支持ブロックは、前記第１のシャフトを回転可能に保持する支持壁に、前記支持ブロックの下面と前記支持壁の上面との離間距離を調整する調整部材及び前記支持ブロックの水平面方向への移動を規制する規制部材を介して設けられることを特徴とする。 The substrate transport apparatus according to the embodiment includes a transport unit that transports the substrate by a plurality of transport rollers provided via a first shaft, and the transport unit ejects liquid toward the transported substrate. In contrast, a contact roller is provided at a position facing the substrate through the substrate conveyance path and contacts the substrate to be conveyed, and the contact roller is provided on the support block so as to be rotatable through the second shaft. The support block includes a support wall that rotatably holds the first shaft, an adjustment member that adjusts a separation distance between a lower surface of the support block and an upper surface of the support wall, and a horizontal surface of the support block. characterized Rukoto provided through the regulating member for regulating the movement in the direction.

実施形態に係る基板処理装置は、第１のシャフトを介して複数設けられる搬送ローラによって基板を搬送する搬送部と、前記搬送部により搬送される前記基板に向けて液体を噴射する噴射部と、を備え、前記搬送部は、前記噴射部に対し、前記基板の搬送経路を介して対向する位置に設けられ、搬送される前記基板に接触する接触ローラを具備し、前記接触ローラは第２のシャフトを介して回転可能に支持ブロックに設けられており、前記支持ブロックは、前記第１のシャフトを回転可能に保持する支持壁に、前記支持ブロックの下面と前記支持壁の上面との離間距離を調整する調整部材及び前記支持ブロックの水平面方向への移動を規制する規制部材を介して設けられることを特徴とする。
The substrate processing apparatus according to the embodiment includes a transport unit that transports a substrate by a plurality of transport rollers provided via a first shaft, an ejection unit that ejects liquid toward the substrate transported by the transport unit, The transport unit includes a contact roller that is provided at a position facing the ejection unit via the transport path of the substrate, and that is in contact with the transported substrate . A support block is rotatably provided via a shaft, and the support block is spaced apart from a lower surface of the support block and an upper surface of the support wall by a support wall that rotatably holds the first shaft. via a regulating member for regulating the movement in the horizontal plane of the adjusting member and said support block for adjusting the characterized Rukoto provided.

Claims

A transport unit that transports the substrate by a plurality of transport rollers provided via the first shaft ;
The transport section, to the injection unit for injecting a liquid toward the substrate to be fed transportable, is provided at a position opposed to each other via the conveyance path of the substrate, comprising a contact roller that contacts the substrate to be conveyed And
The contact roller is rotatably provided on the support block via the second shaft,
The support block includes a support wall that rotatably holds the first shaft, an adjustment member that adjusts a separation distance between a lower surface of the support block and an upper surface of the support wall, and movement of the support block in a horizontal plane direction. substrate transfer apparatus according to claim Rukoto provided via a regulating member for regulating the.

  The transport unit forms a plurality of transport paths so that a plurality of the substrates are transported in parallel,
  In each of the plurality of transport paths, the contact roller is provided,
  The substrate conveying apparatus according to claim 1, wherein all of the contact rollers are provided on the support block via the second shaft.

A transport unit that transports the substrate by a plurality of transport rollers provided via the first shaft ;
An ejection unit that ejects liquid toward the substrate conveyed by the conveyance unit;
With
The transport unit, over the previous SL injection unit, provided at a position opposed through the conveyance path of the substrate, comprising a contact roller that contacts the substrate to be transported,
The contact roller is rotatably provided on the support block via the second shaft,
The support block includes a support wall that rotatably holds the first shaft, an adjustment member that adjusts a separation distance between a lower surface of the support block and an upper surface of the support wall, and movement of the support block in a horizontal plane direction. the substrate processing apparatus according to claim Rukoto provided via a regulating member for regulating the.

The transport unit forms a plurality of transport paths so that a plurality of the substrates are transported in parallel,
In each of the plurality of transport paths, the contact roller is provided,
The substrate processing apparatus according to claim 3 , wherein all of the contact rollers are provided on the support block via a second shaft .

A processing unit for brushing the substrate transported by the transport unit with a brush roller supplied with a processing liquid;
A cleaning unit that discharges a rinsing liquid toward the substrate transported by the transport unit;
A drying section for releasing gas toward the substrate transported by the transport section;
The substrate processing apparatus according to claim 3 , further comprising: