TWI668173B - Floating conveying device and substrate processing device - Google Patents

Abstract

Provided are a floating transfer device and a substrate processing device that can prevent the substrate from being deflected and transferred. The floating conveying device of the present invention is a floating conveying device that lifts a substrate and conveys it, and is characterized by having a lower floating device and an upper floating device sandwiching the conveying path of the substrate, and constituting one of the lower floating device and the upper floating device. A plurality of floating blocks on at least one side are arranged with a gap therebetween, and the floating blocks on the other side are arranged to face the gap.

Description

Floating conveying device and substrate processing device

The present invention relates to a floating transfer apparatus and a substrate processing apparatus.

A liquid crystal manufacturing apparatus and the like use a floating transfer apparatus that transfers a glass substrate while floating. As an example of the floating conveying device, it is known to provide a plurality of gas ejection holes and suction holes on the surface of the floating block, and to set the ejection amount of the gas from each ejection hole and the suction amount of the gas to each suction hole. By adjusting, the substrate is floated from the floating block for conveyance. The amount of the gas to be ejected or sucked is determined in consideration of the weight of the substrate to be transported, the floating distance from the surface of the floating block, and the like. In addition, as the substrate becomes larger, a plurality of floating blocks are arranged side by side along the substrate conveyance direction and a direction orthogonal to the conveyance direction. The substrate is sprayed with a processing liquid, and the substrate is processed. Here, in order to secure the arrangement space of the nozzles and the like for supplying the processing liquid, a gap is provided between adjacent floating blocks to arrange them.间隙 If a gap is formed between adjacent floating blocks, there will be no buoyancy on the substrate in the gap portion. Therefore, the front end of the substrate to be transported may be bent to collide with the floating block. This phenomenon is more pronounced when the substrate is thinner. In addition, the transportation of the substrate has to be interrupted.

It is therefore an object of the present invention to provide a floating transfer device and a substrate processing device that can prevent the substrate from being deflected and transferred. The floating transfer device for the substrate of the embodiment is a floating transfer device that floats and transfers the substrate. It is characterized by having a lower floating device and an upper floating device sandwiching the transport path of the substrate, and constituting the lower floating device. A plurality of floating blocks that are at least one of the above-mentioned upper floating device are arranged with a gap therebetween, and the other floating blocks are arranged so as to face the gap. In addition, regarding the substrate processing apparatus of the embodiment, is a substrate processing apparatus that processes the substrate while the substrate is floated to be transported, and is characterized in that: includes: 上 a floating transfer apparatus having a floating apparatus for floating the substrate, and And a processing fluid supply mechanism for supplying the processing fluid to the substrate transferred to the float by the floating transfer device, and the floating transfer device is the above-mentioned Floating transport device. According to the present invention, it is possible to prevent the substrate from being deflected and to carry it.

Hereinafter, a substrate processing apparatus according to an embodiment of the present invention will be described with reference to the drawings. As shown in FIG. 1, the substrate processing apparatus 100 according to the present embodiment includes a floating transfer apparatus 10 and a processing liquid supply apparatus (processing fluid supply mechanism) 20 and 30. The floating conveying device 10 is a boundary of the conveying path of the substrate W, and includes a lower floating device 11, an upper floating device 12, and a conveying force imparting mechanism 13. (2) As the lower floating device 11 and the upper floating device 12, a conventionally known floating block is used, in which a gas such as air is ejected or sucked from the respective surfaces, and the substrate W is floated. FIG. 2 is a schematic bottom view of one floating block 12a constituting the upper floating device 12, and FIG. 3 is a schematic partial cross-sectional view of the floating block 12a, in particular, the ejection holes and the suction holes. The floating block 12a is a rectangular parallelepiped, and has a uniform arrangement of the ejection holes a and the suction holes b below, the air ejected from the ejection holes a, the air attracted from the suction holes b, and the weight of the substrate W. Equipped with a balance to support the substrate W below. In addition, in FIG. 2, although each area (shown by a one-dot chain line) in which the ejection holes a and the suction holes b are provided is marked as a, b, the ejection holes are arranged in each area indicated by a one-dot chain line. a or suction hole b (Figure 2 is a circular diagram). In addition, in FIG. 3, arrows indicate the direction of air flow. The floating block 12a constituting the upper floating device 12 is disposed above the conveyance surface of the substrate W as shown in FIG. 1. The floating block 12a is disposed in a state where the floating block 12a is vertically reversed from the conventionally known floating block 12b, which is arranged just below the conveyance surface of the substrate W. Each of the ejection holes a of the floating blocks 12a and 12b is a pressurized gas supply device (not shown) connected to a blower or a compressor through a passage c or a filter (not shown), and each of the suction holes b, It is a gas suction device (not shown) connected to a pump (not shown) or the like through each of the passages d. In each of the floating blocks 12a and 12b, it is known that the substrate W can be floated by the action of the gas ejected from the ejection hole a, and the floating rigidity can be maintained by the suction effect of the suction hole b. In the present embodiment, the plurality of floating blocks 12b constituting the lower floating device 11 and the plurality of floating blocks 12a constituting the upper floating device 12 are conveying paths for sandwiching the substrate W of the conveying force imparting mechanism 13 described later. (Transfer surface), the following arrangement relationship is obtained. In FIG. 1, the two floating blocks 12 b constituting the lower floating device 11 and the two floating blocks 12 a constituting the upper floating device 12 are provided along the transport direction A of the substrate W, respectively. The two floating blocks 12b constituting the lower floating device 11 and the two floating blocks 12a constituting the upper floating device 12 are arranged with the same gap in the transport direction A of the substrate W. Specifically, the gap is a size in which the processing liquid supply devices 20 and 30 can be arranged. In addition, as shown in FIG. 1, the size may be a size capable of supplying the processing liquid to the substrate W at least by the processing liquid supply devices 20 and 30. In addition, with respect to the gap provided between the two floating blocks 12b constituting the lower floating device 11, any one of the two floating blocks 12a constituting the upper floating device 12 is opposed to each other. In addition, with respect to the gap provided between the two floating blocks 12a constituting the upper floating device 12, any one of the two floating blocks 12b constituting the lower floating device 11 is opposed to each other. The distance between the lower surface of the floating block 12a and the upper surface of the floating block 12b is, for example, 5 mm or less. The length of the substrate W in the transport direction A is longer than the gap between the pair of floating blocks 12a and the gap between the pair of floating blocks 12b. In addition, although the arrangement relationship between the floating blocks 12a and 12b of the upper floating device 12 and the lower floating device 11 has been described with reference to FIG. 1, in this embodiment, as shown in FIG. The blocks 12a and 12b correspond to the size of the substrate W to be transferred, and are not limited to the direction A in which the substrate W is transferred, but also in a direction orthogonal to the direction A (hereinafter referred to as the "wide direction"). The pattern is 5). In this case, the gap described above is formed along the width direction in addition to the conveying direction A, and the length in the width direction is adjusted according to the size of the substrate W, and the number of floating blocks 12a, 12b is adjusted. This can be set freely. In FIG. 4, the processing liquid supply devices 20 and 30 and the control unit 40 are omitted. The conveying force imparting mechanism 13 conveys the substrate W held in a non-contact state (floating state) to the floating blocks 12 a and 12 b in the conveying direction A. Specifically, as shown in FIG. 4, a contact roller 13 a is provided on a side surface along the conveyance direction A of the substrate W. Each roller 13a is rotationally driven by a driving device (not shown). By the rotation of the roller 13a, a carrying force in the direction A is applied to the floating substrate W. (1) In FIG. 1, the processing liquid supply devices 20 and 30 are devices for supplying a processing liquid (for example, pure water) for processing the substrate W to the surface of the substrate W. The processing liquid supply device 20 is a gap formed between the two floating blocks 12a constituting the upper floating device 12 and supplies the processing liquid to the surface (upper surface) of the lower substrate W through a nozzle, for example. In contrast, the processing liquid supply device 30 is a gap formed between two floating blocks 12b constituting the lower floating device 11 and is supplied to the inside (bottom) of the upper substrate W through a nozzle, for example. Treatment solution. In the case of FIG. 4, the processing liquid supply devices 20 and 30 have, for example, slit nozzles, and can supply the processing liquid to the entire area in the width direction of the substrate W to be transferred. The slit provided in the slit nozzle extends along the width direction of the substrate W, and has a size at least in the width direction of the substrate W. The processing liquid is ejected from the slit nozzle, and the processing liquid is supplied to the front and back surfaces (upper and lower surfaces) of the transferred substrate W. Next, the processing process of the substrate W of the substrate processing apparatus 100 will be described. The operations described below are controlled by the control unit 40. First, on the floating blocks 12a and 12b, the air ejection operation from the ejection hole a and the air ejection operation from the suction hole b are started. Then, when the substrate W is carried into the substrate processing apparatus 100, the substrate W is supported by the floating blocks 12a and 12b by the function of the floating transfer apparatus 10, and is moved in the direction A by the rotation force of the roller 13a. Transport. When the substrate W reaches the arrangement position of the processing liquid supply device 20, the processing liquid is supplied to the surface (upper surface) of the substrate W from a slit nozzle (not shown). When the substrate W reaches the arrangement position of the processing liquid supply device 30, the processing liquid is supplied to the inside (lower surface) of the substrate W from a slit nozzle (not shown). Then, the substrates W processed on the front and rear surfaces by the processing liquid supply devices 20 and 30 are carried out from the substrate processing device 100 and sent to the next process by a transfer mechanism (not shown). Among them, in FIG. 1, the substrate W carried into the substrate processing apparatus 100 is first supported by the floating block 12 a on the carrying side. In FIG. 1, when the front end of the substrate W reaches the gap between the two floating blocks 12 a constituting the upper floating device 12, there is no floating block 12 a facing the front end of the substrate W. However, as described above, the gap provided between the two floating blocks 12a constituting the upper floating device 12 is such that any one of the two floating blocks 12b constituting the lower floating device 11 is opposed to each other. Therefore, in FIG. 1, the front end portion of the substrate W that reaches the gap provided between the adjacent floating blocks 12 a receives the buoyancy from the floating block 12 b of the lower floating device 11. Further, in the substrate W to be transported, a portion facing the gap provided between the adjacent floating blocks 12a is also provided with buoyancy from the floating blocks 12b. In addition, when the front end of the substrate W reaches the gap between the two floating blocks 12 b constituting the lower floating device 11, there is no floating block 12 b facing the front end of the substrate W. However, as described above, the gap provided between the two floating blocks 12b constituting the lower floating device 11 is such that any one of the two floating blocks 12a constituting the upper floating device 12 faces each other. Therefore, in FIG. 1, the front end portion of the substrate W reaching the gap provided between the adjacent floating blocks 12 b receives the buoyancy from the floating block 12 a of the upper floating device 12. Further, in the substrate W to be transported, a portion facing the gap provided between the adjacent floating blocks 12b is provided with buoyancy from the floating blocks 12a. In this embodiment, in order to provide the processing liquid supply devices 20 and 30, a gap is provided between each floating block 12a and each floating block 12b, but it is also configured to arrange the floating of the upper floating device 12 The block 12a is opposed to the gap provided between the two floating blocks 12b constituting the lower floating device 11, or the floating block 12b constituting the lower floating device 11 is arranged to be opposed to the upper floating device 12b. The gaps between the two floating blocks 12a of 11 are opposite to each other. Thereby, even when the substrate W passes through the gap, the substrate W is given buoyancy. In particular, the portion of the substrate W to be transported that passes through the gap is continuously given buoyancy. Therefore, it is possible to prevent the substrate W being transported, especially the front end, from being caused by the dead weight or the pressure of the processing liquid supplied from the processing liquid supply device 20 (30), causing the substrate W between adjacent floating blocks 12a (12b). The formed gap is deflected, and there is a problem that, for example, the deflected front end collides with the floating block 12b and is damaged, or the operation is interrupted and the operation efficiency is lowered, or the transportation is continued in a deflected state, resulting in uneven processing. Here, the length relationship (from Example 1 to Example 3) of each floating block 12a, 12b will be described with reference to FIG. 5. In FIG. 5, the length of the floating direction of the floating block 12a in the transport direction A is L2, the length of the floating direction of the floating block 12b is L1, and the length of the floating block 12a and the floating block 12b in the transportation direction A1 is S. As an example 1, L2 = L1. In this case, as the floating blocks 12a and 12b, the same block can be used up and down. In addition, as Example 2, it is the aforementioned Example 1 (L2 = L1), and it is S = 0 or more [L1 (= L2) / 2] or less. In addition, all S may not be the same value. As Example 3, L2 = L1 × (1 or more and 2 or less). This length relationship is merely an example, and is not limited to the aforementioned relationship. In addition, in the embodiment, the conveying force of the substrate W supported by the floating blocks 12a and 12b on the floating is obtained by the rotation force of the roller 13a. However, as long as the conveying force can be obtained by, for example, inclining the air ejection direction of the ejection holes a from the floating blocks 12a, 12b toward the conveying direction A of the substrate W, the roller 13a may not be particularly provided. It can also be used in combination with the roller 13a. In addition, although air is ejected from the ejection holes a of the floating blocks 12a and 12b, the air may be changed into an inert gas such as helium or the gas may be changed into a liquid such as pure water. In addition, in the embodiment shown in FIG. 1, in order to supply the processing liquid to the upper and lower surfaces of the substrate W, a gap is formed in each of the floating blocks 12 a and 12 b constituting the lower floating device 11 and the upper floating device 12. However, for example, if only the processing liquid is to be supplied to the lower surface of the substrate W, it is not necessary to form a gap between the floating blocks 12 a constituting the upper floating device 12. That is, for example, in FIG. 1, when a gap is formed between at least one of the floating blocks constituting the lower floating device 11 and the upper floating device 12, as long as the floating blocks constituting the other floating device are It may be arranged in a structure facing the gap. In the aforementioned embodiment, although the processing fluid supply means 20 and 30 suitable for supplying the processing liquid to the substrate W are exemplified as the processing fluid supply means, the present invention is not limited to this. For example, it may be a gas supply device, a supply liquid, and Gas dual fluid supply device. Moreover, in the aforementioned embodiment, although a gap is provided between the plurality of floating blocks 12a and 12b constituting the lower floating device 11 or the upper floating device 12, respectively, this is for supplying the processing liquid to the device 20, 30 is arranged in this gap. However, the reason for providing a gap between the floating blocks along the conveyance direction of the substrate W is not limited to this. For example, when the substrate W is conveyed between the adjacent cleaning device and the drying device, the two devices are connected. In some cases, a gap may be provided between adjacent floating blocks, and the reason is not required.

100‧‧‧ substrate processing equipment

10‧‧‧ Floating Transfer Device

11‧‧‧ underside floating device

12‧‧‧ upper side floating device

12a‧‧‧ floating block

12b‧‧‧ floating block

13‧‧‧Transporting force granting agency

13a‧‧‧roller

20‧‧‧ treatment liquid supply device

30‧‧‧ treatment liquid supply device

40‧‧‧Control Department

a‧‧‧outlet

b‧‧‧ suction hole

c‧‧‧access

A‧‧‧ transport direction

W‧‧‧ substrate

FIG. 1 is a front view schematically showing a substrate processing apparatus according to a first embodiment of the present invention. FIG. 2 is a schematic bottom view of a floating block included in the substrate processing apparatus of FIG. 1. FIG. 3 is a schematic partial cross-sectional view of the floating block of FIG. 2. FIG. 4 is a plan view of the substrate processing apparatus of FIG. 1. FIG. 5 is a front view of the floating block of FIG. 1.

Claims (8)

A floating conveying device is used to float a substrate, and is characterized in that the conveying path sandwiching the substrate has a lower floating device and an upper floating device, and the lower floating device and the upper floating device each have a plurality of devices. The floating blocks, each of the floating blocks, has a plurality of ejection holes for ejecting fluid and suction holes for attracting the fluid on a surface opposite to the substrate being transported, and constitutes the lower floating device and the upper side, respectively. The plurality of floating blocks of the floating device are arranged by providing a gap in the conveying direction of the substrate, and the gap existing between the plurality of floating blocks constituting the lower floating device is configured to constitute the upper floating device. Any one of the above-mentioned floating blocks is opposite to each other; and for the gap existing between the plurality of above-mentioned floating blocks constituting the above-side floating-up device, any one of the above-mentioned floating blocks constituting the lower-side floating device is opposed to constitute the above-mentioned floating The aforementioned gaps existing between the plurality of aforementioned floating blocks on the side floating device and The gaps between the plurality of blocks of floating upper floating apparatus is configured not to pair with each other. The floating transfer device according to claim 1, wherein the plurality of floating blocks constituting the lower floating device and the plurality of floating blocks constituting the upper floating device have the same length in the transport direction of the substrate. . The floating transfer device according to claim 1, wherein the overlapping length of one of the floating blocks constituting the lower floating device and one of the floating blocks opposing the floating block constituting the upper floating device is The direction in which the substrate is transported is equal to or less than half the length of the substrate in the transport direction of one of the floating blocks constituting the lower floating device. The floating conveyance device according to any one of claims 1 to 3, wherein the floating blocks constituting the lower floating device and the upper floating device, respectively, are plural in a direction orthogonal to the conveying direction of the substrate. Settings. A substrate processing apparatus for processing the substrate while lifting the substrate and carrying the substrate is characterized in that the substrate processing apparatus includes a floating transfer device including a floating device for floating the substrate, and the floating device to be supported by the floating device. A transfer force applying mechanism for transferring a substrate in a transfer direction; and a processing fluid supply mechanism for supplying a processing fluid to the substrate transferred by the floating transfer device, the floating device having a lower side sandwiching a transfer path of the substrate The floating device and the upper floating device, the lower floating device and the upper floating device each have a plurality of floating blocks, and each of the floating blocks is on a surface opposite to the substrate being transported, and each has a plurality of: The fluid ejection holes and the suction holes for attracting the fluid constitute a plurality of floating blocks of the lower floating device and the upper floating device, respectively, and are arranged by providing a gap in the conveying direction of the substrate. The foregoing exists between a plurality of the foregoing floating blocks Gap, so that any one of the floating blocks constituting the upper floating device is opposed to each other; and for the gap existing between the plurality of floating blocks constituting the upper floating device, any one of the foregoing constituting the lower floating device The floating blocks are opposite to each other, and the gaps between the plurality of floating blocks constituting the lower floating device and the gaps between the plurality of floating blocks constituting the upper floating device are arranged. Do not face each other. The substrate processing apparatus according to claim 5, wherein the lower floating device and the upper floating device both have two floating blocks along the conveying direction of the substrate, and the lower floating device has The aforementioned gap formed by the two aforementioned floating blocks is formed on the downstream side of the substrate in the transport direction of the substrate than the aforementioned gap formed by the two aforementioned floating blocks provided by the aforementioned upper floating device. The substrate processing apparatus according to claim 6, wherein the processing fluid supply mechanism includes: a first supply nozzle that is arranged in the gap provided in the upper floating device to supply the processing fluid; and a second supply nozzle It is arranged in the gap of the lower floating device to supply the processing fluid, and the first supply nozzle is used to supply the processing fluid to the upper surface of the substrate transferred by the transfer force imparting mechanism, and to the above The processing fluid is supplied to the lower surface of the substrate by the second supply nozzle. The substrate processing apparatus according to any one of claims 5 to 7, wherein the floating blocks constituting the lower floating device and the upper floating device, respectively, are plural in a direction orthogonal to the substrate conveying direction. Settings.