JP2017534070A5 - - Google Patents
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- JP2017534070A5 JP2017534070A5 JP2016534124A JP2016534124A JP2017534070A5 JP 2017534070 A5 JP2017534070 A5 JP 2017534070A5 JP 2016534124 A JP2016534124 A JP 2016534124A JP 2016534124 A JP2016534124 A JP 2016534124A JP 2017534070 A5 JP2017534070 A5 JP 2017534070A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- photoresist composition
- compound
- crosslinking system
- divalent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- -1 salt compound Chemical class 0.000 claims 28
- 229920002120 photoresistant polymer Polymers 0.000 claims 18
- 238000000034 method Methods 0.000 claims 12
- 239000000758 substrate Substances 0.000 claims 10
- 239000002253 acid Substances 0.000 claims 9
- 238000004132 cross linking Methods 0.000 claims 8
- 125000000217 alkyl group Chemical group 0.000 claims 6
- 239000011248 coating agent Substances 0.000 claims 5
- 238000000576 coating method Methods 0.000 claims 5
- 238000010438 heat treatment Methods 0.000 claims 5
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 claims 4
- 125000003118 aryl group Chemical group 0.000 claims 4
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical group C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 claims 4
- 229910003472 fullerene Inorganic materials 0.000 claims 4
- 125000001072 heteroaryl group Chemical group 0.000 claims 4
- 239000000463 material Substances 0.000 claims 4
- 239000000178 monomer Substances 0.000 claims 3
- 229920000642 polymer Polymers 0.000 claims 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 claims 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 150000001721 carbon Chemical group 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 125000006264 diethylaminomethyl group Chemical group [H]C([H])([H])C([H])([H])N(C([H])([H])*)C([H])([H])C([H])([H])[H] 0.000 claims 2
- 125000004185 ester group Chemical group 0.000 claims 2
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 claims 2
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 claims 2
- 125000000524 functional group Chemical group 0.000 claims 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 2
- 150000002367 halogens Chemical class 0.000 claims 2
- 125000005842 heteroatom Chemical group 0.000 claims 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims 2
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 claims 2
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 claims 2
- 125000001064 morpholinomethyl group Chemical group [H]C([H])(*)N1C([H])([H])C([H])([H])OC([H])([H])C1([H])[H] 0.000 claims 2
- 229920003986 novolac Polymers 0.000 claims 2
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical group NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 claims 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical class C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 claims 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 125000004429 atom Chemical group 0.000 claims 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 claims 1
- 125000006222 dimethylaminomethyl group Chemical group [H]C([H])([H])N(C([H])([H])[H])C([H])([H])* 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 229920002554 vinyl polymer Polymers 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/516,472 US9383646B2 (en) | 2014-02-24 | 2014-10-16 | Two-step photoresist compositions and methods |
| PCT/US2015/065691 WO2016086236A2 (en) | 2014-02-24 | 2015-12-15 | Two-step photoresist compositions and methods |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2017534070A JP2017534070A (ja) | 2017-11-16 |
| JP2017534070A5 true JP2017534070A5 (enExample) | 2018-11-08 |
Family
ID=60201754
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016534124A Pending JP2017534070A (ja) | 2014-10-16 | 2015-12-15 | 二段階フォトレジスト組成物および方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9383646B2 (enExample) |
| JP (1) | JP2017534070A (enExample) |
| KR (1) | KR20170118587A (enExample) |
| CN (1) | CN107087426A (enExample) |
| WO (1) | WO2016086236A2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6967967B2 (ja) * | 2014-10-08 | 2021-11-17 | アレックス フィリップ グラハム ロビンソンAlex Philip Graham ROBINSON | スピンオンハードマスク材料 |
| US10095112B2 (en) * | 2017-02-24 | 2018-10-09 | Irresistible Materials Ltd | Multiple trigger photoresist compositions and methods |
| KR102417180B1 (ko) * | 2017-09-29 | 2022-07-05 | 삼성전자주식회사 | Duv용 포토레지스트 조성물, 패턴 형성 방법 및 반도체 소자의 제조 방법 |
| JP7432620B2 (ja) * | 2019-05-19 | 2024-02-16 | ロビンソン，アレックス，ピー．ジー． | Ｅｕｖ用パターン化レジストの形成方法 |
| JP2020196771A (ja) * | 2019-05-30 | 2020-12-10 | Jsr株式会社 | 組成物、レジスト下層膜、レジスト下層膜の形成方法及びパターニングされた基板の製造方法 |
| US12386266B2 (en) * | 2021-12-13 | 2025-08-12 | Changxin Memory Technologies, Inc. | Method of processing photoresist layer, and photoresist layer |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0885405B1 (en) * | 1996-03-07 | 2005-06-08 | Sumitomo Bakelite Co., Ltd. | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| US6114082A (en) * | 1996-09-16 | 2000-09-05 | International Business Machines Corporation | Frequency doubling hybrid photoresist having negative and positive tone components and method of preparing the same |
| US6190829B1 (en) * | 1996-09-16 | 2001-02-20 | International Business Machines Corporation | Low “K” factor hybrid photoresist |
| JP4554665B2 (ja) * | 2006-12-25 | 2010-09-29 | 富士フイルム株式会社 | パターン形成方法、該パターン形成方法に用いられる多重現像用ポジ型レジスト組成物、該パターン形成方法に用いられるネガ現像用現像液及び該パターン形成方法に用いられるネガ現像用リンス液 |
| US8530148B2 (en) * | 2006-12-25 | 2013-09-10 | Fujifilm Corporation | Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method |
| GB0920231D0 (en) * | 2009-11-18 | 2010-01-06 | Univ Birmingham | Photoresist composition |
| IL213195A0 (en) * | 2010-05-31 | 2011-07-31 | Rohm & Haas Elect Mat | Photoresist compositions and emthods of forming photolithographic patterns |
| JP5621755B2 (ja) * | 2011-11-17 | 2014-11-12 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト材料及びパターン形成方法 |
| US9256126B2 (en) * | 2012-11-14 | 2016-02-09 | Irresistible Materials Ltd | Methanofullerenes |
| US9323149B2 (en) * | 2013-03-05 | 2016-04-26 | Irresistible Materials Ltd | Methanofullerenes |
| US9046767B2 (en) * | 2013-10-25 | 2015-06-02 | Rohm And Haas Electronic Materials Llc | Photoacid generator, photoresist, coated substrate, and method of forming an electronic device |
-
2014
- 2014-10-16 US US14/516,472 patent/US9383646B2/en active Active
-
2015
- 2015-12-15 WO PCT/US2015/065691 patent/WO2016086236A2/en not_active Ceased
- 2015-12-15 CN CN201580002527.0A patent/CN107087426A/zh active Pending
- 2015-12-15 KR KR1020167015368A patent/KR20170118587A/ko not_active Withdrawn
- 2015-12-15 JP JP2016534124A patent/JP2017534070A/ja active Pending
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