JP2017224601A5 - - Google Patents
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- JP2017224601A5 JP2017224601A5 JP2017113989A JP2017113989A JP2017224601A5 JP 2017224601 A5 JP2017224601 A5 JP 2017224601A5 JP 2017113989 A JP2017113989 A JP 2017113989A JP 2017113989 A JP2017113989 A JP 2017113989A JP 2017224601 A5 JP2017224601 A5 JP 2017224601A5
- Authority
- JP
- Japan
- Prior art keywords
- frequency
- plasma processing
- signal
- processing stations
- distributor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 239000000523 sample Substances 0.000 claims description 12
- 210000002381 plasma Anatomy 0.000 claims 133
- 239000003990 capacitor Substances 0.000 claims 45
- 230000005540 biological transmission Effects 0.000 claims 22
- 238000000034 method Methods 0.000 claims 21
- 230000008878 coupling Effects 0.000 claims 1
- 238000010168 coupling process Methods 0.000 claims 1
- 238000005859 coupling reaction Methods 0.000 claims 1
- 238000013507 mapping Methods 0.000 description 1
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662351879P | 2016-06-17 | 2016-06-17 | |
| US62/351,879 | 2016-06-17 | ||
| US15/254,769 US10187032B2 (en) | 2016-06-17 | 2016-09-01 | Combiner and distributor for adjusting impedances or power across multiple plasma processing stations |
| US15/254,769 | 2016-09-01 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017224601A JP2017224601A (ja) | 2017-12-21 |
| JP2017224601A5 true JP2017224601A5 (Direct) | 2020-09-03 |
| JP6981781B2 JP6981781B2 (ja) | 2021-12-17 |
Family
ID=60659828
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017113989A Active JP6981781B2 (ja) | 2016-06-17 | 2017-06-09 | 複数のプラズマ処理ステーションにわたってインピーダンスまたは電力を調整するための結合器／分配器 |
Country Status (5)
| Country | Link |
|---|---|
| US (5) | US10187032B2 (Direct) |
| JP (1) | JP6981781B2 (Direct) |
| KR (6) | KR102123722B1 (Direct) |
| CN (2) | CN107523810B (Direct) |
| TW (4) | TW202504394A (Direct) |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10187032B2 (en) * | 2016-06-17 | 2019-01-22 | Lam Research Corporation | Combiner and distributor for adjusting impedances or power across multiple plasma processing stations |
| US10283330B2 (en) * | 2016-07-25 | 2019-05-07 | Lam Research Corporation | Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators |
| US10553465B2 (en) * | 2016-07-25 | 2020-02-04 | Lam Research Corporation | Control of water bow in multiple stations |
| US10410836B2 (en) * | 2017-02-22 | 2019-09-10 | Lam Research Corporation | Systems and methods for tuning to reduce reflected power in multiple states |
| DE102018204585A1 (de) * | 2017-03-31 | 2018-10-04 | centrotherm international AG | Plasmagenerator, Plasma-Behandlungsvorrichtung und Verfahren zum gepulsten Bereitstellen von elektrischer Leistung |
| US11289355B2 (en) | 2017-06-02 | 2022-03-29 | Lam Research Corporation | Electrostatic chuck for use in semiconductor processing |
| US11615943B2 (en) * | 2017-07-07 | 2023-03-28 | Advanced Energy Industries, Inc. | Inter-period control for passive power distribution of multiple electrode inductive plasma source |
| US11651939B2 (en) * | 2017-07-07 | 2023-05-16 | Advanced Energy Industries, Inc. | Inter-period control system for plasma power delivery system and method of operating same |
| KR102504624B1 (ko) * | 2017-07-07 | 2023-02-27 | 어드밴스드 에너지 인더스트리즈 인코포레이티드 | 플라즈마 전력 전달 시스템을 위한 주기 간 제어 시스템 및 그 동작 방법 |
| US11469084B2 (en) | 2017-09-05 | 2022-10-11 | Lam Research Corporation | High temperature RF connection with integral thermal choke |
| US11881381B2 (en) | 2018-02-23 | 2024-01-23 | Lam Research Corporation | Capacitance measurement without disconnecting from high power circuit |
| KR102800309B1 (ko) | 2018-02-23 | 2025-04-23 | 램 리써치 코포레이션 | 반도체 프로세싱 툴에서 rf 전류 측정 |
| US11749504B2 (en) * | 2018-02-28 | 2023-09-05 | Applied Materials, Inc. | Methods and apparatus for common excitation of frequency generators |
| US10304663B1 (en) * | 2018-07-19 | 2019-05-28 | Lam Research Corporation | RF generator for generating a modulated frequency or an inter-modulated frequency |
| US11183368B2 (en) * | 2018-08-02 | 2021-11-23 | Lam Research Corporation | RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks |
| US10991550B2 (en) * | 2018-09-04 | 2021-04-27 | Lam Research Corporation | Modular recipe controlled calibration (MRCC) apparatus used to balance plasma in multiple station system |
| CN108712813B (zh) * | 2018-09-13 | 2019-01-04 | 中微半导体设备(上海)有限公司 | 一种可切换匹配网络及电感耦合等离子处理器 |
| US11398387B2 (en) * | 2018-12-05 | 2022-07-26 | Lam Research Corporation | Etching isolation features and dense features within a substrate |
| US10720305B2 (en) * | 2018-12-21 | 2020-07-21 | Advanced Energy Industries, Inc. | Plasma delivery system for modulated plasma systems |
| US10943770B2 (en) * | 2019-03-04 | 2021-03-09 | Advanced Energy Industries, Inc. | Detection of damage in matching networks |
| CN114008735B (zh) * | 2019-04-15 | 2024-08-23 | 朗姆研究公司 | 用于确定电容器故障的早期预警系统和方法 |
| KR102791775B1 (ko) | 2019-05-07 | 2025-04-03 | 램 리써치 코포레이션 | 폐루프 다중 출력 rf 매칭 |
| WO2021022303A1 (en) | 2019-07-31 | 2021-02-04 | Lam Research Corporation | Radio frequency power generator having multiple output ports |
| TW202130229A (zh) * | 2019-10-25 | 2021-08-01 | 美商蘭姆研究公司 | 在多站式積體電路製造腔室中的射頻(rf)功率不均衡化 |
| JP7236985B2 (ja) * | 2019-11-15 | 2023-03-10 | 東京エレクトロン株式会社 | 温度計測システム、温度計測方法及び基板処理装置 |
| CN114762079B (zh) | 2019-12-02 | 2025-02-28 | 朗姆研究公司 | 射频辅助等离子体生成中的阻抗变换 |
| CN112992636B (zh) * | 2019-12-17 | 2023-09-29 | 中微半导体设备(上海)股份有限公司 | 用于等离子体处理设备的射频功率源装置和射频功率分配方法 |
| TWI899187B (zh) * | 2020-03-19 | 2025-10-01 | 美商蘭姆研究公司 | 基板處理系統 |
| US11994542B2 (en) | 2020-03-27 | 2024-05-28 | Lam Research Corporation | RF signal parameter measurement in an integrated circuit fabrication chamber |
| CN116075917A (zh) | 2020-06-12 | 2023-05-05 | 朗姆研究公司 | 通过rf耦合结构对等离子体形成的控制 |
| KR102825317B1 (ko) | 2020-11-19 | 2025-06-26 | 삼성전자주식회사 | 반도체 소자의 제조 장치 및 반도체 소자의 제조 방법 |
| KR20240072245A (ko) | 2021-12-31 | 2024-05-23 | 인투코어테크놀로지 주식회사 | 멀티 스테이션에 대한 플라즈마 공정 시스템 |
| KR102844433B1 (ko) * | 2022-02-07 | 2025-08-12 | 주식회사 뉴파워 프라즈마 | 플라즈마 발생 장치 및 그 제어 방법 |
| DE102022111529A1 (de) * | 2022-05-09 | 2023-11-09 | TRUMPF Hüttinger GmbH + Co. KG | Stromversorgungsanordnung, Plasmaerzeugungseinrichtung und Verfahren zur Steuerung mehrerer Plasmaprozesse |
| US12394606B2 (en) | 2022-10-21 | 2025-08-19 | Applied Materials, Inc. | Impedance control of local areas of a substrate during plasma deposition thereon in a large PECVD chamber |
| US12293897B2 (en) * | 2023-02-28 | 2025-05-06 | Applied Materials, Inc. | Radio frequency diverter assembly enabling on-demand different spatial |
| CN118919388B (zh) * | 2023-05-08 | 2025-09-30 | 江苏鲁汶仪器股份有限公司 | 一种射频等离子体匹配网络电路 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5574967A (en) * | 1994-01-11 | 1996-11-12 | Ericsson Ge Mobile Communications, Inc. | Waste energy control and management in power amplifiers |
| KR100233649B1 (ko) * | 1997-06-24 | 1999-12-01 | 윤종용 | 디스플레이 장치의 채널 자동절환장치 |
| TW391021B (en) * | 1997-09-08 | 2000-05-21 | Murata Manufacturing Co | Variable capacitor |
| US6265831B1 (en) * | 1999-03-31 | 2001-07-24 | Lam Research Corporation | Plasma processing method and apparatus with control of rf bias |
| US6199506B1 (en) | 1999-06-30 | 2001-03-13 | Novellus Systems, Inc. | Radio frequency supply circuit for in situ cleaning of plasma-enhanced chemical vapor deposition chamber using NF3 or NF3/He mixture |
| WO2001073814A2 (en) * | 2000-03-28 | 2001-10-04 | Tokyo Electron Limited | Method and apparatus for controlling power delivered to a multiple segment electrode |
| US6677711B2 (en) * | 2001-06-07 | 2004-01-13 | Lam Research Corporation | Plasma processor method and apparatus |
| US7042311B1 (en) * | 2003-10-10 | 2006-05-09 | Novellus Systems, Inc. | RF delivery configuration in a plasma processing system |
| US7169256B2 (en) * | 2004-05-28 | 2007-01-30 | Lam Research Corporation | Plasma processor with electrode responsive to multiple RF frequencies |
| WO2006133132A2 (en) * | 2005-06-03 | 2006-12-14 | Plasma Control Systems, Llc | Combinations of plasma production devices and method and rf driver circuits with adjustable duty cycle |
| CN100362619C (zh) * | 2005-08-05 | 2008-01-16 | 中微半导体设备(上海)有限公司 | 真空反应室的射频匹配耦合网络及其配置方法 |
| CN101287327B (zh) * | 2007-04-13 | 2011-07-20 | 中微半导体设备(上海)有限公司 | 射频功率源系统及使用该射频功率源系统的等离子体反应腔室 |
| CN101451237B (zh) * | 2007-11-30 | 2012-02-08 | 中微半导体设备(上海)有限公司 | 具有多个等离子体反应区域的包括多个处理平台的等离子体反应室 |
| US7811410B2 (en) * | 2008-06-19 | 2010-10-12 | Lam Research Corporation | Matching circuit for a complex radio frequency (RF) waveform |
| US20100015357A1 (en) * | 2008-07-18 | 2010-01-21 | Hiroji Hanawa | Capacitively coupled plasma etch chamber with multiple rf feeds |
| US8282983B1 (en) | 2008-09-30 | 2012-10-09 | Novellus Systems, Inc. | Closed loop control system for RF power balancing of the stations in a multi-station processing tool with shared RF source |
| US8515362B2 (en) * | 2008-10-30 | 2013-08-20 | Qualcomm, Incorporated | Mixer architectures |
| JP2013004172A (ja) * | 2011-06-10 | 2013-01-07 | Tokyo Electron Ltd | 高周波電力分配装置およびそれを用いた基板処理装置 |
| JP5955520B2 (ja) * | 2011-09-09 | 2016-07-20 | 東京エレクトロン株式会社 | マイクロ波処理装置およびその制御方法 |
| TW201324473A (zh) * | 2011-12-02 | 2013-06-16 | Novatek Microelectronics Corp | 影像顫化模組 |
| US9082589B2 (en) * | 2012-10-09 | 2015-07-14 | Novellus Systems, Inc. | Hybrid impedance matching for inductively coupled plasma system |
| US9620337B2 (en) * | 2013-01-31 | 2017-04-11 | Lam Research Corporation | Determining a malfunctioning device in a plasma system |
| US9263350B2 (en) * | 2014-06-03 | 2016-02-16 | Lam Research Corporation | Multi-station plasma reactor with RF balancing |
| US10187032B2 (en) * | 2016-06-17 | 2019-01-22 | Lam Research Corporation | Combiner and distributor for adjusting impedances or power across multiple plasma processing stations |
-
2016
- 2016-09-01 US US15/254,769 patent/US10187032B2/en active Active
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2017
- 2017-05-30 KR KR1020170066496A patent/KR102123722B1/ko active Active
- 2017-06-09 JP JP2017113989A patent/JP6981781B2/ja active Active
- 2017-06-12 TW TW113136904A patent/TW202504394A/zh unknown
- 2017-06-12 TW TW111117779A patent/TWI827048B/zh active
- 2017-06-12 TW TW106119411A patent/TWI766870B/zh active
- 2017-06-12 TW TW112144890A patent/TWI860897B/zh active
- 2017-06-16 CN CN201710459227.6A patent/CN107523810B/zh active Active
- 2017-06-16 CN CN202010313683.1A patent/CN111534810B/zh active Active
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2019
- 2019-01-16 US US16/249,284 patent/US10622962B2/en active Active
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2020
- 2020-02-21 US US16/797,975 patent/US11258421B2/en active Active
- 2020-06-09 KR KR1020200069563A patent/KR102241517B1/ko active Active
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2021
- 2021-04-12 KR KR1020210047411A patent/KR102308928B1/ko active Active
- 2021-09-28 KR KR1020210128276A patent/KR102418494B1/ko active Active
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2022
- 2022-02-01 US US17/590,803 patent/US12143087B2/en active Active
- 2022-07-04 KR KR1020220081929A patent/KR102566504B1/ko active Active
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2023
- 2023-08-08 KR KR1020230103673A patent/KR20230119102A/ko active Pending
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2024
- 2024-11-08 US US18/941,948 patent/US20250070741A1/en active Pending
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