JP2017188464A5 - - Google Patents

Download PDF

Info

Publication number
JP2017188464A5
JP2017188464A5 JP2017091857A JP2017091857A JP2017188464A5 JP 2017188464 A5 JP2017188464 A5 JP 2017188464A5 JP 2017091857 A JP2017091857 A JP 2017091857A JP 2017091857 A JP2017091857 A JP 2017091857A JP 2017188464 A5 JP2017188464 A5 JP 2017188464A5
Authority
JP
Japan
Prior art keywords
generator
power
impedance
generators
local controller
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2017091857A
Other languages
English (en)
Japanese (ja)
Other versions
JP2017188464A (ja
JP6425765B2 (ja
Filing date
Publication date
Application filed filed Critical
Publication of JP2017188464A publication Critical patent/JP2017188464A/ja
Publication of JP2017188464A5 publication Critical patent/JP2017188464A5/ja
Application granted granted Critical
Publication of JP6425765B2 publication Critical patent/JP6425765B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2017091857A 2011-01-04 2017-05-02 プラズマ処理負荷へのシステムレベルの電力送達 Active JP6425765B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161429472P 2011-01-04 2011-01-04
US61/429,472 2011-01-04

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2016053392A Division JP6141478B2 (ja) 2011-01-04 2016-03-17 プラズマ処理負荷へのシステムレベルの電力送達

Publications (3)

Publication Number Publication Date
JP2017188464A JP2017188464A (ja) 2017-10-12
JP2017188464A5 true JP2017188464A5 (enExample) 2017-11-24
JP6425765B2 JP6425765B2 (ja) 2018-11-21

Family

ID=46457699

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2013547731A Active JP5946227B2 (ja) 2011-01-04 2012-01-04 電力送達システム、電力制御システム、および、電力を送達するまたは電力制御する方法
JP2016053392A Active JP6141478B2 (ja) 2011-01-04 2016-03-17 プラズマ処理負荷へのシステムレベルの電力送達
JP2017091857A Active JP6425765B2 (ja) 2011-01-04 2017-05-02 プラズマ処理負荷へのシステムレベルの電力送達

Family Applications Before (2)

Application Number Title Priority Date Filing Date
JP2013547731A Active JP5946227B2 (ja) 2011-01-04 2012-01-04 電力送達システム、電力制御システム、および、電力を送達するまたは電力制御する方法
JP2016053392A Active JP6141478B2 (ja) 2011-01-04 2016-03-17 プラズマ処理負荷へのシステムレベルの電力送達

Country Status (4)

Country Link
US (2) US9088267B2 (enExample)
JP (3) JP5946227B2 (enExample)
KR (1) KR101675625B1 (enExample)
WO (1) WO2012094416A1 (enExample)

Families Citing this family (72)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2711143C (en) * 2007-12-31 2015-12-08 Ray Ganong Method, system, and computer program for identification and sharing of digital images with face signatures
JP5946227B2 (ja) * 2011-01-04 2016-07-05 アドバンスト・エナジー・インダストリーズ・インコーポレイテッドＡｄｖａｎｃｅｄ Ｅｎｅｒｇｙ Ｉｎｄｕｓｔｒｉｅｓ， Ｉｎｃ． 電力送達システム、電力制御システム、および、電力を送達するまたは電力制御する方法
KR101303040B1 (ko) * 2012-02-28 2013-09-03 주식회사 뉴파워 프라즈마 플라즈마 챔버의 아크 검출 방법 및 장치
US9685297B2 (en) 2012-08-28 2017-06-20 Advanced Energy Industries, Inc. Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system
JP6113450B2 (ja) * 2012-09-07 2017-04-12 株式会社ダイヘン インピーダンス調整装置
JP6084417B2 (ja) 2012-09-28 2017-02-22 株式会社ダイヘン インピーダンス調整装置
CN103730316B (zh) 2012-10-16 2016-04-06 中微半导体设备(上海)有限公司 一种等离子处理方法及等离子处理装置
US8736377B2 (en) * 2012-10-30 2014-05-27 Mks Instruments, Inc. RF pulse edge shaping
US9620334B2 (en) * 2012-12-17 2017-04-11 Lam Research Corporation Control of etch rate using modeling, feedback and impedance match
US9536713B2 (en) * 2013-02-27 2017-01-03 Advanced Energy Industries, Inc. Reliable plasma ignition and reignition
US10821542B2 (en) 2013-03-15 2020-11-03 Mks Instruments, Inc. Pulse synchronization by monitoring power in another frequency band
US9854659B2 (en) * 2014-10-16 2017-12-26 Advanced Energy Industries, Inc. Noise based frequency tuning and identification of plasma characteristics
EP3091559A1 (en) 2015-05-05 2016-11-09 TRUMPF Huettinger Sp. Z o. o. Plasma impedance matching unit, system for supplying rf power to a plasma load, and method of supplying rf power to a plasma load
US9721758B2 (en) * 2015-07-13 2017-08-01 Mks Instruments, Inc. Unified RF power delivery single input, multiple output control for continuous and pulse mode operation
KR101777762B1 (ko) * 2015-09-03 2017-09-12 에이피시스템 주식회사 고주파 전원 공급장치 및 이를 포함하는 기판 처리장치
US9577516B1 (en) * 2016-02-18 2017-02-21 Advanced Energy Industries, Inc. Apparatus for controlled overshoot in a RF generator
KR102901060B1 (ko) * 2016-03-03 2025-12-16 램 리써치 코포레이션 매칭 네트워크 모델의 파라미터들을 결정하도록 하나 이상의 픽스처들 및 효율을 사용하기 위한 시스템들 및 방법들
JP6157036B1 (ja) 2016-07-08 2017-07-05 株式会社京三製作所 高周波電源装置、及び高周波電源装置の制御方法
JP2017073770A (ja) * 2016-09-30 2017-04-13 株式会社ダイヘン 高周波整合システム
JP2017073772A (ja) * 2016-09-30 2017-04-13 株式会社ダイヘン 高周波整合システム
JP6463786B2 (ja) * 2017-01-25 2019-02-06 株式会社ダイヘン 高周波整合システムのインピーダンス調整方法
US10879044B2 (en) * 2017-04-07 2020-12-29 Lam Research Corporation Auxiliary circuit in RF matching network for frequency tuning assisted dual-level pulsing
US11615943B2 (en) 2017-07-07 2023-03-28 Advanced Energy Industries, Inc. Inter-period control for passive power distribution of multiple electrode inductive plasma source
KR102504624B1 (ko) 2017-07-07 2023-02-27 어드밴스드 에너지 인더스트리즈 인코포레이티드 플라즈마 전력 전달 시스템을 위한 주기 간 제어 시스템 및 그 동작 방법
US11651939B2 (en) 2017-07-07 2023-05-16 Advanced Energy Industries, Inc. Inter-period control system for plasma power delivery system and method of operating same
US10679825B2 (en) * 2017-11-15 2020-06-09 Lam Research Corporation Systems and methods for applying frequency and match tuning in a non-overlapping manner for processing substrate
US12505986B2 (en) 2017-11-17 2025-12-23 Advanced Energy Industries, Inc. Synchronization of plasma processing components
US12230476B2 (en) 2017-11-17 2025-02-18 Advanced Energy Industries, Inc. Integrated control of a plasma processing system
US11437221B2 (en) 2017-11-17 2022-09-06 Advanced Energy Industries, Inc. Spatial monitoring and control of plasma processing environments
TWI872423B (zh) 2017-11-17 2025-02-11 新加坡商Aes 全球公司 用於在空間域和時間域上控制基板上的電漿處理之系統和方法，及相關的電腦可讀取媒體
KR102644960B1 (ko) 2017-11-29 2024-03-07 코멧 테크놀로지스 유에스에이, 인크. 임피던스 매칭 네트워크 제어를 위한 리튜닝
US12288673B2 (en) 2017-11-29 2025-04-29 COMET Technologies USA, Inc. Retuning for impedance matching network control
US10553400B2 (en) * 2018-03-30 2020-02-04 Applied Materials, Inc. Methods and apparatus for frequency generator and match network communication
US10916409B2 (en) * 2018-06-18 2021-02-09 Lam Research Corporation Active control of radial etch uniformity
US11804362B2 (en) 2018-12-21 2023-10-31 Advanced Energy Industries, Inc. Frequency tuning for modulated plasma systems
KR20210149225A (ko) 2019-04-29 2021-12-08 램 리써치 코포레이션 Rf 플라즈마 툴들의 멀티 레벨 펄싱을 위한 시스템들 및 방법들
KR102763163B1 (ko) * 2019-04-29 2025-02-07 삼성전자주식회사 Rf 파워 모니터링 장치, 및 그 장치를 포함하는 pe 시스템
US11527385B2 (en) 2021-04-29 2022-12-13 COMET Technologies USA, Inc. Systems and methods for calibrating capacitors of matching networks
US11114279B2 (en) 2019-06-28 2021-09-07 COMET Technologies USA, Inc. Arc suppression device for plasma processing equipment
US11596309B2 (en) 2019-07-09 2023-03-07 COMET Technologies USA, Inc. Hybrid matching network topology
US11107661B2 (en) 2019-07-09 2021-08-31 COMET Technologies USA, Inc. Hybrid matching network topology
KR102884261B1 (ko) 2019-08-28 2025-11-10 코멧 테크놀로지스 유에스에이, 인크. 고전력 저주파 코일들
CN114503238B (zh) 2019-08-28 2025-05-09 应用材料公司 进行调谐以改善等离子稳定性的方法
US11521832B2 (en) 2020-01-10 2022-12-06 COMET Technologies USA, Inc. Uniformity control for radio frequency plasma processing systems
US11887820B2 (en) 2020-01-10 2024-01-30 COMET Technologies USA, Inc. Sector shunts for plasma-based wafer processing systems
US12027351B2 (en) 2020-01-10 2024-07-02 COMET Technologies USA, Inc. Plasma non-uniformity detection
US11830708B2 (en) 2020-01-10 2023-11-28 COMET Technologies USA, Inc. Inductive broad-band sensors for electromagnetic waves
US11670488B2 (en) * 2020-01-10 2023-06-06 COMET Technologies USA, Inc. Fast arc detecting match network
US11605527B2 (en) 2020-01-20 2023-03-14 COMET Technologies USA, Inc. Pulsing control match network
US11961711B2 (en) 2020-01-20 2024-04-16 COMET Technologies USA, Inc. Radio frequency match network and generator
US12261029B2 (en) * 2020-06-17 2025-03-25 Lam Research Corporation Protection system for switches in direct drive circuits of substrate processing systems
US11373844B2 (en) 2020-09-28 2022-06-28 COMET Technologies USA, Inc. Systems and methods for repetitive tuning of matching networks
KR20220067554A (ko) * 2020-11-16 2022-05-25 세메스 주식회사 기판 처리 장치 및 임피던스 정합 방법
US12057296B2 (en) 2021-02-22 2024-08-06 COMET Technologies USA, Inc. Electromagnetic field sensing device
US11961712B2 (en) 2021-04-26 2024-04-16 Advanced Energy Industries, Inc. Combining the determination of single and mutual, preset preserving, impedance loads with advances in single and double sensor calibration techniques in the application of single and pairwise calibration of sensors
US12020901B2 (en) * 2021-05-07 2024-06-25 Applied Materials, Inc. RF impedance matching networks for substrate processing platform
EP4105963A1 (en) 2021-06-17 2022-12-21 Impedans Ltd A controller for a matching unit of a plasma processing system
EP4105962A1 (en) * 2021-06-17 2022-12-21 Impedans Ltd A controller for a matching unit of a plasma processing system
US11923175B2 (en) 2021-07-28 2024-03-05 COMET Technologies USA, Inc. Systems and methods for variable gain tuning of matching networks
US12046448B2 (en) 2022-01-26 2024-07-23 Advanced Energy Industries, Inc. Active switch on time control for bias supply
US11942309B2 (en) 2022-01-26 2024-03-26 Advanced Energy Industries, Inc. Bias supply with resonant switching
US11670487B1 (en) 2022-01-26 2023-06-06 Advanced Energy Industries, Inc. Bias supply control and data processing
WO2023167854A1 (en) * 2022-03-03 2023-09-07 COMET Technologies USA, Inc. Retuning for impedance matching network control
US12243717B2 (en) 2022-04-04 2025-03-04 COMET Technologies USA, Inc. Variable reactance device having isolated gate drive power supplies
DE102022108642A1 (de) * 2022-04-08 2023-10-12 TRUMPF Hüttinger GmbH + Co. KG Plasmazünderkennungsvorrichtung zum Anschluss an eine Impedanzanpassungsschaltung für ein Plasmaerzeugungssystem
US12040139B2 (en) 2022-05-09 2024-07-16 COMET Technologies USA, Inc. Variable capacitor with linear impedance and high voltage breakdown
US11657980B1 (en) 2022-05-09 2023-05-23 COMET Technologies USA, Inc. Dielectric fluid variable capacitor
US12051549B2 (en) 2022-08-02 2024-07-30 COMET Technologies USA, Inc. Coaxial variable capacitor
US11978613B2 (en) 2022-09-01 2024-05-07 Advanced Energy Industries, Inc. Transition control in a bias supply
US12132435B2 (en) 2022-10-27 2024-10-29 COMET Technologies USA, Inc. Method for repeatable stepper motor homing
KR20240138176A (ko) * 2023-03-10 2024-09-20 삼성전자주식회사 Rf 전력 제공 장치 및 그것의 동작 방법
KR102850760B1 (ko) * 2024-05-09 2025-08-28 엠케이에스코리아 유한회사 펄스 발생기의 비대칭 멀티-레벨 제어

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3251087B2 (ja) * 1993-02-16 2002-01-28 東京エレクトロン株式会社 プラズマ処理装置
JP2929284B2 (ja) * 1997-09-10 1999-08-03 株式会社アドテック 高周波プラズマ処理装置のためのインピーダンス整合及び電力制御システム
JP4088499B2 (ja) * 2002-08-28 2008-05-21 株式会社ダイヘン インピーダンス整合器の出力端特性解析方法、およびインピーダンス整合器、ならびにインピーダンス整合器の出力端特性解析システム
US6703080B2 (en) * 2002-05-20 2004-03-09 Eni Technology, Inc. Method and apparatus for VHF plasma processing with load mismatch reliability and stability
US20040016402A1 (en) * 2002-07-26 2004-01-29 Walther Steven R. Methods and apparatus for monitoring plasma parameters in plasma doping systems
KR100877304B1 (ko) * 2003-11-27 2009-01-09 가부시키가이샤 다이헨 고주파 전력 공급 시스템
US7169256B2 (en) * 2004-05-28 2007-01-30 Lam Research Corporation Plasma processor with electrode responsive to multiple RF frequencies
JP4739793B2 (ja) * 2005-03-31 2011-08-03 株式会社ダイヘン 高周波電源装置
US20080179948A1 (en) * 2005-10-31 2008-07-31 Mks Instruments, Inc. Radio frequency power delivery system
US7764140B2 (en) * 2005-10-31 2010-07-27 Mks Instruments, Inc. Radio frequency power delivery system
JP5512127B2 (ja) * 2005-10-31 2014-06-04 エム ケー エス インストルメンツ インコーポレーテッド 無線周波数電力搬送システム及び方法
JP2007336148A (ja) * 2006-06-14 2007-12-27 Daihen Corp 電気特性調整装置
JP2007313432A (ja) 2006-05-25 2007-12-06 Nippon Kankyo Calcium Kenkyusho:Kk 廃棄物処分場を覆う盛土部における設備
JP2008157906A (ja) * 2006-12-25 2008-07-10 Adtec Plasma Technology Co Ltd 出力インピーダンス検出方法およびこの方法を用いたインピーダンスのセンサー、高周波電源につながる負荷側の電力モニターならびに高周波電源の制御装置
KR101528528B1 (ko) 2008-05-14 2015-06-12 어플라이드 머티어리얼스, 인코포레이티드 Ｒｆ 전력 전달을 위한 시간 분해된 조정 방식을 이용하는 펄스화된 플라즈마 처리를 위한 방법 및 장치
US8040068B2 (en) * 2009-02-05 2011-10-18 Mks Instruments, Inc. Radio frequency power control system
JP5946227B2 (ja) * 2011-01-04 2016-07-05 アドバンスト・エナジー・インダストリーズ・インコーポレイテッドＡｄｖａｎｃｅｄ Ｅｎｅｒｇｙ Ｉｎｄｕｓｔｒｉｅｓ， Ｉｎｃ． 電力送達システム、電力制御システム、および、電力を送達するまたは電力制御する方法

Similar Documents

Publication Publication Date Title
JP2017188464A5 (enExample)
EA201992101A1 (ru) Курительная система, способ и программа управления электропитанием, первичное устройство и вторичное устройство
EA201990062A1 (ru) Система управления аккумуляторной батареей
CN103344843B (zh) 一种串补电容器组的测量系统
GB2468802A (en) Electrosurgical system
EP4233585A3 (en) Power management method and system for a battery powered aerosol-generating device
CN106137381A (zh) 射频消融仪、射频消融仪的控制方法和装置
WO2018190589A3 (ko) 에어로졸 생성 장치 및 에어로졸 생성 장치에서 흡연 제한 기능을 제공하는 방법
JP2009514176A5 (enExample)
EA201991565A1 (ru) Генерирующее аэрозоль устройство, способ управления генерирующим аэрозоль устройством и программа
EP4349199A3 (en) Power supply unit for aerosol inhaler and control method of the same
EP4646024A3 (en) Dynamic output power management for electronic smoking device
TW201333507A (zh) 仿真高頻電子記錄的系統與方法
JP2016514561A5 (enExample)
JP2016189664A5 (enExample)
US10539117B2 (en) Power plant controller for generating a power reference to wind turbine generators
JP2014197676A5 (enExample)
EP4488776A3 (en) Aerosol generation device, control method and program
US11139148B2 (en) Method and apparatus for changing the apparent source impedance of a generator
US20160143685A1 (en) Electrosurgical system for multi-frequency interrogration of parasitic parameters of an electrosurgical instrument
US9143112B2 (en) Circuits and methods for providing an impedance adjustment
SE1750045A1 (sv) Circuit for breaking alternating current
WO2011006828A3 (de) Haushaltsgerät und verfahren zum betreiben eines haushaltsgeräts
MX393812B (es) Sistema y metodo para realizar diagnosticos de transformador
CN106526365B (zh) 单火线用电数据测量方法及单火线智能断路器