JP2017084965A - 遷移金属膜のエッチング方法及び基板処理装置 - Google Patents
遷移金属膜のエッチング方法及び基板処理装置 Download PDFInfo
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Abstract
Description
最終的にガスエッチングが完了したか否かについては、例えば処理容器10内に設けられた質量分析計(QMS)80の検出に基づき判断される(工程ST8)。
一方、錯化エッチング工程(工程ST5〜ST7)については、十分に錯体を形成させるために、0.1kPa以上101.3kPa以下の条件で行われることが好ましく、更には、1.33kPa以上13.3kPa以下の条件で行われる。また、被処理体(ウェハW)の温度は100℃以上350℃以下が好ましく、更には、200℃以上300℃以下がより好ましい。
即ち、ガスエッチングが高圧・高温の条件下において実施されるため、錯体反応速度が従来に比べ向上し、エッチング速度やスループットの向上が実現される。加えて、エッチングにおいてプラズマを用いず、錯化ガスを用いて形成した金属錯体を蒸発させることでエッチングを行っているため、エッチング生成物の被処理体への再付着や、デバイスへのダメージといった問題が生じることなくエッチングを行うことができる。
図5(a)に示すインライン型の複数チャンバ方式の装置では、酸化工程を行うチャンバ(図中「酸化」と記載)と、錯化エッチング工程を行うチャンバ(図中「ガス」と記載)を交互に隣接して配置し、被処理体をこれら複数のチャンバで処理を行いつつ搬送することで最終的なエッチングが完了する。
図5(b)に示すクラスター型の複数チャンバ方式の装置は、酸化工程を行うチャンバ(図中「酸化」と記載)と、錯化エッチング工程を行うチャンバ(図中「ガス」と記載)が互いに隣接するように略円環状に配置される。そして、例えば略円環状に構成された装置全体の中心に位置する搬送ロボット等の手段(図示せず)により、被処理体が各チャンバに搬送され、順に処理を行うことで最終的なエッチングが完了する。このような図5に示す構成において、チャンバ数は任意であり、最終的なエッチングが完了するような好適なチャンバ数を設定すれば良い。
10…処理容器
20…載置台
60…第1のガス供給管
61…第1のガス供給源
70…第2のガス供給管
73…第2のガス供給源
80…質量分析計(QMS)
90…酸素イオン
95…錯化ガスに含まれる分子
97…金属錯体
W…ウェハ(被処理体)
Claims (12)
- 基板処理装置を用いて遷移金属膜を異方的にエッチングする方法であって、
前記基板処理装置は、遷移金属膜を含む被処理体の処理を行う1又は複数の処理容器を有し、
前記処理容器内に酸素イオンを含む第1のガスを導入し、酸素イオンを前記遷移金属膜に照射して当該遷移金属膜の遷移金属を酸化させて金属酸化層を形成させる酸化工程と、
前記処理容器内に前記金属酸化層を錯化させるための第2のガスを導入し、当該金属酸化層において金属錯体を形成させてエッチングを行う錯化エッチング工程と、を備えることを特徴とする、遷移金属膜のエッチング方法。 - 前記基板処理装置は、前記処理容器内にプラズマを生成させるプラズマ源を備え、
前記酸化工程においては、前記第1のガスのプラズマを生成させることにより酸素イオンを前記遷移金属膜に照射することを特徴とする、請求項1に記載の遷移金属膜のエッチング方法。 - 前記第2のガスは、β−ジケトン系ガスであることを特徴とする、請求項1又は2に記載の遷移金属膜のエッチング方法。
- 前記錯化エッチング工程は、ガスの圧力が0.1kPa以上101.3kPa以下、且つ、前記被処理体の温度が100℃以上350℃以下の条件下で行われることを特徴とする、請求項1〜3のいずれか一項に記載の遷移金属膜のエッチング方法。
- 前記酸化工程は、ガスの圧力が100Pa以下の条件下で行われることを特徴とする、請求項1〜4のいずれか一項に記載の遷移金属膜のエッチング方法。
- 前記酸化工程と前記錯化エッチング工程とを含むサイクルが繰り返し行われることを特徴とする、請求項1〜5のいずれか一項に記載の遷移金属膜のエッチング方法。
- 前記被処理体は、前記遷移金属膜上にマスクを有しており、当該マスクは、Si、SiO2、SiNのいずれかから構成されることを特徴とする、請求項1〜6のいずれか一項に記載の遷移金属膜のエッチング方法。
- 遷移金属膜を異方的にエッチングする基板処理装置であって、
前記基板処理装置は、遷移金属膜を含む被処理体の処理を行う1又は複数の処理容器を有し、
酸素イオンを前記遷移金属膜に照射して当該遷移金属膜の遷移金属を酸化させて金属酸化層を形成させるために、前記処理容器内に酸素イオンを含む第1のガスを導入する第1のガス供給源と、
前記金属酸化層において金属錯体を形成させてエッチングを行うために、前記処理容器内に錯化ガスとしての第2のガスを導入する第2のガス供給源と、を備えることを特徴とする、基板処理装置。 - 前記処理容器内にプラズマを生成させるプラズマ源を備え、
前記第1のガスのプラズマを生成させることにより酸素イオンを前記遷移金属膜に照射することを特徴とする、請求項8に記載の基板処理装置。 - 前記第2のガスは、β−ジケトン系ガスであることを特徴とする、請求項8又は9に記載の基板処理装置。
- 前記基板処理装置は、
酸素イオンを前記遷移金属膜に照射して当該遷移金属膜の遷移金属を酸化させて金属酸化層を形成させるための第1のガスを導入する処理容器と、
前記金属酸化層において金属錯体を形成させてエッチングを行うための第2のガスを導入する処理容器をそれぞれ個別に有することを特徴とする、請求項8〜10のいずれか一項に記載の基板処理装置。 - 前記金属酸化層において金属錯体を形成させてエッチングを行うための第2のガスを導入する処理容器の容積は、酸素イオンを前記遷移金属膜に照射して当該遷移金属膜の遷移金属を酸化させて金属酸化層を形成させるための第1のガスを導入する処理容器の容積に比べ小さいことを特徴とする、請求項11に記載の基板処理装置。
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TWI662616B (zh) * | 2017-09-22 | 2019-06-11 | 日商斯庫林集團股份有限公司 | 基板處理方法及基板處理裝置 |
WO2020157954A1 (ja) * | 2019-02-01 | 2020-08-06 | 株式会社日立ハイテクノロジーズ | エッチング方法およびプラズマ処理装置 |
WO2020165990A1 (ja) * | 2019-02-14 | 2020-08-20 | 株式会社日立ハイテクノロジーズ | 半導体製造装置 |
US11915951B2 (en) | 2016-10-28 | 2024-02-27 | Hitachi High-Tech Corporation | Plasma processing method |
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US11424134B2 (en) | 2019-09-19 | 2022-08-23 | Applied Materials, Inc. | Atomic layer etching of metals |
JP7379993B2 (ja) * | 2019-09-20 | 2023-11-15 | 東京エレクトロン株式会社 | エッチング装置及びエッチング方法 |
KR102646730B1 (ko) * | 2021-10-06 | 2024-03-12 | 세메스 주식회사 | 원자층 식각 방법 |
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US11915951B2 (en) | 2016-10-28 | 2024-02-27 | Hitachi High-Tech Corporation | Plasma processing method |
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JPWO2020157954A1 (ja) * | 2019-02-01 | 2021-02-18 | 株式会社日立ハイテク | エッチング方法およびプラズマ処理装置 |
JP2021145153A (ja) * | 2019-02-01 | 2021-09-24 | 株式会社日立ハイテク | 試料の処理方法およびプラズマ処理装置 |
KR20210125096A (ko) | 2019-02-01 | 2021-10-15 | 주식회사 히타치하이테크 | 에칭 방법 및 플라스마 처리 장치 |
TWI758640B (zh) * | 2019-02-01 | 2022-03-21 | 日商日立全球先端科技股份有限公司 | 蝕刻方法及電漿處理裝置 |
JP7225318B2 (ja) | 2019-02-01 | 2023-02-20 | 株式会社日立ハイテク | 試料の処理方法およびプラズマ処理装置 |
WO2020165990A1 (ja) * | 2019-02-14 | 2020-08-20 | 株式会社日立ハイテクノロジーズ | 半導体製造装置 |
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JPWO2020165990A1 (ja) * | 2019-02-14 | 2021-02-18 | 株式会社日立ハイテク | 半導体製造装置 |
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