JP2017052078A5 - - Google Patents
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- Publication number
- JP2017052078A5 JP2017052078A5 JP2016125338A JP2016125338A JP2017052078A5 JP 2017052078 A5 JP2017052078 A5 JP 2017052078A5 JP 2016125338 A JP2016125338 A JP 2016125338A JP 2016125338 A JP2016125338 A JP 2016125338A JP 2017052078 A5 JP2017052078 A5 JP 2017052078A5
- Authority
- JP
- Japan
- Prior art keywords
- chemical mechanical
- mechanical polishing
- liquid component
- polyols
- molecular weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 claims 15
- 239000000126 substance Substances 0.000 claims 10
- 239000007788 liquid Substances 0.000 claims 7
- 229920005862 polyol Polymers 0.000 claims 7
- 150000003077 polyols Chemical class 0.000 claims 7
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims 4
- 239000004721 Polyphenylene oxide Substances 0.000 claims 2
- 150000001412 amines Chemical class 0.000 claims 2
- 229910002092 carbon dioxide Inorganic materials 0.000 claims 2
- 239000001569 carbon dioxide Substances 0.000 claims 2
- 239000012948 isocyanate Substances 0.000 claims 2
- 150000002513 isocyanates Chemical class 0.000 claims 2
- 229920000570 polyether Polymers 0.000 claims 2
- -1 alcohol amines Chemical class 0.000 claims 1
- 239000003054 catalyst Substances 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims 1
- 229920000768 polyamine Polymers 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/751,340 | 2015-06-26 | ||
| US14/751,340 US9586305B2 (en) | 2015-06-26 | 2015-06-26 | Chemical mechanical polishing pad and method of making same |
| US15/163,152 US9776300B2 (en) | 2015-06-26 | 2016-05-24 | Chemical mechanical polishing pad and method of making same |
| US15/163,152 | 2016-05-24 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017052078A JP2017052078A (ja) | 2017-03-16 |
| JP2017052078A5 true JP2017052078A5 (cg-RX-API-DMAC7.html) | 2019-07-18 |
| JP6870928B2 JP6870928B2 (ja) | 2021-05-12 |
Family
ID=57537165
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016125338A Active JP6870928B2 (ja) | 2015-06-26 | 2016-06-24 | ケミカルメカニカル研磨パッド及び同研磨パッドの製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9776300B2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6870928B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR102477528B1 (cg-RX-API-DMAC7.html) |
| CN (1) | CN107695868A (cg-RX-API-DMAC7.html) |
| DE (1) | DE102016007775A1 (cg-RX-API-DMAC7.html) |
| FR (1) | FR3037834B1 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI692494B (cg-RX-API-DMAC7.html) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10092998B2 (en) | 2015-06-26 | 2018-10-09 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Method of making composite polishing layer for chemical mechanical polishing pad |
| US10144115B2 (en) | 2015-06-26 | 2018-12-04 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Method of making polishing layer for chemical mechanical polishing pad |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1916330A1 (de) | 1969-03-29 | 1970-10-08 | Richard Zippel & Co Kg Farbspr | Anlage zur Herstellung von grossen oder kompliziert geformten Formteilen aus fluessigen Mehrkomponenten-Kunststoffen |
| US3705821A (en) | 1970-08-07 | 1972-12-12 | Bayer Ag | Process and apparatus for applying polyurethane foam-forming composition |
| US3954544A (en) | 1974-06-20 | 1976-05-04 | Thomas Hooker | Foam applying apparatus |
| DE2538437C3 (de) | 1975-08-29 | 1980-05-08 | Elastogran Maschinenbau Gmbh & Co, 8021 Strasslach | Mischvorrichtung für Mehrkomponentenkunststoffe mit Poren- oder Zellenstruktur, insbesondere Polyurethan |
| US4158535A (en) | 1977-01-25 | 1979-06-19 | Olin Corporation | Generation of polyurethane foam |
| US5163584A (en) | 1990-12-18 | 1992-11-17 | Polyfoam Products, Inc. | Method and apparatus for mixing and dispensing foam with injected low pressure gas |
| US5789451A (en) * | 1996-07-29 | 1998-08-04 | The Dow Chemcial Company | Alkanolamine/carbon dioxide adduct and polyurethane foam therewith |
| US6315820B1 (en) | 1999-10-19 | 2001-11-13 | Ford Global Technologies, Inc. | Method of manufacturing thin metal alloy foils |
| KR100784656B1 (ko) * | 2000-12-08 | 2007-12-12 | 가부시키가이샤 구라레 | 열가소성 폴리우레탄 발포체, 이의 제조방법 및 이로부터제조된 연마 패드 |
| KR100464570B1 (ko) * | 2002-11-18 | 2005-01-03 | 동성에이앤티 주식회사 | 미세기공이 함유된 폴리우레탄 발포체의 제조방법 및그로부터 제조된 연마패드 |
| CN100349267C (zh) * | 2002-11-27 | 2007-11-14 | 东洋橡胶工业株式会社 | 研磨垫及半导体器件的制造方法 |
| JP3776428B2 (ja) | 2002-12-27 | 2006-05-17 | 株式会社加平 | ポリウレタン発泡体シート及びそれを用いた積層体シートの製造方法 |
| US20040224622A1 (en) * | 2003-04-15 | 2004-11-11 | Jsr Corporation | Polishing pad and production method thereof |
| US20050171224A1 (en) * | 2004-02-03 | 2005-08-04 | Kulp Mary J. | Polyurethane polishing pad |
| US20060089093A1 (en) * | 2004-10-27 | 2006-04-27 | Swisher Robert G | Polyurethane urea polishing pad |
| DE102005058292A1 (de) | 2005-12-07 | 2007-06-14 | Hennecke Gmbh | Verfahren und Vorrichtung zur Herstellung von beschichteten Formteilen |
| US20090093202A1 (en) * | 2006-04-19 | 2009-04-09 | Toyo Tire & Rubber Co., Ltd. | Method for manufacturing polishing pad |
| JP4954762B2 (ja) * | 2007-03-27 | 2012-06-20 | 東洋ゴム工業株式会社 | ポリウレタン発泡体の製造方法 |
| US20090094900A1 (en) | 2007-10-15 | 2009-04-16 | Ppg Industries Ohio, Inc. | Method of forming a polyurea polyurethane elastomer containing chemical mechanical polishing pad |
| US8551201B2 (en) * | 2009-08-07 | 2013-10-08 | Praxair S.T. Technology, Inc. | Polyurethane composition for CMP pads and method of manufacturing same |
| US9144880B2 (en) | 2012-11-01 | 2015-09-29 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Soft and conditionable chemical mechanical polishing pad |
| JP2016518746A (ja) | 2013-03-14 | 2016-06-23 | ゼットティーイー ウィストロン テレコム エービー | 分散型ネットワークトポロジにおけるｈａｒｑプロセスの数を適応させる方法および装置 |
| US10092998B2 (en) | 2015-06-26 | 2018-10-09 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Method of making composite polishing layer for chemical mechanical polishing pad |
| US10005172B2 (en) | 2015-06-26 | 2018-06-26 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Controlled-porosity method for forming polishing pad |
| US10144115B2 (en) | 2015-06-26 | 2018-12-04 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Method of making polishing layer for chemical mechanical polishing pad |
| US10105825B2 (en) | 2015-06-26 | 2018-10-23 | Rohm and Haas Electronics Materials CMP Holdings, Inc. | Method of making polishing layer for chemical mechanical polishing pad |
| US9630293B2 (en) | 2015-06-26 | 2017-04-25 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing pad composite polishing layer formulation |
| US9539694B1 (en) | 2015-06-26 | 2017-01-10 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Composite polishing layer chemical mechanical polishing pad |
| US9586305B2 (en) | 2015-06-26 | 2017-03-07 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing pad and method of making same |
| US9457449B1 (en) | 2015-06-26 | 2016-10-04 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing pad with composite polishing layer |
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2016
- 2016-05-24 US US15/163,152 patent/US9776300B2/en not_active Expired - Fee Related
- 2016-06-13 TW TW105118460A patent/TWI692494B/zh active
- 2016-06-23 CN CN201610461559.3A patent/CN107695868A/zh active Pending
- 2016-06-23 KR KR1020160078574A patent/KR102477528B1/ko active Active
- 2016-06-24 DE DE102016007775.1A patent/DE102016007775A1/de not_active Withdrawn
- 2016-06-24 JP JP2016125338A patent/JP6870928B2/ja active Active
- 2016-06-27 FR FR1655965A patent/FR3037834B1/fr not_active Expired - Fee Related