JP2017028090A5 - - Google Patents

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JP2017028090A5
JP2017028090A5 JP2015144970A JP2015144970A JP2017028090A5 JP 2017028090 A5 JP2017028090 A5 JP 2017028090A5 JP 2015144970 A JP2015144970 A JP 2015144970A JP 2015144970 A JP2015144970 A JP 2015144970A JP 2017028090 A5 JP2017028090 A5 JP 2017028090A5
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carbon dioxide
absorbed
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developer
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JP2015144970A
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English (en)
Japanese (ja)
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JP6713658B2 (ja
JP2017028090A (ja
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Priority to JP2015144970A priority Critical patent/JP6713658B2/ja
Priority claimed from JP2015144970A external-priority patent/JP6713658B2/ja
Priority to KR1020150181198A priority patent/KR20170011961A/ko
Priority to TW104143284A priority patent/TWI688836B/zh
Priority to CN201510994050.0A priority patent/CN106371297A/zh
Publication of JP2017028090A publication Critical patent/JP2017028090A/ja
Publication of JP2017028090A5 publication Critical patent/JP2017028090A5/ja
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Publication of JP6713658B2 publication Critical patent/JP6713658B2/ja
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JP2015144970A 2015-07-22 2015-07-22 現像液の成分濃度測定装置、成分濃度測定方法、現像液管理装置、及び現像液管理方法 Expired - Fee Related JP6713658B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2015144970A JP6713658B2 (ja) 2015-07-22 2015-07-22 現像液の成分濃度測定装置、成分濃度測定方法、現像液管理装置、及び現像液管理方法
KR1020150181198A KR20170011961A (ko) 2015-07-22 2015-12-17 현상액의 성분 농도 측정 장치, 성분 농도 측정 방법, 현상액 관리 장치, 및 현상액 관리 방법
TW104143284A TWI688836B (zh) 2015-07-22 2015-12-23 顯影液的成分濃度測定裝置、成分濃度測定方法、顯影液管理裝置、及顯影液管理方法
CN201510994050.0A CN106371297A (zh) 2015-07-22 2015-12-25 显影液成分浓度测定装置及方法、显影液管理装置及方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015144970A JP6713658B2 (ja) 2015-07-22 2015-07-22 現像液の成分濃度測定装置、成分濃度測定方法、現像液管理装置、及び現像液管理方法

Publications (3)

Publication Number Publication Date
JP2017028090A JP2017028090A (ja) 2017-02-02
JP2017028090A5 true JP2017028090A5 (enrdf_load_stackoverflow) 2018-04-05
JP6713658B2 JP6713658B2 (ja) 2020-06-24

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JP2015144970A Expired - Fee Related JP6713658B2 (ja) 2015-07-22 2015-07-22 現像液の成分濃度測定装置、成分濃度測定方法、現像液管理装置、及び現像液管理方法

Country Status (4)

Country Link
JP (1) JP6713658B2 (enrdf_load_stackoverflow)
KR (1) KR20170011961A (enrdf_load_stackoverflow)
CN (1) CN106371297A (enrdf_load_stackoverflow)
TW (1) TWI688836B (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6505534B2 (ja) * 2015-07-22 2019-04-24 株式会社平間理化研究所 現像液の管理方法及び装置
JP2018120897A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像液の濃度監視装置、及び現像液管理装置
JP6763608B2 (ja) * 2017-01-23 2020-09-30 株式会社平間理化研究所 現像液の二酸化炭素濃度表示装置、及び現像液管理装置
JP2018200943A (ja) * 2017-05-26 2018-12-20 株式会社平間理化研究所 現像液の濃度管理装置、及び、基板の現像処理システム
JP6582037B2 (ja) * 2017-12-06 2019-09-25 ジャパンクリエイト株式会社 レジスト現像液の管理装置及び管理方法
WO2022074820A1 (ja) * 2020-10-09 2022-04-14 三菱重工業株式会社 分析システム及び管理システム、並びに分析方法、並びに分析プログラム

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2561578B2 (ja) 1991-08-07 1996-12-11 株式会社平間理化研究所 現像液管理装置
CN1327888A (zh) * 2000-06-09 2001-12-26 株式会社平间理化研究所 基板表面处理装置
JP3610045B2 (ja) * 2001-02-06 2005-01-12 株式会社平間理化研究所 精製現像液製造装置及び精製現像液製造方法
TWI298423B (en) * 2001-02-06 2008-07-01 Nagase & Co Ltd Developer producing equipment and method
TWI298826B (en) * 2001-02-06 2008-07-11 Hirama Lab Co Ltd Purified developer producing equipment and method
US6541188B2 (en) * 2001-05-11 2003-04-01 Kodak Polychrome Graphics Llc Developer for alkaline-developable lithographic printing plates
JP4366490B2 (ja) * 2003-08-22 2009-11-18 長瀬産業株式会社 現像液供給方法及び装置
WO2008065755A1 (fr) * 2006-11-30 2008-06-05 Mitsubishi Chemical Engineering Corporation Procédé de régulation d'une concentration de solution de développement, appareil de préparation de la solution de développement et solution de développement
JP2011128455A (ja) * 2009-12-18 2011-06-30 Nagase & Co Ltd 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法
JP2012225709A (ja) * 2011-04-18 2012-11-15 Toshiba Corp 二酸化炭素濃度測定装置、二酸化炭素濃度測定方法、及び二酸化炭素回収システム
EP2869122A4 (en) * 2012-06-29 2016-03-02 Fujifilm Corp METHOD FOR CONCENTRATING PROCESS WASTEWATER AND RECYCLING PROCESS FOR WASTE WATER

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