CN106371297A - 显影液成分浓度测定装置及方法、显影液管理装置及方法 - Google Patents
显影液成分浓度测定装置及方法、显影液管理装置及方法 Download PDFInfo
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- CN106371297A CN106371297A CN201510994050.0A CN201510994050A CN106371297A CN 106371297 A CN106371297 A CN 106371297A CN 201510994050 A CN201510994050 A CN 201510994050A CN 106371297 A CN106371297 A CN 106371297A
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- 238000000034 method Methods 0.000 title claims abstract description 35
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims abstract description 143
- 239000001569 carbon dioxide Substances 0.000 claims abstract description 70
- 229910002092 carbon dioxide Inorganic materials 0.000 claims abstract description 70
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 21
- 229910052799 carbon Inorganic materials 0.000 claims description 21
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 20
- 239000004408 titanium dioxide Substances 0.000 claims description 10
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
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- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 8
- 239000003513 alkali Substances 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
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- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 238000004448 titration Methods 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 229910002090 carbon oxide Inorganic materials 0.000 description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
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- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
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- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- XUHSGAUBWVXTMJ-UHFFFAOYSA-M OCC[N+](C)(C)C.OCC[NH3+].[OH-].[OH-] Chemical compound OCC[N+](C)(C)C.OCC[NH3+].[OH-].[OH-] XUHSGAUBWVXTMJ-UHFFFAOYSA-M 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 238000002479 acid--base titration Methods 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
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- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001739 density measurement Methods 0.000 description 1
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- 238000012163 sequencing technique Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N9/00—Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity
- G01N9/36—Analysing materials by measuring the density or specific gravity, e.g. determining quantity of moisture
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015144970A JP6713658B2 (ja) | 2015-07-22 | 2015-07-22 | 現像液の成分濃度測定装置、成分濃度測定方法、現像液管理装置、及び現像液管理方法 |
| JP2015-144970 | 2015-07-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106371297A true CN106371297A (zh) | 2017-02-01 |
Family
ID=57880824
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510994050.0A Pending CN106371297A (zh) | 2015-07-22 | 2015-12-25 | 显影液成分浓度测定装置及方法、显影液管理装置及方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6713658B2 (enrdf_load_stackoverflow) |
| KR (1) | KR20170011961A (enrdf_load_stackoverflow) |
| CN (1) | CN106371297A (enrdf_load_stackoverflow) |
| TW (1) | TWI688836B (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108344662A (zh) * | 2017-01-23 | 2018-07-31 | 株式会社平间理化研究所 | 显影液的二氧化碳浓度显示装置及显影液管理装置 |
| CN108957967A (zh) * | 2017-05-26 | 2018-12-07 | 株式会社平间理化研究所 | 显影液的浓度管理装置以及基板的显影处理系统 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6505534B2 (ja) * | 2015-07-22 | 2019-04-24 | 株式会社平間理化研究所 | 現像液の管理方法及び装置 |
| JP2018120897A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像液の濃度監視装置、及び現像液管理装置 |
| JP6582037B2 (ja) * | 2017-12-06 | 2019-09-25 | ジャパンクリエイト株式会社 | レジスト現像液の管理装置及び管理方法 |
| WO2022074820A1 (ja) * | 2020-10-09 | 2022-04-14 | 三菱重工業株式会社 | 分析システム及び管理システム、並びに分析方法、並びに分析プログラム |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1373393A (zh) * | 2001-02-06 | 2002-10-09 | 长濑产业株式会社 | 显影液制造装置及显影液制造方法 |
| CN1379285A (zh) * | 2001-02-06 | 2002-11-13 | 株式会社平间理化研究所 | 精制显影液制造装置及精制显影液制造方法 |
| WO2002093264A1 (en) * | 2001-05-11 | 2002-11-21 | Kodak Polychrome Graphics Company Ltd. | Developer for alkaline-developable lithogaphic printing plates |
| JP2005070351A (ja) * | 2003-08-22 | 2005-03-17 | Nagase & Co Ltd | 現像液供給方法及び装置 |
| CN101563654A (zh) * | 2006-11-30 | 2009-10-21 | 三菱化学工程株式会社 | 显影液的浓度调节方法、调制装置和显影液 |
| JP2011128455A (ja) * | 2009-12-18 | 2011-06-30 | Nagase & Co Ltd | 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法 |
| JP2012225709A (ja) * | 2011-04-18 | 2012-11-15 | Toshiba Corp | 二酸化炭素濃度測定装置、二酸化炭素濃度測定方法、及び二酸化炭素回収システム |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2561578B2 (ja) | 1991-08-07 | 1996-12-11 | 株式会社平間理化研究所 | 現像液管理装置 |
| CN1327888A (zh) * | 2000-06-09 | 2001-12-26 | 株式会社平间理化研究所 | 基板表面处理装置 |
| JP3610045B2 (ja) * | 2001-02-06 | 2005-01-12 | 株式会社平間理化研究所 | 精製現像液製造装置及び精製現像液製造方法 |
| EP2869122A4 (en) * | 2012-06-29 | 2016-03-02 | Fujifilm Corp | METHOD FOR CONCENTRATING PROCESS WASTEWATER AND RECYCLING PROCESS FOR WASTE WATER |
-
2015
- 2015-07-22 JP JP2015144970A patent/JP6713658B2/ja not_active Expired - Fee Related
- 2015-12-17 KR KR1020150181198A patent/KR20170011961A/ko not_active Ceased
- 2015-12-23 TW TW104143284A patent/TWI688836B/zh not_active IP Right Cessation
- 2015-12-25 CN CN201510994050.0A patent/CN106371297A/zh active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1373393A (zh) * | 2001-02-06 | 2002-10-09 | 长濑产业株式会社 | 显影液制造装置及显影液制造方法 |
| CN1379285A (zh) * | 2001-02-06 | 2002-11-13 | 株式会社平间理化研究所 | 精制显影液制造装置及精制显影液制造方法 |
| WO2002093264A1 (en) * | 2001-05-11 | 2002-11-21 | Kodak Polychrome Graphics Company Ltd. | Developer for alkaline-developable lithogaphic printing plates |
| JP2005070351A (ja) * | 2003-08-22 | 2005-03-17 | Nagase & Co Ltd | 現像液供給方法及び装置 |
| CN101563654A (zh) * | 2006-11-30 | 2009-10-21 | 三菱化学工程株式会社 | 显影液的浓度调节方法、调制装置和显影液 |
| CN103852978A (zh) * | 2006-11-30 | 2014-06-11 | 三菱化学工程株式会社 | 显影液的浓度调节方法、调制装置和显影液 |
| JP2011128455A (ja) * | 2009-12-18 | 2011-06-30 | Nagase & Co Ltd | 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法 |
| JP2012225709A (ja) * | 2011-04-18 | 2012-11-15 | Toshiba Corp | 二酸化炭素濃度測定装置、二酸化炭素濃度測定方法、及び二酸化炭素回収システム |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108344662A (zh) * | 2017-01-23 | 2018-07-31 | 株式会社平间理化研究所 | 显影液的二氧化碳浓度显示装置及显影液管理装置 |
| CN108957967A (zh) * | 2017-05-26 | 2018-12-07 | 株式会社平间理化研究所 | 显影液的浓度管理装置以及基板的显影处理系统 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20170011961A (ko) | 2017-02-02 |
| TWI688836B (zh) | 2020-03-21 |
| JP6713658B2 (ja) | 2020-06-24 |
| TW201704900A (zh) | 2017-02-01 |
| JP2017028090A (ja) | 2017-02-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20170201 |