JP2016538576A5 - - Google Patents
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- JP2016538576A5 JP2016538576A5 JP2016515495A JP2016515495A JP2016538576A5 JP 2016538576 A5 JP2016538576 A5 JP 2016538576A5 JP 2016515495 A JP2016515495 A JP 2016515495A JP 2016515495 A JP2016515495 A JP 2016515495A JP 2016538576 A5 JP2016538576 A5 JP 2016538576A5
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- radiation
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- imaging system
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- 230000005855 radiation Effects 0.000 claims description 193
- 238000012360 testing method Methods 0.000 claims description 72
- 238000009826 distribution Methods 0.000 claims description 68
- 238000012634 optical imaging Methods 0.000 claims description 66
- 230000003287 optical effect Effects 0.000 claims description 61
- 230000005670 electromagnetic radiation Effects 0.000 claims description 47
- 238000005286 illumination Methods 0.000 claims description 45
- 210000001747 pupil Anatomy 0.000 claims description 32
- 238000005259 measurement Methods 0.000 claims description 28
- 230000005540 biological transmission Effects 0.000 claims description 27
- 238000004458 analytical method Methods 0.000 claims description 21
- 238000000926 separation method Methods 0.000 claims description 21
- 238000003384 imaging method Methods 0.000 claims description 18
- 238000011156 evaluation Methods 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- 230000004075 alteration Effects 0.000 claims description 13
- 238000012937 correction Methods 0.000 claims description 7
- 238000006243 chemical reaction Methods 0.000 claims description 6
- 238000011144 upstream manufacturing Methods 0.000 claims description 5
- 230000006399 behavior Effects 0.000 description 33
- 230000003595 spectral effect Effects 0.000 description 21
- 239000012528 membrane Substances 0.000 description 19
- 230000000903 blocking effect Effects 0.000 description 11
- 238000006073 displacement reaction Methods 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 230000007246 mechanism Effects 0.000 description 10
- 238000010008 shearing Methods 0.000 description 10
- 230000001419 dependent effect Effects 0.000 description 7
- 238000001914 filtration Methods 0.000 description 6
- 238000005305 interferometry Methods 0.000 description 6
- 238000001393 microlithography Methods 0.000 description 4
- 229910016006 MoSi Inorganic materials 0.000 description 3
- MCVAAHQLXUXWLC-UHFFFAOYSA-N [O-2].[O-2].[S-2].[Gd+3].[Gd+3] Chemical compound [O-2].[O-2].[S-2].[Gd+3].[Gd+3] MCVAAHQLXUXWLC-UHFFFAOYSA-N 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 239000012876 carrier material Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000010485 coping Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102013218991.5 | 2013-09-20 | ||
| DE102013218991.5A DE102013218991A1 (de) | 2013-09-20 | 2013-09-20 | Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Abbildungssystems |
| PCT/EP2014/002528 WO2015039751A1 (de) | 2013-09-20 | 2014-09-18 | Vorrichtung zum bestimmen einer optischen eigenschaft eines optischen abbildungssystems |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016538576A JP2016538576A (ja) | 2016-12-08 |
| JP2016538576A5 true JP2016538576A5 (enExample) | 2019-06-20 |
| JP6546912B2 JP6546912B2 (ja) | 2019-07-17 |
Family
ID=51659602
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016515495A Active JP6546912B2 (ja) | 2013-09-20 | 2014-09-18 | 光学結像系の光学特性を測定する方法及び装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10006807B2 (enExample) |
| JP (1) | JP6546912B2 (enExample) |
| DE (1) | DE102013218991A1 (enExample) |
| WO (1) | WO2015039751A1 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014209348A1 (de) * | 2014-05-16 | 2015-11-19 | Carl Zeiss Smt Gmbh | Ermittlung einer korrigierten Größe |
| DE102015226571B4 (de) * | 2015-12-22 | 2019-10-24 | Carl Zeiss Smt Gmbh | Vorrichtung und Verfahren zur Wellenfrontanalyse |
| DE102016212477A1 (de) * | 2016-07-08 | 2018-01-11 | Carl Zeiss Smt Gmbh | Messverfahren und Messsystem zur interferometrischen Vermessung der Abbildungsqualität eines optischen Abbildungssystems |
| DE102017203376B3 (de) | 2017-03-02 | 2018-05-24 | Carl Zeiss Smt Gmbh | Messvorrichtung und Verfahren zur Vermessung eines Wellenfrontfehlers eines abbildenden optischen Systems sowie Projektionsbelichtungsanlage für die Mikrolithographie |
| DE102017208340A1 (de) | 2017-05-17 | 2018-11-22 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsverfahren und Projektionsobjektiv mit Einstellung der Pupillentransmission |
| CN110892330B (zh) | 2017-07-10 | 2024-05-03 | Asml荷兰有限公司 | 光刻方法和设备 |
| DE102017217251A1 (de) | 2017-09-27 | 2019-03-28 | Carl Zeiss Smt Gmbh | Verfahren und Anordnung zur Analyse der Wellenfrontwirkung eines optischen Systems |
| US11019326B2 (en) * | 2018-02-09 | 2021-05-25 | Jenoptik Optical Systems, Llc | Light-source characterizer and associated methods |
| WO2019166183A1 (en) * | 2018-02-28 | 2019-09-06 | Asml Netherlands B.V. | Apodization measurement for lithographic apparatus |
| DE102021206203A1 (de) * | 2021-06-17 | 2022-12-22 | Carl Zeiss Smt Gmbh | Heizanordnung und Verfahren zum Heizen eines optischen Elements |
| JP7690373B2 (ja) * | 2021-10-13 | 2025-06-10 | レーザーテック株式会社 | 瞳観察方法、撮像方法、および撮像装置 |
| KR20240082039A (ko) * | 2022-12-01 | 2024-06-10 | 삼성전자주식회사 | 모니터링 유닛 및 이를 포함하는 기판 처리 장치 |
| CN116202749B (zh) * | 2023-03-02 | 2025-08-22 | 中国人民解放军国防科技大学 | 一种在线监测强光元件退化失效的装置和方法 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100210569B1 (ko) | 1995-09-29 | 1999-07-15 | 미따라이 하지메 | 노광방법 및 노광장치, 그리고 이를 이용한 디바이스제조방법 |
| TW550377B (en) * | 2000-02-23 | 2003-09-01 | Zeiss Stiftung | Apparatus for wave-front detection |
| EP1184727A1 (en) * | 2000-09-01 | 2002-03-06 | Asm Lithography B.V. | Lithographic apparatus |
| KR100583692B1 (ko) * | 2000-09-01 | 2006-05-25 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 작동 방법, 리소그래피 장치, 디바이스제조방법, 및 이것에 의해 제조된 디바이스 |
| JP2003227914A (ja) | 2002-01-31 | 2003-08-15 | Canon Inc | Ｅｕｖ光用の波面分割素子及びそれを有する位相測定装置 |
| US6958806B2 (en) * | 2002-12-02 | 2005-10-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| WO2004090490A1 (de) | 2003-04-11 | 2004-10-21 | Carl Zeiss Smt Ag | Diffusor, wellenfrontquelle, wellenfrontsensor und projektionsbelichtungsanlage |
| AU2003273925A1 (en) * | 2003-09-26 | 2005-04-14 | Carl Zeiss Smt Ag | Method of determining optical properties and projection exposure system comprising a wave front detection system |
| JP2006080446A (ja) * | 2004-09-13 | 2006-03-23 | Nikon Corp | 露光装置、波面計測装置、反射レチクル、波面計測用マスク、露光方法、波面計測方法及びマイクロデバイスの製造方法 |
| US7405804B2 (en) | 2004-10-06 | 2008-07-29 | Asml Netherlands B.V. | Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured thereby |
| US7142357B2 (en) | 2004-11-22 | 2006-11-28 | Knight's Armament Company | Night-day boresight with adjustable wedge-prism assembly |
| DE102005041373A1 (de) | 2004-11-29 | 2006-06-01 | Carl Zeiss Smt Ag | Verfahren und Vorrichtung zur kalibrierenden Wellenfrontvermessung |
| US7812928B2 (en) | 2005-07-06 | 2010-10-12 | Nikon Corporation | Exposure apparatus |
| US7709816B2 (en) | 2007-08-16 | 2010-05-04 | Sematech, Inc. | Systems and methods for monitoring and controlling the operation of extreme ultraviolet (EUV) light sources used in semiconductor fabrication |
| DE102007054683A1 (de) | 2007-11-14 | 2009-05-28 | Carl Zeiss Smt Ag | Beleuchtungsoptik für die Mikrolithografie |
| DE102008004762A1 (de) * | 2008-01-16 | 2009-07-30 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Mikrolithographie mit einer Messeinrichtung |
| DE102008002247A1 (de) | 2008-06-05 | 2009-12-10 | Carl Zeiss Smt Ag | Verfahren und Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Systems |
| NL2005189A (en) | 2009-09-23 | 2011-03-28 | Asml Netherlands Bv | Spectral purity filter, lithographic apparatus, and device manufacturing method. |
| DE102010038697B4 (de) * | 2010-07-30 | 2012-07-19 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Qualifizierung einer Optik einer Projektionsbelichtungsanlage für die Mikrolithographie |
| DE102011077223B4 (de) | 2011-06-08 | 2013-08-14 | Carl Zeiss Smt Gmbh | Messsystem |
-
2013
- 2013-09-20 DE DE102013218991.5A patent/DE102013218991A1/de not_active Ceased
-
2014
- 2014-09-18 JP JP2016515495A patent/JP6546912B2/ja active Active
- 2014-09-18 WO PCT/EP2014/002528 patent/WO2015039751A1/de not_active Ceased
-
2016
- 2016-03-21 US US15/075,369 patent/US10006807B2/en active Active
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