JP2016535923A - 二次電池用接着層の形成方法 - Google Patents
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- 229910001416 lithium ion Inorganic materials 0.000 abstract description 7
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- 239000004205 dimethyl polysiloxane Substances 0.000 description 40
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- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
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- MSKZUSKIQNZGEZ-UHFFFAOYSA-N cyclohexane;n,n-dimethylformamide Chemical compound CN(C)C=O.C1CCCCC1 MSKZUSKIQNZGEZ-UHFFFAOYSA-N 0.000 description 1
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- H01M50/40—Separators; Membranes; Diaphragms; Spacing elements inside cells
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Abstract
Description
Claims (26)
- 上下方向に開放された開口孔を有するマスクを製作する段階と、
前記マスクを介して感光膜をエッチングし、前記感光膜に前記マスクの開口孔に対応する空隙溝を形成する段階と、
前記空隙溝が形成された感光膜上にポリジメチルシロキシサンを注いで硬化させた後、前記感光膜と前記硬化したポリジメチルシロキシサンとを分離し、凹凸部が形成されたポリジメチルシロキシサンモールドを製作する段階と、
前記凹凸部が形成されたポリジメチルシロキシサンモールドに高分子バインダースラリーを塗布する段階と、
前記ポリジメチルシロキシサンモールドに塗布された高分子バインダースラリーを二次電池の分離膜または電極の表面に転写し、上下方向に開放された空隙部が形成された接着層を、前記分離膜または前記電極の表面に形成する段階と、を含む接着層の形成方法。 - 前記マスクを製作する段階は、
前記開口孔が規則的な配列を有することで、前記開口孔によって規則的なパターンの形成されたマスクを製作する請求項1に記載の接着層の形成方法。 - 前記凹凸部は、前記感光膜に形成された空隙溝に対応する位置に突出するように形成された突起を含み、かつ前記突起より相対的に凹んだ凹溝が形成される請求項2に記載の接着層の形成方法。
- 前記高分子バインダースラリーを塗布する段階は、
前記突起または前記凹溝に前記高分子バインダースラリーを塗布する請求項3に記載の接着層の形成方法。 - 前記高分子バインダースラリーを塗布する段階は、前記凹溝に前記高分子バインダースラリーを塗布し、
前記接着層を形成する段階は、前記開口孔が形成する規則的なパターンと同じパターンを有する空隙部が形成された接着層を形成する請求項4に記載の接着層の形成方法。 - 前記高分子バインダースラリーを塗布する段階は、前記突起に前記高分子バインダースラリーを塗布し、
前記接着層を形成する段階は、前記開口孔が形成する規則的なパターンの逆パターンを有する空隙部の形成された接着層を形成する請求項4に記載の接着層の形成方法。 - 前記マスクを製作する段階は、
長方形状の開口孔を有するマスクを製作する請求項2に記載の接着層の形成方法。 - 前記開口孔は、横×縦の規格が0.5μm×0.5μm〜2μm×2μmである請求項7に記載の接着層の形成方法。
- 前記マスクを製作する段階は,
キャドによって事前に設計された規則的なパターンを用いて前記マスクを製作する請求項2に記載の接着層の形成方法。 - 前記マスクは、クロムマスクである請求項1〜請求項9のいずれか一項に記載の接着層の形成方法。
- 高分子バインダースラリーを塗布する段階の前に、
前記ポリジメチルシロキシサンモールドをO2プラズマ表面処理またはコロナ表面処理を行う段階をさらに含む請求項1〜請求項10のいずれか一項に記載の接着層の形成方法。 - 前記感光膜に空隙溝を形成する段階は、
前記感光膜を光エッチングして空隙溝を形成する請求項1〜請求項11のいずれか一項に記載の接着層の形成方法。 - 前記接着層を形成する段階は、
前記ポリジメチルシロキシサンモールドに塗布された高分子バインダースラリーを、前記二次電池の分離膜表面に形成された無機物粒子を含む多孔性コーティング層に転写し、上下方向に開放された空隙部が形成された接着層を前記多孔性コーティング層上に形成する請求項1〜請求項12のいずれか一項に記載の接着層の形成方法。 - 上下方向に開放され、かつ規則的なパターンを有する空隙部の形成された接着層が表面に形成された接着層複合体。
- 前記接着層複合体は、二次電池の電極及び前記接着層を含み、
前記接着層は、前記二次電池の電極の表面に形成された請求項14に記載の接着層複合体。 - 前記接着層複合体は、二次電池の分離膜及び前記接着層を含み、
前記接着層は、前記二次電池の分離膜の表面に形成された請求項14に記載の接着層複合体。 - 前記接着層は、前記二次電池の分離膜の表面に形成された無機物粒子を含む多孔性コーティング層上に形成された請求項16に記載の接着層複合体。
- 前記接着層は、前記空隙部及びバインダー高分子からなるバインダー領域を含み、
前記空隙部または前記バインダー領域は、規則的なパターンを形成する請求項14〜請求項17のいずれか一項に記載の接着層複合体。 - 前記バインダー領域または前記空隙部は、上面視で長方形状が規則的に反復される請求項18に記載の接着層複合体。
- 前記バインダー領域または前記空隙部は、横×縦の規格が0.5μm×0.5μm〜2μm×2μmである請求項19に記載の接着層複合体。
- 前記接着層の厚さは、0.5μm〜2μmである請求項14〜請求項20のいずれか一項に記載の接着層複合体。
- 請求項14から請求項21のいずれか一項に記載の接着層複合体を含む電極組立体。
- 分離膜または電極表面に高分子バインダースラリーを転写するのに用いられるモールドであって、
表面に規則的なパターンを有する凹凸部が形成されたポリジメチルシロキシサンモールド。 - 前記凹凸部は、前記表面と垂直な方向に突出した突起と、前記表面と垂直した方向に凹んだ凹溝とが規則的に反復して形成された請求項23に記載のポリジメチルシロキシサンモールド。
- 前記突起の高さは、0.5μm〜2μmである請求項24に記載のポリジメチルシロキシサンモールド。
- 前記突起は、横×縦の規格が0.5μm×0.5μm〜2μm×2μmである請求項24または請求項25に記載のポリジメチルシロキシサンモールド。
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ES2873258T3 (es) * | 2016-10-12 | 2021-11-03 | Prologium Tech Co Ltd | Electrodo de metal de litio y su batería de metal de litio asociada |
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CN107649330A (zh) * | 2017-09-06 | 2018-02-02 | 涓ョ考 | 一种非全覆盖式涂覆隔膜的制备装置和制备工艺 |
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