JP2016528497A5 - - Google Patents

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Publication number
JP2016528497A5
JP2016528497A5 JP2016531834A JP2016531834A JP2016528497A5 JP 2016528497 A5 JP2016528497 A5 JP 2016528497A5 JP 2016531834 A JP2016531834 A JP 2016531834A JP 2016531834 A JP2016531834 A JP 2016531834A JP 2016528497 A5 JP2016528497 A5 JP 2016528497A5
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JP
Japan
Prior art keywords
reticle
candidate
location
baseline
defects
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Application number
JP2016531834A
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English (en)
Japanese (ja)
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JP2016528497A (ja
JP6472447B2 (ja
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Priority claimed from US14/278,277 external-priority patent/US9518935B2/en
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Publication of JP2016528497A publication Critical patent/JP2016528497A/ja
Publication of JP2016528497A5 publication Critical patent/JP2016528497A5/ja
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Publication of JP6472447B2 publication Critical patent/JP6472447B2/ja
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JP2016531834A 2013-07-29 2014-07-29 フォトマスク欠陥性における変化の監視 Active JP6472447B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361859670P 2013-07-29 2013-07-29
US61/859,670 2013-07-29
US14/278,277 US9518935B2 (en) 2013-07-29 2014-05-15 Monitoring changes in photomask defectivity
US14/278,277 2014-05-15
PCT/US2014/048720 WO2015017453A1 (en) 2013-07-29 2014-07-29 Monitoring changes in photomask defectivity

Publications (3)

Publication Number Publication Date
JP2016528497A JP2016528497A (ja) 2016-09-15
JP2016528497A5 true JP2016528497A5 (https=) 2017-09-14
JP6472447B2 JP6472447B2 (ja) 2019-02-20

Family

ID=52390256

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016531834A Active JP6472447B2 (ja) 2013-07-29 2014-07-29 フォトマスク欠陥性における変化の監視

Country Status (6)

Country Link
US (2) US9518935B2 (https=)
JP (1) JP6472447B2 (https=)
KR (1) KR102102019B1 (https=)
CN (2) CN109659245B (https=)
TW (1) TWI623812B (https=)
WO (1) WO2015017453A1 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9518935B2 (en) 2013-07-29 2016-12-13 Kla-Tencor Corporation Monitoring changes in photomask defectivity
JP6668199B2 (ja) * 2016-08-19 2020-03-18 株式会社ニューフレアテクノロジー マスク検査方法
US10395358B2 (en) * 2016-11-10 2019-08-27 Kla-Tencor Corp. High sensitivity repeater defect detection
US10451563B2 (en) * 2017-02-21 2019-10-22 Kla-Tencor Corporation Inspection of photomasks by comparing two photomasks
DE102018105322A1 (de) 2018-03-08 2019-09-12 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer industriellen Maschine
US10866197B2 (en) * 2018-09-20 2020-12-15 KLA Corp. Dispositioning defects detected on extreme ultraviolet photomasks
WO2020083612A1 (en) 2018-10-23 2020-04-30 Asml Netherlands B.V. Method and apparatus for adaptive alignment
US11499924B2 (en) * 2019-06-03 2022-11-15 KLA Corp. Determining one or more characteristics of light in an optical system
US11953448B2 (en) * 2019-09-27 2024-04-09 Taiwan Semiconductor Manufacturing Company Ltd. Method for defect inspection
US11379972B2 (en) * 2020-06-03 2022-07-05 Applied Materials Israel Ltd. Detecting defects in semiconductor specimens using weak labeling
US11790518B2 (en) * 2020-07-29 2023-10-17 Tata Consultancy Services Limited Identification of defect types in liquid pipelines for classification and computing severity thereof
US20260099087A1 (en) * 2024-10-07 2026-04-09 Taiwan Semiconductor Manufacturing Company, Ltd. Methods of manufacturing semiconductor device and extreme ultraviolet photolithography systems

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6614520B1 (en) 1997-12-18 2003-09-02 Kla-Tencor Corporation Method for inspecting a reticle
US6516085B1 (en) * 1999-05-03 2003-02-04 Kla-Tencor Apparatus and methods for collecting global data during a reticle inspection
JP2006080437A (ja) 2004-09-13 2006-03-23 Intel Corp マスク・ブランクス検査方法及びマスク・ブランク検査ツール
JP2008020374A (ja) 2006-07-14 2008-01-31 Hitachi High-Technologies Corp 欠陥検査方法およびその装置
US7873204B2 (en) 2007-01-11 2011-01-18 Kla-Tencor Corporation Method for detecting lithographically significant defects on reticles
US7738093B2 (en) 2007-05-07 2010-06-15 Kla-Tencor Corp. Methods for detecting and classifying defects on a reticle
JP2009236697A (ja) * 2008-03-27 2009-10-15 Fujitsu Microelectronics Ltd フォトマスクの検査方法及び検査装置
JP5229575B2 (ja) 2009-05-08 2013-07-03 ソニー株式会社 画像処理装置および方法、並びにプログラム
KR20110027979A (ko) * 2009-09-11 2011-03-17 삼성모바일디스플레이주식회사 마스크 불량 검사 장치
JPWO2011108619A1 (ja) 2010-03-01 2013-06-27 日本電気株式会社 パターンマッチング装置、パターンマッチング方法及びパターンマッチングシステム
JP2011247957A (ja) 2010-05-24 2011-12-08 Toshiba Corp パターン検査方法および半導体装置の製造方法
US9518935B2 (en) 2013-07-29 2016-12-13 Kla-Tencor Corporation Monitoring changes in photomask defectivity

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