JP2016522881A5 - - Google Patents
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- Publication number
- JP2016522881A5 JP2016522881A5 JP2016502941A JP2016502941A JP2016522881A5 JP 2016522881 A5 JP2016522881 A5 JP 2016522881A5 JP 2016502941 A JP2016502941 A JP 2016502941A JP 2016502941 A JP2016502941 A JP 2016502941A JP 2016522881 A5 JP2016522881 A5 JP 2016522881A5
- Authority
- JP
- Japan
- Prior art keywords
- plate
- temperature sensor
- wafer chuck
- chuck according
- shaft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 239000000919 ceramic Substances 0.000 claims 1
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/831,670 | 2013-03-15 | ||
US13/831,670 US9984866B2 (en) | 2012-06-12 | 2013-03-15 | Multiple zone heater |
PCT/US2014/028937 WO2014144502A1 (en) | 2012-06-12 | 2014-03-14 | Multiple zone heater |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2016522881A JP2016522881A (ja) | 2016-08-04 |
JP2016522881A5 true JP2016522881A5 (ru) | 2017-04-20 |
JP6382295B2 JP6382295B2 (ja) | 2018-08-29 |
Family
ID=53040011
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016502941A Active JP6382295B2 (ja) | 2013-03-15 | 2014-03-14 | マルチゾーンヒータ |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP2973659A4 (ru) |
JP (1) | JP6382295B2 (ru) |
KR (1) | KR102171734B1 (ru) |
CN (1) | CN105518825B (ru) |
TW (2) | TWM644795U (ru) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102461150B1 (ko) | 2015-09-18 | 2022-11-01 | 삼성전자주식회사 | 3차원 반도체 메모리 장치 |
TWI791057B (zh) | 2017-10-24 | 2023-02-01 | 美商瓦特隆電子製造公司 | 用於真空腔室的電饋通及製作絕緣電饋通或電終端單元的方法 |
US11961747B2 (en) * | 2018-03-28 | 2024-04-16 | Kyocera Corporation | Heater and heater system |
KR102608397B1 (ko) * | 2018-10-16 | 2023-12-01 | 주식회사 미코세라믹스 | 미들 영역 독립 제어 세라믹 히터 |
KR102558722B1 (ko) * | 2018-12-20 | 2023-07-24 | 엔지케이 인슐레이터 엘티디 | 세라믹 히터 |
JP7240341B2 (ja) | 2020-02-03 | 2023-03-15 | 日本碍子株式会社 | セラミックヒータ及び熱電対ガイド |
JP7202322B2 (ja) * | 2020-02-03 | 2023-01-11 | 日本碍子株式会社 | セラミックヒータ |
JP7360992B2 (ja) * | 2020-06-02 | 2023-10-13 | 京セラ株式会社 | 端子付構造体 |
KR102242589B1 (ko) * | 2020-09-09 | 2021-04-21 | 주식회사 미코세라믹스 | 세라믹 히터 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4854495A (en) * | 1986-06-20 | 1989-08-08 | Hitachi, Ltd. | Sealing structure, method of soldering and process for preparing sealing structure |
US6583638B2 (en) * | 1999-01-26 | 2003-06-24 | Trio-Tech International | Temperature-controlled semiconductor wafer chuck system |
KR20010111058A (ko) * | 2000-06-09 | 2001-12-15 | 조셉 제이. 스위니 | 전체 영역 온도 제어 정전기 척 및 그 제조방법 |
JP3897563B2 (ja) * | 2001-10-24 | 2007-03-28 | 日本碍子株式会社 | 加熱装置 |
JP4098112B2 (ja) | 2003-02-14 | 2008-06-11 | 日本発条株式会社 | ヒータユニット |
JP4238772B2 (ja) | 2003-05-07 | 2009-03-18 | 東京エレクトロン株式会社 | 載置台構造及び熱処理装置 |
JP2005166354A (ja) * | 2003-12-01 | 2005-06-23 | Ngk Insulators Ltd | セラミックヒーター |
JPWO2006046308A1 (ja) * | 2004-10-29 | 2008-05-22 | エピクルー株式会社 | 半導体基板の支持体 |
JP4787568B2 (ja) * | 2004-11-16 | 2011-10-05 | 日本碍子株式会社 | 接合剤、窒化アルミニウム接合体及びその製造方法 |
JP4640842B2 (ja) * | 2006-10-11 | 2011-03-02 | 日本碍子株式会社 | 加熱装置 |
JP4450106B1 (ja) * | 2008-03-11 | 2010-04-14 | 東京エレクトロン株式会社 | 載置台構造及び処理装置 |
JP5791412B2 (ja) * | 2010-07-26 | 2015-10-07 | 日本碍子株式会社 | セラミックヒーター |
JP5855402B2 (ja) * | 2010-09-24 | 2016-02-09 | 日本碍子株式会社 | サセプター及びその製法 |
JP5501467B2 (ja) * | 2010-09-24 | 2014-05-21 | 日本碍子株式会社 | 半導体製造装置部材 |
JP2012080103A (ja) * | 2010-10-01 | 2012-04-19 | Ngk Insulators Ltd | サセプター及びその製法 |
US20120211484A1 (en) * | 2011-02-23 | 2012-08-23 | Applied Materials, Inc. | Methods and apparatus for a multi-zone pedestal heater |
JP6104823B2 (ja) * | 2011-03-01 | 2017-03-29 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 薄型加熱基板支持体 |
-
2014
- 2014-03-14 CN CN201480020826.2A patent/CN105518825B/zh active Active
- 2014-03-14 KR KR1020157029798A patent/KR102171734B1/ko active IP Right Grant
- 2014-03-14 TW TW112200700U patent/TWM644795U/zh not_active IP Right Cessation
- 2014-03-14 JP JP2016502941A patent/JP6382295B2/ja active Active
- 2014-03-14 TW TW103109558A patent/TWI632589B/zh active
- 2014-03-14 EP EP14764068.4A patent/EP2973659A4/en not_active Withdrawn
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