JP2016522881A - マルチゾーンヒータ - Google Patents
マルチゾーンヒータ Download PDFInfo
- Publication number
- JP2016522881A JP2016522881A JP2016502941A JP2016502941A JP2016522881A JP 2016522881 A JP2016522881 A JP 2016522881A JP 2016502941 A JP2016502941 A JP 2016502941A JP 2016502941 A JP2016502941 A JP 2016502941A JP 2016522881 A JP2016522881 A JP 2016522881A
- Authority
- JP
- Japan
- Prior art keywords
- plate
- heater
- shaft
- layer
- temperature sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68792—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/28—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material
- H05B3/283—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material the insulating material being an inorganic material, e.g. ceramic
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/037—Heaters with zones of different power density
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Resistance Heating (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Control And Other Processes For Unpacking Of Materials (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Measuring Temperature Or Quantity Of Heat (AREA)
- Surface Heating Bodies (AREA)
Abstract
Description
500 ウェハチャック又はヒータ
501 第1プレート層又はカバープレート
502 第2プレート層又はヒータプレート
503 中空領域又は通路
504 中央穴
505 第1温度センサ
506 第2温度センサ
507 第3温度センサ
508 第1熱電対穴
509 第2熱電対穴
510 第3熱電対穴
516 シャフト
517 第1端部
518 第2端部
519 長手方向中心軸
521 プレート
522 プレートの一部
526 プレートの中央ゾーン
527 プレートの中間ゾーン
528 プレートの端部ゾーン
531 第1電気リード線
532 第2電気リード線
533 第3電気リード線
Claims (9)
- 半導体製造工程で用いるウェハチャックであって、軸と端部を有するシャフトと、前記シャフトの端部に接合されて前記シャフトを越えて前記軸から半径方向外向きに延びる部分を有するプレートと、前記プレートの前記部分に配置された温度センサと、半導体製造工程中に前記温度センサの周りで前記プレートの温度を測定するために前記温度センサから前記シャフトを貫通して延びる電気リード線と、を備えている、
ことを特徴とするウェハチャック。 - 前記プレートは、セラミック製プレートである、
請求項1に記載のウェハチャック。 - 前記温度センサから半径方向に距離をおいて前記プレートの一部分に配置された追加の温度センサと、前記追加の温度センサの周りで前記プレートの温度を測定するために前記追加の温度センサから前記シャフトを貫通して延びる追加の電気リード線とをさらに備えている、
請求項1に記載のウェハチャック。 - 前記温度センサの周りの前記プレートを加熱するための第1ヒータと、前記第1ヒータから独立している前記追加の温度センサの周りの前記プレートを加熱するための第2ヒータとをさらに備えている、
請求項3に記載のウェハチャック。 - 前記プレートは、少なくとも第1プレート層と、前記第1プレート層に隣接して気密接合された第2プレート層とから形成され、前記第1プレート層は第1表面を有し、前記第2プレート層は前記第1表面に対向する第2表面を有し、前記電気リード線を収容するための前記温度センサと前記シャフトとの間に延びる前記第1及び前記第2プレート層間の凹部を形成するために、前記第1及び前記第2表面のうちの少なくとも一方は、内部に凹部を有している、
請求項3に記載のウェハチャック。 - 前記凹部は、前記電気リード線を収容する第1通路と、前記追加の電気リード線を収容する第2通路とを有している、
請求項5に記載のウェハチャック。 - 前記凹部は、前記軸を中心とする円柱形キャビティを含む、
請求項5に記載のウェハチャック。 - 前記プレート層を気密接合するために、前記第1プレートと前記第2プレートとの間に配置された接合層をさらに含む、請求項5に記載のウェハチャック。
- 前記温度センサは、熱電対である、
請求項1に記載のウェハチャック。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/831,670 US9984866B2 (en) | 2012-06-12 | 2013-03-15 | Multiple zone heater |
US13/831,670 | 2013-03-15 | ||
PCT/US2014/028937 WO2014144502A1 (en) | 2012-06-12 | 2014-03-14 | Multiple zone heater |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2016522881A true JP2016522881A (ja) | 2016-08-04 |
JP2016522881A5 JP2016522881A5 (ja) | 2017-04-20 |
JP6382295B2 JP6382295B2 (ja) | 2018-08-29 |
Family
ID=53040011
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016502941A Active JP6382295B2 (ja) | 2013-03-15 | 2014-03-14 | マルチゾーンヒータ |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP2973659A4 (ja) |
JP (1) | JP6382295B2 (ja) |
KR (1) | KR102171734B1 (ja) |
CN (1) | CN105518825B (ja) |
TW (2) | TWM644795U (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021500709A (ja) * | 2017-10-24 | 2021-01-07 | コンポーネント リ−エンジニアリング カンパニー インコーポレイテッド | セラミック絶縁体及びアルミニウムスリーブを備えた電気コネクタ及びその製造方法 |
US11993547B2 (en) | 2021-06-08 | 2024-05-28 | Watlow Electric Manufacturing Company | Termination feedthrough unit with ceramic insulator for vacuum and corrosive applications |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102461150B1 (ko) | 2015-09-18 | 2022-11-01 | 삼성전자주식회사 | 3차원 반도체 메모리 장치 |
JP7037640B2 (ja) * | 2018-03-28 | 2022-03-16 | 京セラ株式会社 | ヒータ及びヒータシステム |
KR102608397B1 (ko) * | 2018-10-16 | 2023-12-01 | 주식회사 미코세라믹스 | 미들 영역 독립 제어 세라믹 히터 |
JP6775099B1 (ja) * | 2018-12-20 | 2020-10-28 | 日本碍子株式会社 | セラミックヒータ |
JP7202322B2 (ja) * | 2020-02-03 | 2023-01-11 | 日本碍子株式会社 | セラミックヒータ |
JP7240341B2 (ja) | 2020-02-03 | 2023-03-15 | 日本碍子株式会社 | セラミックヒータ及び熱電対ガイド |
JP7360992B2 (ja) | 2020-06-02 | 2023-10-13 | 京セラ株式会社 | 端子付構造体 |
KR102242589B1 (ko) * | 2020-09-09 | 2021-04-21 | 주식회사 미코세라믹스 | 세라믹 히터 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010109346A (ja) * | 2008-03-11 | 2010-05-13 | Tokyo Electron Ltd | 載置台構造及び処理装置 |
JP2012069947A (ja) * | 2010-09-24 | 2012-04-05 | Ngk Insulators Ltd | サセプター及びその製法 |
JP2012080103A (ja) * | 2010-10-01 | 2012-04-19 | Ngk Insulators Ltd | サセプター及びその製法 |
US20120211484A1 (en) * | 2011-02-23 | 2012-08-23 | Applied Materials, Inc. | Methods and apparatus for a multi-zone pedestal heater |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6583638B2 (en) * | 1999-01-26 | 2003-06-24 | Trio-Tech International | Temperature-controlled semiconductor wafer chuck system |
JP3897563B2 (ja) * | 2001-10-24 | 2007-03-28 | 日本碍子株式会社 | 加熱装置 |
JP4098112B2 (ja) * | 2003-02-14 | 2008-06-11 | 日本発条株式会社 | ヒータユニット |
JP4238772B2 (ja) * | 2003-05-07 | 2009-03-18 | 東京エレクトロン株式会社 | 載置台構造及び熱処理装置 |
JP2005166354A (ja) * | 2003-12-01 | 2005-06-23 | Ngk Insulators Ltd | セラミックヒーター |
US20080093315A1 (en) * | 2004-10-29 | 2008-04-24 | Epicrew Corporation | Support for Semiconductor Substrate |
JP4787568B2 (ja) * | 2004-11-16 | 2011-10-05 | 日本碍子株式会社 | 接合剤、窒化アルミニウム接合体及びその製造方法 |
JP4640842B2 (ja) * | 2006-10-11 | 2011-03-02 | 日本碍子株式会社 | 加熱装置 |
JP5791412B2 (ja) * | 2010-07-26 | 2015-10-07 | 日本碍子株式会社 | セラミックヒーター |
WO2012039453A1 (ja) * | 2010-09-24 | 2012-03-29 | 日本碍子株式会社 | 半導体製造装置部材 |
-
2014
- 2014-03-14 TW TW112200700U patent/TWM644795U/zh not_active IP Right Cessation
- 2014-03-14 CN CN201480020826.2A patent/CN105518825B/zh active Active
- 2014-03-14 JP JP2016502941A patent/JP6382295B2/ja active Active
- 2014-03-14 KR KR1020157029798A patent/KR102171734B1/ko active IP Right Grant
- 2014-03-14 TW TW103109558A patent/TWI632589B/zh active
- 2014-03-14 EP EP14764068.4A patent/EP2973659A4/en not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010109346A (ja) * | 2008-03-11 | 2010-05-13 | Tokyo Electron Ltd | 載置台構造及び処理装置 |
JP2012069947A (ja) * | 2010-09-24 | 2012-04-05 | Ngk Insulators Ltd | サセプター及びその製法 |
JP2012080103A (ja) * | 2010-10-01 | 2012-04-19 | Ngk Insulators Ltd | サセプター及びその製法 |
US20120211484A1 (en) * | 2011-02-23 | 2012-08-23 | Applied Materials, Inc. | Methods and apparatus for a multi-zone pedestal heater |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021500709A (ja) * | 2017-10-24 | 2021-01-07 | コンポーネント リ−エンジニアリング カンパニー インコーポレイテッド | セラミック絶縁体及びアルミニウムスリーブを備えた電気コネクタ及びその製造方法 |
JP7428640B2 (ja) | 2017-10-24 | 2024-02-06 | ワトロー エレクトリック マニュファクチャリング カンパニー | セラミック絶縁体及びアルミニウムスリーブを備えた電気コネクタ及びその製造方法 |
US11993547B2 (en) | 2021-06-08 | 2024-05-28 | Watlow Electric Manufacturing Company | Termination feedthrough unit with ceramic insulator for vacuum and corrosive applications |
Also Published As
Publication number | Publication date |
---|---|
EP2973659A4 (en) | 2016-11-09 |
KR102171734B1 (ko) | 2020-10-29 |
TWM644795U (zh) | 2023-08-11 |
TWI632589B (zh) | 2018-08-11 |
CN105518825B (zh) | 2018-02-06 |
JP6382295B2 (ja) | 2018-08-29 |
CN105518825A (zh) | 2016-04-20 |
KR20150132515A (ko) | 2015-11-25 |
EP2973659A1 (en) | 2016-01-20 |
TW201506989A (zh) | 2015-02-16 |
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