JP2016521314A - 永久磁石を有するアーク蒸着源 - Google Patents
永久磁石を有するアーク蒸着源 Download PDFInfo
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- JP2016521314A JP2016521314A JP2016507952A JP2016507952A JP2016521314A JP 2016521314 A JP2016521314 A JP 2016521314A JP 2016507952 A JP2016507952 A JP 2016507952A JP 2016507952 A JP2016507952 A JP 2016507952A JP 2016521314 A JP2016521314 A JP 2016521314A
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- H—ELECTRICITY
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- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C—CHEMISTRY; METALLURGY
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- C21C5/00—Manufacture of carbon-steel, e.g. plain mild steel, medium carbon steel or cast steel or stainless steel
- C21C5/28—Manufacture of steel in the converter
- C21C5/30—Regulating or controlling the blowing
- C21C5/305—Afterburning
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- C—CHEMISTRY; METALLURGY
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- C21C—PROCESSING OF PIG-IRON, e.g. REFINING, MANUFACTURE OF WROUGHT-IRON OR STEEL; TREATMENT IN MOLTEN STATE OF FERROUS ALLOYS
- C21C5/00—Manufacture of carbon-steel, e.g. plain mild steel, medium carbon steel or cast steel or stainless steel
- C21C5/56—Manufacture of steel by other methods
- C21C5/562—Manufacture of steel by other methods starting from scrap
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- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21C—PROCESSING OF PIG-IRON, e.g. REFINING, MANUFACTURE OF WROUGHT-IRON OR STEEL; TREATMENT IN MOLTEN STATE OF FERROUS ALLOYS
- C21C5/00—Manufacture of carbon-steel, e.g. plain mild steel, medium carbon steel or cast steel or stainless steel
- C21C5/56—Manufacture of steel by other methods
- C21C5/567—Manufacture of steel by other methods operating in a continuous way
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32614—Consumable cathodes for arc discharge
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
- H01J37/32669—Particular magnets or magnet arrangements for controlling the discharge
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3417—Arrangements
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- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21B—MANUFACTURE OF IRON OR STEEL
- C21B2100/00—Handling of exhaust gases produced during the manufacture of iron or steel
- C21B2100/40—Gas purification of exhaust gases to be recirculated or used in other metallurgical processes
- C21B2100/44—Removing particles, e.g. by scrubbing, dedusting
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- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21B—MANUFACTURE OF IRON OR STEEL
- C21B2100/00—Handling of exhaust gases produced during the manufacture of iron or steel
- C21B2100/60—Process control or energy utilisation in the manufacture of iron or steel
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- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21B—MANUFACTURE OF IRON OR STEEL
- C21B2100/00—Handling of exhaust gases produced during the manufacture of iron or steel
- C21B2100/60—Process control or energy utilisation in the manufacture of iron or steel
- C21B2100/62—Energy conversion other than by heat exchange, e.g. by use of exhaust gas in energy production
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- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21B—MANUFACTURE OF IRON OR STEEL
- C21B2100/00—Handling of exhaust gases produced during the manufacture of iron or steel
- C21B2100/60—Process control or energy utilisation in the manufacture of iron or steel
- C21B2100/66—Heat exchange
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (10)
- 蒸発させる蒸着材料のターゲット(2)と、蒸発させる蒸着材料の蒸発に影響を与えるフェロ磁性ヨーク(3)と、蒸発させる蒸着材料の蒸発に影響を与える少なくとも1つの永久磁石(4)とを有し、前記フェロ磁性ヨーク(3)が前記ターゲット(2)に接触して配置されたアーク蒸着源(1)であって、
前記永久磁石(4)が前記フェロ磁性ヨーク(3)を介して前記ターゲット(2)に固定されることを特徴とするアーク蒸着源(1)。 - 前記フェロ磁性ヨーク(3)と前記ターゲット(2)とが機械結合(5)によって互いに連結されていることを特徴とする請求項1記載のアーク蒸着源。
- 前記フェロ磁性ヨーク(3)と前記ターゲット(2)とがねじ結合によって互いに連結されていることを特徴とする請求項1または2記載のアーク蒸着源。
- 前記ターゲット(2)が前記ヨーク(3)に設けられた雌ねじと組み合わされる雄ねじを備えることを特徴とする上記請求項のいずれか1つに記載のアーク蒸着源。
- 前記フェロ磁性ヨーク(3)を前記ターゲット(2)の背面(21)に配置したことを特徴とする上記請求項のいずれか1つに記載のアーク蒸着源。
- 前記フェロ磁性ヨーク(3)が前記ターゲット(2)の背面(21)を基本的に椀状に取り囲んでいることを特徴とする上記請求項のいずれか1つに記載のアーク蒸着源。
- 前記永久磁石(4)が前記フェロ磁性ヨーク(3)の前記ターゲット(2)に対向する側で前記ヨーク(3)内に収納されていることを特徴とする上記請求項のいずれか1つに記載のアーク蒸着源。
- 前記永久磁石(4)がリング状に形成されていることを特徴とする上記請求項のいずれか1つに記載のアーク蒸着源。
- 前記ヨーク(3)がアーク蒸着装置の冷却支持部と機械結合するための1つの固定部分(33)を有することを特徴とする上記請求項のいずれか1つに記載のアーク蒸着源。
- 前記固定部分(33)がねじであることを特徴とする上記請求項のいずれか1つに記載のアーク蒸着源。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ATGM131/2013 | 2013-04-22 | ||
ATGM131/2013U AT13830U1 (de) | 2013-04-22 | 2013-04-22 | Lichtbogenverdampfungs-Beschichtungsquelle |
PCT/AT2014/000078 WO2014172722A1 (de) | 2013-04-22 | 2014-04-17 | Lichtbogenverdampfungs-beschichtungsquelle mit permanentmagnet |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2016521314A true JP2016521314A (ja) | 2016-07-21 |
JP2016521314A5 JP2016521314A5 (ja) | 2017-05-18 |
JP6374948B2 JP6374948B2 (ja) | 2018-08-15 |
Family
ID=51492675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2016507952A Expired - Fee Related JP6374948B2 (ja) | 2013-04-22 | 2014-04-17 | 永久磁石を有するアーク蒸着源 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20160099134A1 (ja) |
EP (1) | EP2989654B1 (ja) |
JP (1) | JP6374948B2 (ja) |
KR (1) | KR102167854B1 (ja) |
AT (1) | AT13830U1 (ja) |
CA (1) | CA2907804A1 (ja) |
WO (1) | WO2014172722A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE1650144A1 (en) * | 2016-02-05 | 2017-08-06 | Impact Coatings Ab | Device for a physical vapor deposition (pvd) process |
CA3077570A1 (en) * | 2017-10-03 | 2019-05-02 | Oerlikon Surface Solutions Ag, Pfaffikon | Arc source with confined magnetic field |
SE542687C2 (en) * | 2018-06-27 | 2020-06-23 | Impact Coatings Ab Publ | Arc source system for a cathode |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4622452A (en) * | 1983-07-21 | 1986-11-11 | Multi-Arc Vacuum Systems, Inc. | Electric arc vapor deposition electrode apparatus |
JPH03500469A (ja) * | 1987-08-18 | 1991-01-31 | リージェンツ オブ ザ ユニバーシティ オブ ミネソタ | 厚いターゲットを用い、方向制御されたアーク・コーティング |
JP2000026966A (ja) * | 1997-11-26 | 2000-01-25 | Vapor Technol Inc | スパッタリングあるいはア―ク蒸着用の装置 |
JP2002212711A (ja) * | 2001-01-16 | 2002-07-31 | Kobe Steel Ltd | 真空アーク蒸発源 |
US20040126492A1 (en) * | 2002-12-30 | 2004-07-01 | Weaver Scott Andrew | Method and apparatus for using ion plasma deposition to produce coating |
JP2011127138A (ja) * | 2009-12-15 | 2011-06-30 | Mitsubishi Materials Corp | 円筒型スパッタリングターゲット製造方法 |
WO2011127504A1 (de) * | 2010-04-14 | 2011-10-20 | Plansee Se | Beschichtungsquelle und verfahren zu deren herstellung |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3625848A (en) * | 1968-12-26 | 1971-12-07 | Alvin A Snaper | Arc deposition process and apparatus |
DE4017111C2 (de) * | 1990-05-28 | 1998-01-29 | Hauzer Holding | Lichtbogen-Magnetron-Vorrichtung |
DE4237517A1 (de) * | 1992-11-06 | 1994-05-11 | Leybold Ag | Vorrichtung zum Beschichten eines Substrats, insbesondere mit elektrisch nichtleitenden Schichten |
US5656091A (en) * | 1995-11-02 | 1997-08-12 | Vacuum Plating Technology Corporation | Electric arc vapor deposition apparatus and method |
US5736019A (en) * | 1996-03-07 | 1998-04-07 | Bernick; Mark A. | Sputtering cathode |
US6843891B2 (en) * | 1998-05-14 | 2005-01-18 | Kaufman & Robinson, Inc. | Apparatus for sputter deposition |
DE10234856A1 (de) * | 2002-07-31 | 2004-02-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Einrichtung zum Beschichten durch Magnetron-Sputtern |
US7575088B2 (en) * | 2005-07-01 | 2009-08-18 | Chrysler Group Llc | Powertrain mounting system |
-
2013
- 2013-04-22 AT ATGM131/2013U patent/AT13830U1/de not_active IP Right Cessation
-
2014
- 2014-04-17 WO PCT/AT2014/000078 patent/WO2014172722A1/de active Application Filing
- 2014-04-17 EP EP14731536.0A patent/EP2989654B1/de active Active
- 2014-04-17 KR KR1020157029977A patent/KR102167854B1/ko active IP Right Grant
- 2014-04-17 US US14/786,226 patent/US20160099134A1/en not_active Abandoned
- 2014-04-17 JP JP2016507952A patent/JP6374948B2/ja not_active Expired - Fee Related
- 2014-04-17 CA CA2907804A patent/CA2907804A1/en not_active Abandoned
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4622452A (en) * | 1983-07-21 | 1986-11-11 | Multi-Arc Vacuum Systems, Inc. | Electric arc vapor deposition electrode apparatus |
JPH03500469A (ja) * | 1987-08-18 | 1991-01-31 | リージェンツ オブ ザ ユニバーシティ オブ ミネソタ | 厚いターゲットを用い、方向制御されたアーク・コーティング |
JP2000026966A (ja) * | 1997-11-26 | 2000-01-25 | Vapor Technol Inc | スパッタリングあるいはア―ク蒸着用の装置 |
JP2002212711A (ja) * | 2001-01-16 | 2002-07-31 | Kobe Steel Ltd | 真空アーク蒸発源 |
US20040126492A1 (en) * | 2002-12-30 | 2004-07-01 | Weaver Scott Andrew | Method and apparatus for using ion plasma deposition to produce coating |
JP2011127138A (ja) * | 2009-12-15 | 2011-06-30 | Mitsubishi Materials Corp | 円筒型スパッタリングターゲット製造方法 |
WO2011127504A1 (de) * | 2010-04-14 | 2011-10-20 | Plansee Se | Beschichtungsquelle und verfahren zu deren herstellung |
Also Published As
Publication number | Publication date |
---|---|
CA2907804A1 (en) | 2014-10-30 |
KR20150144753A (ko) | 2015-12-28 |
KR102167854B1 (ko) | 2020-10-21 |
AT13830U1 (de) | 2014-09-15 |
JP6374948B2 (ja) | 2018-08-15 |
EP2989654B1 (de) | 2017-09-13 |
EP2989654A1 (de) | 2016-03-02 |
US20160099134A1 (en) | 2016-04-07 |
WO2014172722A1 (de) | 2014-10-30 |
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