JP2016519637A - フォトマシナブル層を含むフュージョンドローガラス積層構造体の機械加工 - Google Patents
フォトマシナブル層を含むフュージョンドローガラス積層構造体の機械加工 Download PDFInfo
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- ZFZQOKHLXAVJIF-UHFFFAOYSA-N zinc;boric acid;dihydroxy(dioxido)silane Chemical compound [Zn+2].OB(O)O.O[Si](O)([O-])[O-] ZFZQOKHLXAVJIF-UHFFFAOYSA-N 0.000 description 1
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- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
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- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
- B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
- B32B3/266—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by an apertured layer, the apertures going through the whole thickness of the layer, e.g. expanded metal, perforated layer, slit layer regular cells B32B3/12
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- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/02—Forming molten glass coated with coloured layers; Forming molten glass of different compositions or layers; Forming molten glass comprising reinforcements or inserts
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/06—Forming glass sheets
- C03B17/064—Forming glass sheets by the overflow downdraw fusion process; Isopipes therefor
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
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- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/002—Other surface treatment of glass not in the form of fibres or filaments by irradiation by ultraviolet light
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/007—Other surface treatment of glass not in the form of fibres or filaments by thermal treatment
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
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Abstract
Description
102 コア層
104a 第1のクラッド層
104b 第2のクラッド層
110 フォトマスク
115 開口
120 紫外線放射
130 結晶化領域
135 コア結晶化領域
140a、140b 孔構造
150a、150b 貫通孔
Claims (10)
- ガラス構造体を機械加工する方法において、
前記ガラス構造体が、第1のクラッド層と第2のクラッド層との間にコア層を介在させた、フュージョンドロー積層体を含み、
前記コア層が、コア感光性を有するコアガラス組成から形成され、
前記第1のクラッド層が、前記コア感光性とは異なる第1のクラッド感光性を有する、第1のクラッドガラス組成から形成され、
前記第2のクラッド層が、前記コア感光性とは異なる第2のクラッド感光性を有する、第2のクラッドガラス組成から形成され、さらに、
前記コア層と、前記第1のクラッド層と、前記第2のクラッド層とのうちの少なくとも1つが、フォトマシナブル層であり、
前記方法が、
前記フュージョンドロー積層体の少なくとも1つの前記フォトマシナブル層の少なくとも1つの選択された領域を、紫外線放射に既定の露出時間の間露出するステップ、
前記少なくとも1つの選択された領域が前記フォトマシナブル層で結晶化材料の結晶化領域を形成するまで、前記ガラス構造体を加熱するステップ、および、
前記フォトマシナブル層から選択的に前記結晶化領域を除去するステップ、
を有してなることを特徴とする方法。 - 前記コア層と、前記第1のクラッド層と、前記第2のクラッド層との夫々が、フォトマシナブル層であり、かつ、
前記第1のクラッド感光性と前記第2のクラッド感光性との両方が、前記コア感光性よりも高いことを特徴とする請求項1記載の方法。 - 前記第1のクラッド層の第1の複数の選択領域と前記第2のクラッド層の第2の複数の選択領域とが、前記紫外線放射に露出され、さらに、
前記加熱するステップの際に、前記第1の複数の選択領域が前記第1のクラッド層に前記結晶化領域を形成し、かつ前記第2の複数の選択領域が前記第2のクラッド層に前記結晶化領域を形成することを特徴とする請求項1記載の方法。 - 前記露出するステップが、前記第1の複数の選択領域、または前記第2の複数の選択領域、あるいは前記第1の複数の選択領域および前記第2の複数の選択領域の両方、を画成する開口を含む、少なくとも1つのフォトマスクを通じて行われることを特徴とする請求項3記載の方法。
- 前記ガラス構造体を加熱するステップの後でありかつ前記結晶化領域を除去するステップの前に、前記コア層の第1の部分が前記結晶化領域によって紫外線放射から遮断されかつ前記コア層の第2の部分が該紫外線放射から遮断されないように、前記ガラス構造体を紫外線放射に2度目に露出するステップ、および、
前記コア層の前記遮断されなかった部分が結晶化するまで、前記ガラス構造体を加熱するステップ、
をさらに含み、前記ガラス構造体を紫外線放射に2度目に露出するステップの後でありかつ前記コア層の前記遮断されなかった部分が結晶化するまで前記ガラス構造体を加熱するステップの前に、前記結晶化領域を除去することを特徴とする請求項4記載の方法。 - 前記第1の複数の選択領域および前記第2の複数の選択領域が、鉛直に位置合わせされたものであり、前記第1の複数の選択領域と前記第2の複数の選択領域との間の前記コア層の部分を除去して、前記ガラス構造体を通る貫通孔を形成するステップをさらに含むことを特徴とする請求項4記載の方法。
- 前記結晶化領域を除去するステップが、前記第1のクラッド層、または前記第2のクラッド層、あるいは前記第1のクラッド層および前記第2のクラッド層の両方に、孔構造を形成することを特徴とする請求項4記載の方法。
- 前記ガラス構造体を加熱するステップと前記結晶化領域を除去するステップとの後に、前記孔構造よりも小さくかつ前記孔構造に位置合わせされた、開口を含む、フォトマスクを通じて、前記ガラス構造体を紫外線放射に2度目に露出するステップ、および、
前記2度目の露出の後に、前記コア層の少なくともコア結晶化領域が結晶化するまで、前記ガラス構造体を加熱するステップ、
をさらに含むことを特徴とする請求項7記載の方法。 - 前記第1のクラッド感光性および前記第2のクラッド感光性の両方が、前記コア感光性よりも低いことを特徴とする請求項1記載の方法。
- 前記第1のクラッド感光性および前記第2のクラッド感光性の両方がゼロであり、前記コア感光性がゼロ以外であり、さらに前記第1のクラッドガラス組成および前記第2のクラッドガラス組成が、エッチング液内での前記コアガラス組成のコア溶解度の少なくとも1.5倍の、前記エッチング液内でのクラッド溶解度を夫々有している、高速エッチングガラス組成であることを特徴とする請求項1記載の方法。
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US13/798,479 US9340451B2 (en) | 2013-02-28 | 2013-03-13 | Machining of fusion-drawn glass laminate structures containing a photomachinable layer |
US13/798,479 | 2013-03-13 | ||
PCT/US2014/018496 WO2014134098A1 (en) | 2013-02-28 | 2014-02-26 | Machining of fusion-drawn glass laminate structures containing a photomachinable layer |
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US9340451B2 (en) | 2016-05-17 |
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