JP2016513071A5 - - Google Patents
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- JP2016513071A5 JP2016513071A5 JP2015547398A JP2015547398A JP2016513071A5 JP 2016513071 A5 JP2016513071 A5 JP 2016513071A5 JP 2015547398 A JP2015547398 A JP 2015547398A JP 2015547398 A JP2015547398 A JP 2015547398A JP 2016513071 A5 JP2016513071 A5 JP 2016513071A5
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- 239000000203 mixture Substances 0.000 claims 13
- 238000003776 cleavage reaction Methods 0.000 claims 12
- 150000001875 compounds Chemical class 0.000 claims 12
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 9
- 239000000178 monomer Substances 0.000 claims 8
- 238000000034 method Methods 0.000 claims 6
- 239000011347 resin Substances 0.000 claims 5
- 229920005989 resin Polymers 0.000 claims 5
- 125000000524 functional group Chemical group 0.000 claims 4
- 239000002253 acid Substances 0.000 claims 3
- 125000005842 heteroatom Chemical group 0.000 claims 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 239000004851 dental resin Substances 0.000 claims 2
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 claims 2
- 239000003999 initiator Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 2
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 claims 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 claims 1
- VNFYMAPAENTMMO-UHFFFAOYSA-N 5-chloro-2-methylquinoline Chemical compound ClC1=CC=CC2=NC(C)=CC=C21 VNFYMAPAENTMMO-UHFFFAOYSA-N 0.000 claims 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 claims 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims 1
- AMFGWXWBFGVCKG-UHFFFAOYSA-N Panavia opaque Chemical compound C1=CC(OCC(O)COC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OCC(O)COC(=O)C(C)=C)C=C1 AMFGWXWBFGVCKG-UHFFFAOYSA-N 0.000 claims 1
- 239000002202 Polyethylene glycol Substances 0.000 claims 1
- UKMBKKFLJMFCSA-UHFFFAOYSA-N [3-hydroxy-2-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)OC(=O)C(C)=C UKMBKKFLJMFCSA-UHFFFAOYSA-N 0.000 claims 1
- BIAPHJKUKHWRMP-UHFFFAOYSA-N [SiH4].C=C1CCCCSS1 Chemical compound [SiH4].C=C1CCCCSS1 BIAPHJKUKHWRMP-UHFFFAOYSA-N 0.000 claims 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 229940008075 allyl sulfide Drugs 0.000 claims 1
- QUZSUMLPWDHKCJ-UHFFFAOYSA-N bisphenol A dimethacrylate Chemical class C1=CC(OC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OC(=O)C(C)=C)C=C1 QUZSUMLPWDHKCJ-UHFFFAOYSA-N 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 239000003085 diluting agent Substances 0.000 claims 1
- 125000003700 epoxy group Chemical group 0.000 claims 1
- 150000002148 esters Chemical group 0.000 claims 1
- MKVYSRNJLWTVIK-UHFFFAOYSA-N ethyl carbamate;2-methylprop-2-enoic acid Chemical compound CCOC(N)=O.CC(=C)C(O)=O.CC(=C)C(O)=O MKVYSRNJLWTVIK-UHFFFAOYSA-N 0.000 claims 1
- 239000000945 filler Substances 0.000 claims 1
- 229910052809 inorganic oxide Inorganic materials 0.000 claims 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims 1
- -1 neopentyl glycol diester Chemical class 0.000 claims 1
- 229920001223 polyethylene glycol Polymers 0.000 claims 1
- 150000003254 radicals Chemical class 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 229920002554 vinyl polymer Polymers 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261738067P | 2012-12-17 | 2012-12-17 | |
| US61/738,067 | 2012-12-17 | ||
| PCT/US2013/072250 WO2014099317A1 (en) | 2012-12-17 | 2013-11-27 | Addition-fragmentation oligomers |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016513071A JP2016513071A (ja) | 2016-05-12 |
| JP2016513071A5 true JP2016513071A5 (cg-RX-API-DMAC7.html) | 2016-12-22 |
| JP6306044B2 JP6306044B2 (ja) | 2018-04-04 |
Family
ID=49780392
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015547398A Expired - Fee Related JP6306044B2 (ja) | 2012-12-17 | 2013-11-27 | 付加開裂オリゴマー |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9463146B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP2931756B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6306044B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR102008353B1 (cg-RX-API-DMAC7.html) |
| CN (1) | CN104870484B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2014099317A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6300899B2 (ja) | 2013-03-20 | 2018-03-28 | スリーエム イノベイティブ プロパティズ カンパニー | 高屈折率の付加−開裂剤 |
| WO2014172138A1 (en) | 2013-04-15 | 2014-10-23 | 3M Innovative Properties Company | Dental composition containing high refractive index monomers |
| JP6410803B2 (ja) | 2013-09-20 | 2018-10-24 | スリーエム イノベイティブ プロパティズ カンパニー | トリチオカーボネート含有付加−開裂剤 |
| KR101712414B1 (ko) | 2013-10-16 | 2017-03-06 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 알릴 다이설파이드-함유 부가-단편화 올리고머 |
| EP3107975B1 (en) * | 2014-02-18 | 2020-01-15 | 3M Innovative Properties Company | Addition-fragmentation oligomers having high refractive index groups |
| EP3212153A1 (en) | 2014-10-31 | 2017-09-06 | 3M Innovative Properties Company | Dental materials and methods |
| US10350297B2 (en) | 2014-10-31 | 2019-07-16 | 3M Innovative Properties Company | Dental materials and methods |
| US10479848B2 (en) | 2015-02-20 | 2019-11-19 | 3M Innovative Properties Company | Addition-fragmentation oligomers |
| US10492888B2 (en) | 2015-07-07 | 2019-12-03 | Align Technology, Inc. | Dental materials using thermoset polymers |
| WO2018017513A1 (en) * | 2016-07-20 | 2018-01-25 | 3M Innovative Properties Company | Stabilizing styrenic polymer for quantum dots |
| WO2018080834A1 (en) * | 2016-10-27 | 2018-05-03 | 3M Innovative Properties Company | Crosslinkable composition including a (meth)acrylic polymer and methods of making a crosslinked composition |
| US11952447B2 (en) * | 2018-03-30 | 2024-04-09 | Mitsui Chemicals, Inc. | Polymerizable composition for dental material, and dental material obtained from said composition |
| CN116640061A (zh) * | 2018-05-04 | 2023-08-25 | 阿莱恩技术有限公司 | 可聚合单体及其聚合方法 |
| WO2019213585A1 (en) | 2018-05-04 | 2019-11-07 | Align Technology, Inc. | Curable composition for use in a high temperature lithography-based photopolymerization process and method of producing crosslinked polymers therefrom |
| JP7703455B2 (ja) | 2019-05-24 | 2025-07-07 | コベストロ （ネザーランズ） ビー．ヴィー． | 強化された高速加工性を備えた光ファイバーをコーティングするための放射線硬化性組成物 |
| DE102019122174A1 (de) | 2019-08-19 | 2021-02-25 | Voco Gmbh | Dentale polymerisierbare Zusammensetzung auf der Basis kondensierter Silane |
| EP4041119A2 (en) | 2019-10-31 | 2022-08-17 | Align Technology, Inc. | Crystallizable resins |
| US12404419B2 (en) | 2020-11-05 | 2025-09-02 | 3M Innovative Properties Company | Imide addition-fragmentation agents |
| WO2023105327A1 (en) | 2021-12-06 | 2023-06-15 | 3M Innovative Properties Company | Adhesives comprising cyclic imide addition-fragmentation and adhesion agents |
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| US20120208965A1 (en) | 2011-02-15 | 2012-08-16 | 3M Innovative Properties Company | Addition-fragmentation agents |
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| CN103732629B (zh) | 2011-08-23 | 2015-10-21 | 3M创新有限公司 | 加成-断裂剂 |
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| EP2916801B1 (en) | 2012-11-12 | 2017-02-22 | 3M Innovative Properties Company | Dental compositions comprising addition-fragmentation agents |
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-
2013
- 2013-11-27 EP EP13808374.6A patent/EP2931756B1/en active Active
- 2013-11-27 WO PCT/US2013/072250 patent/WO2014099317A1/en not_active Ceased
- 2013-11-27 JP JP2015547398A patent/JP6306044B2/ja not_active Expired - Fee Related
- 2013-11-27 US US14/652,134 patent/US9463146B2/en active Active
- 2013-11-27 CN CN201380065942.1A patent/CN104870484B/zh active Active
- 2013-11-27 KR KR1020157018846A patent/KR102008353B1/ko active Active