JP2016506067A5 - - Google Patents
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- Publication number
- JP2016506067A5 JP2016506067A5 JP2015545109A JP2015545109A JP2016506067A5 JP 2016506067 A5 JP2016506067 A5 JP 2016506067A5 JP 2015545109 A JP2015545109 A JP 2015545109A JP 2015545109 A JP2015545109 A JP 2015545109A JP 2016506067 A5 JP2016506067 A5 JP 2016506067A5
- Authority
- JP
- Japan
- Prior art keywords
- energy source
- radiant energy
- fluence
- radiation
- pulsed laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261730924P | 2012-11-28 | 2012-11-28 | |
| US61/730,924 | 2012-11-28 | ||
| PCT/US2013/071312 WO2014085201A1 (en) | 2012-11-28 | 2013-11-21 | Thermal treatment methods and apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2016506067A JP2016506067A (ja) | 2016-02-25 |
| JP2016506067A5 true JP2016506067A5 (enExample) | 2017-01-12 |
Family
ID=50773664
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015545109A Pending JP2016506067A (ja) | 2012-11-28 | 2013-11-21 | 熱処理方法及び装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20140148017A1 (enExample) |
| JP (1) | JP2016506067A (enExample) |
| KR (1) | KR20150088875A (enExample) |
| TW (1) | TWI614346B (enExample) |
| WO (1) | WO2014085201A1 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9830409B2 (en) * | 2012-04-10 | 2017-11-28 | The Penn State Research Foundation | Electromagnetic band gap structure and method for enhancing the functionality of electromagnetic band gap structures |
| KR20200075531A (ko) * | 2018-12-18 | 2020-06-26 | 삼성전자주식회사 | 기판 처리 장치 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2923016B2 (ja) * | 1990-09-17 | 1999-07-26 | 株式会社日立製作所 | 薄膜半導体の製造方法及びその装置 |
| JPH05226790A (ja) * | 1992-02-18 | 1993-09-03 | Hitachi Ltd | レーザアニール装置 |
| JP4472066B2 (ja) * | 1999-10-29 | 2010-06-02 | シャープ株式会社 | 結晶性半導体膜の製造方法、結晶化装置及びｔｆｔの製造方法 |
| JP2002064060A (ja) * | 2000-08-22 | 2002-02-28 | Matsushita Electric Ind Co Ltd | 非結晶薄膜のレーザーアニール方法とその装置 |
| JP3973849B2 (ja) * | 2001-03-09 | 2007-09-12 | 住友重機械工業株式会社 | レーザアニール方法 |
| JP4397571B2 (ja) * | 2001-09-25 | 2010-01-13 | 株式会社半導体エネルギー研究所 | レーザ照射方法およびレーザ照射装置、並びに半導体装置の作製方法 |
| TWI289896B (en) * | 2001-11-09 | 2007-11-11 | Semiconductor Energy Lab | Laser irradiation apparatus, laser irradiation method, and method of manufacturing a semiconductor device |
| US7521651B2 (en) * | 2003-09-12 | 2009-04-21 | Orbotech Ltd | Multiple beam micro-machining system and method |
| US7569463B2 (en) * | 2006-03-08 | 2009-08-04 | Applied Materials, Inc. | Method of thermal processing structures formed on a substrate |
| US8148663B2 (en) * | 2007-07-31 | 2012-04-03 | Applied Materials, Inc. | Apparatus and method of improving beam shaping and beam homogenization |
| JP2010212478A (ja) * | 2009-03-11 | 2010-09-24 | Panasonic Corp | レーザ加工方法およびレーザ加工装置 |
-
2013
- 2013-11-12 TW TW102141103A patent/TWI614346B/zh not_active IP Right Cessation
- 2013-11-21 US US14/086,773 patent/US20140148017A1/en not_active Abandoned
- 2013-11-21 KR KR1020157017061A patent/KR20150088875A/ko not_active Ceased
- 2013-11-21 JP JP2015545109A patent/JP2016506067A/ja active Pending
- 2013-11-21 WO PCT/US2013/071312 patent/WO2014085201A1/en not_active Ceased
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