JP2016152382A5 - - Google Patents
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- Publication number
- JP2016152382A5 JP2016152382A5 JP2015030489A JP2015030489A JP2016152382A5 JP 2016152382 A5 JP2016152382 A5 JP 2016152382A5 JP 2015030489 A JP2015030489 A JP 2015030489A JP 2015030489 A JP2015030489 A JP 2015030489A JP 2016152382 A5 JP2016152382 A5 JP 2016152382A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- roller
- cleaning
- rotating
- slip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 94
- 238000004140 cleaning Methods 0.000 claims description 52
- 230000002093 peripheral Effects 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 9
- 230000003287 optical Effects 0.000 claims description 9
- 238000001514 detection method Methods 0.000 claims 5
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015030489A JP6491903B2 (ja) | 2015-02-19 | 2015-02-19 | 基板洗浄装置および方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015030489A JP6491903B2 (ja) | 2015-02-19 | 2015-02-19 | 基板洗浄装置および方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2016152382A JP2016152382A (ja) | 2016-08-22 |
JP2016152382A5 true JP2016152382A5 (no) | 2018-02-08 |
JP6491903B2 JP6491903B2 (ja) | 2019-03-27 |
Family
ID=56696758
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015030489A Active JP6491903B2 (ja) | 2015-02-19 | 2015-02-19 | 基板洗浄装置および方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP6491903B2 (no) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6792512B2 (ja) | 2017-05-16 | 2020-11-25 | 株式会社荏原製作所 | 基板洗浄装置および基板処理装置 |
JP7115403B2 (ja) * | 2019-04-11 | 2022-08-09 | 株式会社Sumco | ウェーハの回転検出方法及びウェーハの回転検出システム |
JP7078602B2 (ja) * | 2019-12-25 | 2022-05-31 | 株式会社荏原製作所 | 洗浄装置、研磨装置、洗浄装置において基板の回転速度を算出する装置および方法 |
JP2023095345A (ja) * | 2021-12-24 | 2023-07-06 | 株式会社荏原製作所 | 基板処理方法および基板処理装置 |
CN114472265B (zh) * | 2021-12-31 | 2022-11-08 | 华海清科股份有限公司 | 一种晶圆清洗方法及晶圆清洗装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10289889A (ja) * | 1997-04-16 | 1998-10-27 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JPH11219930A (ja) * | 1998-01-30 | 1999-08-10 | Ebara Corp | 洗浄装置 |
JP4620911B2 (ja) * | 2001-09-05 | 2011-01-26 | 芝浦メカトロニクス株式会社 | 基板の処理装置及び処理方法 |
JP2003092278A (ja) * | 2001-09-18 | 2003-03-28 | Shibaura Mechatronics Corp | 基板の処理装置及び処理方法 |
US7685667B2 (en) * | 2005-06-14 | 2010-03-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Post-CMP cleaning system |
US20080216863A1 (en) * | 2007-03-09 | 2008-09-11 | Applied Materials, Inc. | Methods and apparatus for monitoring the rotation of a substrate during cleaning |
JP6125884B2 (ja) * | 2013-04-23 | 2017-05-10 | 株式会社荏原製作所 | 基板処理装置及び処理基板の製造方法 |
-
2015
- 2015-02-19 JP JP2015030489A patent/JP6491903B2/ja active Active
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