SG10201803908SA - End point detection method, polishing apparatus, and polishing method - Google Patents
End point detection method, polishing apparatus, and polishing methodInfo
- Publication number
- SG10201803908SA SG10201803908SA SG10201803908SA SG10201803908SA SG10201803908SA SG 10201803908S A SG10201803908S A SG 10201803908SA SG 10201803908S A SG10201803908S A SG 10201803908SA SG 10201803908S A SG10201803908S A SG 10201803908SA SG 10201803908S A SG10201803908S A SG 10201803908SA
- Authority
- SG
- Singapore
- Prior art keywords
- polishing
- end point
- point detection
- drive
- detection method
- Prior art date
Links
- 238000005498 polishing Methods 0.000 title abstract 15
- 238000001514 detection method Methods 0.000 title abstract 5
- 238000000034 method Methods 0.000 title abstract 2
- 238000007517 polishing process Methods 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/013—Devices or means for detecting lapping completion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/046—Lapping machines or devices; Accessories designed for working plane surfaces using electric current
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/10—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S13/00—Systems using the reflection or reradiation of radio waves, e.g. radar systems; Analogous systems using reflection or reradiation of waves whose nature or wavelength is irrelevant or unspecified
- G01S13/02—Systems using reflection of radio waves, e.g. primary radar systems; Analogous systems
- G01S13/50—Systems of measurement based on relative movement of target
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Abstract
END POINT DETECTION METHOD, POLISHING APPARATUS, AND POLISHING METHOD To improve accuracy of polishing end point detection, provided is an end point detection method of detecting and end point based on a drive current supplied to a drive unit (first electric motor or second electric motor) that rotates and drives one of a polishing table that holds a polishing pad and a holding unit (top ring) that holds a polishing target and presses the polishing target against a polishing pad. The end point detection method includes: a step (S102) of determining whether a polishing condition of a polishing process to be executed coincides with a preset specific polishing condition; a step (S103) of adjusting a current control parameter in a drive control unit (motor driver) that controls the drive current, the current control parameter related to a change in the drive current with respect to a change in a driving load of the drive unit, if it is determined that the polishing condition coincides with the specific polishing condition; and a step (S105) of detecting the drive current supplied to the drive unit based on the adjusted current control parameter and detecting an end point of polishing based on the detected drive current. Figure 8
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014177742A JP6377463B2 (en) | 2014-09-02 | 2014-09-02 | End point detection method and polishing apparatus |
JP2015099643A JP6727761B2 (en) | 2015-05-15 | 2015-05-15 | Polishing apparatus and polishing method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201803908SA true SG10201803908SA (en) | 2018-06-28 |
Family
ID=55439738
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201803908SA SG10201803908SA (en) | 2014-09-02 | 2015-08-27 | End point detection method, polishing apparatus, and polishing method |
SG11201701152WA SG11201701152WA (en) | 2014-09-02 | 2015-08-27 | End point detection method, polishing apparatus, and polishing method |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201701152WA SG11201701152WA (en) | 2014-09-02 | 2015-08-27 | End point detection method, polishing apparatus, and polishing method |
Country Status (6)
Country | Link |
---|---|
US (2) | US10759019B2 (en) |
KR (1) | KR102388170B1 (en) |
CN (1) | CN106604802B (en) |
SG (2) | SG10201803908SA (en) |
TW (1) | TWI678259B (en) |
WO (1) | WO2016035673A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG10201803908SA (en) * | 2014-09-02 | 2018-06-28 | Ebara Corp | End point detection method, polishing apparatus, and polishing method |
JP6775354B2 (en) | 2015-10-16 | 2020-10-28 | 株式会社荏原製作所 | Polishing equipment and polishing method |
US10744617B2 (en) * | 2015-10-16 | 2020-08-18 | Ebara Corporation | Polishing endpoint detection method |
JP6357260B2 (en) * | 2016-09-30 | 2018-07-11 | 株式会社荏原製作所 | Polishing apparatus and polishing method |
JP6989317B2 (en) * | 2017-08-04 | 2022-01-05 | キオクシア株式会社 | Polishing equipment, polishing methods, and programs |
JP7098311B2 (en) * | 2017-12-05 | 2022-07-11 | 株式会社荏原製作所 | Polishing equipment and polishing method |
JP2022066034A (en) * | 2020-10-16 | 2022-04-28 | 新東工業株式会社 | Automatic polishing system and automatic polishing device |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3807979A (en) * | 1972-05-08 | 1974-04-30 | Philadelphia Quartz Co | Quaternary ammonium silicate for polishing silicon metal |
US5846882A (en) * | 1996-10-03 | 1998-12-08 | Applied Materials, Inc. | Endpoint detector for a chemical mechanical polishing system |
JPH10180625A (en) * | 1996-12-26 | 1998-07-07 | Toshiba Corp | Polishing method and polishing device |
JPH1187286A (en) * | 1997-09-05 | 1999-03-30 | Lsi Logic Corp | Two-staged mechanical and chemical polishing method and system for semiconductor wafer |
US6190494B1 (en) * | 1998-07-29 | 2001-02-20 | Micron Technology, Inc. | Method and apparatus for electrically endpointing a chemical-mechanical planarization process |
JP2001198813A (en) | 2000-01-13 | 2001-07-24 | Toshiba Corp | Polishing device and its polishing method |
US6547637B1 (en) * | 2000-10-05 | 2003-04-15 | Momentum Technical Consulting Inc. | Chemical/mechanical polishing endpoint detection device and method |
JP4370789B2 (en) * | 2002-07-12 | 2009-11-25 | 東京エレクトロン株式会社 | Plasma processing apparatus and variable impedance means calibration method |
DE10345381B4 (en) * | 2003-09-30 | 2013-04-11 | Advanced Micro Devices, Inc. | A method and system for controlling chemical mechanical polishing using a sensor signal from a pad conditioner |
WO2005059970A2 (en) * | 2003-12-17 | 2005-06-30 | Acm Research, Inc. | Controlling removal rate uniformity of an electropolishing process in integrated circuit fabrication |
ATE425841T1 (en) * | 2004-01-26 | 2009-04-15 | Tbw Ind Inc | CHEMICAL-MECHANICAL PLANARIZATION PROCESS CONTROL WITH AN IN-SITU PROCESSING PROCESS |
JP2005288664A (en) * | 2004-04-05 | 2005-10-20 | Ebara Corp | Polishing device and method for detecting completion of polishing pad standing |
JP2005034992A (en) | 2004-10-29 | 2005-02-10 | Ebara Corp | Detection method of polishing endpoint |
US20070108066A1 (en) * | 2005-10-28 | 2007-05-17 | Applied Materials, Inc. | Voltage mode current control |
JP5060755B2 (en) | 2006-09-29 | 2012-10-31 | Sumco Techxiv株式会社 | Semiconductor wafer rough polishing method and semiconductor wafer polishing apparatus |
KR101357290B1 (en) * | 2006-10-06 | 2014-01-28 | 가부시끼가이샤 도시바 | Processing end point detection method, polishing method, and polishing apparatus |
US8870625B2 (en) * | 2007-11-28 | 2014-10-28 | Ebara Corporation | Method and apparatus for dressing polishing pad, profile measuring method, substrate polishing apparatus, and substrate polishing method |
JP6046933B2 (en) * | 2012-07-10 | 2016-12-21 | 株式会社荏原製作所 | Polishing method |
JP6196858B2 (en) * | 2012-09-24 | 2017-09-13 | 株式会社荏原製作所 | Polishing method and polishing apparatus |
JP5863614B2 (en) * | 2012-09-28 | 2016-02-16 | 株式会社荏原製作所 | Polishing equipment |
TWI530360B (en) * | 2012-09-28 | 2016-04-21 | 荏原製作所股份有限公司 | Polishing apparatus |
JP5990074B2 (en) * | 2012-09-28 | 2016-09-07 | 株式会社荏原製作所 | Polishing equipment |
JP6030041B2 (en) * | 2013-11-01 | 2016-11-24 | 株式会社荏原製作所 | Polishing apparatus and polishing method |
JP6327958B2 (en) * | 2014-06-03 | 2018-05-23 | 株式会社荏原製作所 | Polishing equipment |
SG10201803908SA (en) * | 2014-09-02 | 2018-06-28 | Ebara Corp | End point detection method, polishing apparatus, and polishing method |
US10744617B2 (en) * | 2015-10-16 | 2020-08-18 | Ebara Corporation | Polishing endpoint detection method |
-
2015
- 2015-08-27 SG SG10201803908SA patent/SG10201803908SA/en unknown
- 2015-08-27 CN CN201580047764.9A patent/CN106604802B/en active Active
- 2015-08-27 KR KR1020177006188A patent/KR102388170B1/en active IP Right Grant
- 2015-08-27 WO PCT/JP2015/074254 patent/WO2016035673A1/en active Application Filing
- 2015-08-27 SG SG11201701152WA patent/SG11201701152WA/en unknown
- 2015-08-27 US US15/508,034 patent/US10759019B2/en active Active
- 2015-08-31 TW TW104128583A patent/TWI678259B/en active
-
2020
- 2020-07-21 US US16/934,329 patent/US20200346318A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
KR102388170B1 (en) | 2022-04-19 |
SG11201701152WA (en) | 2017-04-27 |
TW201620669A (en) | 2016-06-16 |
US20200346318A1 (en) | 2020-11-05 |
CN106604802B (en) | 2019-05-31 |
CN106604802A (en) | 2017-04-26 |
US20170282325A1 (en) | 2017-10-05 |
WO2016035673A1 (en) | 2016-03-10 |
TWI678259B (en) | 2019-12-01 |
US10759019B2 (en) | 2020-09-01 |
KR20170048397A (en) | 2017-05-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
SG10201803908SA (en) | End point detection method, polishing apparatus, and polishing method | |
MX2016003877A (en) | Control method and device for adjusting photographing function, and apparatus. | |
EP4223200A3 (en) | Cleaning robot and controlling method thereof | |
EP3531525A4 (en) | Voltage/reactive power operation assisting device and assisting method, and voltage/reactive power operation monitoring control device and monitoring control method | |
WO2014208066A3 (en) | Electronic apparatus, method of controlling electronic apparatus, power reception device, electric device, and system | |
MX2016012293A (en) | Information presentation device and information presentation method. | |
PH12014000198A1 (en) | Stepping motor control device, optical apparatus, stepping motor control method, and program | |
EP3023862A3 (en) | Power control method and apparatus for reducing power consumption | |
WO2013147324A3 (en) | Electric tool and fastening method using the same | |
EP2760124A3 (en) | Power tool having a brushless motor and a control unit for controlling the brushless motor | |
EP2827219A3 (en) | Mobile terminal and method of controlling the same with tap detection | |
EP2760125A3 (en) | Motor control apparatus and method | |
EP3217537A4 (en) | Motor control device, electric power steering device, and method for detecting inverter-system failure | |
EP3026449A3 (en) | System and method of electric motor fault detection | |
EP3018038A3 (en) | Electric power steering system | |
WO2015003919A3 (en) | Apparatus and method for stretching a pelt on a pelt board | |
EP2636484A3 (en) | Eyeglass lens processing apparatus | |
EP2830175A3 (en) | Inverter control apparatus and control method thereof | |
EP3139490A4 (en) | Ac rotating machine control device and control method, and electric power steering device | |
EP2779430A3 (en) | Motor control system for determining a reference d-axis current and a q-axis current | |
MX359440B (en) | Camshaft position determination. | |
EP3002951A3 (en) | Display apparatus and control system and method for same | |
WO2013087150A3 (en) | Method and apparatus for controlling an electric motor on the basis of temperature | |
TW201614428A (en) | Wearable device, method of controlling the same, and mobile device configured to control the same | |
JP2016067067A5 (en) |