JP2016132035A5 - - Google Patents

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Publication number
JP2016132035A5
JP2016132035A5 JP2016005742A JP2016005742A JP2016132035A5 JP 2016132035 A5 JP2016132035 A5 JP 2016132035A5 JP 2016005742 A JP2016005742 A JP 2016005742A JP 2016005742 A JP2016005742 A JP 2016005742A JP 2016132035 A5 JP2016132035 A5 JP 2016132035A5
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JP
Japan
Prior art keywords
laser beam
workpiece
view
field
engaging
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JP2016005742A
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English (en)
Japanese (ja)
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JP6159428B2 (ja
JP2016132035A (ja
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Priority claimed from US14/599,612 external-priority patent/US10357848B2/en
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JP2016005742A 2015-01-19 2016-01-15 レーザ加工システム及び方法 Active JP6159428B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/599,612 US10357848B2 (en) 2015-01-19 2015-01-19 Laser machining systems and methods
US14/599,612 2015-01-19

Publications (3)

Publication Number Publication Date
JP2016132035A JP2016132035A (ja) 2016-07-25
JP2016132035A5 true JP2016132035A5 (https=) 2017-06-15
JP6159428B2 JP6159428B2 (ja) 2017-07-05

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JP2016005742A Active JP6159428B2 (ja) 2015-01-19 2016-01-15 レーザ加工システム及び方法

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US (2) US10357848B2 (https=)
EP (1) EP3050664B1 (https=)
JP (1) JP6159428B2 (https=)
CN (1) CN105798455B (https=)
BR (1) BR102016001021A2 (https=)
CA (1) CA2917563C (https=)

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JP2019512397A (ja) * 2016-03-17 2019-05-16 エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド レーザ加工システムにおける像平面の配置
CN109530928B (zh) * 2018-12-27 2021-03-05 北京中科镭特电子有限公司 一种激光加工芯片的方法及装置
JP7299597B2 (ja) * 2018-12-27 2023-06-28 国立大学法人 東京大学 レーザ加工におけるレーザ光強度への依存性の判定方法及びレーザ加工装置
CN109530929B (zh) * 2018-12-27 2021-03-19 北京中科镭特电子有限公司 一种激光加工芯片的方法
CN110181172B (zh) * 2019-06-06 2024-08-20 武汉华工激光工程有限责任公司 一种激光加工陶瓷异形槽的装置及方法
DE102019125124A1 (de) * 2019-09-18 2021-03-18 Rogers Germany Gmbh Verfahren zum Bearbeiten eines Metall-Keramik-Substrats, Anlage für ein solches Verfahren und Metall-Keramik-Substrate hergestellt mit einem solchen Verfahren
DE102019134004A1 (de) 2019-12-11 2021-06-17 Rogers Germany Gmbh Verfahren zum Bearbeiten eines Metall-Keramik-Substrats, Anlage für ein solches Verfahren und Metall-Keramik-Substrate hergestellt mit einem solchen Verfahren
KR102324548B1 (ko) * 2019-12-31 2021-11-10 (주)미래컴퍼니 레이저 가공 시스템 및 레이저 가공 방법
CN111098043B (zh) * 2020-01-19 2024-12-27 中国科学院宁波材料技术与工程研究所 水导激光加工装置和加工系统
JP7599776B2 (ja) 2020-10-02 2024-12-16 株式会社ディスコ 被加工物の加工方法
KR102921493B1 (ko) * 2021-01-27 2026-02-02 삼성디스플레이 주식회사 표시 장치의 제조장치
CN115301636A (zh) * 2022-08-12 2022-11-08 阳程科技股份有限公司 激光除胶方法及采用该方法的除胶设备

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