JP2016121333A - フォトマスクとして使用するのに適した水分散性相変化インク - Google Patents
フォトマスクとして使用するのに適した水分散性相変化インク Download PDFInfo
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- JP2016121333A JP2016121333A JP2015233144A JP2015233144A JP2016121333A JP 2016121333 A JP2016121333 A JP 2016121333A JP 2015233144 A JP2015233144 A JP 2015233144A JP 2015233144 A JP2015233144 A JP 2015233144A JP 2016121333 A JP2016121333 A JP 2016121333A
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- MESJRHHDBDCQTH-UHFFFAOYSA-N 3-(dimethylamino)phenol Chemical compound CN(C)C1=CC=CC(O)=C1 MESJRHHDBDCQTH-UHFFFAOYSA-N 0.000 description 1
- UJAWGGOCYUPCPS-UHFFFAOYSA-N 4-(2-phenylpropan-2-yl)-n-[4-(2-phenylpropan-2-yl)phenyl]aniline Chemical compound C=1C=C(NC=2C=CC(=CC=2)C(C)(C)C=2C=CC=CC=2)C=CC=1C(C)(C)C1=CC=CC=C1 UJAWGGOCYUPCPS-UHFFFAOYSA-N 0.000 description 1
- XWLYWWDJKAPLDA-UHFFFAOYSA-N 4-(diethylaminomethyl)-2,5-dimethylphenol Chemical compound CCN(CC)CC1=CC(C)=C(O)C=C1C XWLYWWDJKAPLDA-UHFFFAOYSA-N 0.000 description 1
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- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
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- XXUJMEYKYHETBZ-UHFFFAOYSA-N ethyl 4-nitrophenyl ethylphosphonate Chemical compound CCOP(=O)(CC)OC1=CC=C([N+]([O-])=O)C=C1 XXUJMEYKYHETBZ-UHFFFAOYSA-N 0.000 description 1
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- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical class [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
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- AJDUTMFFZHIJEM-UHFFFAOYSA-N n-(9,10-dioxoanthracen-1-yl)-4-[4-[[4-[4-[(9,10-dioxoanthracen-1-yl)carbamoyl]phenyl]phenyl]diazenyl]phenyl]benzamide Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2NC(=O)C(C=C1)=CC=C1C(C=C1)=CC=C1N=NC(C=C1)=CC=C1C(C=C1)=CC=C1C(=O)NC1=CC=CC2=C1C(=O)C1=CC=CC=C1C2=O AJDUTMFFZHIJEM-UHFFFAOYSA-N 0.000 description 1
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- 229910052757 nitrogen Inorganic materials 0.000 description 1
- NRZWYNLTFLDQQX-UHFFFAOYSA-N p-tert-Amylphenol Chemical compound CCC(C)(C)C1=CC=C(O)C=C1 NRZWYNLTFLDQQX-UHFFFAOYSA-N 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
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- IMFACGCPASFAPR-UHFFFAOYSA-O tributylazanium Chemical compound CCCC[NH+](CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-O 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/32—Inkjet printing inks characterised by colouring agents
- C09D11/328—Inkjet printing inks characterised by colouring agents characterised by dyes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/34—Hot-melt inks
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/17—Amines; Quaternary ammonium compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/12—Printing inks based on waxes or bitumen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/50—Sympathetic, colour changing or similar inks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
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- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
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- Inks, Pencil-Leads, Or Crayons (AREA)
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Abstract
【解決手段】少なくとも1つのエトキシル部分を有する親水性ワックス、少なくとも1つのヒドロキシル基を有し親水性ワックスと混和性である低粘度ワックス、任意の安定剤、及び、遮断したい領域における光を吸収するように選択された着色剤よりなる水分散性相変化インク組成物、水分散性相変化インク組成物を含むインクジェットプリンタのスティック又はペレット。更には、水分散性相変化インク組成物を使用し、光画像化ステンシルを形成する方法。
【選択図】なし
Description
インク実施例を、表1に提供した成分を有するように調製した。前記インクを、表1に示した量の成分を、マグネチックスターラー及びヒーターを備えるビーカー中で組合せ、約130℃の温度に加熱し、約2時間の期間攪拌することにより調製した。ついで、前記インクを、1μmのろ紙でろ過して、所望のインクを得た。
DuPont2100熱量計を使用して、10℃/分のスキャン速度で、示差走査熱量計により、融点を測定した。
Claims (10)
- 水分散性相変化インク組成物であって、
少なくとも1つのエトキシル部分を有する親水性ワックス、
少なくとも1つのヒドロキシル基を有する低粘度ワックスであって、前記低粘度ワックスが、前記親水性ワックスと混和性である低粘度ワックス、
任意の安定剤、及び、
着色剤であって、前記着色剤が、遮断したい領域における光を吸収するように選択された着色剤を含む、
水分散性相変化インク組成物。 - 前記着色剤が、可視域における光を吸収するように選択された着色剤である、請求項1記載の水分散性相変化インク組成物。
- 前記着色剤が、紫外域における光を吸収するように選択された着色剤である、請求項1記載の水分散性相変化インク組成物。
- 前記着色剤が、紫外域における光を吸収するように選択された黒色染料である、請求項1記載の水分散性相変化インク組成物。
- 水分散性相変化インク組成物を含むインクジェットプリンタのスティック又はペレットであって、
前記相変化インク組成物が、
少なくとも1つのエトキシル部分を有する親水性ワックス、
少なくとも1つのヒドロキシル基を有する低粘度ワックスであって、前記低粘度ワックスが、前記親水性ワックスと混和性である低粘度ワックス、
任意の安定剤であって、存在する場合、前記任意の安定剤が、芳香族アミン、ヒンダードアミン、フェノール並びにそれらの混合物及び組合せからなる群から選択される安定剤、及び、
着色剤であって、前記着色剤が、遮断したい領域における光を吸収するように選択された着色剤を含む、
インクジェットプリンタのスティック又はペレット。 - 前記着色剤が、可視域又は紫外域における光を吸収するように選択された着色剤である、請求項5記載のインクジェットプリンタのスティック又はペレット。
- 前記着色剤が、紫外域における光を吸収するように選択された黒色染料である、請求項5記載のインクジェットプリンタのスティック又はペレット。
- 水分散性相変化インク組成物を、スクリーン上に配置された感光性エマルジョンフィルム上に配置して、マスクを形成する工程であって、前記水分散性相変化インク組成物が、少なくとも1つのエトキシル部分を有する親水性ワックス、少なくとも1つのヒドロキシル基を有する低粘度ワックスであって、前記低粘度ワックスが、前記親水性ワックスと混和性である低粘度ワックス、任意の安定剤、及び、着色剤であって、前記着色剤が、遮断したい領域における光を吸収するように選択された着色剤を含む工程、
前記マスクを照射に曝して、ステンシルを形成する工程、及び、
水で洗浄して、前記マスクを除去し、光画像化ステンシルを残す工程を含む、
方法。 - 前記親水性ワックスが、エトキシル化炭化水素ワックス、エトキシル化アルコール並びにそれらの混合物及び組合せからなる群から選択される、請求項8記載の方法。
- 前記低粘度ワックスが、約80℃から約120℃の範囲の温度において、約1から約15センチポイズの粘度を有するワックスである、請求項8記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US14/569,678 US9481803B2 (en) | 2014-12-13 | 2014-12-13 | Water dispersible phase change ink suitable for use as a photo-mask |
US14/569,678 | 2014-12-13 |
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JP2016121333A true JP2016121333A (ja) | 2016-07-07 |
JP2016121333A5 JP2016121333A5 (ja) | 2018-12-27 |
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US (1) | US9481803B2 (ja) |
JP (1) | JP2016121333A (ja) |
KR (1) | KR102255881B1 (ja) |
CN (1) | CN105694592B (ja) |
DE (1) | DE102015223783B4 (ja) |
RU (1) | RU2690438C2 (ja) |
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- 2014-12-13 US US14/569,678 patent/US9481803B2/en active Active
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- 2015-11-26 RU RU2015150764A patent/RU2690438C2/ru active
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RU2690438C2 (ru) | 2019-06-03 |
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RU2015150764A (ru) | 2017-06-02 |
CN105694592B (zh) | 2018-12-25 |
DE102015223783B4 (de) | 2022-05-05 |
DE102015223783A1 (de) | 2016-06-16 |
US20160168403A1 (en) | 2016-06-16 |
CN105694592A (zh) | 2016-06-22 |
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