JP2016118563A - パターン化構造の光学検査を最適化するための方法およびシステム - Google Patents
パターン化構造の光学検査を最適化するための方法およびシステム Download PDFInfo
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Images
Classifications
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- G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
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- G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
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Abstract
Description
26 3次元形
100 モデリングシステム
100A 入力/出力ユーティリティ
100B メモリユーティリティ
100C データ処理/分析ユーティリティ
200 モデリング(コンピューティング)システム
Claims (1)
- パターン化構造の検査で使用するシステムであって、
前記パターン化構造の少なくとも一部に関するイメージデータを示す第1のタイプのデータを受信するためのデータ入力ユーティリティと、
前記イメージデータを分析し、前記構造におけるパターンの少なくとも1つの特徴に関する形状モデルを決定し、前記形状モデルを使用して、パターン化構造に対する光学測定を示す第2のタイプのデータに関する光学モデルを決定するように構成され、動作可能なデータ処理/分析ユーティリティと
を備えるシステム。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US35557110P | 2010-06-17 | 2010-06-17 | |
US61/355,571 | 2010-06-17 |
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JP2013514839A Division JP5876040B2 (ja) | 2010-06-17 | 2011-06-16 | パターン化構造の光学検査を最適化するための方法およびシステム |
Publications (2)
Publication Number | Publication Date |
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JP2016118563A true JP2016118563A (ja) | 2016-06-30 |
JP6463701B2 JP6463701B2 (ja) | 2019-02-06 |
Family
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JP2013514839A Active JP5876040B2 (ja) | 2010-06-17 | 2011-06-16 | パターン化構造の光学検査を最適化するための方法およびシステム |
JP2016008542A Active JP6463701B2 (ja) | 2010-06-17 | 2016-01-20 | パターン化構造の光学検査を最適化するための方法およびシステム |
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JP2013514839A Active JP5876040B2 (ja) | 2010-06-17 | 2011-06-16 | パターン化構造の光学検査を最適化するための方法およびシステム |
Country Status (7)
Country | Link |
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US (6) | US20140079312A9 (ja) |
EP (1) | EP2583056B1 (ja) |
JP (2) | JP5876040B2 (ja) |
KR (1) | KR101930913B1 (ja) |
IL (1) | IL223629A (ja) |
TW (1) | TWI569005B (ja) |
WO (1) | WO2011158239A1 (ja) |
Cited By (3)
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US10156435B1 (en) | 2017-09-19 | 2018-12-18 | Toshiba Memory Corporation | Shape measuring apparatus and shape measuring method |
KR20190095347A (ko) * | 2016-12-15 | 2019-08-14 | 꼼미사리아 아 레네르지 아토미끄 에뜨 옥스 에너지스 앨터네이티브즈 | Cd-sem 주사 전자 현미경에 의한 특성화에 대한 방법 |
KR20210005149A (ko) * | 2018-05-24 | 2021-01-13 | 에이에스엠엘 네델란즈 비.브이. | 기판의 스택 구성을 결정하는 방법 |
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US9222895B2 (en) | 2013-02-25 | 2015-12-29 | Kla-Tencor Corp. | Generalized virtual inspector |
KR102214643B1 (ko) | 2013-07-08 | 2021-02-10 | 노바 메주어링 인스트루먼츠 엘티디. | 샘플 내 응력변형 분포 결정 방법 및 시스템 |
FR3012894B1 (fr) * | 2013-11-07 | 2017-02-17 | Commissariat Energie Atomique | Systeme informatique pour l'exploitation de mesures heterogenes issues de differents appareils de metrologie en vue de l'estimation de valeurs de caracteristiques de dispositifs microelectroniques, procede et programme d'ordinateur correspondants |
US20170018069A1 (en) * | 2014-02-23 | 2017-01-19 | Globalfoundries Inc. | Hybrid metrology technique |
US9816939B2 (en) | 2014-07-22 | 2017-11-14 | Kla-Tencor Corp. | Virtual inspection systems with multiple modes |
CN105571484B (zh) * | 2014-10-14 | 2018-07-06 | 睿励科学仪器(上海)有限公司 | 确定测量模式和光学系统参数容差的方法和装置 |
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JP6418606B2 (ja) * | 2015-08-07 | 2018-11-07 | 東芝メモリ株式会社 | パターン輪郭抽出装置、パターン輪郭抽出方法およびパターン輪郭抽出プログラム |
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KR20200139800A (ko) * | 2018-04-06 | 2020-12-14 | 램 리써치 코포레이션 | Cd-sem을 사용한 프로세스 시뮬레이션 모델 캘리브레이션 |
US10572697B2 (en) | 2018-04-06 | 2020-02-25 | Lam Research Corporation | Method of etch model calibration using optical scatterometry |
WO2019200015A1 (en) | 2018-04-10 | 2019-10-17 | Lam Research Corporation | Optical metrology in machine learning to characterize features |
WO2019199697A1 (en) | 2018-04-10 | 2019-10-17 | Lam Research Corporation | Resist and etch modeling |
US10977405B2 (en) | 2019-01-29 | 2021-04-13 | Lam Research Corporation | Fill process optimization using feature scale modeling |
WO2020121565A1 (ja) * | 2019-07-04 | 2020-06-18 | 株式会社日立ハイテク | 三次元形状検出装置、方法、及びプラズマ処理装置 |
WO2021140508A1 (en) * | 2020-01-06 | 2021-07-15 | Nova Measuring Instruments Ltd. | Self-supervised representation learning for interpretation of ocd data |
KR20220123303A (ko) * | 2020-01-07 | 2022-09-06 | 노바 엘티디. | Ocd 계측 머신 학습에 대한 이상치 및 이상 검출 시스템 및 방법 |
KR102409758B1 (ko) * | 2020-06-01 | 2022-06-17 | 파크시스템스 주식회사 | 광학 측정 장치가 장착된 원자 현미경 및 이를 이용하여 측정 대상의 표면의 정보를 얻는 방법 |
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- 2011-06-16 EP EP11748750.4A patent/EP2583056B1/en active Active
- 2011-06-16 JP JP2013514839A patent/JP5876040B2/ja active Active
- 2011-06-16 WO PCT/IL2011/000479 patent/WO2011158239A1/en active Application Filing
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KR102483920B1 (ko) | 2016-12-15 | 2023-01-02 | 꼼미사리아 아 레네르지 아토미끄 에뜨 옥스 에너지스 앨터네이티브즈 | Cd-sem 주사 전자 현미경에 의한 특성화에 대한 방법 |
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KR20210005149A (ko) * | 2018-05-24 | 2021-01-13 | 에이에스엠엘 네델란즈 비.브이. | 기판의 스택 구성을 결정하는 방법 |
KR102580667B1 (ko) | 2018-05-24 | 2023-09-21 | 에이에스엠엘 네델란즈 비.브이. | 기판의 스택 구성을 결정하는 방법 |
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US20230401690A1 (en) | 2023-12-14 |
IL223629A (en) | 2017-05-29 |
JP5876040B2 (ja) | 2016-03-02 |
US20210090244A1 (en) | 2021-03-25 |
US20130208973A1 (en) | 2013-08-15 |
US9904993B2 (en) | 2018-02-27 |
JP6463701B2 (ja) | 2019-02-06 |
KR20130047731A (ko) | 2013-05-08 |
KR101930913B1 (ko) | 2018-12-19 |
EP2583056A1 (en) | 2013-04-24 |
TWI569005B (zh) | 2017-02-01 |
US20200058118A1 (en) | 2020-02-20 |
EP2583056B1 (en) | 2018-12-12 |
TW201215879A (en) | 2012-04-16 |
JP2013531794A (ja) | 2013-08-08 |
WO2011158239A1 (en) | 2011-12-22 |
US20140079312A9 (en) | 2014-03-20 |
US20160284077A1 (en) | 2016-09-29 |
US20180182089A1 (en) | 2018-06-28 |
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