JP2016105077A5 - - Google Patents

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JP2016105077A5
JP2016105077A5 JP2015215353A JP2015215353A JP2016105077A5 JP 2016105077 A5 JP2016105077 A5 JP 2016105077A5 JP 2015215353 A JP2015215353 A JP 2015215353A JP 2015215353 A JP2015215353 A JP 2015215353A JP 2016105077 A5 JP2016105077 A5 JP 2016105077A5
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Japan
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probe
sample
charged particle
workpiece
particle beam
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JP2015215353A
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Japanese (ja)
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JP2016105077A (ja
JP6552383B2 (ja
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JP2015215353A 2014-11-07 2015-11-01 自動化されたｔｅｍ試料調製 Active JP6552383B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201462077148P 2014-11-07 2014-11-07
US62/077,148 2014-11-07

Publications (3)

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JP2016105077A JP2016105077A (ja) 2016-06-09
JP2016105077A5 true JP2016105077A5 (cg-RX-API-DMAC7.html) 2018-12-13
JP6552383B2 JP6552383B2 (ja) 2019-07-31

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JP2015215353A Active JP6552383B2 (ja) 2014-11-07 2015-11-01 自動化されたｔｅｍ試料調製

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US (3) US9601313B2 (cg-RX-API-DMAC7.html)
EP (1) EP3018693B1 (cg-RX-API-DMAC7.html)
JP (1) JP6552383B2 (cg-RX-API-DMAC7.html)
KR (1) KR101970478B1 (cg-RX-API-DMAC7.html)
CN (1) CN105588742A (cg-RX-API-DMAC7.html)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10088401B2 (en) * 2014-06-30 2018-10-02 Hitachi High-Tech Science Corporation Automatic sample preparation apparatus
JP6552383B2 (ja) * 2014-11-07 2019-07-31 エフ・イ−・アイ・カンパニー 自動化されたｔｅｍ試料調製
US9837246B1 (en) 2016-07-22 2017-12-05 Fei Company Reinforced sample for transmission electron microscope
JP7113613B2 (ja) 2016-12-21 2022-08-05 エフ イー アイ カンパニ 欠陥分析
JP6885576B2 (ja) * 2017-01-19 2021-06-16 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
JP6931214B2 (ja) * 2017-01-19 2021-09-01 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
DE102017202339B3 (de) 2017-02-14 2018-05-24 Carl Zeiss Microscopy Gmbh Strahlsystem mit geladenen Teilchen und Verfahren dafür
US10303829B2 (en) 2017-05-31 2019-05-28 International Business Machines Corporation Automated method for integrated analysis of back end of the line yield, line resistance/capacitance and process performance
DE102017212020B3 (de) 2017-07-13 2018-05-30 Carl Zeiss Microscopy Gmbh Verfahren zur In-situ-Präparation und zum Transfer mikroskopischer Proben, Computerprogrammprodukt sowie mikroskopische Probe
JP7109051B2 (ja) * 2018-03-30 2022-07-29 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
DE102018108974B3 (de) * 2018-04-16 2019-05-09 Carl Zeiss Microscopy Gmbh Verfahren zum Herstellen einer TEM-Probe
DE102018206278A1 (de) 2018-04-24 2019-10-24 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Entfernen eines Partikels von einer photolithographischen Maske
DE102018210098B4 (de) 2018-06-21 2022-02-03 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zum Untersuchen und/oder zum Bearbeiten einer Probe
DE102018010436B4 (de) 2018-06-21 2025-01-23 Carl Zeiss Smt Gmbh Vorrichtung zum Untersuchen und/oder zum Bearbeiten einer Probe
CN109011030B (zh) * 2018-08-08 2021-02-09 长沙理工大学 自动注射仪器针头的位置检测矫正方法及装置
CN110514679B (zh) * 2019-09-16 2021-04-30 南京大学 一种带有活动拉曼针尖探头的透射电镜原位反应舱芯片及其使用方法
US11355305B2 (en) * 2019-10-08 2022-06-07 Fei Company Low keV ion beam image restoration by machine learning for object localization
CN110554063B (zh) * 2019-10-21 2021-10-12 长江存储科技有限责任公司 一种tem样品以及制备tem样品的方法
CN111537533B (zh) * 2020-03-24 2023-06-30 天津华慧芯科技集团有限公司 一种尖晶石微米颗粒的球差矫正tem样品制备方法
DE102020112220B9 (de) * 2020-05-06 2022-05-25 Carl Zeiss Microscopy Gmbh Teilchenstrahlgerät zum Abtragen mindestens eines Materials von einer Materialeinheit und Anordnen des Materials an einem Objekt
GB202013591D0 (en) * 2020-08-28 2020-10-14 Oxford Instr Nanotechnology Ltd Sample preparation and method aparatus
EP4068333A1 (en) * 2021-03-31 2022-10-05 FEI Company Sample carrier for use in a charged particle microscope, and a method of using such a sample carrier in a charged particle microscope
DE102021205001B4 (de) 2021-05-18 2023-07-27 Carl Zeiss Microscopy Gmbh Verfahren zum Positionieren von Objekten in einem Teilchenstrahlmikroskop mithilfe einer flexiblen Teilchenstrahlschranke sowie Computerprogrammprodukt
CN114858828A (zh) * 2022-02-23 2022-08-05 厦门士兰集科微电子有限公司 透射电子显微镜样品的制备方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0542524Y2 (cg-RX-API-DMAC7.html) * 1987-11-18 1993-10-26
JPH03230696A (ja) * 1990-02-05 1991-10-14 Nec Corp 移動体速度検知装置
JP2774884B2 (ja) * 1991-08-22 1998-07-09 株式会社日立製作所 試料の分離方法及びこの分離方法で得た分離試料の分析方法
JP3613039B2 (ja) * 1998-12-02 2005-01-26 株式会社日立製作所 試料作製装置
US6405584B1 (en) * 1999-10-05 2002-06-18 Agere Systems Guardian Corp. Probe for scanning probe microscopy and related methods
WO2002095378A1 (en) * 2000-05-22 2002-11-28 Moore Thomas M Method for sample separation and lift-out
US6889113B2 (en) 2001-08-23 2005-05-03 Fei Company Graphical automated machine control and metrology
JP2003156539A (ja) * 2001-11-26 2003-05-30 Hitachi Ltd 評価装置および評価方法
CN1871684B (zh) * 2003-09-23 2011-08-24 塞威仪器公司 采用fib准备的样本的抓取元件的显微镜检查的方法、系统和设备
JP2005147671A (ja) * 2003-11-11 2005-06-09 Hitachi Ltd 荷電粒子線調整方法および装置
JP4130798B2 (ja) * 2003-12-05 2008-08-06 株式会社日立ハイテクノロジーズ プローブ付き複合顕微鏡及びプローブ駆動方法
WO2006138593A2 (en) * 2005-06-16 2006-12-28 Imago Scientific Instruments Corporation Atom probe component treatments
JP2007018935A (ja) * 2005-07-08 2007-01-25 Hitachi High-Technologies Corp プローブ付き顕微鏡及びプローブ接触方法
WO2008049134A2 (en) * 2006-10-20 2008-04-24 Fei Company Method for s/tem sample analysis
WO2008051880A2 (en) * 2006-10-20 2008-05-02 Fei Company Method and apparatus for sample extraction and handling
JP2008210732A (ja) * 2007-02-28 2008-09-11 Hitachi High-Technologies Corp 荷電粒子ビーム装置
US7834315B2 (en) * 2007-04-23 2010-11-16 Omniprobe, Inc. Method for STEM sample inspection in a charged particle beam instrument
JP5537058B2 (ja) * 2009-03-30 2014-07-02 株式会社日立ハイテクノロジーズ 試料作製装置、及び試料作製装置における制御方法
JP5537653B2 (ja) * 2010-04-16 2014-07-02 株式会社日立ハイテクノロジーズ イオンビーム装置およびイオンビーム加工方法
JP6224612B2 (ja) * 2011-12-01 2017-11-01 エフ・イ−・アイ・カンパニー 断面観察薄片の裏側薄化用の高スループットｔｅｍ調製プロセスおよびハードウェア
US10465293B2 (en) * 2012-08-31 2019-11-05 Fei Company Dose-based end-pointing for low-kV FIB milling TEM sample preparation
US10088401B2 (en) * 2014-06-30 2018-10-02 Hitachi High-Tech Science Corporation Automatic sample preparation apparatus
JP6552383B2 (ja) * 2014-11-07 2019-07-31 エフ・イ−・アイ・カンパニー 自動化されたｔｅｍ試料調製

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