JP2016103641A - ネオジム磁石の絶縁接着方法及び積層ネオジム磁石の押圧装置 - Google Patents
ネオジム磁石の絶縁接着方法及び積層ネオジム磁石の押圧装置 Download PDFInfo
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Abstract
Description
また、以下に示す特許文献も存在するが、いずれも接着後の絶縁性に課題を有するものであった。
本願発明は、複数個のネオジム磁石を絶縁継ぎ目によって接着する際、継ぎ目の厚さを調整し、かつ確実な接着を実現するため、順次以下の工程を有するものである。
まず、接着対象とする四角形等に加工するネオジム磁石1を用意する。当該ネオジム磁石1は焼結ネオジム磁石又は重希土類拡散後のネオジム磁石であり、重希土類はTb又はDyである。
接着前の下処理として、磁石表面のリン酸塩処理後、可能な限り外界との接触を減らし、埃や油汚れによる汚染を防止する。次に、ネオジム磁石1をアルコール、ナフサ、アセトン、イソプロパノール等を含む脱脂溶液で複数回拭き、錆や油染みがなくなるまで拭き取り、低温プラズマ洗浄機に投入し、ガスを送る。ガスは、空気、アルゴンガス、窒素ガスのうちの一種であり、処理時間は≦10minであり、処理後、低温プラズマ洗浄機から取り出し、表面活性化処理を行う。
以上説明した本願発明の方法と装置を用い、焼結ネオジム磁石の接着に適用する例を説明する。
焼結ネオジム磁石をリン酸塩処理した後、アルコール、ナフサ、アセトン及びイソプロパノールによって、表面に腐食や油脂がなくなるまで洗浄、脱脂した後、低温イオン洗浄を実施し、表面活性化処理を行う。焼結ネオジム磁石の接着を要する表面に絶縁接着剤を均一に塗布する。絶縁接着剤はエポキシ樹脂であり、絶縁接着剤の一次硬化処理の温度は20℃、処理時間は24時間、絶縁接着剤層の厚さは1µmである。2片のネオジム磁石を積層し、積層したネオジム磁石間の絶縁接着剤層の厚さは2µmである。押圧装置を使用して位置を固定し、接着方向に0.1Mpaの圧力を加え、さらに150℃、処理時間は12時間の二次硬化処理を行う。硬化終了後に室温まで冷却し、接着後のネオジム磁石を目標の寸法となるようワイヤーカット加工し、外表面に被膜層を形成する。被膜層の原料はエポキシ樹脂であり、被膜層の厚さは8µmである。
本願発明の方法と装置を用い、重希土類Tb拡散後のネオジム磁石の接着に適用する例を説明する。
重希土類Tb拡散後のネオジム磁石を、リン酸塩処理した後、アルコール、ナフサ、アセトン及びイソプロパノールによって、表面に腐食や油脂がなくなるまで洗浄、脱脂した後、低温イオン洗浄を実施し、表面活性化処理を行う。ネオジム磁石の接着を要する表面に刷毛塗りによって絶縁接着剤を均一に塗布する。絶縁接着剤はフェノール樹脂であり、絶縁接着剤の一次硬化処理の温度は135℃、処理時間は12時間であり、絶縁接着剤層の厚さは50µmである。12枚のネオジム磁石を積層し、積層したネオジム磁石間の絶縁接着剤層の厚さは100µmであり、押圧装置を使用して位置を固定し、接着方向に5Mpaの圧力を加え、250℃、処理時間は6時間の二次硬化処理を行う。硬化終了後に室温まで冷却し、接着後のネオジム磁石を目標の寸法となるようマルチワイヤーカット加工し、外表面に被膜層を形成する。被膜層の原料はフェノール樹脂であり、被膜層の厚さは29µmである。
本願発明の方法と装置を用い、重希土類Dy拡散後のネオジム磁石の接着に適用する例を説明する。
重希土類Dy拡散後のネオジム磁石を、リン酸塩処理した後、アルコール、ナフサ、アセトン及びイソプロパノールによって、表面に腐食や油脂がなくなるまで洗浄、脱脂してから、低温イオン洗浄を実施し、表面活性化処理を行う。ネオジム磁石の接着を要する表面に、エポキシ樹脂とフェノール樹脂を混合した絶縁接着剤を均一にローラー塗布し、絶縁接着剤の一次硬化処理の温度は250℃、処理時間は0.1時間であり、絶縁接着剤層の厚さは100µmである。25片のネオジム磁石を積層し、積層したネオジム磁石の絶縁接着剤層の厚さは200µmであり、押圧装置を使用して位置を固定し、接着方向に10Mpaの圧力を加え、350℃、処理時間は0.1時間の二次硬化処理を行う。硬化終了後に室温まで冷却し、接着後のネオジム磁石を目標の寸法となるようスライサ加工し、外表面に被膜層を形成する。被膜層の原料はフェノール樹脂であり、被膜層の厚さは50µmである。
2 絶縁接着剤層
3 ボルト
4 磁石位置決め装置
5 中間ガイドレール
6 上押圧板
7 下押圧板
Claims (11)
- ネオジム磁石の絶縁接着方法であって、
前記ネオジム磁石の表面を脱脂し、活性化処理を行う工程と、
前記ネオジム磁石の接着を要する表面に、絶縁接着剤を1〜100µmの厚さで均一に塗布する工程と、
前記絶縁接着剤が塗布された前記ネオジム磁石をオーブンに入れ、20℃〜250℃の温度下で、0.1〜24時間放置して、前記絶縁接着剤を一次硬化処理する工程と、
前記一次硬化処理後の前記ネオジム磁石を、前記絶縁接着剤が対面するように複数個積層し、位置を固定した後、接着方向に0.1Mpa〜10Mpaの圧力を加える工程と、
押圧積層した状態の前記ネオジム磁石をオーブンに入れ、150℃〜350℃の温度下で、0.1〜12時間放置して、前記絶縁接着剤を二次硬化処理する工程と、
前記ネオジム磁石を室温まで冷却する工程と、を含む、
ことを特徴とするネオジム磁石の絶縁接着方法。 - 接着後の前記ネオジム磁石に二次機械加工を行って目標の寸法に成形し、外表面に被膜層の形成を行う工程と、更に含む、
ことを特徴とする請求項1に記載のネオジム磁石の絶縁接着方法。 - 前記ネオジム磁石は、焼結ネオジム磁石又は重希土類拡散後のネオジム磁石である、
ことを特徴とする請求項1に記載のネオジム磁石の絶縁接着方法。 - 前記重希土類はTb又はDyを含む、
ことを特徴とする請求項3に記載のネオジム磁石の絶縁接着方法。 - 前記表面の脱脂処理、前記活性化処理は、前記ネオジム磁石にリン酸塩処理を行った後、アルコール、ナフサ、アセトン、イソプロパノールを用いて、表面に腐食、油脂がなくなるまで洗浄、脱脂し、その後低温イオン洗浄を行い、表面活性化処理を行う、
ことを特徴とする請求項1に記載のネオジム磁石の絶縁接着方法。 - 前記絶縁接着剤は熱硬化性樹脂である、
ことを特徴とする請求項1に記載のネオジム磁石の絶縁接着方法。 - 前記被膜層の形成方法は、吹付、刷毛塗り又はローラー塗布を含み、前記被膜層の厚さは8µm〜50µmである、
ことを特徴とする請求項2に記載のネオジム磁石の絶縁接着方法。 - 積層されたネオジム磁石間の絶縁接着剤層の厚さは2µm〜200µmである、
ことを特徴とする請求項1に記載のネオジム磁石の絶縁接着方法。 - 前記ネオジム磁石は2〜25片を積層して接着する、
ことを特徴とする請求項1に記載のネオジム磁石の絶縁接着方法。 - 前記二次機械加工は、ワイヤー切断、マルチワイヤー切断又はスライサ加工である、
ことを特徴とする請求項2に記載のネオジム磁石の絶縁接着方法。 - 請求項1〜10のいずれか一項に記載のネオジム磁石の絶縁接着方法の実施に用いられる押圧装置であって、
磁石位置決め装置と、
前記磁石位置決め装置の中間に均等に設けられた中間ガイドレールと、
前記磁石位置決め装置の上下にそれぞれ設けられた上押圧板及び下押圧板を含み、
前記上押圧板には貫通孔が設けられ、前記貫通孔の位置は前記磁石位置決め装置と前記中間ガイドレールの位置に対応し、
前記磁石位置決め装置にはボルトが設けられ、前記ボルトは前記上押圧板の上方に位置する、
ことを特徴とする積層ネオジム磁石の押圧装置。
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