JP2016082180A5 - - Google Patents

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Publication number
JP2016082180A5
JP2016082180A5 JP2014214964A JP2014214964A JP2016082180A5 JP 2016082180 A5 JP2016082180 A5 JP 2016082180A5 JP 2014214964 A JP2014214964 A JP 2014214964A JP 2014214964 A JP2014214964 A JP 2014214964A JP 2016082180 A5 JP2016082180 A5 JP 2016082180A5
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JP
Japan
Prior art keywords
plasma processing
frequency power
processing apparatus
plasma
power source
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Pending
Application number
JP2014214964A
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English (en)
Japanese (ja)
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JP2016082180A (ja
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Priority to JP2014214964A priority Critical patent/JP2016082180A/ja
Priority claimed from JP2014214964A external-priority patent/JP2016082180A/ja
Publication of JP2016082180A publication Critical patent/JP2016082180A/ja
Publication of JP2016082180A5 publication Critical patent/JP2016082180A5/ja
Pending legal-status Critical Current

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JP2014214964A 2014-10-22 2014-10-22 プラズマ処理装置 Pending JP2016082180A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014214964A JP2016082180A (ja) 2014-10-22 2014-10-22 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014214964A JP2016082180A (ja) 2014-10-22 2014-10-22 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JP2016082180A JP2016082180A (ja) 2016-05-16
JP2016082180A5 true JP2016082180A5 (enrdf_load_stackoverflow) 2017-08-17

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ID=55959264

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014214964A Pending JP2016082180A (ja) 2014-10-22 2014-10-22 プラズマ処理装置

Country Status (1)

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JP (1) JP2016082180A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10242845B2 (en) * 2017-01-17 2019-03-26 Lam Research Corporation Near-substrate supplemental plasma density generation with low bias voltage within inductively coupled plasma processing chamber
JP6976279B2 (ja) * 2019-03-25 2021-12-08 株式会社Kokusai Electric 基板処理装置、半導体装置の製造方法及びプログラム
US20230282448A1 (en) * 2020-07-15 2023-09-07 Lam Research Corporation Pulsing rf coils of a plasma chamber in reverse synchronization

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6632322B1 (en) * 2000-06-30 2003-10-14 Lam Research Corporation Switched uniformity control
JP4332894B2 (ja) * 2003-10-02 2009-09-16 セイコーエプソン株式会社 表面処理装置および表面処理方法
IES20050301A2 (en) * 2005-05-11 2006-11-15 Univ Dublin City Plasma source
JP4659771B2 (ja) * 2007-02-13 2011-03-30 株式会社日立ハイテクノロジーズ プラズマ処理装置
JP5172928B2 (ja) * 2010-09-30 2013-03-27 株式会社東芝 基板処理方法および基板処理装置
JP5639866B2 (ja) * 2010-12-03 2014-12-10 株式会社日立ハイテクノロジーズ プラズマ処理装置

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