JP2016072517A5 - - Google Patents

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Publication number
JP2016072517A5
JP2016072517A5 JP2014202300A JP2014202300A JP2016072517A5 JP 2016072517 A5 JP2016072517 A5 JP 2016072517A5 JP 2014202300 A JP2014202300 A JP 2014202300A JP 2014202300 A JP2014202300 A JP 2014202300A JP 2016072517 A5 JP2016072517 A5 JP 2016072517A5
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JP
Japan
Prior art keywords
particles
resin
target surface
particle removal
substrate processing
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JP2014202300A
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English (en)
Japanese (ja)
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JP6522306B2 (ja
JP2016072517A (ja
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Priority to JP2014202300A priority Critical patent/JP6522306B2/ja
Priority claimed from JP2014202300A external-priority patent/JP6522306B2/ja
Publication of JP2016072517A publication Critical patent/JP2016072517A/ja
Publication of JP2016072517A5 publication Critical patent/JP2016072517A5/ja
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Publication of JP6522306B2 publication Critical patent/JP6522306B2/ja
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JP2014202300A 2014-09-30 2014-09-30 基板処理装置及び基板処理方法 Active JP6522306B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014202300A JP6522306B2 (ja) 2014-09-30 2014-09-30 基板処理装置及び基板処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014202300A JP6522306B2 (ja) 2014-09-30 2014-09-30 基板処理装置及び基板処理方法

Publications (3)

Publication Number Publication Date
JP2016072517A JP2016072517A (ja) 2016-05-09
JP2016072517A5 true JP2016072517A5 (enExample) 2017-11-09
JP6522306B2 JP6522306B2 (ja) 2019-05-29

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ID=55867438

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JP2014202300A Active JP6522306B2 (ja) 2014-09-30 2014-09-30 基板処理装置及び基板処理方法

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JP (1) JP6522306B2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10384238B2 (en) 2007-09-17 2019-08-20 Rave Llc Debris removal in high aspect structures
US10330581B2 (en) 2007-09-17 2019-06-25 Rave Llc Debris removal from high aspect structures
EP3519894B1 (en) 2016-09-27 2024-04-17 Illumina, Inc. Imprinted substrates
JP7175620B2 (ja) * 2018-03-30 2022-11-21 キヤノン株式会社 型を用いて基板上の組成物を成形する成形装置、成形方法、および物品の製造方法
DE102018206278A1 (de) * 2018-04-24 2019-10-24 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Entfernen eines Partikels von einer photolithographischen Maske
KR20230069820A (ko) * 2021-11-12 2023-05-19 캐논 가부시끼가이샤 입자 제거 방법, 입자 제거 장치, 및 물품의 제조 방법
JP7551694B2 (ja) * 2021-11-12 2024-09-17 キヤノン株式会社 異物除去方法、異物除去装置、及び物品の製造方法
JP2023162949A (ja) 2022-04-27 2023-11-09 キヤノン株式会社 異物除去方法、形成方法、物品の製造方法、異物除去装置、およびシステム
JP2023162948A (ja) * 2022-04-27 2023-11-09 キヤノン株式会社 異物除去方法、形成方法、物品の製造方法、異物除去装置、システム、およびテンプレート

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6023024A (ja) * 1983-07-20 1985-02-05 Atake Ind:Kk 液体注出器等の使い捨てチツプの製造方法
JPS61242389A (ja) * 1985-04-19 1986-10-28 Hitachi Ltd 電磁記憶デバイスの異物除去方法
JPS61245536A (ja) * 1985-04-24 1986-10-31 Hitachi Ltd 電子素子の製造方法
JPS63124531A (ja) * 1986-11-14 1988-05-28 Hitachi Ltd 平滑面清掃方法
JP2000228439A (ja) * 1999-02-05 2000-08-15 Advantest Corp ステージ上のパーティクル除去方法及び清掃板
JP2005084582A (ja) * 2003-09-11 2005-03-31 Sii Nanotechnology Inc フォトマスクのパーティクル除去方法
JP2006326716A (ja) * 2005-05-24 2006-12-07 Sony Corp 挟持具および挟持装置ならびに挟持方法
JP2009265176A (ja) * 2008-04-22 2009-11-12 Toshiba Corp 異物除去方法、異物除去装置および半導体装置の作製方法
JP6045787B2 (ja) * 2011-12-05 2016-12-14 Ntn株式会社 異物除去装置および異物除去方法

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