JP2016058446A5 - - Google Patents

Download PDF

Info

Publication number
JP2016058446A5
JP2016058446A5 JP2014181471A JP2014181471A JP2016058446A5 JP 2016058446 A5 JP2016058446 A5 JP 2016058446A5 JP 2014181471 A JP2014181471 A JP 2014181471A JP 2014181471 A JP2014181471 A JP 2014181471A JP 2016058446 A5 JP2016058446 A5 JP 2016058446A5
Authority
JP
Japan
Prior art keywords
substrate
processing
air flow
heating unit
target surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014181471A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016058446A (ja
JP6501469B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2014181471A priority Critical patent/JP6501469B2/ja
Priority claimed from JP2014181471A external-priority patent/JP6501469B2/ja
Publication of JP2016058446A publication Critical patent/JP2016058446A/ja
Publication of JP2016058446A5 publication Critical patent/JP2016058446A5/ja
Application granted granted Critical
Publication of JP6501469B2 publication Critical patent/JP6501469B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2014181471A 2014-09-05 2014-09-05 基板処理装置及び基板処理方法 Active JP6501469B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014181471A JP6501469B2 (ja) 2014-09-05 2014-09-05 基板処理装置及び基板処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014181471A JP6501469B2 (ja) 2014-09-05 2014-09-05 基板処理装置及び基板処理方法

Publications (3)

Publication Number Publication Date
JP2016058446A JP2016058446A (ja) 2016-04-21
JP2016058446A5 true JP2016058446A5 (enrdf_load_stackoverflow) 2017-10-19
JP6501469B2 JP6501469B2 (ja) 2019-04-17

Family

ID=55758820

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014181471A Active JP6501469B2 (ja) 2014-09-05 2014-09-05 基板処理装置及び基板処理方法

Country Status (1)

Country Link
JP (1) JP6501469B2 (enrdf_load_stackoverflow)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004221155A (ja) * 2003-01-10 2004-08-05 Tokyo Electron Ltd 酸化膜の除去方法、加熱方法、及び処理装置
JP5420596B2 (ja) * 2011-07-12 2014-02-19 東京エレクトロン株式会社 液処理装置および液処理方法
JP6242057B2 (ja) * 2013-02-15 2017-12-06 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Similar Documents

Publication Publication Date Title
JP2014209605A5 (enrdf_load_stackoverflow)
JP2015092538A5 (enrdf_load_stackoverflow)
TW201613016A (en) Substrate treatment apparatus, and substrate treatment method
KR20180084642A (ko) 기판 처리 장치, 기판 처리 방법 및 기억 매체
JP2016036005A5 (enrdf_load_stackoverflow)
JP2015144253A5 (enrdf_load_stackoverflow)
RU2015152213A (ru) Машина для очистки секции трубопровода
JP2012044204A5 (ja) メンテナンス方法、露光装置、及びデバイス製造方法
JP2014168046A5 (enrdf_load_stackoverflow)
NZ731256A (en) Dehumidification system and method
JP2015084455A5 (ja) 流体ハンドリング構造
JP2015062259A5 (ja) 基板洗浄システムおよび基板洗浄方法
JP2015092537A5 (enrdf_load_stackoverflow)
JP2019506308A5 (enrdf_load_stackoverflow)
WO2016190143A8 (en) Liquid discharge apparatus, imprint apparatus, and method of manufacturing a component
JP2015112576A5 (enrdf_load_stackoverflow)
JP2016021532A5 (enrdf_load_stackoverflow)
JP2020031200A5 (ja) 気相成長装置及び気相成長方法
JP2014207437A5 (enrdf_load_stackoverflow)
KR20180084640A (ko) 기판 처리 장치, 기판 처리 방법 및 컴퓨터 판독 가능한 기록 매체
JP2019067820A5 (enrdf_load_stackoverflow)
JP2015221452A5 (enrdf_load_stackoverflow)
JP2016058446A5 (enrdf_load_stackoverflow)
JP2011211224A5 (ja) 液浸露光装置、液浸露光方法、及びデバイス製造方法
JP2016107436A5 (enrdf_load_stackoverflow)