JP2016001308A - 結像光学系、露光装置、およびデバイス製造方法 - Google Patents
結像光学系、露光装置、およびデバイス製造方法 Download PDFInfo
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
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- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
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- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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Abstract
Description
前記第2面上の第1方向に関する前記第2面側の開口数は、前記第2面上において前記第1方向と交差する第2方向に関する前記第2面側の開口数の1.1倍よりも大きいことを特徴とする結像光学系を提供する。
前記第2面上の第1方向に関する前記第2面側の開口数は、前記第2面上において前記第1方向と交差する第2方向に関する前記第2面側の開口数の1.5倍よりも大きいことを特徴とする結像光学系を提供する。
前記第2面側の開口数を規定する開口絞りを備え、
前記開口絞りは楕円形状の開口部を有し、該楕円形状の開口部の長径方向の寸法は短径方向の寸法の1.1倍よりも大きいことを特徴とする結像光学系を提供する。
前記所定のパターンが転写された前記感光性基板を現像し、前記所定のパターンに対応する形状のマスク層を前記感光性基板の表面に形成する現像工程と、
前記マスク層を介して前記感光性基板の表面を加工する加工工程とを含むことを特徴とするデバイス製造方法を提供する。
図3は、第1実施例にかかる結像光学系のYZ平面に沿った構成を概略的に示す図である。図4は、第1実施例にかかる結像光学系のXZ平面に沿った構成を概略的に示す図である。次の表(1)に、第1実施例にかかる結像光学系の諸元の値を掲げる。表(1)の主要諸元の欄において、λは露光光の波長を、βは結像倍率を、NAxはX方向に関する像側(ウェハ側)開口数を、NAyはY方向に関する像側(ウェハ側)開口数を、Y0はウェハ7上でのイメージサークルIFの半径(最大像高)を、LXは有効結像領域ERのX方向に沿った寸法を、LYは有効結像領域ERのY方向に沿った寸法(円弧状の有効結像領域ERの幅寸法)を、Dxは開口絞りASの楕円形状の開口部の長径方向であるX方向の寸法を、Dyは開口絞りASの楕円形状の開口部の短径方向であるY方向の寸法をそれぞれ表している。
+C6・h6+C8・h8+C10・h10+C12・h12+C14・h14+C16・h16
+C18・h18+C20・h20 (a)
(主要諸元)
λ=13.5nm
β=1/4
NAx=0.4
NAy=0.2
Y0=37mm
LX=26mm
LY=2mm
Dx=84.0838mm
Dy=41.6781mm
(光線追跡設定値)
DIM MM
WL 13.50
XOB 0.00000 0.00000 0.00000 0.00000 0.00000
6.50000 6.50000 6.50000 6.50000 6.50000
13.00000 13.00000 13.00000 13.00000 13.00000
YOB 37.00000 36.50000 36.00000 35.50000 35.00000
36.40833 35.90833 35.40833 34.90833 34.40833
34.57082 34.07082 33.57082 33.07082 32.57082
(レンズデータ)
RDY THI RMD
OBJ: INFINITY 0.000000
1: INFINITY 528.623387
2: -592.28723 -488.623387 REFL
ASP:
K : 0.000000
A :-.254657E-10 B :-.111703E-15 C :-.366523E-21 D :-.105104E-26
E :-.614569E-32 F :0.552344E-37 G :-.520745E-42 H :0.000000E+00
J :0.000000E+00
XDE: 0.000000 YDE: -0.135994 ZDE: 0.000000 DAR
ADE: 0.002819 BDE: 0.000000 CDE: 0.000000
3: -685.82108 1758.023140 REFL
ASP:
K : 0.000000
A :-.342613E-08 B :-.598557E-13 C :-.508202E-18 D :0.257521E-21
E :-.629350E-25 F :0.733153E-29 G :-.349548E-33 H :0.000000E+00
J :0.000000E+00
XDE: 0.000000 YDE: -0.159098 ZDE: 0.000000 DAR
ADE: 0.002117 BDE: 0.000000 CDE: 0.000000
4: -1428.35928 -999.904639 REFL
ASP:
K : 0.000000
A :-.224179E-12 B :-.338584E-18 C :-.217996E-23 D :0.151885E-28
E :-.688940E-34 F :0.153991E-39 G :-.139951E-45 H :0.000000E+00
J :0.000000E+00
XDE: 0.000000 YDE: 0.174976 ZDE: 0.000000 DAR
ADE: 0.011492 BDE: 0.000000 CDE: 0.000000
5: -676.50202 265.439672 REFL
ASP:
K : 0.000000
A :0.128920E-08 B :-.707305E-15 C :0.189300E-18 D :-.332017E-22
E :0.330624E-26 F :-.178255E-30 G :0.404070E-35 H :0.000000E+00
J :0.000000E+00
XDE: 0.000000 YDE: -0.075707 ZDE: 0.000000 DAR
ADE: 0.001504 BDE: 0.000000 CDE: 0.000000
STO: INFINITY 464.183715
XDE: 0.000000 YDE: 0.014383 ZDE: 0.000000 DAR
ADE: 0.000000 BDE: 0.000000 CDE: 0.000000
7: -9662.07987 -1139.165307 REFL
ASP:
K : 0.000000
A :0.168021E-09 B :-.112219E-15 C :0.887751E-21 D :0.457673E-25
E :-.216329E-29 F :0.450161E-34 G :-.378974E-39 H :0.000000E+00
J :0.000000E+00
XDE: 0.000000 YDE: 0.005654 ZDE: 0.000000 DAR
ADE: 0.007150 BDE: 0.000000 CDE: 0.000000
8: 2275.61649 1611.423419 REFL
ASP:
K : 0.000000
A :0.726621E-11 B :0.832232E-18 C :0.251018E-22 D :-.243698E-27
E :0.154171E-32 F :-.547826E-38 G :0.830853E-44 H :0.000000E+00
J :0.000000E+00
XDE: 0.000000 YDE: -0.029638 ZDE: 0.000000 DAR
ADE: 0.009792 BDE: 0.000000 CDE: 0.000000
IMG: INFINITY 0.000000
XDE: 0.000000 YDE: 0.969601 ZDE: 0.000000 DAR
ADE: 0.000000 BDE: 0.000000 CDE: 0.000000
NAmax>sinα (b)
図8は、第2実施例にかかる結像光学系のYZ平面に沿った構成を概略的に示す図である。図9は、第2実施例にかかる結像光学系のXZ平面に沿った構成を概略的に示す図である。次の表(2)に、第2実施例にかかる結像光学系の諸元の値を掲げる。
(主要諸元)
λ=13.5nm
β=1/4
NAx=0.35
NAy=0.25
Y0=41.5mm
LX=26mm
LY=2mm
Dx=70.5689mm
Dy=49.9638mm
(光線追跡設定値)
DIM MM
WL 13.50
XOB 0.00000 0.00000 0.00000 0.00000 0.00000
6.50000 6.50000 6.50000 6.50000 6.50000
13.00000 13.00000 13.00000 13.00000 13.00000
YOB 41.50000 41.00000 40.50000 40.00000 39.50000
40.97499 40.47499 39.97499 39.47499 38.97499
39.35688 38.85688 38.35688 37.85688 37.35688
(レンズデータ)
RDY THI RMD
OBJ: INFINITY 0.000000
1: INFINITY 527.112108
2: -586.28043 -487.112108 REFL
ASP:
K : 0.000000
A :-.236164E-10 B :-.110626E-15 C :-.284530E-21 D :-.544786E-26
E :0.122403E-30 F :-.189106E-35 G :0.112384E-40 H :0.000000E+00
J :0.000000E+00
XDE: 0.000000 YDE: 0.023322 ZDE: 0.000000 DAR
ADE: 0.001515 BDE: 0.000000 CDE: 0.000000
3: -684.71542 1760.000000 REFL
ASP:
K : 0.000000
A :-.396159E-08 B :-.632367E-13 C :-.653539E-18 D :0.253964E-21
E :-.692815E-25 F :0.989160E-29 G :-.596456E-33 H :0.000000E+00
J :0.000000E+00
XDE: 0.000000 YDE: 0.009293 ZDE: 0.000000 DAR
ADE: 0.000924 BDE: 0.000000 CDE: 0.000000
4: -1401.87799 -962.106539 REFL
ASP:
K : 0.000000
A :0.344061E-13 B :-.777174E-19 C :-.235587E-23 D :0.104955E-28
E :-.323960E-34 F :0.517487E-40 G :-.351408E-46 H :0.000000E+00
J :0.000000E+00
XDE: 0.000000 YDE: 0.228380 ZDE: 0.000000 DAR
ADE: 0.005863 BDE: 0.000000 CDE: 0.000000
5: -682.83983 270.501910 REFL
ASP:
K : 0.000000
A :0.129775E-08 B :-.134507E-14 C :0.421784E-19 D :-.278865E-23
E :-.509373E-29 F :0.103118E-31 G :-.381436E-36 H :0.000000E+00
J :0.000000E+00
XDE: 0.000000 YDE: 0.135445 ZDE: 0.000000 DAR
ADE: 0.002567 BDE: 0.000000 CDE: 0.000000
STO: INFINITY 405.127751
XDE: 0.000000 YDE: 0.236494 ZDE: 0.000000 DAR
ADE: 0.000000 BDE: 0.000000 CDE: 0.000000
7: 43553.22016 -926.411013 REFL
ASP:
K : 0.000000
A :0.275599E-09 B :-.938191E-16 C :0.115376E-20 D :0.163736E-24
E :-.956816E-29 F :0.276251E-33 G :-.320812E-38 H :0.000000E+00
J :0.000000E+00
XDE: 0.000000 YDE: 0.207241 ZDE: 0.000000 DAR
ADE: 0.003758 BDE: 0.000000 CDE: 0.000000
8: 1921.64574 1412.887892 REFL
ASP:
K : 0.000000
A :0.122524E-10 B :0.531596E-17 C :-.102435E-22 D :0.192287E-27
E :-.152511E-32 F :0.621001E-38 G :-.102035E-43 H :0.000000E+00
J :0.000000E+00
XDE: 0.000000 YDE: 0.187309 ZDE: 0.000000 DAR
ADE: 0.002261 BDE: 0.000000 CDE: 0.000000
IMG: INFINITY 0.000000
XDE: 0.000000 YDE: 0.249032 ZDE: 0.000000 DAR
ADE: 0.000000 BDE: 0.000000 CDE: 0.000000
2a,2b フライアイ光学系
3 斜入射ミラー
4 マスク
5 マスクステージ
6 結像光学系
7 ウェハ
8 ウェハステージ
IL 照明光学系
G1,G2 反射光学系
M1〜M6 反射鏡
Claims (1)
- 第1面の像を第2面上に形成する反射結像光学系において、
前記第2面上の第1方向に関する前記第2面側の開口数は、前記第2面上において前記第1方向と交差する第2方向に関する前記第2面側の開口数の1.1倍よりも大きいことを特徴とする結像光学系。
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JP2015124424A JP6098847B2 (ja) | 2009-11-24 | 2015-06-22 | 露光装置、およびデバイス製造方法 |
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JP2009265912 | 2009-11-24 | ||
JP2009265912 | 2009-11-24 | ||
JP2015124424A JP6098847B2 (ja) | 2009-11-24 | 2015-06-22 | 露光装置、およびデバイス製造方法 |
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JP2011543267A Division JPWO2011065374A1 (ja) | 2009-11-24 | 2010-11-24 | 結像光学系、露光装置、およびデバイス製造方法 |
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JP2016001308A true JP2016001308A (ja) | 2016-01-07 |
JP2016001308A5 JP2016001308A5 (ja) | 2016-03-31 |
JP6098847B2 JP6098847B2 (ja) | 2017-03-22 |
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JP2015124424A Active JP6098847B2 (ja) | 2009-11-24 | 2015-06-22 | 露光装置、およびデバイス製造方法 |
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US (6) | US9557548B2 (ja) |
EP (1) | EP2506061A4 (ja) |
JP (2) | JPWO2011065374A1 (ja) |
KR (5) | KR102223843B1 (ja) |
WO (1) | WO2011065374A1 (ja) |
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KR102223843B1 (ko) | 2009-11-24 | 2021-03-08 | 가부시키가이샤 니콘 | 결상 광학계, 노광 장치 및 디바이스 제조 방법 |
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WO2011065374A1 (ja) | 2011-06-03 |
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EP2506061A4 (en) | 2017-12-20 |
US20230024028A1 (en) | 2023-01-26 |
KR20120093135A (ko) | 2012-08-22 |
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US20170146911A1 (en) | 2017-05-25 |
US9557548B2 (en) | 2017-01-31 |
US20190302621A1 (en) | 2019-10-03 |
KR20190016125A (ko) | 2019-02-15 |
US9939733B2 (en) | 2018-04-10 |
KR101946596B1 (ko) | 2019-02-11 |
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US20210200100A1 (en) | 2021-07-01 |
US20180210347A1 (en) | 2018-07-26 |
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EP2506061A1 (en) | 2012-10-03 |
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US10228623B2 (en) | 2019-03-12 |
US10866522B2 (en) | 2020-12-15 |
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