JP2015528569A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2015528569A5 JP2015528569A5 JP2015527065A JP2015527065A JP2015528569A5 JP 2015528569 A5 JP2015528569 A5 JP 2015528569A5 JP 2015527065 A JP2015527065 A JP 2015527065A JP 2015527065 A JP2015527065 A JP 2015527065A JP 2015528569 A5 JP2015528569 A5 JP 2015528569A5
- Authority
- JP
- Japan
- Prior art keywords
- data
- parameters
- parameter
- sequence
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 47
- 238000012545 processing Methods 0.000 claims 22
- 238000005259 measurement Methods 0.000 claims 15
- 230000003287 optical effect Effects 0.000 claims 10
- 238000005457 optimization Methods 0.000 claims 7
- 230000004298 light response Effects 0.000 claims 4
- 238000011065 in-situ storage Methods 0.000 claims 3
- 238000004891 communication Methods 0.000 claims 1
- 238000013479 data entry Methods 0.000 claims 1
- 238000001514 detection method Methods 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 238000005286 illumination Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000012544 monitoring process Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261683215P | 2012-08-15 | 2012-08-15 | |
| US61/683,215 | 2012-08-15 | ||
| PCT/IL2013/050697 WO2014027354A1 (en) | 2012-08-15 | 2013-08-15 | Optical metrology for in-situ measurements |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015528569A JP2015528569A (ja) | 2015-09-28 |
| JP2015528569A5 true JP2015528569A5 (enExample) | 2016-10-27 |
| JP6336982B2 JP6336982B2 (ja) | 2018-06-06 |
Family
ID=50685435
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015527065A Active JP6336982B2 (ja) | 2012-08-15 | 2013-08-15 | その場測定のための光計測 |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US9528946B2 (enExample) |
| EP (1) | EP2890951A4 (enExample) |
| JP (1) | JP6336982B2 (enExample) |
| KR (1) | KR102205682B1 (enExample) |
| CN (1) | CN104583712B (enExample) |
| TW (3) | TWI635269B (enExample) |
| WO (1) | WO2014027354A1 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI863630B (zh) * | 2015-12-15 | 2024-11-21 | 以色列商諾威股份有限公司 | 用於測量圖案化半導體結構之特性的系統 |
| US9792393B2 (en) * | 2016-02-08 | 2017-10-17 | Lam Research Corporation | Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization |
| US10032681B2 (en) * | 2016-03-02 | 2018-07-24 | Lam Research Corporation | Etch metric sensitivity for endpoint detection |
| WO2018092050A1 (en) * | 2016-11-16 | 2018-05-24 | Nova Measuring Instruments Ltd. | Layer detection for high aspect ratio etch control |
| US11519869B2 (en) * | 2018-03-20 | 2022-12-06 | Kla Tencor Corporation | Methods and systems for real time measurement control |
| US10572697B2 (en) | 2018-04-06 | 2020-02-25 | Lam Research Corporation | Method of etch model calibration using optical scatterometry |
| CN111971551B (zh) | 2018-04-10 | 2025-02-28 | 朗姆研究公司 | 机器学习中的光学计量以表征特征 |
| WO2019199697A1 (en) | 2018-04-10 | 2019-10-17 | Lam Research Corporation | Resist and etch modeling |
| JP7020392B2 (ja) * | 2018-12-25 | 2022-02-16 | 東芝三菱電機産業システム株式会社 | データ収集再生システム |
| US11989492B2 (en) * | 2018-12-26 | 2024-05-21 | Applied Materials, Inc. | Preston matrix generator |
| JP7220573B2 (ja) | 2019-01-24 | 2023-02-10 | 株式会社荏原製作所 | 情報処理システム、情報処理方法、プログラム及び基板処理装置 |
| TWI865489B (zh) * | 2019-02-14 | 2024-12-11 | 美商蘭姆研究公司 | 用以支援基板製造系統之資料分析及機器學習的資料擷取與轉換 |
| IL294547B2 (en) * | 2020-01-06 | 2023-07-01 | Nova Ltd | Self-supervised representational learning for interpreting ocd data |
| KR20220123303A (ko) | 2020-01-07 | 2022-09-06 | 노바 엘티디. | Ocd 계측 머신 학습에 대한 이상치 및 이상 검출 시스템 및 방법 |
| US11698628B2 (en) * | 2020-03-16 | 2023-07-11 | Vitro Flat Glass Llc | System, method, and computer program product for optimizing a manufacturing process |
| US12420373B2 (en) | 2021-03-05 | 2025-09-23 | Applied Materials, Inc. | Control of processing parameters during substrate polishing using cost function |
| US11619594B2 (en) * | 2021-04-28 | 2023-04-04 | Applied Materials, Inc. | Multiple reflectometry for measuring etch parameters |
| DE102022129114A1 (de) * | 2021-11-05 | 2023-05-25 | Jasco Corporation | Spektrometer |
| JP2023113180A (ja) * | 2022-02-03 | 2023-08-16 | 東京エレクトロン株式会社 | データ算出方法及び基板処理装置 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5081421A (en) * | 1990-05-01 | 1992-01-14 | At&T Bell Laboratories | In situ monitoring technique and apparatus for chemical/mechanical planarization endpoint detection |
| EP0661279B1 (fr) | 1993-12-30 | 2001-03-07 | Guerbet | Ligands polyaminés, complexes métalliques, procédé de préparation, applications diagnostiques et thérapeutiques |
| US8531678B2 (en) * | 1999-07-09 | 2013-09-10 | Nova Measuring Instruments, Ltd. | Method and system for measuring patterned structures |
| US6160621A (en) * | 1999-09-30 | 2000-12-12 | Lam Research Corporation | Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source |
| IL133326A0 (en) * | 1999-12-06 | 2001-04-30 | Nova Measuring Instr Ltd | Method and system for endpoint detection |
| JP2004146782A (ja) * | 2002-08-29 | 2004-05-20 | Advanced Lcd Technologies Development Center Co Ltd | 結晶化状態のｉｎ−ｓｉｔｕモニタリング方法 |
| US6937337B2 (en) * | 2003-11-19 | 2005-08-30 | International Business Machines Corporation | Overlay target and measurement method using reference and sub-grids |
| US7526354B2 (en) * | 2006-07-10 | 2009-04-28 | Tokyo Electron Limited | Managing and using metrology data for process and equipment control |
| KR20100131512A (ko) * | 2008-03-31 | 2010-12-15 | 비티 이미징 피티와이 리미티드 | 웨이퍼 이미징 및 처리하는 방법 및 장치 |
-
2013
- 2013-08-15 EP EP13879352.6A patent/EP2890951A4/en not_active Withdrawn
- 2013-08-15 TW TW106123287A patent/TWI635269B/zh active
- 2013-08-15 WO PCT/IL2013/050697 patent/WO2014027354A1/en not_active Ceased
- 2013-08-15 KR KR1020157006613A patent/KR102205682B1/ko active Active
- 2013-08-15 TW TW102129310A patent/TWI600895B/zh active
- 2013-08-15 CN CN201380043900.8A patent/CN104583712B/zh active Active
- 2013-08-15 TW TW107120615A patent/TW201831885A/zh unknown
- 2013-08-15 JP JP2015527065A patent/JP6336982B2/ja active Active
- 2013-08-15 US US14/422,190 patent/US9528946B2/en active Active
-
2016
- 2016-12-20 US US15/385,495 patent/US9915624B2/en active Active
-
2018
- 2018-03-08 US US15/915,613 patent/US10197506B2/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2015528569A5 (enExample) | ||
| EP3244204B1 (en) | Method and apparatus for acoustic emissions testing | |
| JP6336982B2 (ja) | その場測定のための光計測 | |
| IL274834B2 (en) | A method for determining information about a printing procedure, a method for reducing errors in measurement data, a method for calibrating a metrology process, a method for selecting metrological targets | |
| JP2017531410A5 (enExample) | ||
| JP2008076384A5 (enExample) | ||
| JP2015527740A5 (enExample) | ||
| JP2015524977A5 (enExample) | ||
| JP2009288027A5 (enExample) | ||
| JP2015518535A5 (enExample) | ||
| CN108535354B (zh) | 一种钢丝绳漏磁检测和磁发射检测的损伤判定及定位方法 | |
| CN115713524B (zh) | 一种基于点云数据的木材破损类缺陷检测方法 | |
| CN109521725A (zh) | 检测异常数据的方法、装置和设备以及机器可读介质 | |
| WO2010037472A3 (en) | Method and system for determining a lithographic process parameter | |
| CN108333617B (zh) | 一种海水中放射性物质检测的快速寻峰方法 | |
| JPWO2020255413A5 (ja) | データ解析装置、データ解析方法、及びプログラム | |
| JP2010266327A (ja) | 設備診断装置及び設備診断方法 | |
| US10955359B2 (en) | Method for quantification of process non uniformity using model-based metrology | |
| CN113721042A (zh) | 确定疲劳辉纹的特征和疲劳损伤存在的方法，系统和载体 | |
| CN109580049A (zh) | 遥控器按键的压力检测方法及装置 | |
| JP2014086733A5 (enExample) | ||
| JP2005521054A5 (enExample) | ||
| JPWO2022050026A5 (ja) | 測定データ処理装置、測定データ処理方法及びプログラム | |
| CN115169385A (zh) | 拟合车辆用目标传感器的方法和系统、存储介质 | |
| JP2019074724A5 (enExample) |