KR102205682B1 - 인-시추 측정을 위한 광학 계측 - Google Patents

인-시추 측정을 위한 광학 계측 Download PDF

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KR102205682B1
KR102205682B1 KR1020157006613A KR20157006613A KR102205682B1 KR 102205682 B1 KR102205682 B1 KR 102205682B1 KR 1020157006613 A KR1020157006613 A KR 1020157006613A KR 20157006613 A KR20157006613 A KR 20157006613A KR 102205682 B1 KR102205682 B1 KR 102205682B1
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sequence
parameters
measured data
measured
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KR20150043478A (ko
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이고르 튜로베츠
코넬 보즈도그
다리오 엘리야시
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노바 메주어링 인스트루먼츠 엘티디.
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901—Optical details; Scanning details
    • G01N21/8903—Optical details; Scanning details using a multiple detector array
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
    • G01B2210/56—Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/12—Circuits of general importance; Signal processing

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Immunology (AREA)
  • General Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Drying Of Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR1020157006613A 2012-08-15 2013-08-15 인-시추 측정을 위한 광학 계측 Active KR102205682B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261683215P 2012-08-15 2012-08-15
US61/683,215 2012-08-15
PCT/IL2013/050697 WO2014027354A1 (en) 2012-08-15 2013-08-15 Optical metrology for in-situ measurements

Publications (2)

Publication Number Publication Date
KR20150043478A KR20150043478A (ko) 2015-04-22
KR102205682B1 true KR102205682B1 (ko) 2021-01-21

Family

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Application Number Title Priority Date Filing Date
KR1020157006613A Active KR102205682B1 (ko) 2012-08-15 2013-08-15 인-시추 측정을 위한 광학 계측

Country Status (7)

Country Link
US (3) US9528946B2 (enExample)
EP (1) EP2890951A4 (enExample)
JP (1) JP6336982B2 (enExample)
KR (1) KR102205682B1 (enExample)
CN (1) CN104583712B (enExample)
TW (3) TW201831885A (enExample)
WO (1) WO2014027354A1 (enExample)

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TWI863630B (zh) * 2015-12-15 2024-11-21 以色列商諾威股份有限公司 用於測量圖案化半導體結構之特性的系統
US9792393B2 (en) * 2016-02-08 2017-10-17 Lam Research Corporation Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization
US10032681B2 (en) * 2016-03-02 2018-07-24 Lam Research Corporation Etch metric sensitivity for endpoint detection
WO2018092050A1 (en) * 2016-11-16 2018-05-24 Nova Measuring Instruments Ltd. Layer detection for high aspect ratio etch control
US11519869B2 (en) * 2018-03-20 2022-12-06 Kla Tencor Corporation Methods and systems for real time measurement control
US10572697B2 (en) 2018-04-06 2020-02-25 Lam Research Corporation Method of etch model calibration using optical scatterometry
KR20250078603A (ko) 2018-04-10 2025-06-02 램 리써치 코포레이션 레지스트 및 에칭 모델링
CN111971551B (zh) 2018-04-10 2025-02-28 朗姆研究公司 机器学习中的光学计量以表征特征
JP7020392B2 (ja) * 2018-12-25 2022-02-16 東芝三菱電機産業システム株式会社 データ収集再生システム
US11989492B2 (en) 2018-12-26 2024-05-21 Applied Materials, Inc. Preston matrix generator
JP7220573B2 (ja) 2019-01-24 2023-02-10 株式会社荏原製作所 情報処理システム、情報処理方法、プログラム及び基板処理装置
KR102838452B1 (ko) 2019-02-14 2025-07-24 램 리써치 코포레이션 기판 제작 시스템들을 위해 데이터 분석 및 머신 러닝을 지원하기 위한 데이터 캡처 및 변환
WO2021140508A1 (en) * 2020-01-06 2021-07-15 Nova Measuring Instruments Ltd. Self-supervised representation learning for interpretation of ocd data
CN116880134A (zh) * 2020-01-07 2023-10-13 诺威有限公司 用于ocd计量的方法
US11698628B2 (en) 2020-03-16 2023-07-11 Vitro Flat Glass Llc System, method, and computer program product for optimizing a manufacturing process
WO2022187146A1 (en) 2021-03-05 2022-09-09 Applied Materials, Inc. Control of processing parameters during substrate polishing using cost function or expected future parameter changes
US11619594B2 (en) * 2021-04-28 2023-04-04 Applied Materials, Inc. Multiple reflectometry for measuring etch parameters
DE102022129114A1 (de) * 2021-11-05 2023-05-25 Jasco Corporation Spektrometer
JP2023113180A (ja) * 2022-02-03 2023-08-16 東京エレクトロン株式会社 データ算出方法及び基板処理装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010003084A1 (en) 1999-12-06 2001-06-07 Moshe Finarov Method and system for endpoint detection
US20080009081A1 (en) 2006-07-10 2008-01-10 Tokyo Electron Limited Managing and using metrology data for process and equipment control
US20120008147A1 (en) * 1999-07-09 2012-01-12 Nova Measuring Instruments Ltd. Of Weizmann Scientific Park Method and system for measuring patterned structures

Family Cites Families (6)

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US5081421A (en) * 1990-05-01 1992-01-14 At&T Bell Laboratories In situ monitoring technique and apparatus for chemical/mechanical planarization endpoint detection
EP0661279B1 (fr) 1993-12-30 2001-03-07 Guerbet Ligands polyaminés, complexes métalliques, procédé de préparation, applications diagnostiques et thérapeutiques
US6160621A (en) * 1999-09-30 2000-12-12 Lam Research Corporation Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source
JP2004146782A (ja) * 2002-08-29 2004-05-20 Advanced Lcd Technologies Development Center Co Ltd 結晶化状態のｉｎ−ｓｉｔｕモニタリング方法
US6937337B2 (en) * 2003-11-19 2005-08-30 International Business Machines Corporation Overlay target and measurement method using reference and sub-grids
TWI609177B (zh) * 2008-03-31 2017-12-21 Ｂｔ映像私人有限公司 晶圓成像及處理方法與裝置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120008147A1 (en) * 1999-07-09 2012-01-12 Nova Measuring Instruments Ltd. Of Weizmann Scientific Park Method and system for measuring patterned structures
US20010003084A1 (en) 1999-12-06 2001-06-07 Moshe Finarov Method and system for endpoint detection
US20080009081A1 (en) 2006-07-10 2008-01-10 Tokyo Electron Limited Managing and using metrology data for process and equipment control

Also Published As

Publication number Publication date
TW201415003A (zh) 2014-04-16
TWI600895B (zh) 2017-10-01
US20180195975A1 (en) 2018-07-12
TW201734434A (zh) 2017-10-01
US20150226680A1 (en) 2015-08-13
TWI635269B (zh) 2018-09-11
US10197506B2 (en) 2019-02-05
JP2015528569A (ja) 2015-09-28
US20170167987A1 (en) 2017-06-15
WO2014027354A1 (en) 2014-02-20
EP2890951A1 (en) 2015-07-08
EP2890951A4 (en) 2016-05-18
KR20150043478A (ko) 2015-04-22
CN104583712A (zh) 2015-04-29
JP6336982B2 (ja) 2018-06-06
TW201831885A (zh) 2018-09-01
CN104583712B (zh) 2017-12-01
US9915624B2 (en) 2018-03-13
US9528946B2 (en) 2016-12-27

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