IL309690A - System and method for library construction and use in measurements on patterned structures - Google Patents
System and method for library construction and use in measurements on patterned structuresInfo
- Publication number
- IL309690A IL309690A IL309690A IL30969023A IL309690A IL 309690 A IL309690 A IL 309690A IL 309690 A IL309690 A IL 309690A IL 30969023 A IL30969023 A IL 30969023A IL 309690 A IL309690 A IL 309690A
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- theoretical
- library
- parameters
- qor
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- 238000000034 method Methods 0.000 title claims description 31
- 238000005259 measurement Methods 0.000 title claims description 27
- 238000010276 construction Methods 0.000 title description 9
- 230000003287 optical effect Effects 0.000 claims description 17
- 238000012360 testing method Methods 0.000 claims description 10
- 238000012549 training Methods 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 238000001228 spectrum Methods 0.000 claims description 8
- 238000013400 design of experiment Methods 0.000 claims description 7
- 238000000605 extraction Methods 0.000 claims description 7
- 238000012545 processing Methods 0.000 claims description 7
- 230000003595 spectral effect Effects 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 6
- 238000010200 validation analysis Methods 0.000 claims description 5
- 238000012986 modification Methods 0.000 claims description 4
- 230000004048 modification Effects 0.000 claims description 4
- 238000012956 testing procedure Methods 0.000 claims description 4
- 238000003672 processing method Methods 0.000 claims description 2
- 230000000977 initiatory effect Effects 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 description 9
- 238000013459 approach Methods 0.000 description 6
- 238000005457 optimization Methods 0.000 description 5
- 238000004886 process control Methods 0.000 description 4
- 238000007405 data analysis Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 238000000572 ellipsometry Methods 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 238000010420 art technique Methods 0.000 description 1
- 238000013528 artificial neural network Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
- G06F1/02—Digital function generators
- G06F1/03—Digital function generators working, at least partly, by table look-up
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- Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Length Measuring Devices By Optical Means (AREA)
Description
SYSTEM AND METHOD FOR LIBRARY CONSTRUCTION AND USE IN MEASUREMENTS ON PATTERNED STRUCTURES TECHNOLOGICAL FIELD The invention is in the field of automatic model-based measurements of parameters of patterned structures, and relates to construction and use of library for interpreting measured data, which is particularly useful in semiconductor industry, e.g., for the control of a manufacturing process.
BACKGROUND It is a common goal of various stages in the semiconductor industry to characterize the properties of a semiconductor structure. To this end and keeping in mind reduction of the dimensions of semiconductor devices based on such structures, highly sensitive metrology tools and accurate data analysis are required for monitoring the properties of the semiconductor structure.
Optical Critical Dimension (OCD) measurement technique (known also as Scatterometry) is known as being efficient for measuring parameters of patterned (periodic) structures. Measured data is typically optical data, which can be analyzed to derive information regarding the geometrical parameters of patterns including thicknesses, critical dimension (CD), line spacing, line width, wall depth, wall profile, etc., as well as optical constants of materials included in the sample. Optical metrology tools used for such measurements are typically ellipsometry and/or reflectometry-based tools. Reflectometry based tools typically measure changes in the magnitude of radiation returned/transmitted from/through the sample, and ellipsometry based tools typically measure changes of the polarization state of radiation after interacting with the sample. In addition, or as alternative to these techniques, angular analysis of light returned (reflected and/or scattered) from a patterned (periodic) structure could be used to measure the parameters that define/characterize the structure.
Data analysis is typically performed using a fitting procedure based on theoretical model-based data and/or reference data, and the structure parameters are derived from the theoretical data satisfying the "best fit" condition with the measured data. More specifically, this approach for measured data interpretation generally includes comparison between the theoretical and measured data. Theoretical data is based on one or more optical models, each based on various combinations of multiple parameters. The parameters taken into account in the model are typically of two types, one associated with the structure and the other associated with the measurement technique. If the comparison stage does not provide a desired result, model parameters of the theoretical data are varied, thus varying the theoretical input data, and comparison is repeated until desired degree of fit (e.g., convergence to minimal value of a merit function) is obtained.
GENERAL DESCRIPTION There is a need in the art for a novel approach for measured data interpretation allowing data analysis optimization to meet the specific (customized) requirements of process control application.
As described above, theoretical data (including various models or multiple parameters sets of a certain model), is typically provided for a structure of a specific type (having certain geometrical and material characteristics). This theoretical data is typically generated off-line, i.e., prior to and independent of the actual measurements on a specific structure and presents a collection (library) of theoretical signals (signatures) each corresponding to data measurable from a certain type of structure under certain measurement conditions (i.e., values of parameters). In case of spectrometry-based OCD measurements in patterned structures, such as semiconductor wafers, these may be spectral signatures.
Most semiconductor process control applications operate at a lot level, where wafers of the lot are sequentially measured between process steps. As the geometries shrink and the performance and chip densities continue to increase, control of various 30 manufacturing processes need finer levels of control and monitoring, such as wafer-to-wafer (W2W), within-wafer (WIW) and die-to-die variation of one or more critical parameters (e.g., pattern features).
Process control in high end applications presents new challenges. In particular, stabilization of the manufacturing process and yield optimization require tight process control and highly accurate OCD metrology. Among the important process parameters requiring tight control are: repeatability, correlation to reference, tool-to-tool (T2T) variation in measurement, radial trend, de-correlation of parameters, site/layer-to-site/layer matching, DOE any others. On the one hand, the final measurement accuracy of the library search, which is one of the most commonly used methods for solving the inverse problem in optical scatterometry, is highly dependent on the grid interval selected for each parameter in the library. The time cost of the parameter extraction increases dramatically when the grid interval is decreasing.
The present invention provides a novel technique for creating an optimized library, e.g., for scatterometry-based theoretical data. Such optimized library, on the one hand, meets the basic requirement that, for any measured spectrum, it returns parameter values and a theoretical spectrum, so best fit can be one of the criteria used to determine the results, and, on the other hand, it has internal degrees of freedom (is flexible) such that the quality of results for the available measured data can be used in addition to (or instead of) best fit to obtain the best interpretation scheme. This library optimization procedure is performed off-line, and upon creating the optimized library (after optimization on available data), it can be used to interpret new measured spectra.
The technique of the present invention eliminates a need for manual trial and error optimizations, e.g., of library matching, which is critical for very tight time frame during production processes and enables a novel automatic and robust interpretation flows to aid in achieving an accurate solution.
According to one broad aspect of the invention, there is provided a computer system configured and operable as a library constructor for use in extracting one or more parameters of a patterned structure from real time measured data obtained on said structure, the computer system comprising: 30 data input utility for receiving input data comprising preliminary measured data obtained from at least a part of a structure, and comprising data indicative of user-defined quality of measurement results (QOR); and a data processor configured and operable for processing and analyzing the input data and predetermined theoretical modeled data corresponding to said measured data to modify said theoretical modeled data and defining optimized theoretical data enabling extraction therefrom, in response to the preliminary measured data, one or more parameters of the structure satisfying a first condition of best fit criteria between the optimized theoretical data and the preliminary measured data, and a second condition of said QOR, thereby enabling further use of said library for interpretation of the real-time measured data to extract the one or more parameters of the structure being measured.
In some embodiments, the data processor comprises a library optimizer utility configured and operable to provide the theoretical modeled data satisfying the first condition and apply a modification procedure to these theoretical modeled data by iterative training and testing it on the preliminary measured data in accordance with one or more merits determined by the data indicative of the user-defined QOR, until the one or more merits satisfy a predetermined ranking, to thereby obtain the optimized theoretical data.
In some embodiments, the library optimizer utilizes previously prepared and stored initial theoretical modeled data satisfying the first condition. In some other embodiments, the library optimizer utility may be configured to generate the theoretical modeled data satisfying the first condition. To this end, the library optimizer may operate to applying iterative training, testing and validation procedures to at least one predetermined model using train and test parameters of the structure.
The library optimizer utility may include the following utilities/modules: a library estimator having a library convergence criteria with respect to model data; an interpretation engine associated with said library estimator and being configured and operable to interpret input measured data and operate together with said library estimator to perform iterative data interpretation to provide interpretation results enabling to identify theoretical modeled data matching said input measured data, wherein said interpretation engine has internal degrees of freedom for modifying the interpretation results by interpreting both the preliminary measured data and the QOR, enabling to determine a theoretical data set formed by matching theoretical data and corresponding theoretical values for a set of structure parameters; a merits evaluator utility configured and operable to analyze a quality of results represented by said set of parameters with respect to said QOR and generate data indicative of corresponding at least one merit; a ranking utility configured and operable to rank said data indicative of the at least one merit and, upon identifying that the rank does not satisfy said second condition, initiate operation of the interpretation engine and the library estimator with modified library convergence criteria to perform the iterative data interpretation procedure by modifying the theoretical matching data until it satisfies the second condition.
Considering measurements on patterned structures progressing on a production line (such as semiconductor wafers), the data indicative of the user-defined QOR may include one or more of the following: repeatability of measurement for at least one parameter; correlation of at least one parameter of the structure to reference, tool-to-tool (T2T) variation in measurement, radial trend, de-correlation of parameters, site/layer-to-site/layer matching, Design-of-experiment (DOE).
The library optimizer utility is configured to generate the theoretical modeled data satisfying the first condition by applying iterative training, testing and validation procedures to at least one predetermined model using train and test parameters of the structure.
In some embodiments, the library optimizer utility comprises: a library estimator having a library convergence criteria with respect to model data; an interpretation engine associated with said library estimator and being configured and operable to interpret input measured data and operate together with said library estimator to perform iterative data interpretation to provide interpretation results enabling to identify theoretical modeled data matching said input measured data, wherein said interpretation engine has internal degrees of freedom for modifying the interpretation results by interpreting both the preliminary measured data and the QOR, enabling to 30 determine a theoretical data set formed by matching theoretical data and corresponding theoretical values for a set of structure parameters; a merits evaluator utility configured and operable to analyze a quality of results represented by said set of parameters with respect to said QOR and generate data indicative of corresponding at least one merit; a ranking utility configured and operable to rank said data indicative of the at least one merit and, upon identifying that the rank does not satisfy said second condition, initiate operation of the interpretation engine and the library estimator with modified library convergence criteria to perform the iterative data interpretation procedure by modifying the theoretical matching data until it satisfies the second condition.
In some embodiments, the measured data is optical data. For example, the measured data comprises spectral data.
In some examples, the data indicative of the user-defined QOR comprises a degree to which the theoretical modeled data predicts at least one of geometrical and material-relating parameters of the structure, for different theoretical spectra.
In some embodiments, the data indicative of the user-defined QOR comprises degree of smoothness of at least one of geometrical and material-related parameters across the same structure or within several structures.
According to another broad aspect of the invention, it provides a data processing method for extracting one or more parameters of a patterned structure from real time measured data obtained on said structure The method comprises: receiving input data comprising preliminary measured data obtained from at least a part of a structure, and data indicative of user-defined quality of measurement results (QOR); and processing and analyzing the input data and predetermined theoretical modeled data corresponding to said measured data to modify said theoretical modeled data and define optimized theoretical data enabling extraction therefrom, in response to the preliminary measured data, one or more parameters of the structure satisfying a first condition of best fit criteria between the optimized theoretical data and the preliminary measured data, and a second condition of said QOR, thereby enabling further use of said 30 library for interpretation of the real-time measured data to extract the one or more parameters of the structure being measured.
BRIEF DESCRIPTION OF THE DRAWINGS In order to better understand the subject matter that is disclosed herein and to exemplify how it may be carried out in practice, embodiments will now be described, by way of non-limiting example only, with reference to the accompanying drawings, in which: Figs. 1A – 1E show schematically a known in the art technique of library construction and use, wherein Fig. 1A shows the library training, testing and validation stages; Fig. 1B schematically shows operation of the library with its associated interpretation engine to interpret newly measured data by fitting; Fig. 1C exemplifies the principle of library construction using neural network; Fig. 1D exemplifies the principle of regression-based library construction; and Fig. 1E shows an example of self-convergence results of spectral fit during library training / testing according to the conventional approach of library construction; Fig. 2 is a block diagram exemplifying the main principles of the invention for configuration and operation of a library constructor; Fig. 3 is a flow diagram exemplifying a method performed by the library constructor system of the invention; Figs. 4A-4C illustrate the main operational steps of the library construction according to the invention, wherein Fig. 4A illustrates the operation of the library estimator together with its associated optimized interpretation engine configured according to the invention to utilize additional data relating to user-defined quality of measurement result and construct the optimized library; Fig. 4B illustrates the operation of the optimized library to interpret the real-time measure data and extract structure parameter(s); and Fig. 4C shows some examples of quality of results conditions typically required in the semiconductor industry; Fig. 5 schematically illustrates a solution flow which would be needed to incorporate the additional user input requirements while using a library configured according to the conventional approach; Fig. 6 is a top-level flow diagram of the approach of the invention for optimized library creation and use; Fig. 7 exemplifies best self-convergence of the library achievable with the convention approach (two solutions) as compared to the same achievable by the optimized library according to the invention providing a better fitting model to the broader set of constraints.
DETAILED DESCRIPTION OF EMBODIMENTS In order to better understand the principles of the present invention, reference is first made to Figs. 1A to 1E illustrating schematically a known process to construct and use a library (theoretical model-based data, e.g., spectral data) for interpretation of measured data (e.g., spectral data) to evaluate structure parameters.
As shown in Fig. 1A, each of one or more predetermined models (e.g., RCWA) undergoes training and testing, and the resulting theoretical spectra inputs a library constructor, to be further validated to form the library data.
Each model is configured to describe detectable optical response of a structure, having predetermined general characteristics (material and geometry relating parameters), under predetermined illumination and detection conditions (measurement conditions). The model, e.g., Rigorous-Coupled-Wave-Analysis (RCWA) model, describes relation between the detectable optical response and various parameters of the structure each varying within a respective parametric space/range.
During the library construction stage, train set of parameters,
Claims (20)
1. An optical metrology system comprising: an Optical Critical Dimension (OCD) measurement system, a computer system configured and operable as a library constructor for use in extracting one or more parameters of a patterned structure from measured data obtained on said structure during manufacturing, the computer system comprising: data input utility for receiving input data comprising preliminary measured data obtained from at least a part of a structure, and comprising data indicative of user-defined quality of measurement results (QOR); and a data processor configured and operable for processing and analyzing the input data and predetermined theoretical modeled data corresponding to said measured data to modify said theoretical modeled data and define optimized theoretical data enabling extraction therefrom, in response to the preliminary measured data, one or more parameters of the structure satisfying a first condition of best fit criteria between the optimized theoretical data and the preliminary measured data, and a second condition of said QOR, thereby enabling further use of said library for interpretation of the real-time measured data to extract the one or more parameters of the structure being measured.
2. The system according to claim 1 , wherein said data processor comprises a library optimizer utility configured and operable to provide the theoretical modeled data satisfying the first condition and apply a modification procedure to said theoretical modeled data by iterative training and testing it on the preliminary measured data in accordance with one or more merits determined by said data indicative of the user-defined QOR, until said one or more merits satisfy a predetermined ranking, to thereby obtain the optimized theoretical data.
3. The system according to claim 2, wherein the library optimizer utility is configured to generate said theoretical modeled data satisfying the first condition by applying iterative training, testing and validation procedures to at least one predetermined model using train and test parameters of the structure.
4. The system according to claim 2, wherein the library optimizer utility comprises: a library estimator having library convergence criteria with respect to model data; an interpretation engine associated with said library estimator and being configured and operable to interpret input measured data and operate together with said library estimator to perform iterative data interpretation to provide interpretation results enabling to identify theoretical modeled data matching said input measured data, wherein said interpretation engine has internal degrees of freedom for modifying the interpretation results by interpreting both the preliminary measured data and the QOR, enabling to determine a theoretical data set formed by matching theoretical data and corresponding theoretical values for a set of structure parameters; a merits evaluator utility configured and operable to analyze a quality of results represented by said set of parameters with respect to said QOR and generate data indicative of corresponding at least one merit; a ranking utility configured and operable to rank said data indicative of the at least one merit and, upon identifying that the rank does not satisfy said second condition, initiate operation of the interpretation engine and the library estimator with modified library convergence criteria to perform the iterative data interpretation procedure by modifying the matching theoretical data until it satisfies the second condition.
5. The system according to claim 1, wherein said data indicative of the user-defined QOR comprises at least one of the following: repeatability of measurement for at least one parameter; correlation of at least one parameter of the structure to reference, tool-to-tool (T2T) variation in measurement, radial trend, de-correlation of parameters, site/layer-to-site/layer matching, Design-of-experiment (DOE).
6. The system according to claim 1, wherein said measured data is optical data.
7. The system according to claim 6, wherein the measured data comprises spectral data.
8. The system according to claim 7, wherein said data indicative of the user-defined QOR comprises a degree to which the theoretical modeled data predicts at least one of geometrical and material-relating parameters of the structure, for different theoretical spectra.
9. The system according to claim 1, wherein said data indicative of the user-defined QOR comprises degree of smoothness of at least one of geometrical and material-related parameters across the same structure or within several structures.
10. An optical metrology system comprising: an Optical Critical Dimension (OCD) measurement system, computer system configured and operable as a library constructor for use in extracting one or more parameters of a patterned structure from measured data obtained on said structure during manufacturing, the computer system comprising: data input utility for receiving input data comprising preliminary measured data obtained from at least a part of a structure, and comprising data indicative of user-defined quality of measurement results (QOR); and a data processor configured and operable for processing and analyzing the input data and predetermined theoretical modeled data and define optimized theoretical data enabling extraction therefrom, in response to the preliminary measured data, one or more parameters of the structure satisfying a first condition of best fit criteria between the optimized theoretical data and the preliminary measured data, and a second condition of said QOR, thereby enabling further use of said library for interpretation of the real-time measured data to extract the one or more parameters of the structure being measured, the data processor comprising: a library optimizer utility configured and operable to provide the theoretical modeled data satisfying the first condition and apply a modification procedure to said theoretical modeled data and obtain the optimized theoretical data; a merits evaluator utility configured and operable to analyze a quality of results represented by said set of parameters with respect to said QOR and generate data indicative of corresponding at least one merit; and a ranking utility configured and operable to rank said data indicative of the at least one merit and selectively initiate the iterative data interpretation procedure by modifying the matching theoretical data until it satisfies the second condition.
11. An optical metrology system comprising: an Optical Critical Dimension (OCD) measurement system, computer system configured and operable as a library constructor for use in extracting one or more parameters of a patterned structure from measured data obtained on said structure during manufacturing, the computer system comprising: data input utility for receiving input data comprising: preliminary measured data obtained from at least a part of a structure; and comprising data indicative of user-defined quality of measurement results (QOR) comprising a degree to which predetermined theoretical modeled data predicts at least one of geometrical and material-relating parameters of the structure for different theoretical spectra; and a data processor configured and operable for processing and analyzing the input data and the predetermined theoretical modeled data corresponding to said measured data to modify said theoretical modeled data and define optimized theoretical data enabling extraction therefrom, in response to the preliminary measured data, one or more parameters of the structure satisfying a first condition of best fit criteria between the optimized theoretical data and the preliminary measured data, and a second condition of said QOR, thereby enabling further use of said library for interpretation of the real-time measured data to extract the one or more parameters of the structure being measured.
12. A data processing method for extracting one or more parameters of a patterned structure from measured data obtained on said structure during manufacturing, the method comprising: receiving input data comprising preliminary measured data obtained from at least a part of a structure, and data indicative of user-defined quality of measurement results (QOR); and processing and analyzing the input data and predetermined theoretical modeled data corresponding to said measured data to modify said theoretical modeled data and define optimized theoretical data enabling extraction therefrom, in response to the preliminary measured data, one or more parameters of the structure satisfying a first condition of best fit criteria between the optimized theoretical data and the preliminary measured data, and a second condition of said QOR, thereby enabling further use of said library for interpretation of the real-time measured data to extract the one or more parameters of the structure being measured.
13. The method according to claim 12, wherein said processing comprising: providing the theoretical modeled data satisfying the first condition; and applying a modification procedure to said theoretical modeled data by iterative training and testing it on the preliminary measured data in accordance with one or more merits determined by said data indicative of the user-defined QOR, until said one or more merits satisfy a predetermined ranking, to thereby obtain the optimized theoretical data.
14. The method according to claim 13, wherein said providing of the theoretical modeled data satisfying the first condition comprises generating said theoretical modeled data satisfying the first condition by applying iterative training, testing and validation procedures to at least one predetermined model using train and test parameters of the structure.
15. The method according to claim 13, wherein providing of the theoretical modeled data satisfying the first condition comprises: providing a library estimator having a library convergence criteria with respect to model data; and an interpretation engine associated with said library estimator, said interpretation engine being configured and operable to interpret input measured data and operate together with said library estimator to perform iterative data interpretation to provide interpretation results enabling to identify theoretical modeled data matching said input measured data, wherein said interpretation engine has internal degrees of freedom for modifying the interpretation results by interpreting both the preliminary measured data and the QOR, enabling to determine a theoretical data set formed by matching theoretical data and corresponding theoretical values for a set of structure parameters; analyzing a quality of results represented by said set of parameters with respect to said QOR and generating data indicative of corresponding at least one merit; ranking said data indicative of the at least one merit and, upon identifying that the rank does not satisfy said second condition, initiating operation of the interpretation engine and the library estimator with modified library convergence criteria to perform the iterative data interpretation procedure by modifying the theoretical matching data until it satisfies the second condition.
16. The method according to claim 12, wherein said data indicative of the user-defined QOR comprises at least one of the following: repeatability of measurement for at least one parameter; correlation of at least one parameter of the structure to reference, tool-to-tool (T2T) variation in measurement, radial trend, de-correlation of parameters, site/layer-to-site/layer matching, Design-of-experiment (DOE).
17. The method according to claim 12, wherein said measured data is optical data.
18. The method according to claim 17, wherein the measured data comprises spectral data.
19. The method according to claim 18, wherein said data indicative of the user-defined QOR comprises a degree to which the theoretical modeled data predicts at least one of geometrical and material-relating parameters of the structure, for different theoretical spectra.
20. The method according to claim 12, wherein said data indicative of the user-defined QOR comprises degree of smoothness of at least one of geometrical and material-related parameters across the same structure or within several structures.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IL309690A IL309690B1 (en) | 2023-12-24 | 2023-12-24 | System and method for library construction and use in measurements on patterned structures |
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| IL309690A IL309690B1 (en) | 2023-12-24 | 2023-12-24 | System and method for library construction and use in measurements on patterned structures |
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| IL309690A true IL309690A (en) | 2024-02-01 |
| IL309690B1 IL309690B1 (en) | 2024-09-01 |
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| IL309690B1 (en) | 2024-09-01 |
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