JP2015525833A - プレスフィットコンタクトのためのコーティング方法およびコーティング - Google Patents
プレスフィットコンタクトのためのコーティング方法およびコーティング Download PDFInfo
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- 238000000576 coating method Methods 0.000 title claims abstract description 84
- 239000011248 coating agent Substances 0.000 title claims abstract description 71
- 239000010410 layer Substances 0.000 claims abstract description 247
- 239000000463 material Substances 0.000 claims abstract description 123
- 238000000034 method Methods 0.000 claims abstract description 96
- 239000000758 substrate Substances 0.000 claims abstract description 59
- 239000011241 protective layer Substances 0.000 claims abstract description 38
- 230000003647 oxidation Effects 0.000 claims abstract description 9
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 9
- 238000012546 transfer Methods 0.000 claims abstract description 6
- 229910052725 zinc Inorganic materials 0.000 claims description 105
- 239000011701 zinc Substances 0.000 claims description 105
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 99
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 97
- 229910052718 tin Inorganic materials 0.000 claims description 97
- 230000008018 melting Effects 0.000 claims description 61
- 238000002844 melting Methods 0.000 claims description 61
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 50
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 41
- 229910052751 metal Inorganic materials 0.000 claims description 40
- 239000002184 metal Substances 0.000 claims description 38
- 230000008569 process Effects 0.000 claims description 34
- 239000000203 mixture Substances 0.000 claims description 33
- 229910045601 alloy Inorganic materials 0.000 claims description 25
- 239000000956 alloy Substances 0.000 claims description 25
- 238000009792 diffusion process Methods 0.000 claims description 24
- 230000008021 deposition Effects 0.000 claims description 21
- 229910052759 nickel Inorganic materials 0.000 claims description 20
- 230000004888 barrier function Effects 0.000 claims description 16
- 229910002804 graphite Inorganic materials 0.000 claims description 13
- 239000010439 graphite Substances 0.000 claims description 13
- 229910052709 silver Inorganic materials 0.000 claims description 10
- 239000004332 silver Substances 0.000 claims description 10
- 229910052787 antimony Inorganic materials 0.000 claims description 9
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 9
- 230000009974 thixotropic effect Effects 0.000 claims description 8
- 150000002739 metals Chemical class 0.000 claims description 5
- 239000007769 metal material Substances 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 abstract description 23
- 238000000151 deposition Methods 0.000 abstract description 15
- 238000007747 plating Methods 0.000 description 24
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 12
- 229910052802 copper Inorganic materials 0.000 description 11
- 239000010949 copper Substances 0.000 description 11
- 230000005496 eutectics Effects 0.000 description 11
- 230000008901 benefit Effects 0.000 description 10
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 description 10
- 238000003780 insertion Methods 0.000 description 9
- 230000037431 insertion Effects 0.000 description 9
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 238000012545 processing Methods 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 5
- 239000012467 final product Substances 0.000 description 4
- 229910000765 intermetallic Inorganic materials 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
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- 229910001128 Sn alloy Inorganic materials 0.000 description 3
- 239000003963 antioxidant agent Substances 0.000 description 3
- 230000003078 antioxidant effect Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 229910017482 Cu 6 Sn 5 Inorganic materials 0.000 description 2
- OQDDOQFECBFUPY-UHFFFAOYSA-N [Ni].[Sn].[Zn] Chemical compound [Ni].[Sn].[Zn] OQDDOQFECBFUPY-UHFFFAOYSA-N 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
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- QCEUXSAXTBNJGO-UHFFFAOYSA-N [Ag].[Sn] Chemical compound [Ag].[Sn] QCEUXSAXTBNJGO-UHFFFAOYSA-N 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000002051 biphasic effect Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 210000001787 dendrite Anatomy 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
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- 230000036961 partial effect Effects 0.000 description 1
- 238000010587 phase diagram Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000002277 temperature effect Effects 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/03—Contact members characterised by the material, e.g. plating, or coating materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
- B32B15/013—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C13/00—Alloys based on tin
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C18/00—Alloys based on zinc
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/343—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one DLC or an amorphous carbon based layer, the layer being doped or not
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- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R12/00—Structural associations of a plurality of mutually-insulated electrical connecting elements, specially adapted for printed circuits, e.g. printed circuit boards [PCB], flat or ribbon cables, or like generally planar structures, e.g. terminal strips, terminal blocks; Coupling devices specially adapted for printed circuits, flat or ribbon cables, or like generally planar structures; Terminals specially adapted for contact with, or insertion into, printed circuits, flat or ribbon cables, or like generally planar structures
- H01R12/50—Fixed connections
- H01R12/51—Fixed connections for rigid printed circuits or like structures
- H01R12/55—Fixed connections for rigid printed circuits or like structures characterised by the terminals
- H01R12/58—Fixed connections for rigid printed circuits or like structures characterised by the terminals terminals for insertion into holes
- H01R12/585—Terminals having a press fit or a compliant portion and a shank passing through a hole in the printed circuit board
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0091—Apparatus for coating printed circuits using liquid non-metallic coating compositions
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12785—Group IIB metal-base component
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Abstract
Description
Claims (24)
- 基材のコーティングのための方法であって、該方法において:
基材(100)が少なくとも1つの自由表面(110)を有するように提供され;
第1の材料の第1層(101)が基材(100)の自由表面(110)上に蒸着され;
第1の材料と異なる第2の材料の第2層(102)が第1層(101)上に蒸着され;
第1および第2の材料と異なる第3の材料の第3層(103)が第2層(102)上に蒸着され;
該方法は、更に、
第1、第2および第3の材料と異なる第4の材料の保護層(104)が第3層(103)上に蒸着されること;および、
保護層(104)上への熱的接触による熱の伝達によって、第1層(101)、第2層(102)および第3層(103)のうち少なくとも第2層(102)および第3層(103)がリフローし、保護層(104)が少なくとも第3層(103)の酸化を防止すること;
を含むことを特徴とする方法。 - 保護層(104)の材料が、リフロー工程の間に第1層(101)、第2層(102)および第3層(103)と混合しないものであるように選択される、請求項1に記載の基材のコーティングのための方法。
- リフロー工程の温度が、第3の材料(103)の溶融温度より1.5〜3倍高く、第2の材料(102)の溶融温度より0.8〜1.5倍高く、第1の材料(101)および/または基材(100)の溶融温度以下である、請求項1または2に記載の基材のコーティングのための方法。
- 第4の材料(104)が、グラファイト粉末と微結晶性活性炭との混合物、特に80%〜95%のグラファイトと残余が微結晶性活性炭である混合物、より特に90%のグラファイトと10%の微結晶性活性炭との混合物である、請求項1〜3のいずれかに記載の基材のコーティングのための方法。
- 第1の材料(101)、第2の材料(102)および第3の材料(103)が、金属材料、特に単体金属であるか、または単体金属を含む、請求項1〜4のいずれかに記載の基材のコーティングのための方法。
- 第3の材料(103)が、第1の材料(101)、第2の材料(102)および第3の材料(103)の融点のうち最も低い融点を有する材料である、請求項1〜5のいずれかに記載の基材のコーティングのための方法。
- 第2の材料(102)が、第3の材料(103)の溶融温度より1.5〜3倍大きい溶融温度を有する、請求項1〜6のいずれかに記載の基材のコーティングのための方法。
- 基材(100)および/または第1の材料(101)が、第2の材料(102)の溶融温度の少なくとも2〜3倍高い溶融温度を有する、請求項1〜7のいずれかに記載の基材のコーティングのための方法。
- 第4の材料(104)が、第2の材料(102)および第3の材料(103)の比熱より2〜3倍高い比熱を有する、請求項1〜8のいずれかに記載の基材のコーティングのための方法。
- 第1の材料(101)がニッケルであるか、ニッケルを含み、および/または第2の材料(102)が亜鉛またはアンチモンであるか、亜鉛またはアンチモンを含み、および/または第3の材料(103)がスズおよび/または銀であるか、スズおよび/または銀を含む、請求項1〜9のいずれかに記載の基材のコーティングのための方法。
- リフロー工程の温度が、少なくとも350℃、特に350℃〜600℃の範囲内、より特に380℃〜580℃の範囲内、またより特に400℃〜550℃の範囲内である、請求項1〜10のいずれかに記載の基材のコーティングのための方法。
- リフロー工程の時間が、少なくとも1秒〜15秒の間、特に2秒〜10秒の間、より特に3秒〜7秒の間である、請求項12に記載の基材のコーティングのための方法。
- 第1層(101)の厚さが0.05μm〜5μmの範囲内であり、および/または第2層(102)の厚さが0.05μm〜5μmの範囲内であり、および/または第3層(103)の厚さが0.05μm〜2.5μmの範囲内である、請求項1〜12のいずれかに記載の基材のコーティングのための方法。
- リフロー工程の後に加えて、保護層(104)を除去することを含む、請求項1〜13のいずれかに記載の基材のコーティングのための方法。
- 埋込可能な金属要素(200、300)のためのコーティング(223、323)であって、該コーティング(223、323)が、拡散バリア層(201’、301)と、少なくとも2種の金属の合金から成り、かつチキソトロピック特性を有する多相固化構造体層(211、311)とを含むことを特徴とするコーティング。
- 加えて、バッファ層(302’)を拡散バリア層(301)と固化構造体層(311)との間に含む、請求項15に記載の埋込可能な金属要素(300)のためのコーティング(323)。
- 請求項1〜14のいずれかに記載の方法により製造されたものであることを特徴とする、請求項15または16に記載の埋込可能な金属要素(200、300)のためのコーティング(223、323)。
- 固化構造体が、亜鉛とスズを、5〜15質量%の亜鉛の蒸着量に対して85〜95質量%のスズの蒸着量、特に10質量%の亜鉛の蒸着量に対して90質量%のスズの蒸着量の割合、または85〜95質量%の亜鉛の蒸着量に対して5〜15質量%のスズの蒸着量、特に90質量%の亜鉛の蒸着量に対して10質量%のスズの蒸着量の割合、または58〜48質量%の亜鉛の蒸着量に対して42〜52質量%のスズの蒸着量、特に53質量%の亜鉛の蒸着量に対して47質量%のスズの蒸着量の割合、または21〜31質量%の亜鉛の蒸着量に対して69〜79質量%のスズの蒸着量、特に26質量%の亜鉛の蒸着量に対して74質量%のスズの蒸着量の割合、または72〜82質量%の亜鉛の蒸着量に対して18〜28質量%のスズの蒸着量、特に77質量%の亜鉛の蒸着量に対して23質量%のスズの蒸着量の割合で含む、請求項15〜17のいずれかに記載の埋込可能な金属要素(200、300)のためのコーティング(223、323)。
- 請求項15〜18のいずれかに記載の埋込可能な金属要素のためのコーティングでめっきされたプレスフィットコンタクトピン。
- 請求項1〜14のいずれかに記載の基材のコーティングのための方法により製造されるコーティングでめっきされたプレスフィットコンタクトピン。
- 請求項15〜18のいずれかに記載の埋込可能な金属要素のためのコーティングでめっきされたプリント回路プレスフィットコンタクトのための穴。
- 請求項1〜14のいずれかに従って製造されるコーティングを有するプリント回路プレスフィットコンタクトのための穴。
- 請求項15〜18のいずれかに記載の埋込可能な金属要素のためのコーティングでめっきされた要素を少なくとも1つ含むプリント回路。
- 請求項1〜14のいずれかに記載の方法により製造されるコーティングでめっきされた要素を少なくとも1つ含むプリント回路。
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FR1257093A FR2993579B1 (fr) | 2012-07-20 | 2012-07-20 | Procede de revetement et revetement pour contact a insertion a force |
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PCT/EP2013/065286 WO2014013055A1 (en) | 2012-07-20 | 2013-07-19 | Coating process and coating for press-fit contact |
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DE102014117410B4 (de) * | 2014-11-27 | 2019-01-03 | Heraeus Deutschland GmbH & Co. KG | Elektrisches Kontaktelement, Einpressstift, Buchse und Leadframe |
DE102017002150A1 (de) * | 2017-03-06 | 2018-09-06 | Rosenberger Hochfrequenztechnik Gmbh & Co. Kg | Elektrisches Kontaktelement |
US11183779B2 (en) * | 2017-07-12 | 2021-11-23 | ept Holding GmbH & Co. KG | Press-in pin and method for producing same |
DE102018203800B4 (de) * | 2018-03-13 | 2019-11-21 | Te Connectivity Germany Gmbh | Kontaktstift und Anordnung zur Verbindung von elektrischen Leitern aus Kupfer und Aluminium |
US11296436B2 (en) * | 2019-06-10 | 2022-04-05 | Rohm And Haas Electronic Materials Llc | Press-fit terminal with improved whisker inhibition |
JP7352851B2 (ja) * | 2019-08-05 | 2023-09-29 | 株式会社オートネットワーク技術研究所 | 電気接点材料、端子金具、コネクタ、及びワイヤーハーネス |
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EP2875170A1 (en) | 2015-05-27 |
JP6174698B2 (ja) | 2017-08-02 |
US20150136456A1 (en) | 2015-05-21 |
WO2014013055A1 (en) | 2014-01-23 |
US10348017B2 (en) | 2019-07-09 |
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