JP2015523917A5 - - Google Patents
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- Publication number
- JP2015523917A5 JP2015523917A5 JP2015510287A JP2015510287A JP2015523917A5 JP 2015523917 A5 JP2015523917 A5 JP 2015523917A5 JP 2015510287 A JP2015510287 A JP 2015510287A JP 2015510287 A JP2015510287 A JP 2015510287A JP 2015523917 A5 JP2015523917 A5 JP 2015523917A5
- Authority
- JP
- Japan
- Prior art keywords
- composite material
- soc
- layer
- polymer substrate
- soc layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000002131 composite material Substances 0.000 claims description 35
- 229920000307 polymer substrate Polymers 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 21
- 238000000151 deposition Methods 0.000 claims description 16
- 239000012707 chemical precursor Substances 0.000 claims description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 10
- 229910052760 oxygen Inorganic materials 0.000 claims description 10
- 239000001301 oxygen Substances 0.000 claims description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- WZJUBBHODHNQPW-UHFFFAOYSA-N 2,4,6,8-tetramethyl-1,3,5,7,2$l^{3},4$l^{3},6$l^{3},8$l^{3}-tetraoxatetrasilocane Chemical compound C[Si]1O[Si](C)O[Si](C)O[Si](C)O1 WZJUBBHODHNQPW-UHFFFAOYSA-N 0.000 claims description 6
- 230000004888 barrier function Effects 0.000 claims description 6
- 230000008021 deposition Effects 0.000 claims description 6
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 claims description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 5
- 238000009792 diffusion process Methods 0.000 claims description 5
- 229910000077 silane Inorganic materials 0.000 claims description 5
- 230000003647 oxidation Effects 0.000 claims description 4
- 238000007254 oxidation reaction Methods 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 150000004756 silanes Chemical class 0.000 claims 3
- 230000001737 promoting effect Effects 0.000 description 7
- 239000004642 Polyimide Substances 0.000 description 4
- 229910010293 ceramic material Inorganic materials 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 239000007769 metal material Substances 0.000 description 4
- 150000001282 organosilanes Chemical class 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 230000004580 weight loss Effects 0.000 description 4
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 239000004643 cyanate ester Substances 0.000 description 2
- 229920003192 poly(bis maleimide) Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261640293P | 2012-04-30 | 2012-04-30 | |
| US61/640,293 | 2012-04-30 | ||
| US13/833,686 | 2013-03-15 | ||
| US13/833,686 US10787591B2 (en) | 2012-04-30 | 2013-03-15 | Composites including silicon-oxy-carbide layers and methods of making the same |
| PCT/US2013/034435 WO2014007894A2 (en) | 2012-04-30 | 2013-03-28 | Composites including silicon-oxy-carbide layers and methods of making the same |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018159930A Division JP2019022984A (ja) | 2012-04-30 | 2018-08-29 | シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015523917A JP2015523917A (ja) | 2015-08-20 |
| JP2015523917A5 true JP2015523917A5 (cg-RX-API-DMAC7.html) | 2016-05-19 |
| JP6421114B2 JP6421114B2 (ja) | 2018-11-07 |
Family
ID=49477561
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015510287A Active JP6421114B2 (ja) | 2012-04-30 | 2013-03-28 | シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法 |
| JP2018159930A Pending JP2019022984A (ja) | 2012-04-30 | 2018-08-29 | シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018159930A Pending JP2019022984A (ja) | 2012-04-30 | 2018-08-29 | シリコンオキシカーバイド層を含む複合材料、及び複合材料を形成する方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US10787591B2 (cg-RX-API-DMAC7.html) |
| EP (2) | EP3428311B1 (cg-RX-API-DMAC7.html) |
| JP (2) | JP6421114B2 (cg-RX-API-DMAC7.html) |
| AU (1) | AU2013287214B2 (cg-RX-API-DMAC7.html) |
| WO (1) | WO2014007894A2 (cg-RX-API-DMAC7.html) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9786491B2 (en) | 2015-11-12 | 2017-10-10 | Asm Ip Holding B.V. | Formation of SiOCN thin films |
| KR102378021B1 (ko) * | 2016-05-06 | 2022-03-23 | 에이에스엠 아이피 홀딩 비.브이. | SiOC 박막의 형성 |
| US10847529B2 (en) | 2017-04-13 | 2020-11-24 | Asm Ip Holding B.V. | Substrate processing method and device manufactured by the same |
| CN114875388A (zh) | 2017-05-05 | 2022-08-09 | Asm Ip 控股有限公司 | 用于受控形成含氧薄膜的等离子体增强沉积方法 |
| US10991573B2 (en) | 2017-12-04 | 2021-04-27 | Asm Ip Holding B.V. | Uniform deposition of SiOC on dielectric and metal surfaces |
| US12341005B2 (en) | 2020-01-17 | 2025-06-24 | Asm Ip Holding B.V. | Formation of SiCN thin films |
| US12142479B2 (en) | 2020-01-17 | 2024-11-12 | Asm Ip Holding B.V. | Formation of SiOCN thin films |
Family Cites Families (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3745149A (en) | 1971-09-29 | 1973-07-10 | Nasa | Preparation of polyimides from mixtures of monomeric diamines and esters of polycarboxylic acids |
| US5654396A (en) | 1983-09-27 | 1997-08-05 | The Boeing Company | Polyimide oligomers |
| US5081198A (en) | 1988-09-28 | 1992-01-14 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Tough, high performance, addition-type thermoplastic polymers |
| US5338827A (en) | 1990-01-30 | 1994-08-16 | Trw Inc. | Polyimide resins useful at high temperatures |
| US5171822A (en) | 1991-02-11 | 1992-12-15 | The United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration | Low toxicity high temperature pmr polyimide |
| JP3232124B2 (ja) * | 1992-05-20 | 2001-11-26 | 鐘淵化学工業株式会社 | 硬化性組成物 |
| US5846649A (en) | 1994-03-03 | 1998-12-08 | Monsanto Company | Highly durable and abrasion-resistant dielectric coatings for lenses |
| US5412066A (en) | 1994-03-03 | 1995-05-02 | Ther United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Phenylethynyl terminated imide oligomers |
| US5853877A (en) * | 1996-05-31 | 1998-12-29 | Hyperion Catalysis International, Inc. | Method for disentangling hollow carbon microfibers, electrically conductive transparent carbon microfibers aggregation film amd coating for forming such film |
| US6214451B1 (en) * | 1996-12-10 | 2001-04-10 | Takiron Co., Ltd. | Formable antistatic resin molded article |
| US5826366A (en) * | 1997-01-16 | 1998-10-27 | Matibe; Jeffrey T. | Illuminated fishing rod |
| US6194036B1 (en) | 1997-10-20 | 2001-02-27 | The Regents Of The University Of California | Deposition of coatings using an atmospheric pressure plasma jet |
| US5939521A (en) * | 1998-01-23 | 1999-08-17 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Polyimides based on 4,4'-bis (4-aminophenoxy)-2,2'or 2,2', 6,6'-substituted biphenyl |
| US6124035A (en) | 1999-04-13 | 2000-09-26 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | High temperature transfer molding resins |
| DE19932417A1 (de) * | 1999-07-15 | 2001-01-18 | Hoechst Trespaphan Gmbh | Papierähnliche Kunststoffolie |
| JP4066229B2 (ja) * | 2001-02-14 | 2008-03-26 | 株式会社カネカ | 硬化剤、硬化性組成物、光学材料用組成物、光学材料、その製造方法、並びに、それを用いた液晶表示装置及びled |
| US6841652B2 (en) * | 2001-05-17 | 2005-01-11 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Space environmentally durable polyimides and copolyimides |
| DE10131156A1 (de) * | 2001-06-29 | 2003-01-16 | Fraunhofer Ges Forschung | Arikel mit plasmapolymerer Beschichtung und Verfahren zu dessen Herstellung |
| US6958192B2 (en) | 2002-04-05 | 2005-10-25 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Polyimides from 2,3,3′,4′-biphenyltetracarboxylic dianhydride and aromatic diamines |
| US8704211B2 (en) | 2004-06-30 | 2014-04-22 | General Electric Company | High integrity protective coatings |
| US7015640B2 (en) | 2002-09-11 | 2006-03-21 | General Electric Company | Diffusion barrier coatings having graded compositions and devices incorporating the same |
| JP4338495B2 (ja) | 2002-10-30 | 2009-10-07 | 富士通マイクロエレクトロニクス株式会社 | シリコンオキシカーバイド、半導体装置、および半導体装置の製造方法 |
| US7041778B1 (en) | 2003-06-05 | 2006-05-09 | The United States Of America As Represented By The Secretary Of The Air Force | Processable thermally stable addition polyimide for composite applications |
| EP1749860A4 (en) * | 2004-05-14 | 2009-12-23 | Dow Corning Toray Co Ltd | FREE FILMS MANUFACTURED FROM ORGANOPOLYSILOXANE RESINS, THEIR PRODUCTION PROCESS AND LAMINATED FILMS |
| US20060063015A1 (en) * | 2004-09-23 | 2006-03-23 | 3M Innovative Properties Company | Protected polymeric film |
| JP2006123306A (ja) * | 2004-10-28 | 2006-05-18 | Dainippon Printing Co Ltd | ガスバリア性積層体 |
| US8092910B2 (en) * | 2005-02-16 | 2012-01-10 | Dow Corning Toray Co., Ltd. | Reinforced silicone resin film and method of preparing same |
| US20090130463A1 (en) | 2005-10-05 | 2009-05-21 | John Dean Albaugh | Coated Substrates and Methods for their Preparation |
| US20070196633A1 (en) | 2005-11-30 | 2007-08-23 | Coak Craig E | Durable transparent coatings for polymeric substrates |
| US7776404B2 (en) | 2006-11-30 | 2010-08-17 | General Electric Company | Methods for forming thermal oxidative barrier coatings on organic matrix composite substrates |
| US7776434B2 (en) | 2006-05-12 | 2010-08-17 | General Electric Company | Organic matrix composite structures and thermal oxidative barrier coating therefor |
| US7776433B2 (en) | 2006-11-30 | 2010-08-17 | General Electric Company | Thermal oxidative barrier coatings for organic matrix composite substrates and coated articles |
| FR2902422B1 (fr) * | 2006-06-16 | 2008-07-25 | Saint Gobain | Procede de depot par plasma atmopherique d'un revetement hydrophobe/oleophobe a durabilite amelioree |
| US20100178490A1 (en) * | 2007-03-28 | 2010-07-15 | Glenn Cerny | Roll-to-roll plasma enhanced chemical vapor deposition method of barrier layers comprising silicon and carbon |
| CN101678618A (zh) | 2007-05-01 | 2010-03-24 | 埃克阿泰克有限责任公司 | 等离子体涂层的边缘修补和现场修复 |
| KR101408510B1 (ko) * | 2007-05-18 | 2014-06-17 | 삼성전자주식회사 | 표시소자용 연성기판 및 이를 이용한 디스플레이 소자 |
| KR101796065B1 (ko) * | 2007-11-09 | 2017-11-10 | 가부시키가이샤 가네카 | 변성 폴리오르가노실록산 조성물, 변성 폴리오르가노실록산 화합물, 및 경화성 조성물 |
| US7799843B2 (en) * | 2008-02-29 | 2010-09-21 | Fujifilm Corporation | Film |
| JP5244622B2 (ja) * | 2009-01-08 | 2013-07-24 | 三菱樹脂株式会社 | ガスバリア性フィルム |
| US8206794B2 (en) | 2009-05-04 | 2012-06-26 | The Boeing Company | System and method for applying abrasion-resistant coatings |
| JP2011039283A (ja) * | 2009-08-11 | 2011-02-24 | Konica Minolta Holdings Inc | 調光素子 |
| US20120035057A1 (en) * | 2010-08-03 | 2012-02-09 | Alexandre Bratkovski | Room-temperature superconductive-like diode device |
-
2013
- 2013-03-15 US US13/833,686 patent/US10787591B2/en active Active
- 2013-03-28 EP EP18188957.7A patent/EP3428311B1/en active Active
- 2013-03-28 JP JP2015510287A patent/JP6421114B2/ja active Active
- 2013-03-28 AU AU2013287214A patent/AU2013287214B2/en active Active
- 2013-03-28 EP EP13783121.0A patent/EP2844783B1/en active Active
- 2013-03-28 WO PCT/US2013/034435 patent/WO2014007894A2/en not_active Ceased
-
2018
- 2018-08-29 JP JP2018159930A patent/JP2019022984A/ja active Pending
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