JP2015521385A5 - - Google Patents
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- Publication number
- JP2015521385A5 JP2015521385A5 JP2015512034A JP2015512034A JP2015521385A5 JP 2015521385 A5 JP2015521385 A5 JP 2015521385A5 JP 2015512034 A JP2015512034 A JP 2015512034A JP 2015512034 A JP2015512034 A JP 2015512034A JP 2015521385 A5 JP2015521385 A5 JP 2015521385A5
- Authority
- JP
- Japan
- Prior art keywords
- plate
- cooling
- small beam
- cooling channels
- coolant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261646398P | 2012-05-14 | 2012-05-14 | |
| US61/646,398 | 2012-05-14 | ||
| PCT/EP2013/059948 WO2013171216A1 (en) | 2012-05-14 | 2013-05-14 | Charged particle multi-beamlet lithography system and cooling arrangement manufacturing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015521385A JP2015521385A (ja) | 2015-07-27 |
| JP2015521385A5 true JP2015521385A5 (enExample) | 2016-07-14 |
| JP5973061B2 JP5973061B2 (ja) | 2016-08-23 |
Family
ID=48444378
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015512034A Active JP5973061B2 (ja) | 2012-05-14 | 2013-05-14 | 荷電粒子マルチ小ビームリソグラフィシステム及び冷却装置製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP2850635B1 (enExample) |
| JP (1) | JP5973061B2 (enExample) |
| KR (1) | KR101945964B1 (enExample) |
| CN (1) | CN104471669B (enExample) |
| NL (1) | NL2010799C2 (enExample) |
| WO (1) | WO2013171216A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101961914B1 (ko) | 2012-05-14 | 2019-03-25 | 마퍼 리쏘그라피 아이피 비.브이. | 하전 입자 리소그래피 시스템 및 빔 생성기 |
| US11348756B2 (en) | 2012-05-14 | 2022-05-31 | Asml Netherlands B.V. | Aberration correction in charged particle system |
| WO2015032955A1 (en) * | 2013-09-07 | 2015-03-12 | Mapper Lithography Ip B.V. | Target processing unit |
| CN105874560B (zh) * | 2013-11-14 | 2018-07-20 | 迈普尔平版印刷Ip有限公司 | 电极堆栈布置 |
| US10486232B2 (en) | 2015-04-21 | 2019-11-26 | Varian Semiconductor Equipment Associates, Inc. | Semiconductor manufacturing device with embedded fluid conduits |
| US9829804B1 (en) | 2016-07-28 | 2017-11-28 | Mapper Lithography Ip B.V. | Substrate holding device, method for manufacturing such a device, and use of such a device in a lithography system |
| CN108121164B (zh) * | 2016-11-29 | 2020-12-01 | 中芯国际集成电路制造(上海)有限公司 | 光罩散热装置及其工作方法 |
| KR102491478B1 (ko) * | 2017-08-28 | 2023-01-26 | 에이에스엠엘 네델란즈 비.브이. | 미리 결정된 시동 값을 갖는 메모리 디바이스 |
| US12287151B2 (en) | 2021-02-26 | 2025-04-29 | Teradyne, Inc. | Thermal plate having a fluid channel |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3157308A (en) | 1961-09-05 | 1964-11-17 | Clark Mfg Co J L | Canister type container and method of making the same |
| US3159408A (en) | 1961-10-05 | 1964-12-01 | Grace W R & Co | Chuck |
| US4524308A (en) | 1984-06-01 | 1985-06-18 | Sony Corporation | Circuits for accomplishing electron beam convergence in color cathode ray tubes |
| AU6449994A (en) | 1993-04-30 | 1994-11-21 | Board Of Regents, The University Of Texas System | Megavoltage scanning imager and method for its use |
| EP0766405A1 (en) | 1995-09-29 | 1997-04-02 | STMicroelectronics S.r.l. | Successive approximation register without redundancy |
| US6046457A (en) * | 1998-01-09 | 2000-04-04 | International Business Machines Corporation | Charged particle beam apparatus having anticontamination means |
| JP2000348662A (ja) * | 1999-06-02 | 2000-12-15 | Nikon Corp | 荷電粒子線照射系、荷電粒子線露光装置及び半導体デバイス製造方法 |
| JP4355446B2 (ja) * | 2000-12-28 | 2009-11-04 | 株式会社アドバンテスト | 電子ビーム露光装置及び電子ビーム成形部材 |
| US6563124B2 (en) | 2001-03-21 | 2003-05-13 | Applied Materials, Inc. | Electron beam apparatus having traversing circuit boards |
| US6768125B2 (en) * | 2002-01-17 | 2004-07-27 | Ims Nanofabrication, Gmbh | Maskless particle-beam system for exposing a pattern on a substrate |
| AU2003274829A1 (en) | 2002-10-25 | 2004-05-13 | Mapper Lithography Ip B.V. | Lithography system |
| EP2701178B1 (en) | 2002-10-30 | 2020-02-12 | ASML Netherlands B.V. | Electron beam exposure system |
| KR101068607B1 (ko) | 2003-03-10 | 2011-09-30 | 마퍼 리쏘그라피 아이피 비.브이. | 복수 개의 빔렛 발생 장치 |
| JP4113032B2 (ja) * | 2003-04-21 | 2008-07-02 | キヤノン株式会社 | 電子銃及び電子ビーム露光装置 |
| CN100543920C (zh) | 2003-05-28 | 2009-09-23 | 迈普尔平版印刷Ip有限公司 | 带电粒子小射束曝光系统 |
| WO2005010618A2 (en) | 2003-07-30 | 2005-02-03 | Mapper Lithography Ip B.V. | Modulator circuitry |
| US7145641B2 (en) * | 2003-12-31 | 2006-12-05 | Asml Netherlands, B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| JP3929459B2 (ja) | 2004-11-11 | 2007-06-13 | 株式会社日立ハイテクノロジーズ | 荷電粒子線露光装置 |
| TWI345685B (en) * | 2005-09-06 | 2011-07-21 | Asml Netherlands Bv | Lithographic method |
| US7709815B2 (en) | 2005-09-16 | 2010-05-04 | Mapper Lithography Ip B.V. | Lithography system and projection method |
| JP6049627B2 (ja) * | 2010-11-13 | 2016-12-21 | マッパー・リソグラフィー・アイピー・ビー．ブイ． | 中間チャンバを備えた荷電粒子リソグラフィシステム |
| EP2638560B1 (en) * | 2010-11-13 | 2017-02-22 | Mapper Lithography IP B.V. | Charged particle lithography system with aperture array cooling |
| JP5253532B2 (ja) * | 2011-03-01 | 2013-07-31 | キヤノン株式会社 | 偏向器アレイ、偏向器アレイの製造方法、描画装置、および物品の製造方法 |
| NL2007604C2 (en) * | 2011-10-14 | 2013-05-01 | Mapper Lithography Ip Bv | Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams. |
| EP3279624B1 (en) | 2015-04-03 | 2019-08-28 | Hitachi High-Technologies Corporation | Light quantity detection device, and immunoanalysis device and charged particle beam device using same |
-
2013
- 2013-05-14 NL NL2010799A patent/NL2010799C2/en active
- 2013-05-14 JP JP2015512034A patent/JP5973061B2/ja active Active
- 2013-05-14 KR KR1020147035213A patent/KR101945964B1/ko active Active
- 2013-05-14 WO PCT/EP2013/059948 patent/WO2013171216A1/en not_active Ceased
- 2013-05-14 CN CN201380037560.8A patent/CN104471669B/zh active Active
- 2013-05-14 EP EP13722748.4A patent/EP2850635B1/en active Active
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