JP2015521385A5 - - Google Patents

Download PDF

Info

Publication number
JP2015521385A5
JP2015521385A5 JP2015512034A JP2015512034A JP2015521385A5 JP 2015521385 A5 JP2015521385 A5 JP 2015521385A5 JP 2015512034 A JP2015512034 A JP 2015512034A JP 2015512034 A JP2015512034 A JP 2015512034A JP 2015521385 A5 JP2015521385 A5 JP 2015521385A5
Authority
JP
Japan
Prior art keywords
plate
cooling
small beam
cooling channels
coolant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2015512034A
Other languages
English (en)
Japanese (ja)
Other versions
JP5973061B2 (ja
JP2015521385A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2013/059948 external-priority patent/WO2013171216A1/en
Publication of JP2015521385A publication Critical patent/JP2015521385A/ja
Publication of JP2015521385A5 publication Critical patent/JP2015521385A5/ja
Application granted granted Critical
Publication of JP5973061B2 publication Critical patent/JP5973061B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2015512034A 2012-05-14 2013-05-14 荷電粒子マルチ小ビームリソグラフィシステム及び冷却装置製造方法 Active JP5973061B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261646398P 2012-05-14 2012-05-14
US61/646,398 2012-05-14
PCT/EP2013/059948 WO2013171216A1 (en) 2012-05-14 2013-05-14 Charged particle multi-beamlet lithography system and cooling arrangement manufacturing method

Publications (3)

Publication Number Publication Date
JP2015521385A JP2015521385A (ja) 2015-07-27
JP2015521385A5 true JP2015521385A5 (enExample) 2016-07-14
JP5973061B2 JP5973061B2 (ja) 2016-08-23

Family

ID=48444378

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015512034A Active JP5973061B2 (ja) 2012-05-14 2013-05-14 荷電粒子マルチ小ビームリソグラフィシステム及び冷却装置製造方法

Country Status (6)

Country Link
EP (1) EP2850635B1 (enExample)
JP (1) JP5973061B2 (enExample)
KR (1) KR101945964B1 (enExample)
CN (1) CN104471669B (enExample)
NL (1) NL2010799C2 (enExample)
WO (1) WO2013171216A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11348756B2 (en) 2012-05-14 2022-05-31 Asml Netherlands B.V. Aberration correction in charged particle system
NL2010797C2 (en) 2012-05-14 2014-08-21 Mapper Lithography Ip Bv Charged particle lithography system and beam generator.
NL2013438B1 (en) 2013-09-07 2016-05-18 Mapper Lithography Ip Bv Target processing unit.
WO2015071440A1 (en) * 2013-11-14 2015-05-21 Mapper Lithography Ip B.V. Electrode cooling arrangement
US10486232B2 (en) 2015-04-21 2019-11-26 Varian Semiconductor Equipment Associates, Inc. Semiconductor manufacturing device with embedded fluid conduits
US9829804B1 (en) 2016-07-28 2017-11-28 Mapper Lithography Ip B.V. Substrate holding device, method for manufacturing such a device, and use of such a device in a lithography system
CN108121164B (zh) * 2016-11-29 2020-12-01 中芯国际集成电路制造(上海)有限公司 光罩散热装置及其工作方法
KR102626791B1 (ko) * 2017-08-28 2024-01-19 에이에스엠엘 네델란즈 비.브이. 미리 결정된 시동 값을 갖는 메모리 디바이스
US12287151B2 (en) 2021-02-26 2025-04-29 Teradyne, Inc. Thermal plate having a fluid channel

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3157308A (en) 1961-09-05 1964-11-17 Clark Mfg Co J L Canister type container and method of making the same
US3159408A (en) 1961-10-05 1964-12-01 Grace W R & Co Chuck
US4524308A (en) 1984-06-01 1985-06-18 Sony Corporation Circuits for accomplishing electron beam convergence in color cathode ray tubes
WO1994025880A1 (en) 1993-04-30 1994-11-10 Board Of Regents, The University Of Texas System Megavoltage scanning imager and method for its use
EP0766405A1 (en) 1995-09-29 1997-04-02 STMicroelectronics S.r.l. Successive approximation register without redundancy
US6046457A (en) * 1998-01-09 2000-04-04 International Business Machines Corporation Charged particle beam apparatus having anticontamination means
JP2000348662A (ja) * 1999-06-02 2000-12-15 Nikon Corp 荷電粒子線照射系、荷電粒子線露光装置及び半導体デバイス製造方法
JP4355446B2 (ja) * 2000-12-28 2009-11-04 株式会社アドバンテスト 電子ビーム露光装置及び電子ビーム成形部材
US6563124B2 (en) 2001-03-21 2003-05-13 Applied Materials, Inc. Electron beam apparatus having traversing circuit boards
US6768125B2 (en) * 2002-01-17 2004-07-27 Ims Nanofabrication, Gmbh Maskless particle-beam system for exposing a pattern on a substrate
KR101368027B1 (ko) 2002-10-25 2014-02-26 마퍼 리쏘그라피 아이피 비.브이. 리소그라피 장치
EP3671804A1 (en) 2002-10-30 2020-06-24 ASML Netherlands B.V. Electron beam exposure system
WO2004081910A2 (en) 2003-03-10 2004-09-23 Mapper Lithography Ip B.V. Apparatus for generating a plurality of beamlets
JP4113032B2 (ja) * 2003-04-21 2008-07-02 キヤノン株式会社 電子銃及び電子ビーム露光装置
EP1830384B1 (en) 2003-05-28 2011-09-14 Mapper Lithography Ip B.V. Charged particle beamlet exposure system
WO2005010618A2 (en) 2003-07-30 2005-02-03 Mapper Lithography Ip B.V. Modulator circuitry
US7145641B2 (en) * 2003-12-31 2006-12-05 Asml Netherlands, B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP3929459B2 (ja) * 2004-11-11 2007-06-13 株式会社日立ハイテクノロジーズ 荷電粒子線露光装置
TWI345685B (en) * 2005-09-06 2011-07-21 Asml Netherlands Bv Lithographic method
US7709815B2 (en) 2005-09-16 2010-05-04 Mapper Lithography Ip B.V. Lithography system and projection method
JP6133212B2 (ja) * 2010-11-13 2017-05-24 マッパー・リソグラフィー・アイピー・ビー．ブイ． アパーチャアレイ冷却部を備えた荷電粒子リソグラフィシステム
JP6049627B2 (ja) * 2010-11-13 2016-12-21 マッパー・リソグラフィー・アイピー・ビー．ブイ． 中間チャンバを備えた荷電粒子リソグラフィシステム
JP5253532B2 (ja) * 2011-03-01 2013-07-31 キヤノン株式会社 偏向器アレイ、偏向器アレイの製造方法、描画装置、および物品の製造方法
NL2007604C2 (en) * 2011-10-14 2013-05-01 Mapper Lithography Ip Bv Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams.
EP3279624B1 (en) 2015-04-03 2019-08-28 Hitachi High-Technologies Corporation Light quantity detection device, and immunoanalysis device and charged particle beam device using same

Similar Documents

Publication Publication Date Title
WO2013171216A4 (en) Charged particle multi-beamlet lithography system and cooling arrangement manufacturing method
US10873115B2 (en) Housing for accommodation of a plurality of battery cells having a cooling device integrated in the housing
US9980415B2 (en) Configurable double-sided modular jet impingement assemblies for electronics cooling
US9445526B2 (en) Modular jet impingement assemblies with passive and active flow control for electronics cooling
US20150229009A1 (en) Cooling device, in particular for a battery of a motor vehicle
CN103281890B (zh) 一种水冷板
JP2016156823A5 (enExample)
TWI672468B (zh) 燈頭總成及其組裝方法
TW201236045A (en) Charged particle lithography system with aperture array cooling
US20140029199A1 (en) Cooling apparatuses and electronics modules having branching microchannels
CN111918520B (zh) 散热片和散热器
CN105308739A (zh) 液冷散热器
Han et al. Package-level Si-based micro-jet impingement cooling solution with multiple drainage micro-trenches
JP6567344B2 (ja) 伝熱プレート
US11462785B2 (en) Immersion cooling of battery device
CN108091899A (zh) 燃料电池
CN103296330A (zh) 一种电源冷却装置
CN108452541A (zh) 蒸发器和燃料电池装置
KR101449285B1 (ko) 스택형 열전 발전 시스템
JP2016025354A (ja) 伝熱板
JP2016017737A (ja) Ｔｅｄ熱交換器
CN106887624A (zh) 燃料电池
CN102741967A (zh) X 射线管
US20160025423A1 (en) Heat transfer plate
JP5577897B2 (ja) 電子デバイスとその製造方法