JP2015521103A - 低抵抗微細加工フィルタ - Google Patents
低抵抗微細加工フィルタ Download PDFInfo
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- JP2015521103A JP2015521103A JP2015512854A JP2015512854A JP2015521103A JP 2015521103 A JP2015521103 A JP 2015521103A JP 2015512854 A JP2015512854 A JP 2015512854A JP 2015512854 A JP2015512854 A JP 2015512854A JP 2015521103 A JP2015521103 A JP 2015521103A
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- 238000000034 method Methods 0.000 claims abstract description 193
- 239000012530 fluid Substances 0.000 claims abstract description 125
- 238000001914 filtration Methods 0.000 claims abstract description 113
- 239000012528 membrane Substances 0.000 claims abstract description 104
- 239000000758 substrate Substances 0.000 claims description 163
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- 238000000108 ultra-filtration Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
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- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
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- HEMINMLPKZELPP-UHFFFAOYSA-N Phosdiphen Chemical compound C=1C=C(Cl)C=C(Cl)C=1OP(=O)(OCC)OC1=CC=C(Cl)C=C1Cl HEMINMLPKZELPP-UHFFFAOYSA-N 0.000 description 1
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- UGFMBZYKVQSQFX-UHFFFAOYSA-N para-methoxy-n-methylamphetamine Chemical compound CNC(C)CC1=CC=C(OC)C=C1 UGFMBZYKVQSQFX-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
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- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D39/00—Filtering material for liquid or gaseous fluids
- B01D39/14—Other self-supporting filtering material ; Other filtering material
- B01D39/16—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres
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- B01D67/0053—Inorganic membrane manufacture by inducing porosity into non porous precursor membranes
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- B01D69/02—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor characterised by their properties
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- B01D69/10—Supported membranes; Membrane supports
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- B01D71/02—Inorganic material
- B01D71/0213—Silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
- A61M1/00—Suction or pumping devices for medical purposes; Devices for carrying-off, for treatment of, or for carrying-over, body-liquids; Drainage systems
- A61M1/14—Dialysis systems; Artificial kidneys; Blood oxygenators ; Reciprocating systems for treatment of body fluids, e.g. single needle systems for hemofiltration or pheresis
- A61M1/16—Dialysis systems; Artificial kidneys; Blood oxygenators ; Reciprocating systems for treatment of body fluids, e.g. single needle systems for hemofiltration or pheresis with membranes
- A61M1/1621—Constructional aspects thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/06—Filter cloth, e.g. knitted, woven non-woven; self-supported material
- B01D2239/065—More than one layer present in the filtering material
- B01D2239/0654—Support layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D2239/10—Filtering material manufacturing
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01D2239/12—Special parameters characterising the filtering material
- B01D2239/1216—Pore size
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D2315/14—Batch-systems
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
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- B01D2315/22—Membrane contactor
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01D2325/02—Details relating to pores or porosity of the membranes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D2325/00—Details relating to properties of membranes
- B01D2325/02—Details relating to pores or porosity of the membranes
- B01D2325/021—Pore shapes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/02—Details relating to pores or porosity of the membranes
- B01D2325/0283—Pore size
- B01D2325/02831—Pore size less than 1 nm
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D2325/0283—Pore size
- B01D2325/02832—1-10 nm
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/027—Nanofiltration
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Water Supply & Treatment (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Urology & Nephrology (AREA)
- Heart & Thoracic Surgery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Organic Chemistry (AREA)
- Hematology (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Emergency Medicine (AREA)
- General Chemical & Material Sciences (AREA)
- Vascular Medicine (AREA)
- Anesthesiology (AREA)
- Biomedical Technology (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Animal Behavior & Ethology (AREA)
- General Health & Medical Sciences (AREA)
- Public Health (AREA)
- Veterinary Medicine (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Micromachines (AREA)
- External Artificial Organs (AREA)
- Sampling And Sample Adjustment (AREA)
- Diaphragms And Bellows (AREA)
Abstract
Description
Claims (21)
- それぞれが約100nm未満の幅を有する複数の孔を備える平坦な膜部分と、
前記膜部分と結合した基板を備える支持体部分であって、前記基板が複数の厚い部分、及び隣接する厚い部分間にある第2の薄い部分において前記厚い部分間にある複数の凹部を含み、前記凹部が前記複数の孔の前記孔と通じる支持体部分と
を備える微細加工ろ過デバイス。 - 前記基板の前記薄い部分が約10μmから約100μmの厚さを備える、請求項1に記載の微細加工ろ過デバイス。
- 前記基板の前記薄い部分が約20μmから約50μmの厚さを備える、請求項2に記載の微細加工ろ過デバイス。
- 前記基板と前記膜部分との間に追加の材料層をさらに備える、請求項1に記載の微細加工ろ過デバイス。
- 前記追加の材料層が誘電体材料を備える、請求項4に記載の微細加工ろ過デバイス。
- それぞれが約100nm未満の幅を有する複数の孔を備える平坦な膜部分と、
前記膜部分と結合した基板を備える支持体部分であって、前記基板が複数の厚い部分、及び隣接する厚い部分間にある第2の薄い部分において前記厚い部分間にある複数の凹部を含み、前記凹部が前記複数の孔の前記孔と通じる支持体部分と
を備えるろ過デバイスに流体を供出することと、
ろ過された流体を生成するために前記流体を前記平坦な膜部分上に流すことと、
前記ろ過デバイスから前記ろ過された流体を供出することと
を含む、微細加工ろ過デバイスを使用する方法。 - 前記ろ過デバイスが、前記ろ過デバイスの前記膜部分と流体連通する第1のチャネル、及び前記ろ過デバイスの前記支持体部分と流体連通する第2のチャネルをさらに含む、請求項6に記載の方法。
- 第1の流体を前記第1のチャネルを通って第1の流れの方向に流すことと、
第2の流体を前記第2のチャネルを通って前記第1の流れの方向と反対方向の流れの方向に流すことと、
前記第1の流体と前記第2の流体との間の前記膜部分を横切って溶質を輸送することと
をさらに含む、請求項7に記載の方法。 - 前記ろ過デバイスの前記膜部分を横切って等しい圧力を維持するように、前記第1及び第2の流体を、前記ろ過デバイスを通って送り出すことをさらに含む、請求項8に記載の方法。
- 前記ろ過デバイスに前記流体を供出する前に追加の材料を前記第1の流体に組み込むことをさらに含む、請求項9に記載の方法。
- 高さが約1μm未満の厚さを有し、約10nm未満の幅を有する複数の孔を画成する膜部分と、
前記膜部分と結合した基板を備える支持体部分であって、前記基板がキャビティ及び複数の凹部を少なくとも部分的に画成し、
前記キャビティが前記基板の裏面に位置し、前記複数の凹部と通じ、前記凹部が前記画成された孔と通じ、
前記複数の凹部が、任意の2つの凹部間に位置する前記基板の部分それぞれが約50μm以下の高さを備えるように前記基板の部分によって画成される
支持体部分と
を備える、微細加工ろ過デバイス。 - 前記支持体部分が前記基板と膜部分との間に配置された少なくとも1つの追加の材料層をさらに備え、前記少なくとも1つの追加の層が前記凹部の一部分を画成する、請求項11に記載の微細加工ろ過デバイス。
- 任意の2つの凹部間に位置する前記基板の前記部分が約20μm以上の高さを備える、請求項11に記載の微細加工ろ過デバイス。
- 前記複数の凹部が約150μm未満の直径を備える、請求項11に記載の微細加工ろ過デバイス。
- 前記基板が単一の均質の材料層を備える、請求項11に記載の微細加工ろ過デバイス。
- 前記キャビティが前記複数の凹部に向かって内側に傾斜する壁を備える、請求項11に記載の微細加工ろ過デバイス。
- 前記複数の凹部が約100μm×約50μmの長さ×幅の寸法を備える、請求項11に記載の微細加工ろ過デバイス。
- 半導体基板上に誘電体層を堆積させることと、
前記誘電体層上に第1の膜材料層を形成し、前記第1の膜材料層にパターンをエッチングすることと、
前記パターニングされた第1の膜材料層上に犠牲誘電体層を形成し、前記犠牲誘電体層上に第2の膜材料層を形成することと、
前記第2の膜材料層上に保護層を形成することと、
前記膜材料層まで延在しないキャビティを生成する第1のエッチング液プロセスによって前記基板をエッチングすることと、
前記基板の残りの部分を貫いて複数の凹部を形成する第2のエッチング液プロセスによって前記基板をエッチングすることと、
前記膜材料層を貫く孔を形成する前記犠牲誘電体層を除去する第3のエッチング液プロセスによって前記ろ過デバイスをエッチングすることであって、前記孔、凹部、及び前記キャビティの組合せが前記ろ過デバイスを貫く開口を生成するように、前記凹部へのアクセスを与えるエッチングをすることと
を含む、微細加工ろ過デバイスを作る方法。 - 前記第1のエッチング液プロセスがウェットエッチング液を含む、請求項18に記載の方法。
- 前記第1及び第2のエッチング液プロセスが反応性イオンエッチを含む、請求項19に記載の方法。
- 第1の流体をろ過デバイス内に供出することと、
高さが約1μm未満の厚さを有し、それぞれが約50nm未満の幅を有する複数の孔を画成する膜部分を含む前記ろ過デバイス内に位置するろ過部材の前面を横切って前記第1の流体を流すことと、
前記膜部分と結合した基板を備える支持体部分を含む前記ろ過デバイス内に位置する前記ろ過部材の裏面を横切って第2の流体を流すことであって、前記基板がキャビティ及び複数の凹部を少なくとも部分的に画成し、
前記キャビティが前記基板の裏面に位置し、前記複数の凹部と通じ、前記凹部が前記画成された孔と通じ、
前記複数の凹部が、任意の2つの凹部間に位置する前記基板の部分それぞれが約50μm以下の高さを備えるように前記基板の部分によって画成され、
ろ過された第1の流体を生成するため拡散輸送が前記第1の流体と第2の流体間で前記膜部分を横切って行われるように、前記第2の流体が前記キャビティを通って流れ、前記第2の流体を前記凹部に提供する、ことと、
前記ろ過デバイスから前記ろ過された第1の流体を移送することと
を含む、流体をろ過する方法。
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