JP2015520358A - 小型自蔵式ホログラフィ及び干渉計デバイス - Google Patents

小型自蔵式ホログラフィ及び干渉計デバイス Download PDF

Info

Publication number
JP2015520358A
JP2015520358A JP2015502150A JP2015502150A JP2015520358A JP 2015520358 A JP2015520358 A JP 2015520358A JP 2015502150 A JP2015502150 A JP 2015502150A JP 2015502150 A JP2015502150 A JP 2015502150A JP 2015520358 A JP2015520358 A JP 2015520358A
Authority
JP
Japan
Prior art keywords
reference beam
image plane
object beam
lens
optical path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2015502150A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015520358A5 (enExample
Inventor
ヴラディミルスキー，ユリ
リジコフ，レヴ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Holding NV
Original Assignee
ASML Holding NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Holding NV filed Critical ASML Holding NV
Publication of JP2015520358A publication Critical patent/JP2015520358A/ja
Publication of JP2015520358A5 publication Critical patent/JP2015520358A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/021—Interferometers using holographic techniques
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/04—Measuring microscopes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G02B21/08—Condensers
    • G02B21/14—Condensers affording illumination for phase-contrast observation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/34—Phase-edge PSM, e.g. chromeless PSM; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005—Adaptation of holography to specific applications
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0402—Recording geometries or arrangements
    • G03H1/041—Optical element in the object space affecting the object beam, not otherwise provided for
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0443—Digital holography, i.e. recording holograms with digital recording means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0486—Improving or monitoring the quality of the record, e.g. by compensating distortions, aberrations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0493—Special holograms not otherwise provided for, e.g. conoscopic, referenceless holography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005—Adaptation of holography to specific applications
    • G03H2001/005—Adaptation of holography to specific applications in microscopy, e.g. digital holographic microscope [DHM]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0443—Digital holography, i.e. recording holograms with digital recording means
    • G03H2001/0447—In-line recording arrangement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2223/00—Optical components
    • G03H2223/50—Particular location or purpose of optical element
    • G03H2223/52—Filtering the object information

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Computing Systems (AREA)
  • Theoretical Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2015502150A 2012-03-29 2013-01-31 小型自蔵式ホログラフィ及び干渉計デバイス Pending JP2015520358A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261617348P 2012-03-29 2012-03-29
US61/617,348 2012-03-29
PCT/EP2013/051932 WO2013143723A1 (en) 2012-03-29 2013-01-31 Compact self-contained holographic and interferometric apparatus

Publications (2)

Publication Number Publication Date
JP2015520358A true JP2015520358A (ja) 2015-07-16
JP2015520358A5 JP2015520358A5 (enExample) 2016-03-17

Family

ID=47633062

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015502150A Pending JP2015520358A (ja) 2012-03-29 2013-01-31 小型自蔵式ホログラフィ及び干渉計デバイス

Country Status (5)

Country Link
US (1) US20150085291A1 (enExample)
JP (1) JP2015520358A (enExample)
NL (1) NL2010215A (enExample)
TW (1) TW201339537A (enExample)
WO (1) WO2013143723A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6286546B2 (ja) * 2013-07-30 2018-02-28 ドルビー ラボラトリーズ ライセンシング コーポレイション 非機械的ミラービームステアリングを備えたプロジェクタ表示システム
WO2016030205A1 (en) * 2014-08-28 2016-03-03 Vrije Universiteit Amsterdam Inspection apparatus, inspection method and manufacturing method
NL2021848A (en) 2018-04-09 2018-11-06 Stichting Vu Holographic metrology apparatus.
EP3825752A1 (de) * 2019-11-20 2021-05-26 Siemens Aktiengesellschaft Kompaktes common path interferometer

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001165634A (ja) * 1999-12-09 2001-06-22 Fujitsu Ltd 表面形状測定装置
JP2011508241A (ja) * 2008-11-26 2011-03-10 ザイゴ コーポレーション 低コヒーレンス走査干渉法における走査エラー補正

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040130762A1 (en) * 2002-09-12 2004-07-08 Thomas Clarence E. Optical acquisition systems for direct-to-digital holography and holovision
US8184298B2 (en) * 2008-05-21 2012-05-22 The Board Of Trustees Of The University Of Illinois Spatial light interference microscopy and fourier transform light scattering for cell and tissue characterization
JP5201580B2 (ja) * 2008-06-06 2013-06-05 新オプトウエア株式会社 ホログラム作成装置及びホログラムプリンタ
JP2012530929A (ja) * 2009-06-22 2012-12-06 エーエスエムエル ネザーランズ ビー．ブイ． オブジェクト検査システムおよび方法
US8559014B2 (en) * 2009-09-25 2013-10-15 Hwan J. Jeong High-resolution, common-path interferometric imaging systems and methods
US9360423B2 (en) * 2011-07-01 2016-06-07 Canon Kabushiki Kaisha Optical system for a holographic microscope including a spatial filter
US9164479B2 (en) * 2011-09-16 2015-10-20 University Of Massachusetts Systems and methods of dual-plane digital holographic microscopy
US9557549B2 (en) * 2011-12-09 2017-01-31 Massachusetts Institute Of Technology Systems and methods for self-referenced quantitative phase microscopy

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001165634A (ja) * 1999-12-09 2001-06-22 Fujitsu Ltd 表面形状測定装置
JP2011508241A (ja) * 2008-11-26 2011-03-10 ザイゴ コーポレーション 低コヒーレンス走査干渉法における走査エラー補正

Also Published As

Publication number Publication date
TW201339537A (zh) 2013-10-01
US20150085291A1 (en) 2015-03-26
WO2013143723A1 (en) 2013-10-03
NL2010215A (en) 2013-10-01

Similar Documents

Publication Publication Date Title
KR102523532B1 (ko) 구조의 특성을 결정하는 방법 및 계측 장치
KR102076021B1 (ko) 검사와 계측을 위한 방법 및 장치
JP5277348B2 (ja) オーバーレイエラーを決定する方法
JP5284481B2 (ja) スキャトロメータおよびリソグラフィ装置
JP4812712B2 (ja) 基板の特性を測定する方法及びデバイス測定方法
JP6500107B2 (ja) 光学瞳対称化のための方法および装置
TWI686587B (zh) 度量衡裝置、微影系統及量測結構之方法
JP2011525713A (ja) オーバレイ測定装置、リソグラフィ装置、及びそのようなオーバレイ測定装置を用いたデバイス製造方法
JP2013034013A (ja) 検査装置、リソグラフィ装置、リソグラフィプロセシングセルおよび検査方法
JP6275834B2 (ja) 検査装置及び方法、リソグラフィ装置、リソグラフィ処理セル並びにデバイス製造方法
TWI691800B (zh) 量測系統、微影系統及量測目標的方法
KR20110015624A (ko) 리소그래피용 검사 장치
CN110050232A (zh) 量测设备、光刻系统和测量结构的方法
KR100823242B1 (ko) 리소그래피 장치, 렌즈 간섭계 및 디바이스 제조 방법
JP5283372B2 (ja) スキャトロメータの収差を測定する方法
JP2013500597A (ja) リソグラフィ用の検査方法
JP2015520358A (ja) 小型自蔵式ホログラフィ及び干渉計デバイス
JP5525547B2 (ja) 特性を求める方法
JP5784576B2 (ja) リソグラフィ装置および方法
US20210240091A1 (en) Alignment Method and Apparatus
KR20210029292A (ko) 간섭성을 갖는 방사선 빔 처리 장치 및 방법

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160126

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20160126

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20161214

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20161216

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20170630