NL2010215A - Compact self-contained holographic and interferometric apparatus. - Google Patents
Compact self-contained holographic and interferometric apparatus. Download PDFInfo
- Publication number
- NL2010215A NL2010215A NL2010215A NL2010215A NL2010215A NL 2010215 A NL2010215 A NL 2010215A NL 2010215 A NL2010215 A NL 2010215A NL 2010215 A NL2010215 A NL 2010215A NL 2010215 A NL2010215 A NL 2010215A
- Authority
- NL
- Netherlands
- Prior art keywords
- reference beam
- lens
- image plane
- optical
- substrate
- Prior art date
Links
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- 238000000059 patterning Methods 0.000 claims description 42
- 230000005855 radiation Effects 0.000 claims description 36
- 238000001459 lithography Methods 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 description 97
- 238000005259 measurement Methods 0.000 description 54
- 238000000034 method Methods 0.000 description 40
- 238000003384 imaging method Methods 0.000 description 37
- 210000001747 pupil Anatomy 0.000 description 34
- 238000007689 inspection Methods 0.000 description 24
- 230000001902 propagating effect Effects 0.000 description 17
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- 238000012545 processing Methods 0.000 description 10
- 238000006073 displacement reaction Methods 0.000 description 9
- 230000015654 memory Effects 0.000 description 8
- 230000007547 defect Effects 0.000 description 6
- 238000001093 holography Methods 0.000 description 6
- 238000004891 communication Methods 0.000 description 5
- 238000011835 investigation Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
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- 238000007654 immersion Methods 0.000 description 4
- 238000005305 interferometry Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000386 microscopy Methods 0.000 description 4
- 230000010363 phase shift Effects 0.000 description 4
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- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 230000002452 interceptive effect Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
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- 238000000206 photolithography Methods 0.000 description 2
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- 238000012876 topography Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 238000003491 array Methods 0.000 description 1
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- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/021—Interferometers using holographic techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/04—Measuring microscopes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/06—Means for illuminating specimens
- G02B21/08—Condensers
- G02B21/14—Condensers affording illumination for phase-contrast observation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/34—Phase-edge PSM, e.g. chromeless PSM; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0402—Recording geometries or arrangements
- G03H1/041—Optical element in the object space affecting the object beam, not otherwise provided for
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0443—Digital holography, i.e. recording holograms with digital recording means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0486—Improving or monitoring the quality of the record, e.g. by compensating distortions, aberrations
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0493—Special holograms not otherwise provided for, e.g. conoscopic, referenceless holography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
- G03H2001/005—Adaptation of holography to specific applications in microscopy, e.g. digital holographic microscope [DHM]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0443—Digital holography, i.e. recording holograms with digital recording means
- G03H2001/0447—In-line recording arrangement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2223/00—Optical components
- G03H2223/50—Particular location or purpose of optical element
- G03H2223/52—Filtering the object information
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Computing Systems (AREA)
- Theoretical Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Microscoopes, Condenser (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261617348P | 2012-03-29 | 2012-03-29 | |
| US201261617348 | 2012-03-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2010215A true NL2010215A (en) | 2013-10-01 |
Family
ID=47633062
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2010215A NL2010215A (en) | 2012-03-29 | 2013-01-31 | Compact self-contained holographic and interferometric apparatus. |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20150085291A1 (enExample) |
| JP (1) | JP2015520358A (enExample) |
| NL (1) | NL2010215A (enExample) |
| TW (1) | TW201339537A (enExample) |
| WO (1) | WO2013143723A1 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11119415B2 (en) | 2018-04-09 | 2021-09-14 | Asml Netherlands B.V. | Method of determining a characteristic of a structure, and metrology apparatus |
| EP3667412B1 (en) * | 2013-07-30 | 2023-11-01 | Dolby Laboratories Licensing Corporation | Projector display systems having non-mechanical mirror beam steering |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016030205A1 (en) * | 2014-08-28 | 2016-03-03 | Vrije Universiteit Amsterdam | Inspection apparatus, inspection method and manufacturing method |
| EP3825752A1 (de) * | 2019-11-20 | 2021-05-26 | Siemens Aktiengesellschaft | Kompaktes common path interferometer |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001165634A (ja) * | 1999-12-09 | 2001-06-22 | Fujitsu Ltd | 表面形状測定装置 |
| US20040130762A1 (en) * | 2002-09-12 | 2004-07-08 | Thomas Clarence E. | Optical acquisition systems for direct-to-digital holography and holovision |
| US8184298B2 (en) * | 2008-05-21 | 2012-05-22 | The Board Of Trustees Of The University Of Illinois | Spatial light interference microscopy and fourier transform light scattering for cell and tissue characterization |
| JP5201580B2 (ja) * | 2008-06-06 | 2013-06-05 | 新オプトウエア株式会社 | ホログラム作成装置及びホログラムプリンタ |
| US8120781B2 (en) * | 2008-11-26 | 2012-02-21 | Zygo Corporation | Interferometric systems and methods featuring spectral analysis of unevenly sampled data |
| JP2012530929A (ja) * | 2009-06-22 | 2012-12-06 | エーエスエムエル ネザーランズ ビー．ブイ． | オブジェクト検査システムおよび方法 |
| US8559014B2 (en) * | 2009-09-25 | 2013-10-15 | Hwan J. Jeong | High-resolution, common-path interferometric imaging systems and methods |
| US9360423B2 (en) * | 2011-07-01 | 2016-06-07 | Canon Kabushiki Kaisha | Optical system for a holographic microscope including a spatial filter |
| US9164479B2 (en) * | 2011-09-16 | 2015-10-20 | University Of Massachusetts | Systems and methods of dual-plane digital holographic microscopy |
| US9557549B2 (en) * | 2011-12-09 | 2017-01-31 | Massachusetts Institute Of Technology | Systems and methods for self-referenced quantitative phase microscopy |
-
2013
- 2013-01-31 WO PCT/EP2013/051932 patent/WO2013143723A1/en not_active Ceased
- 2013-01-31 JP JP2015502150A patent/JP2015520358A/ja active Pending
- 2013-01-31 US US14/388,322 patent/US20150085291A1/en not_active Abandoned
- 2013-01-31 NL NL2010215A patent/NL2010215A/en not_active Application Discontinuation
- 2013-02-19 TW TW102105764A patent/TW201339537A/zh unknown
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3667412B1 (en) * | 2013-07-30 | 2023-11-01 | Dolby Laboratories Licensing Corporation | Projector display systems having non-mechanical mirror beam steering |
| US11119415B2 (en) | 2018-04-09 | 2021-09-14 | Asml Netherlands B.V. | Method of determining a characteristic of a structure, and metrology apparatus |
| US12399434B2 (en) | 2018-04-09 | 2025-08-26 | Asml Netherlands B.V. | Method of determining a characteristic of a structure, and metrology apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201339537A (zh) | 2013-10-01 |
| US20150085291A1 (en) | 2015-03-26 |
| JP2015520358A (ja) | 2015-07-16 |
| WO2013143723A1 (en) | 2013-10-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WDAP | Patent application withdrawn |
Effective date: 20140303 |