JP2015509133A5 - - Google Patents

Download PDF

Info

Publication number
JP2015509133A5
JP2015509133A5 JP2014520733A JP2014520733A JP2015509133A5 JP 2015509133 A5 JP2015509133 A5 JP 2015509133A5 JP 2014520733 A JP2014520733 A JP 2014520733A JP 2014520733 A JP2014520733 A JP 2014520733A JP 2015509133 A5 JP2015509133 A5 JP 2015509133A5
Authority
JP
Japan
Prior art keywords
deposition method
vapor deposition
vapor
cracked
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014520733A
Other languages
English (en)
Japanese (ja)
Other versions
JP6151690B2 (ja
JP2015509133A (ja
Filing date
Publication date
Priority claimed from GB1112600.0A external-priority patent/GB2493020B/en
Application filed filed Critical
Publication of JP2015509133A publication Critical patent/JP2015509133A/ja
Publication of JP2015509133A5 publication Critical patent/JP2015509133A5/ja
Application granted granted Critical
Publication of JP6151690B2 publication Critical patent/JP6151690B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2014520733A 2011-07-21 2012-07-20 化合物の調製のための蒸着方法 Active JP6151690B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB1112600.0A GB2493020B (en) 2011-07-21 2011-07-21 Vapour deposition process for the preparation of a chemical compound
GB1112600.0 2011-07-21
PCT/GB2012/051741 WO2013011327A2 (en) 2011-07-21 2012-07-20 Vapour deposition process for the preparation of a chemical compound

Publications (3)

Publication Number Publication Date
JP2015509133A JP2015509133A (ja) 2015-03-26
JP2015509133A5 true JP2015509133A5 (enExample) 2015-07-02
JP6151690B2 JP6151690B2 (ja) 2017-06-21

Family

ID=44652141

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014520733A Active JP6151690B2 (ja) 2011-07-21 2012-07-20 化合物の調製のための蒸着方法

Country Status (6)

Country Link
US (1) US9067790B2 (enExample)
EP (1) EP2734657A2 (enExample)
JP (1) JP6151690B2 (enExample)
CN (1) CN104093876B (enExample)
GB (1) GB2493020B (enExample)
WO (1) WO2013011327A2 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2493022B (en) * 2011-07-21 2014-04-23 Ilika Technologies Ltd Vapour deposition process for the preparation of a phosphate compound
US9627680B2 (en) * 2013-11-15 2017-04-18 Sumitomo Metal Mining Co., Ltd. Method for producing surface-treated oxide particles, and oxide particles produced by said production method
GB201400274D0 (en) 2014-01-08 2014-02-26 Ilika Technologies Ltd Vapour deposition method for preparing amorphous lithium-containing compounds
GB201400276D0 (en) 2014-01-08 2014-02-26 Ilika Technologies Ltd Vapour deposition method for fabricating lithium-containing thin film layered structures
GB201400277D0 (en) * 2014-01-08 2014-02-26 Ilika Technologies Ltd Vapour deposition method for preparing crystalline lithium-containing compounds
FR3020503B1 (fr) * 2014-04-24 2016-05-06 Commissariat Energie Atomique Electrolyte solide pour micro batterie
WO2016125230A1 (ja) * 2015-02-02 2016-08-11 富士通株式会社 固体電解質、及び全固体電池
US10177406B2 (en) 2015-07-21 2019-01-08 Samsung Electronics Co., Ltd. Solid electrolyte and/or electroactive material
TWI618282B (zh) * 2015-08-28 2018-03-11 行政院原子能委員會核能研究所 多晶粒電極製造方法
CN105870434B (zh) * 2016-06-06 2019-12-20 南昌大学 一种硅粉掺杂的方法
WO2017216532A1 (en) 2016-06-15 2017-12-21 Ilika Technologies Limited Lithium borosilicate glass as electrolyte and electrode protective layer
US20180127875A1 (en) * 2016-11-04 2018-05-10 National Chung Shan Institute Of Science And Technology Apparatus for performing selenization and sulfurization process on glass substrate
WO2018168963A1 (ja) * 2017-03-15 2018-09-20 キヤノンオプトロン株式会社 親水性蒸着膜及び蒸着材料
GB2575786B (en) 2018-07-20 2021-11-03 Dyson Technology Ltd Stack for an energy storage device
GB201814039D0 (en) 2018-08-29 2018-10-10 Ilika Tech Ltd Method
CN109160501A (zh) * 2018-11-06 2019-01-08 中山大学 用微波等离子体化学气相沉积制备过渡金属磷化物的方法
GB2589626A (en) 2019-12-05 2021-06-09 Ilika Tech Ltd Method
CN114774886B (zh) * 2022-06-21 2022-09-13 柔电(武汉)科技有限公司 一种耐氧化抗盐雾吸波材料粉体及制备方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE895514A (nl) * 1981-12-30 1983-06-30 Stauffer Chemical Co Kettingvormige fosformaterialen, de bereiding en toepassing daarvan alsmede halfgeleiders en andere inrichtingen waarin zij worden toegepast
US4649024A (en) * 1983-06-29 1987-03-10 Stauffer Chemical Company Method for forming evaporated pnictide and alkali metal polypnictide films
US4878989A (en) * 1986-11-26 1989-11-07 Texas Instruments Incorporated Chemical beam epitaxy system
US5730852A (en) * 1995-09-25 1998-03-24 Davis, Joseph & Negley Preparation of cuxinygazsen (X=0-2, Y=0-2, Z=0-2, N=0-3) precursor films by electrodeposition for fabricating high efficiency solar cells
CA2311061C (en) * 1999-06-11 2009-10-06 National Research Council Of Canada Molecular beam epitaxy (mbe) growth of semi-insulating c-doped gan
US6852139B2 (en) 2003-07-11 2005-02-08 Excellatron Solid State, Llc System and method of producing thin-film electrolyte
GB2406860A (en) 2003-10-09 2005-04-13 Univ Southampton Vapour deposition method
US20050229856A1 (en) * 2004-04-20 2005-10-20 Malik Roger J Means and method for a liquid metal evaporation source with integral level sensor and external reservoir
CA2649520A1 (en) * 2006-04-14 2007-10-25 Silica Tech, Llc Plasma deposition apparatus and method for making solar cells
KR101234233B1 (ko) * 2006-05-18 2013-02-18 삼성에스디아이 주식회사 포스페이트를 포함하는 반도체 전극 및 이를 채용한태양전지
JP5246839B2 (ja) * 2006-08-24 2013-07-24 独立行政法人産業技術総合研究所 半導体薄膜の製造方法、半導体薄膜の製造装置、光電変換素子の製造方法及び光電変換素子
JP4963679B2 (ja) * 2007-05-29 2012-06-27 キヤノン株式会社 液体吐出ヘッド用基体及びその製造方法、並びに該基体を用いる液体吐出ヘッド
CA2703288A1 (en) * 2007-11-20 2009-05-28 Mosaic Crystals Ltd. Amorphous group iii-v semiconductor material and preparation thereof
US20090325340A1 (en) * 2008-06-30 2009-12-31 Mohd Aslami Plasma vapor deposition system and method for making multi-junction silicon thin film solar cell modules and panels
US20100037824A1 (en) * 2008-08-13 2010-02-18 Synos Technology, Inc. Plasma Reactor Having Injector
KR101245371B1 (ko) * 2009-06-19 2013-03-19 한국전자통신연구원 태양전지 및 그 제조방법

Similar Documents

Publication Publication Date Title
JP2015509133A5 (enExample)
JP2014525989A5 (enExample)
GB201112600D0 (en) Vapour deposition proces for the preparation of a chemical compound
Parasyuk et al. Crystal growth, electron structure and photo induced optical changes in novel AgxGaxGe1− xSe2 (x= 0.333, 0.250, 0.200, 0.167) crystals
GB201112604D0 (en) Vapour deposition process for the preparation of a phosphate compound
Kieslich et al. Role of entropic effects in controlling the polymorphism in formate ABX 3 metal–organic frameworks
RU2012108604A (ru) Осаждение на большой площади и легирование графена и содержащие его продукты
Park et al. The critical effect of solvent geometry on the determination of fullerene (C 60) self-assembly into dot, wire and disk structures
JP6234594B2 (ja) アモルファスリチウム含有化合物を作製するための蒸着方法
KR101560370B1 (ko) 수용성 규산염 및 그 제조방법
JP2014502039A5 (enExample)
JP2014201463A5 (enExample)
Chen et al. Low-temperature growth of Na doped CIGS films on flexible polymer substrates by pulsed laser ablation from a Na containing target
Aoki et al. Chemical and structural changes of 70Li2S-30P2S5 solid electrolyte during heat treatment
Sun et al. High-sulfur Cu2ZnSn (S, Se) 4 films by sulfurizing as-deposited CZTSe film: The evolutions of phase, crystallinity and S/(S+ Se) ratio
Arepalli et al. Influence of substrate temperature on the growth properties of Ag-doped SnS films deposited by sputtering method
Miao et al. Crystallization temperature investigation of Cu2ZnSnS4 by using Differential scanning calorimetry (DSC)
US20190010629A1 (en) METHOD FOR MANUFACTURING SINGLE-CRYSTAL SiC, AND HOUSING CONTAINER
Muhammad et al. Optical and morphological modifications in post-thermally treated tris (8-hydroxyquinoline) gallium films deposited on quartz substrates
JP2013054927A5 (enExample)
Reyes‐Francis et al. Enhancing Stability of Microwave‐Synthesized Cs2SnxTi1‐xBr6 Perovskite by Cation Mixing
CA2933658A1 (en) Iron-ion supply material
US20170253990A1 (en) A method for producing monocrystalline gallium containing nitride and monocrystalline gallium containing nitride, prepared with this method
Sun et al. Investigation of structural properties of electron-beam deposition of zinc oxide coatings doped with copper
Stathokostopoulos et al. Experimental and thermodynamic considerations of Mg2Si coatings deposited by pack cementation process