JP2015505419A5 - - Google Patents

Download PDF

Info

Publication number
JP2015505419A5
JP2015505419A5 JP2014553398A JP2014553398A JP2015505419A5 JP 2015505419 A5 JP2015505419 A5 JP 2015505419A5 JP 2014553398 A JP2014553398 A JP 2014553398A JP 2014553398 A JP2014553398 A JP 2014553398A JP 2015505419 A5 JP2015505419 A5 JP 2015505419A5
Authority
JP
Japan
Prior art keywords
plasma
filter assembly
plasma cell
cell
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014553398A
Other languages
English (en)
Japanese (ja)
Other versions
JP6333734B2 (ja
JP2015505419A (ja
Filing date
Publication date
Priority claimed from US13/741,566 external-priority patent/US9927094B2/en
Application filed filed Critical
Publication of JP2015505419A publication Critical patent/JP2015505419A/ja
Publication of JP2015505419A5 publication Critical patent/JP2015505419A5/ja
Application granted granted Critical
Publication of JP6333734B2 publication Critical patent/JP6333734B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2014553398A 2012-01-17 2013-01-17 レーザ維持プラズマ光源におけるｖｕｖフィルタリングを提供するためのプラズマセル Active JP6333734B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261587380P 2012-01-17 2012-01-17
US61/587,380 2012-01-17
US13/741,566 US9927094B2 (en) 2012-01-17 2013-01-15 Plasma cell for providing VUV filtering in a laser-sustained plasma light source
US13/741,566 2013-01-15
PCT/US2013/021857 WO2013109701A1 (en) 2012-01-17 2013-01-17 Plasma cell for providing vuv filtering in a laser-sustained plasma light source

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018084339A Division JP6509404B2 (ja) 2012-01-17 2018-04-25 レーザ維持プラズマ光源におけるｖｕｖフィルタリングを提供するためのプラズマセル

Publications (3)

Publication Number Publication Date
JP2015505419A JP2015505419A (ja) 2015-02-19
JP2015505419A5 true JP2015505419A5 (https=) 2016-03-03
JP6333734B2 JP6333734B2 (ja) 2018-05-30

Family

ID=48779500

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2014553398A Active JP6333734B2 (ja) 2012-01-17 2013-01-17 レーザ維持プラズマ光源におけるｖｕｖフィルタリングを提供するためのプラズマセル
JP2018084339A Active JP6509404B2 (ja) 2012-01-17 2018-04-25 レーザ維持プラズマ光源におけるｖｕｖフィルタリングを提供するためのプラズマセル

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2018084339A Active JP6509404B2 (ja) 2012-01-17 2018-04-25 レーザ維持プラズマ光源におけるｖｕｖフィルタリングを提供するためのプラズマセル

Country Status (5)

Country Link
US (3) US9927094B2 (https=)
JP (2) JP6333734B2 (https=)
KR (2) KR102004520B1 (https=)
DE (2) DE112013000595T5 (https=)
WO (1) WO2013109701A1 (https=)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8796652B2 (en) * 2012-08-08 2014-08-05 Kla-Tencor Corporation Laser sustained plasma bulb including water
US9232622B2 (en) * 2013-02-22 2016-01-05 Kla-Tencor Corporation Gas refraction compensation for laser-sustained plasma bulbs
US8853655B2 (en) * 2013-02-22 2014-10-07 Kla-Tencor Corporation Gas refraction compensation for laser-sustained plasma bulbs
US9709811B2 (en) 2013-08-14 2017-07-18 Kla-Tencor Corporation System and method for separation of pump light and collected light in a laser pumped light source
IL234728A0 (en) * 2013-09-20 2014-11-30 Asml Netherlands Bv A light source powered by a Yadel laser
WO2015055387A1 (en) * 2013-10-17 2015-04-23 Asml Netherlands B.V. Photon source, metrology apparatus, lithographic system and device manufacturing method
WO2015086258A1 (en) * 2013-12-13 2015-06-18 Asml Netherlands B.V. Radiation source, metrology apparatus, lithographic system and device manufacturing method
US9913357B2 (en) 2013-12-13 2018-03-06 Asml Netherlands B.V. Radiation source, metrology apparatus, lithographic system and device manufacturing method
US9433070B2 (en) 2013-12-13 2016-08-30 Kla-Tencor Corporation Plasma cell with floating flange
US9530636B2 (en) 2014-03-20 2016-12-27 Kla-Tencor Corporation Light source with nanostructured antireflection layer
US9263238B2 (en) 2014-03-27 2016-02-16 Kla-Tencor Corporation Open plasma lamp for forming a light-sustained plasma
US10032620B2 (en) 2014-04-30 2018-07-24 Kla-Tencor Corporation Broadband light source including transparent portion with high hydroxide content
US9615439B2 (en) 2015-01-09 2017-04-04 Kla-Tencor Corporation System and method for inhibiting radiative emission of a laser-sustained plasma source
US10217625B2 (en) * 2015-03-11 2019-02-26 Kla-Tencor Corporation Continuous-wave laser-sustained plasma illumination source
US9891175B2 (en) 2015-05-08 2018-02-13 Kla-Tencor Corporation System and method for oblique incidence scanning with 2D array of spots
US10008378B2 (en) * 2015-05-14 2018-06-26 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability
US10283342B2 (en) * 2015-12-06 2019-05-07 Kla-Tencor Corporation Laser sustained plasma light source with graded absorption features
JP2018037276A (ja) * 2016-08-31 2018-03-08 ウシオ電機株式会社 レーザ駆動ランプ
US10495287B1 (en) 2017-01-03 2019-12-03 Kla-Tencor Corporation Nanocrystal-based light source for sample characterization
US10690589B2 (en) * 2017-07-28 2020-06-23 Kla-Tencor Corporation Laser sustained plasma light source with forced flow through natural convection
US10691024B2 (en) 2018-01-26 2020-06-23 Kla-Tencor Corporation High-power short-pass total internal reflection filter
US10714327B2 (en) 2018-03-19 2020-07-14 Kla-Tencor Corporation System and method for pumping laser sustained plasma and enhancing selected wavelengths of output illumination
US10568195B2 (en) 2018-05-30 2020-02-18 Kla-Tencor Corporation System and method for pumping laser sustained plasma with a frequency converted illumination source
US11262591B2 (en) 2018-11-09 2022-03-01 Kla Corporation System and method for pumping laser sustained plasma with an illumination source having modified pupil power distribution
US11121521B2 (en) 2019-02-25 2021-09-14 Kla Corporation System and method for pumping laser sustained plasma with interlaced pulsed illumination sources
US11862922B2 (en) * 2020-12-21 2024-01-02 Energetiq Technology, Inc. Light emitting sealed body and light source device
US11972931B2 (en) * 2020-12-21 2024-04-30 Hamamatsu Photonics K.K. Light emitting sealed body, light emitting unit, and light source device
US20240276625A1 (en) * 2023-02-14 2024-08-15 Kla Corporation Vuv laser-sustained plasma light source with long-pass filtering

Family Cites Families (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3054921A (en) * 1960-12-08 1962-09-18 Union Carbide Corp Electric lamp
US3682525A (en) * 1970-06-26 1972-08-08 Westinghouse Electric Corp Method of seasoning crystalline ceramic discharge lamps
US3748518A (en) * 1972-06-14 1973-07-24 Westinghouse Electric Corp Fluorescent lamp having titania-doped glass envelope with transparent buffer film of titania
SU470019A1 (ru) 1973-05-31 1975-05-05 Предприятие П/Я М-5907 Малогабаритна люминесцентна лампа
CA1015817A (en) * 1974-06-13 1977-08-16 Canadian Patents And Development Limited Liquid-cooled arc radiation source
US4049987A (en) * 1976-06-04 1977-09-20 The Perkin-Elmer Corporation Ozone absorbance controller
JPS5699959A (en) * 1979-12-26 1981-08-11 Sylvania Electric Prod Fluorescent discharge lamp
JPS5821293A (ja) * 1981-07-29 1983-02-08 株式会社日立製作所 ガス放電発光装置およびその駆動方法
US4524299A (en) * 1982-04-08 1985-06-18 North American Philips Corporation Fluorescent sunlamp having controlled ultraviolet output
US4935668A (en) * 1988-02-18 1990-06-19 General Electric Company Metal halide lamp having vacuum shroud for improved performance
US4949005A (en) * 1988-11-14 1990-08-14 General Electric Company Tantala-silica interference filters and lamps using same
CA2017471C (en) * 1989-07-19 2000-10-24 Matthew Eric Krisl Optical interference coatings and lamps using same
RU1775751C (ru) 1991-02-19 1992-11-15 Саранское производственное объединение "Лисма" Газоразр дна лампа
DE59105798D1 (de) * 1991-04-15 1995-07-27 Heraeus Noblelight Gmbh Bestrahlungseinrichtung.
US5345465A (en) * 1992-08-10 1994-09-06 The University Of Iowa Research Foundation Apparatus and method for guiding an electric discharge
DE4432315A1 (de) * 1994-09-12 1996-03-14 Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh Quecksilberdampf-Kurzbogenlampe
US5658612A (en) * 1995-09-29 1997-08-19 Osram Sylvania Inc. Method for making a tantala/silica interference filter on the surface of a tungsten-halogen incandescent lamp
US6052401A (en) * 1996-06-12 2000-04-18 Rutgers, The State University Electron beam irradiation of gases and light source using the same
JP2000285854A (ja) * 1999-03-30 2000-10-13 Toshiba Lighting & Technology Corp ２重管形放電ランプおよび照明装置
DE19933023A1 (de) * 1999-07-15 2001-01-18 Philips Corp Intellectual Pty Gasentladungslampe
EP1384245A4 (en) * 2001-03-30 2005-03-16 Advanced Lighting Tech Inc IMPROVED PLASMA LAMP AND METHOD
US20020145875A1 (en) 2001-04-10 2002-10-10 Perkinelmer Optoelectronics N.C., Inc. Compact water-cooled multi-kilowatt lamp
JP4221561B2 (ja) * 2002-10-02 2009-02-12 株式会社ジーエス・ユアサコーポレーション エキシマランプ
KR100541380B1 (ko) * 2002-12-20 2006-01-11 주식회사 일진옵텍 자외선 및 적외선 차단용 코팅 박막
JP4177720B2 (ja) 2003-06-25 2008-11-05 ハリソン東芝ライティング株式会社 閃光放電ランプ、閃光放電ランプ点灯装置および光照射装置
US7772773B1 (en) * 2003-11-13 2010-08-10 Imaging Systems Technology Electrode configurations for plasma-dome PDP
US20050168148A1 (en) * 2004-01-30 2005-08-04 General Electric Company Optical control of light in ceramic arctubes
WO2006085896A2 (en) * 2004-05-13 2006-08-17 Nanodynamics, Inc. Self assembled nanotubes and methods for preparing the same
US7166963B2 (en) * 2004-09-10 2007-01-23 Axcelis Technologies, Inc. Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation
JP2006099966A (ja) * 2004-09-28 2006-04-13 Hitachi Lighting Ltd Ｈｉｄランプ
CN100529892C (zh) * 2005-04-23 2009-08-19 鸿富锦精密工业（深圳）有限公司 冷阴极灯管和使用该灯管的背光模组
US7336416B2 (en) * 2005-04-27 2008-02-26 Asml Netherlands B.V. Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
KR20070012224A (ko) * 2005-07-22 2007-01-25 도시바 라이텍쿠 가부시키가이샤 자외선 차단 재료, 자외선 차단 가시 선택 투과 필터, 가시선택 투과 수지 재료, 광원 및 조명 장치
US20070099001A1 (en) * 2005-10-27 2007-05-03 Cymer, Inc. Blister resistant optical coatings
US7989786B2 (en) * 2006-03-31 2011-08-02 Energetiq Technology, Inc. Laser-driven light source
US7435982B2 (en) * 2006-03-31 2008-10-14 Energetiq Technology, Inc. Laser-driven light source
US8525138B2 (en) 2006-03-31 2013-09-03 Energetiq Technology, Inc. Laser-driven light source
EP2008296A2 (en) * 2006-04-11 2008-12-31 Luxim Corporation Methods and apparatus for thermal management and light recycling
US7705331B1 (en) 2006-06-29 2010-04-27 Kla-Tencor Technologies Corp. Methods and systems for providing illumination of a specimen for a process performed on the specimen
US7772749B2 (en) * 2007-05-01 2010-08-10 General Electric Company Wavelength filtering coating for high temperature lamps
JP5126965B2 (ja) * 2007-12-18 2013-01-23 株式会社東通研 水冷式紫外線照射装置
JP4998827B2 (ja) 2008-01-31 2012-08-15 ウシオ電機株式会社 エキシマランプ
US9279982B2 (en) * 2008-08-25 2016-03-08 Konica Minolta Holdings, Inc. Weather-resistant article, weather-resistant film and optical member
JP5252586B2 (ja) 2009-04-15 2013-07-31 ウシオ電機株式会社 レーザー駆動光源
JP2011049513A (ja) * 2009-07-30 2011-03-10 Ushio Inc 光源装置
JP2011175823A (ja) * 2010-02-24 2011-09-08 Ushio Inc 蛍光ランプ
US8643840B2 (en) * 2010-02-25 2014-02-04 Kla-Tencor Corporation Cell for light source
DE102010033446B4 (de) * 2010-08-04 2012-03-22 Heraeus Noblelight Gmbh Quecksilberdampflampe für eine homogene flächenhafte Bestrahlung
US9047985B2 (en) * 2012-10-19 2015-06-02 Infineon Technologies Dresden Gmbh Apparatus, storage device, switch and methods, which include microstructures extending from a support

Similar Documents

Publication Publication Date Title
JP2015505419A5 (https=)
WO2013066576A3 (en) Plasma cell for laser sustained plasma light source
GB2526956B (en) Ultraviolet light discharge lamp apparatuses having transparent housings and configurations for routing gas through the housings
JP2012129505A5 (https=)
JP2016080613A5 (ja) ガスセルおよび原子発振器
SG11201506470UA (en) Extreme ultraviolet lithography mask blank manufacturing system and method of operation therefor
SG11201604722WA (en) Glass ceramic for ultraviolet lithography and method of manufacturing thereof
JP2018168606A5 (https=)
MX2018014392A (es) Cartucho para un sistema generador de aerosol.
CL2013000963A1 (es) "tubo para el consumidor final con mínima oxidación interior y exterior, con granos que pueden ser seleccionables en tamaño y orden; y proceso de producción de los tubos".
EP3088572A4 (en) Quartz glass crucible and manufacturing method therefor
EA201692183A1 (ru) Способ и устройство для плавки и осветления стекла
EP1876181A4 (en) IONIC LIQUID CONTAINING PHOSPHONIUMION AND METHOD OF MANUFACTURING THEREOF
USD704377S1 (en) Alien lamp
Yang et al. On the exact multicast delay in mobile ad hoc networks with f-cast relay
Girotti Riemann–Hilbert approach to gap probabilities for the Bessel process
WO2016193694A8 (en) Mercury-free gas-discharge lamp
ITUA20163249A1 (it) Camera di scarico di gas da vuoto e linea di produzione di vetro sotto vuoto
CN302267741S (zh) 低频高压气体放电镇流器（ab型）
US20130217293A1 (en) Mechanism for Creating Smoke-Blowing Figurines
JP2011151020A5 (https=)
CN302392708S (zh) 可换壳高压气体放电镇流器（m型）
CN302385765S (zh) 电弧管
WO2017207848A9 (es) Blanco sólido de gases nobles para reacciones nucleares
DE502006008974D1 (de) Metallhalogenidlampe