JP2015205262A - 洗浄装置 - Google Patents
洗浄装置 Download PDFInfo
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- JP2015205262A JP2015205262A JP2014088987A JP2014088987A JP2015205262A JP 2015205262 A JP2015205262 A JP 2015205262A JP 2014088987 A JP2014088987 A JP 2014088987A JP 2014088987 A JP2014088987 A JP 2014088987A JP 2015205262 A JP2015205262 A JP 2015205262A
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- Prior art keywords
- cleaning liquid
- fluid nozzle
- cleaning
- check valve
- pressure gauge
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- 238000005406 washing Methods 0.000 title abstract description 19
- 239000007788 liquid Substances 0.000 claims abstract description 154
- 239000012530 fluid Substances 0.000 claims abstract description 111
- 238000004140 cleaning Methods 0.000 claims description 209
- 238000012423 maintenance Methods 0.000 description 15
- 239000002699 waste material Substances 0.000 description 9
- 238000003754 machining Methods 0.000 description 6
- 238000012544 monitoring process Methods 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 239000007921 spray Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 230000005856 abnormality Effects 0.000 description 3
- 230000002950 deficient Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Nozzles (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
1 洗浄装置
3 保持手段
4 2流体ノズル
41 洗浄液供給源
42 洗浄液用配管
45 逆止弁
46 圧力ゲージ
51 気体供給源
52 気体用配管
72 判断部
Claims (1)
- 気体と洗浄液とを混合させた2流体を噴出する2流体ノズルと、被洗浄物を保持する保持手段と、を、備え、該2流体ノズルから噴出される該2流体で該保持手段が保持する被洗浄物を洗浄する洗浄装置であって、
気体供給源と該2流体ノズルとを連通する気体用配管と、
洗浄液供給源と該2流体ノズルとを連通する洗浄液用配管と、
該洗浄液用配管に配設される逆止弁と、
該逆止弁と該洗浄液供給源との間に配設され該洗浄液用配管の内部圧力を認識する圧力ゲージと、を、備え、
該逆止弁は、該2流体ノズルから該洗浄液供給源に向かう方向で該洗浄液用配管へ気体の流入を遮断するように方向付けられていて、
該2流体ノズルに気体と洗浄液を供給した時に、該圧力ゲージの値が、該逆止弁の作動圧力から該洗浄液供給源の圧力までの範囲で予め設定される設定範囲に入っていれば該2流体ノズルに洗浄液が供給されていると判断する判断部を有する洗浄装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014088987A JP2015205262A (ja) | 2014-04-23 | 2014-04-23 | 洗浄装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014088987A JP2015205262A (ja) | 2014-04-23 | 2014-04-23 | 洗浄装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2015205262A true JP2015205262A (ja) | 2015-11-19 |
Family
ID=54602582
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014088987A Pending JP2015205262A (ja) | 2014-04-23 | 2014-04-23 | 洗浄装置 |
Country Status (1)
Country | Link |
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JP (1) | JP2015205262A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107008707A (zh) * | 2017-06-02 | 2017-08-04 | 武汉华星光电技术有限公司 | 歧管清洗装置及歧管清洗方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61192960A (ja) * | 1985-02-21 | 1986-08-27 | Koyo Seiko Co Ltd | 潤滑油供給異常検知方法 |
JP2008136913A (ja) * | 2006-11-30 | 2008-06-19 | Optrex Corp | 洗浄装置 |
JP2012004204A (ja) * | 2010-06-15 | 2012-01-05 | Disco Abrasive Syst Ltd | パッド洗浄装置およびパッド洗浄方法 |
-
2014
- 2014-04-23 JP JP2014088987A patent/JP2015205262A/ja active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61192960A (ja) * | 1985-02-21 | 1986-08-27 | Koyo Seiko Co Ltd | 潤滑油供給異常検知方法 |
JP2008136913A (ja) * | 2006-11-30 | 2008-06-19 | Optrex Corp | 洗浄装置 |
JP2012004204A (ja) * | 2010-06-15 | 2012-01-05 | Disco Abrasive Syst Ltd | パッド洗浄装置およびパッド洗浄方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107008707A (zh) * | 2017-06-02 | 2017-08-04 | 武汉华星光电技术有限公司 | 歧管清洗装置及歧管清洗方法 |
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